KR101127779B1 - 웨이퍼 불균일성 및 그래픽적 탐색의 유의성을 정량화하기위한 유저 인터페이스 - Google Patents

웨이퍼 불균일성 및 그래픽적 탐색의 유의성을 정량화하기위한 유저 인터페이스 Download PDF

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Publication number
KR101127779B1
KR101127779B1 KR1020057005323A KR20057005323A KR101127779B1 KR 101127779 B1 KR101127779 B1 KR 101127779B1 KR 1020057005323 A KR1020057005323 A KR 1020057005323A KR 20057005323 A KR20057005323 A KR 20057005323A KR 101127779 B1 KR101127779 B1 KR 101127779B1
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KR
South Korea
Prior art keywords
wafer
data
selection
measurement data
area
Prior art date
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KR1020057005323A
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English (en)
Korean (ko)
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KR20050084603A (ko
Inventor
조르제 루케
3세 앤드류 디 베일리
마크 윌콕슨
Original Assignee
램 리써치 코포레이션
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Publication date
Priority claimed from US10/331,194 external-priority patent/US7239737B2/en
Priority claimed from US10/452,248 external-priority patent/US7738693B2/en
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20050084603A publication Critical patent/KR20050084603A/ko
Application granted granted Critical
Publication of KR101127779B1 publication Critical patent/KR101127779B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020057005323A 2002-09-26 2003-09-24 웨이퍼 불균일성 및 그래픽적 탐색의 유의성을 정량화하기위한 유저 인터페이스 KR101127779B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US41402102P 2002-09-26 2002-09-26
US60/414,021 2002-09-26
US10/331,194 2002-12-24
US10/331,194 US7239737B2 (en) 2002-09-26 2002-12-24 User interface for quantifying wafer non-uniformities and graphically explore significance
US10/452,248 2003-05-30
US10/452,248 US7738693B2 (en) 2002-12-24 2003-05-30 User interface for wafer data analysis and visualization
PCT/US2003/030456 WO2004030083A2 (fr) 2002-09-26 2003-09-24 Interface utilisateur permettant de quantifier les aspects non uniformes d'une plaquette et d'explorer graphiquement leur signification

Publications (2)

Publication Number Publication Date
KR20050084603A KR20050084603A (ko) 2005-08-26
KR101127779B1 true KR101127779B1 (ko) 2012-03-27

Family

ID=32045857

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057005323A KR101127779B1 (ko) 2002-09-26 2003-09-24 웨이퍼 불균일성 및 그래픽적 탐색의 유의성을 정량화하기위한 유저 인터페이스

Country Status (6)

Country Link
EP (1) EP1543550A2 (fr)
JP (1) JP2006515468A (fr)
KR (1) KR101127779B1 (fr)
AU (1) AU2003299056A1 (fr)
TW (1) TWI229914B (fr)
WO (1) WO2004030083A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4290204B2 (ja) * 2007-02-13 2009-07-01 東京エレクトロン株式会社 基板処理装置の設定操作支援装置，設定操作支援方法，プログラムを記憶する記憶媒体
JP5597056B2 (ja) * 2010-08-02 2014-10-01 株式会社キーエンス 画像測定装置、画像測定方法及び画像測定装置用のプログラム

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228430A (ja) 1998-11-30 2000-08-15 Hitachi Ltd 回路パターンの検査装置、検査システム、および検査方法
US20010000460A1 (en) 1989-07-12 2001-04-26 Kazuko Ishihara Semiconductor failure analysis system
US20020051565A1 (en) 2000-10-26 2002-05-02 Takashi Hiroi Circuit pattern inspection method and apparatus
JP2002148027A (ja) 2000-11-09 2002-05-22 Hitachi Ltd パターン検査方法及び装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5127726A (en) * 1989-05-19 1992-07-07 Eastman Kodak Company Method and apparatus for low angle, high resolution surface inspection
JP2941308B2 (ja) * 1989-07-12 1999-08-25 株式会社日立製作所 検査システムおよび電子デバイスの製造方法
US5448399A (en) * 1992-03-13 1995-09-05 Park Scientific Instruments Optical system for scanning microscope
US5761064A (en) * 1995-10-06 1998-06-02 Advanced Micro Devices, Inc. Defect management system for productivity and yield improvement
JPH1145919A (ja) * 1997-07-24 1999-02-16 Hitachi Ltd 半導体基板の製造方法
JP4006119B2 (ja) * 1998-11-30 2007-11-14 株式会社日立製作所 回路パターン検査装置、および回路パターン検査方法
US6477685B1 (en) * 1999-09-22 2002-11-05 Texas Instruments Incorporated Method and apparatus for yield and failure analysis in the manufacturing of semiconductors
JP3996728B2 (ja) * 2000-03-08 2007-10-24 株式会社日立製作所 表面検査装置およびその方法
JP4526661B2 (ja) * 2000-06-28 2010-08-18 株式会社日立製作所 検査装置および検査方法
US6586263B2 (en) * 2000-09-18 2003-07-01 Neuristics Physics Laboratory, Inc. Correction of overlay offset between inspection layers in integrated circuits

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010000460A1 (en) 1989-07-12 2001-04-26 Kazuko Ishihara Semiconductor failure analysis system
JP2000228430A (ja) 1998-11-30 2000-08-15 Hitachi Ltd 回路パターンの検査装置、検査システム、および検査方法
US20020051565A1 (en) 2000-10-26 2002-05-02 Takashi Hiroi Circuit pattern inspection method and apparatus
JP2002148027A (ja) 2000-11-09 2002-05-22 Hitachi Ltd パターン検査方法及び装置

Also Published As

Publication number Publication date
JP2006515468A (ja) 2006-05-25
TW200414395A (en) 2004-08-01
WO2004030083A3 (fr) 2004-07-15
EP1543550A2 (fr) 2005-06-22
WO2004030083A2 (fr) 2004-04-08
TWI229914B (en) 2005-03-21
KR20050084603A (ko) 2005-08-26
AU2003299056A1 (en) 2004-04-19

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