KR101120647B1 - 광투과율이 높은 윈도우를 갖는 연마 패드 - Google Patents

광투과율이 높은 윈도우를 갖는 연마 패드 Download PDF

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Publication number
KR101120647B1
KR101120647B1 KR1020040097316A KR20040097316A KR101120647B1 KR 101120647 B1 KR101120647 B1 KR 101120647B1 KR 1020040097316 A KR1020040097316 A KR 1020040097316A KR 20040097316 A KR20040097316 A KR 20040097316A KR 101120647 B1 KR101120647 B1 KR 101120647B1
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South Korea
Prior art keywords
diisocyanate
polishing pad
hexamethylene
window
hydroxyl
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR1020040097316A
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English (en)
Korean (ko)
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KR20050050582A (ko
Inventor
로버츠존브이.에이취.
Original Assignee
롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드
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Application filed by 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드 filed Critical 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드
Publication of KR20050050582A publication Critical patent/KR20050050582A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020040097316A 2003-11-25 2004-11-25 광투과율이 높은 윈도우를 갖는 연마 패드 Expired - Lifetime KR101120647B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/722,739 US6984163B2 (en) 2003-11-25 2003-11-25 Polishing pad with high optical transmission window
US10/722,739 2003-11-25

Publications (2)

Publication Number Publication Date
KR20050050582A KR20050050582A (ko) 2005-05-31
KR101120647B1 true KR101120647B1 (ko) 2012-03-16

Family

ID=34465692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040097316A Expired - Lifetime KR101120647B1 (ko) 2003-11-25 2004-11-25 광투과율이 높은 윈도우를 갖는 연마 패드

Country Status (7)

Country Link
US (1) US6984163B2 (enExample)
EP (1) EP1535699B1 (enExample)
JP (1) JP2005175464A (enExample)
KR (1) KR101120647B1 (enExample)
CN (1) CN100347826C (enExample)
DE (1) DE602004000805T2 (enExample)
TW (1) TWI324545B (enExample)

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Also Published As

Publication number Publication date
US6984163B2 (en) 2006-01-10
TWI324545B (en) 2010-05-11
DE602004000805D1 (de) 2006-06-08
KR20050050582A (ko) 2005-05-31
CN100347826C (zh) 2007-11-07
EP1535699B1 (en) 2006-05-03
JP2005175464A (ja) 2005-06-30
TW200531785A (en) 2005-10-01
CN1622289A (zh) 2005-06-01
DE602004000805T2 (de) 2006-11-30
US20050113008A1 (en) 2005-05-26
EP1535699A1 (en) 2005-06-01

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