KR101121809B1 - 런 투 런 제어를 위한 방법 및 시스템 - Google Patents

런 투 런 제어를 위한 방법 및 시스템 Download PDF

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KR101121809B1
KR101121809B1 KR1020067016060A KR20067016060A KR101121809B1 KR 101121809 B1 KR101121809 B1 KR 101121809B1 KR 1020067016060 A KR1020067016060 A KR 1020067016060A KR 20067016060 A KR20067016060 A KR 20067016060A KR 101121809 B1 KR101121809 B1 KR 101121809B1
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process control
input data
control input
output data
control output
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KR20070012340A (ko
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홍유 유이
조셉 윌리엄 와이즈먼
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어드밴스드 마이크로 디바이시즈, 인코포레이티드
도쿄엘렉트론가부시키가이샤
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/06—Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/041—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a variable is automatically adjusted to optimise the performance

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Evolutionary Computation (AREA)
  • Automation & Control Theory (AREA)
  • Health & Medical Sciences (AREA)
  • Software Systems (AREA)
  • Artificial Intelligence (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Medical Informatics (AREA)
  • Business, Economics & Management (AREA)
  • Strategic Management (AREA)
  • Human Resources & Organizations (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Economics (AREA)
  • Game Theory and Decision Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Business, Economics & Management (AREA)
  • Tourism & Hospitality (AREA)
  • Quality & Reliability (AREA)
  • Operations Research (AREA)
  • Marketing (AREA)
  • Educational Administration (AREA)
  • Development Economics (AREA)
  • Drying Of Semiconductors (AREA)
  • Feedback Control In General (AREA)
KR1020067016060A 2004-03-30 2005-02-01 런 투 런 제어를 위한 방법 및 시스템 Expired - Fee Related KR101121809B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/811,932 US7127358B2 (en) 2004-03-30 2004-03-30 Method and system for run-to-run control
US10/811,932 2004-03-30
PCT/US2005/002770 WO2005103997A2 (en) 2004-03-30 2005-02-01 Method and system for run-to-run control

Publications (2)

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KR20070012340A KR20070012340A (ko) 2007-01-25
KR101121809B1 true KR101121809B1 (ko) 2012-03-20

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US (1) US7127358B2 (https=)
EP (1) EP1733325A4 (https=)
JP (1) JP4971132B2 (https=)
KR (1) KR101121809B1 (https=)
CN (1) CN100530206C (https=)
TW (1) TWI292111B (https=)
WO (1) WO2005103997A2 (https=)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8765167B2 (en) 2001-10-12 2014-07-01 Monosol Rx, Llc Uniform films for rapid-dissolve dosage form incorporating anti-tacking compositions
US10285910B2 (en) 2001-10-12 2019-05-14 Aquestive Therapeutics, Inc. Sublingual and buccal film compositions
US20190328679A1 (en) 2001-10-12 2019-10-31 Aquestive Therapeutics, Inc. Uniform films for rapid-dissolve dosage form incorporating anti-tacking compositions
US20110033542A1 (en) 2009-08-07 2011-02-10 Monosol Rx, Llc Sublingual and buccal film compositions
US8603514B2 (en) 2002-04-11 2013-12-10 Monosol Rx, Llc Uniform films for rapid dissolve dosage form incorporating taste-masking compositions
US11207805B2 (en) 2001-10-12 2021-12-28 Aquestive Therapeutics, Inc. Process for manufacturing a resulting pharmaceutical film
US20070281003A1 (en) 2001-10-12 2007-12-06 Fuisz Richard C Polymer-Based Films and Drug Delivery Systems Made Therefrom
US8900497B2 (en) 2001-10-12 2014-12-02 Monosol Rx, Llc Process for making a film having a substantially uniform distribution of components
US7357891B2 (en) 2001-10-12 2008-04-15 Monosol Rx, Llc Process for making an ingestible film
US8900498B2 (en) 2001-10-12 2014-12-02 Monosol Rx, Llc Process for manufacturing a resulting multi-layer pharmaceutical film
KR100909184B1 (ko) * 2004-03-11 2009-07-23 주식회사 동진쎄미켐 근적외선 분광기를 이용한 리쏘그래피 공정용 조성물의실시간 제어 시스템 및 제어 방법
US7309842B1 (en) * 2004-03-19 2007-12-18 Verionix Incorporated Shielded monolithic microplasma source for prevention of continuous thin film formation
US20060079983A1 (en) * 2004-10-13 2006-04-13 Tokyo Electron Limited R2R controller to automate the data collection during a DOE
US7751908B2 (en) * 2004-12-02 2010-07-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for thermal process control
US7532999B2 (en) * 2005-02-25 2009-05-12 International Business Machines Corporation Determining root cause of matching problem and/or fleet measurement precision problem for measurement system
US7340374B2 (en) * 2005-02-25 2008-03-04 International Business Machines Corporation Determining fleet matching problem and root cause issue for measurement system
KR100744121B1 (ko) * 2006-01-11 2007-08-01 삼성전자주식회사 반도체 기판의 처리 방법
DE102006004430B4 (de) * 2006-01-31 2010-06-10 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System für eine fortschrittliche Prozesssteuerung in einem Ätzsystem durch Gasflusssteuerung auf der Grundlage von CD-Messungen
US8026113B2 (en) * 2006-03-24 2011-09-27 Tokyo Electron Limited Method of monitoring a semiconductor processing system using a wireless sensor network
JP2007318036A (ja) * 2006-05-29 2007-12-06 Toshiba Corp 半導体製造装置管理システム、半導体製造装置の異常要因抽出方法及びその管理方法
US7829468B2 (en) * 2006-06-07 2010-11-09 Lam Research Corporation Method and apparatus to detect fault conditions of plasma processing reactor
US7725205B1 (en) 2006-09-21 2010-05-25 Novellus Systems, Inc. Apparatus and methods for providing a homogenous I/O interface for controlling a heterogenous mixture of hardware I/O systems
US20080233269A1 (en) * 2007-03-20 2008-09-25 Tokyo Electron Limited Apparatus and methods for applying a layer of a spin-on material on a series of substrates
US20080248412A1 (en) * 2007-04-09 2008-10-09 John Douglas Stuber Supervisory etch cd control
DE102007017592B4 (de) * 2007-04-13 2011-11-24 Texas Instruments Deutschland Gmbh Verfahren zur Regelung eines Epitaxieaufwachsverfahrens in einem Epitaxiereaktor, Regler und Datenanlysemodul für Epitaxieaufwachsverfahren
US7720560B2 (en) * 2007-07-26 2010-05-18 International Business Machines Corporation Semiconductor manufacturing process monitoring
US7925369B2 (en) * 2007-12-18 2011-04-12 Globalfoundries Inc. Method and apparatus for optimizing models for extracting dose and focus from critical dimension
JP4917527B2 (ja) * 2007-12-21 2012-04-18 東京エレクトロン株式会社 情報処理装置、情報処理方法、およびプログラム
ES2342958B2 (es) * 2008-09-03 2011-07-04 Emite Ingenieria Slne Analizador de multiples entradas y multiples salidas.
US8355810B2 (en) * 2009-01-29 2013-01-15 Applied Materials, Inc. Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility
US8983631B2 (en) * 2009-06-30 2015-03-17 Lam Research Corporation Arrangement for identifying uncontrolled events at the process module level and methods thereof
CN102044482B (zh) * 2009-10-20 2013-03-06 中芯国际集成电路制造(上海)有限公司 沟槽的形成方法
US8577488B2 (en) * 2010-02-11 2013-11-05 Monosol Rx, Llc Method and system for optimizing film production and minimizing film scrap
US9149959B2 (en) 2010-10-22 2015-10-06 Monosol Rx, Llc Manufacturing of small film strips
US20130046494A1 (en) * 2011-08-18 2013-02-21 General Electric Company Meter having a fiber optic interface
US10295993B2 (en) * 2011-09-01 2019-05-21 Kla-Tencor Corporation Method and system for detecting and correcting problematic advanced process control parameters
US8917261B2 (en) * 2012-06-26 2014-12-23 Atmel Corporation Pixel occlusion mitigation
WO2014068981A1 (ja) * 2012-10-31 2014-05-08 東京エレクトロン株式会社 基板処理装置及び基板処理装置の制御装置
US9711332B2 (en) * 2013-05-09 2017-07-18 Lam Research Corporation Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator
US9606519B2 (en) * 2013-10-14 2017-03-28 Applied Materials, Inc. Matching process controllers for improved matching of process
CN104733277B (zh) * 2013-12-23 2017-03-08 中微半导体设备(上海)有限公司 等离子体刻蚀系统
CN104733279B (zh) * 2013-12-23 2017-02-15 中微半导体设备(上海)有限公司 等离子体刻蚀系统
EP2937747A1 (de) * 2014-04-24 2015-10-28 Siemens Aktiengesellschaft Auf Modellierung einer Beizlinie beruhende Optimierung einer Sequenz von zu beizenden Bändern
EP3164983B1 (en) * 2014-07-03 2018-05-16 Atlas Copco Industrial Technique AB Methods and systems for facilitating communication in a work tools network environment
US10102321B2 (en) * 2014-10-24 2018-10-16 Lam Research Corporation System, method and apparatus for refining radio frequency transmission system models
CN104332435B (zh) * 2014-11-17 2017-07-21 北京七星华创电子股份有限公司 一种半导体工艺设备的参数调整方法
KR102553462B1 (ko) * 2015-07-21 2023-07-10 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 플라즈마 처리 방법
CN105185680B (zh) * 2015-09-22 2017-10-03 上海华力微电子有限公司 一种电流检测装置及介质膜蚀刻装置
US11273131B2 (en) 2016-05-05 2022-03-15 Aquestive Therapeutics, Inc. Pharmaceutical compositions with enhanced permeation
KR20230137362A (ko) 2016-05-05 2023-10-04 어퀘스티브 테라퓨틱스, 아이엔씨. 강화된 전달 에프네프린 조성물
US12427121B2 (en) 2016-05-05 2025-09-30 Aquestive Therapeutics, Inc. Enhanced delivery epinephrine compositions
US12433850B2 (en) 2016-05-05 2025-10-07 Aquestive Therapeutics, Inc. Enhanced delivery epinephrine and prodrug compositions
JP6991833B2 (ja) * 2017-10-31 2022-01-13 株式会社日立製作所 因果関係モデル構築システムおよび方法
US10763144B2 (en) * 2018-03-01 2020-09-01 Verity Instruments, Inc. Adaptable-modular optical sensor based process control system, and method of operation thereof
TWI698728B (zh) * 2018-03-13 2020-07-11 日商住友重機械工業股份有限公司 用以支援製程控制之顯示裝置及顯示方法
SG11202009105YA (en) * 2018-03-20 2020-10-29 Tokyo Electron Ltd Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same
SG11202010209PA (en) 2018-05-24 2020-12-30 Applied Materials Inc Virtual sensor for spatially resolved wafer temperature control
US10770257B2 (en) * 2018-07-20 2020-09-08 Asm Ip Holding B.V. Substrate processing method
CN110931377B (zh) * 2018-09-20 2023-11-03 台湾积体电路制造股份有限公司 反射率测量系统与方法
US10903050B2 (en) * 2018-12-10 2021-01-26 Lam Research Corporation Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity
CN111109643B (zh) * 2019-12-12 2021-10-22 河南中烟工业有限责任公司 一种薄板烘丝的烟丝含水量的控制方法及系统
JP2021180070A (ja) * 2020-05-11 2021-11-18 東京エレクトロン株式会社 プラズマ処理装置及びマイクロ波制御方法
US11587765B2 (en) * 2020-11-22 2023-02-21 Applied Materials, Inc. Plasma ignition optimization in semiconductor processing chambers
EP4355499A2 (en) 2021-06-16 2024-04-24 3M Innovative Properties Company Adhesive dispensing systems and methods
EP4422607A4 (en) 2021-10-25 2025-09-03 Aquestive Therapeutics Inc ORAL AND NASAL COMPOSITIONS AND METHODS OF TREATMENT
US20240213007A1 (en) * 2022-12-27 2024-06-27 Applied Materials, Inc. Power Compensation in PVD Chambers
CN117194963B (zh) * 2023-11-02 2024-02-09 合肥喆塔科技有限公司 工业fdc质量根因分析方法、设备及存储介质
CN117954390B (zh) * 2024-03-21 2024-06-21 粤芯半导体技术股份有限公司 铜互连结构制备方法、装置、设备以及存储介质

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030036791A (ko) * 2000-09-15 2003-05-09 어드밴스드 마이크로 디바이시즈, 인코포레이티드 반도체 제조의 개선된 제어를 위한 적응성 샘플링
JP2003531491A (ja) 2000-04-13 2003-10-21 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド 半導体加工のための自動プロセスモニタおよび分析システム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5408405A (en) * 1993-09-20 1995-04-18 Texas Instruments Incorporated Multi-variable statistical process controller for discrete manufacturing
SE9304246L (sv) * 1993-12-22 1995-06-23 Asea Brown Boveri Förfarande vid övervakning av multivariata processer
US6249712B1 (en) * 1995-09-26 2001-06-19 William J. N-O. Boiquaye Adaptive control process and system
KR0160386B1 (ko) * 1995-10-13 1999-02-01 김광호 반도체소자 제조 공정의 제어 시스템 및 그 제어 방법
AU5881700A (en) * 1999-06-22 2001-01-09 Brooks Automation, Inc. Run-to-run controller for use in microelectronic fabrication
US6439964B1 (en) * 1999-10-12 2002-08-27 Applied Materials, Inc. Method of controlling a polishing machine
ATE303618T1 (de) * 2000-03-10 2005-09-15 Smiths Detection Inc Steuerung für einen industriellen prozes mit einer oder mehreren multidimensionalen variablen
JP4342770B2 (ja) * 2002-05-08 2009-10-14 Ｎｅｃエレクトロニクス株式会社 半導体製造システムおよび半導体製造のプロセス制御方法
JP4995419B2 (ja) * 2002-06-28 2012-08-08 東京エレクトロン株式会社 材料プロセスツール及びパフォーマンスデータを用いてプロセスを制御する方法及びシステム
US7158851B2 (en) * 2003-06-30 2007-01-02 Tokyo Electron Limited Feedforward, feedback wafer to wafer control method for an etch process
US8050900B2 (en) * 2003-09-30 2011-11-01 Tokyo Electron Limited System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003531491A (ja) 2000-04-13 2003-10-21 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド 半導体加工のための自動プロセスモニタおよび分析システム
KR20030036791A (ko) * 2000-09-15 2003-05-09 어드밴스드 마이크로 디바이시즈, 인코포레이티드 반도체 제조의 개선된 제어를 위한 적응성 샘플링

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Adaptive Optimization of Run-to-Run Controller(The EWMA Example, Nital S. Patel, Steven T. Jenkins, IEEE TRANSACTIONS ON SEMICONDUCTOR ENGINEERING Vol.13 No.1, 2000.12월 발행)

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EP1733325A2 (en) 2006-12-20
JP2007531305A (ja) 2007-11-01
CN100530206C (zh) 2009-08-19
WO2005103997A3 (en) 2005-12-29
TW200606687A (en) 2006-02-16
US20050222781A1 (en) 2005-10-06
EP1733325A4 (en) 2007-12-26
WO2005103997A2 (en) 2005-11-03
US7127358B2 (en) 2006-10-24
TWI292111B (en) 2008-01-01
KR20070012340A (ko) 2007-01-25
JP4971132B2 (ja) 2012-07-11
CN1914618A (zh) 2007-02-14

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