AU2003299056A1 - User interface for quantifying wafer non-uniformities and graphically explore significance - Google Patents

User interface for quantifying wafer non-uniformities and graphically explore significance

Info

Publication number
AU2003299056A1
AU2003299056A1 AU2003299056A AU2003299056A AU2003299056A1 AU 2003299056 A1 AU2003299056 A1 AU 2003299056A1 AU 2003299056 A AU2003299056 A AU 2003299056A AU 2003299056 A AU2003299056 A AU 2003299056A AU 2003299056 A1 AU2003299056 A1 AU 2003299056A1
Authority
AU
Australia
Prior art keywords
uniformities
user interface
wafer non
significance
quantifying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003299056A
Other languages
English (en)
Inventor
Iii Andrew D. Bailey
Jorge Luque
Mark Wilcoxson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/331,194 external-priority patent/US7239737B2/en
Priority claimed from US10/452,248 external-priority patent/US7738693B2/en
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of AU2003299056A1 publication Critical patent/AU2003299056A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
AU2003299056A 2002-09-26 2003-09-24 User interface for quantifying wafer non-uniformities and graphically explore significance Abandoned AU2003299056A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US41402102P 2002-09-26 2002-09-26
US60/414,021 2002-09-26
US10/331,194 2002-12-24
US10/331,194 US7239737B2 (en) 2002-09-26 2002-12-24 User interface for quantifying wafer non-uniformities and graphically explore significance
US10/452,248 2003-05-30
US10/452,248 US7738693B2 (en) 2002-12-24 2003-05-30 User interface for wafer data analysis and visualization
PCT/US2003/030456 WO2004030083A2 (fr) 2002-09-26 2003-09-24 Interface utilisateur permettant de quantifier les aspects non uniformes d'une plaquette et d'explorer graphiquement leur signification

Publications (1)

Publication Number Publication Date
AU2003299056A1 true AU2003299056A1 (en) 2004-04-19

Family

ID=32045857

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003299056A Abandoned AU2003299056A1 (en) 2002-09-26 2003-09-24 User interface for quantifying wafer non-uniformities and graphically explore significance

Country Status (6)

Country Link
EP (1) EP1543550A2 (fr)
JP (1) JP2006515468A (fr)
KR (1) KR101127779B1 (fr)
AU (1) AU2003299056A1 (fr)
TW (1) TWI229914B (fr)
WO (1) WO2004030083A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4290204B2 (ja) * 2007-02-13 2009-07-01 東京エレクトロン株式会社 基板処理装置の設定操作支援装置，設定操作支援方法，プログラムを記憶する記憶媒体
JP5597056B2 (ja) * 2010-08-02 2014-10-01 株式会社キーエンス 画像測定装置、画像測定方法及び画像測定装置用のプログラム

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5127726A (en) * 1989-05-19 1992-07-07 Eastman Kodak Company Method and apparatus for low angle, high resolution surface inspection
JP2941308B2 (ja) * 1989-07-12 1999-08-25 株式会社日立製作所 検査システムおよび電子デバイスの製造方法
US6185324B1 (en) 1989-07-12 2001-02-06 Hitachi, Ltd. Semiconductor failure analysis system
US5448399A (en) * 1992-03-13 1995-09-05 Park Scientific Instruments Optical system for scanning microscope
US5761064A (en) * 1995-10-06 1998-06-02 Advanced Micro Devices, Inc. Defect management system for productivity and yield improvement
JPH1145919A (ja) * 1997-07-24 1999-02-16 Hitachi Ltd 半導体基板の製造方法
JP4206192B2 (ja) * 2000-11-09 2009-01-07 株式会社日立製作所 パターン検査方法及び装置
JP4006119B2 (ja) * 1998-11-30 2007-11-14 株式会社日立製作所 回路パターン検査装置、および回路パターン検査方法
JP4041630B2 (ja) * 1998-11-30 2008-01-30 株式会社日立製作所 回路パターンの検査装置および検査方法
US6477685B1 (en) * 1999-09-22 2002-11-05 Texas Instruments Incorporated Method and apparatus for yield and failure analysis in the manufacturing of semiconductors
JP3996728B2 (ja) * 2000-03-08 2007-10-24 株式会社日立製作所 表面検査装置およびその方法
JP4526661B2 (ja) * 2000-06-28 2010-08-18 株式会社日立製作所 検査装置および検査方法
US6586263B2 (en) * 2000-09-18 2003-07-01 Neuristics Physics Laboratory, Inc. Correction of overlay offset between inspection layers in integrated circuits
US6975754B2 (en) * 2000-10-26 2005-12-13 Hitachi, Ltd. Circuit pattern inspection method and apparatus

Also Published As

Publication number Publication date
EP1543550A2 (fr) 2005-06-22
JP2006515468A (ja) 2006-05-25
KR101127779B1 (ko) 2012-03-27
WO2004030083A2 (fr) 2004-04-08
TW200414395A (en) 2004-08-01
TWI229914B (en) 2005-03-21
WO2004030083A3 (fr) 2004-07-15
KR20050084603A (ko) 2005-08-26

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase