KR101117997B1 - 착색 감광성 조성물 - Google Patents

착색 감광성 조성물 Download PDF

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Publication number
KR101117997B1
KR101117997B1 KR1020080063448A KR20080063448A KR101117997B1 KR 101117997 B1 KR101117997 B1 KR 101117997B1 KR 1020080063448 A KR1020080063448 A KR 1020080063448A KR 20080063448 A KR20080063448 A KR 20080063448A KR 101117997 B1 KR101117997 B1 KR 101117997B1
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South Korea
Prior art keywords
epoxy compound
resin
photosensitive composition
component
compound
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KR1020080063448A
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English (en)
Korean (ko)
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KR20090004647A (ko
Inventor
마사루 시다
미츠루 곤도
다이 시오타
데츠야 가토
Original Assignee
도오꾜오까고오교 가부시끼가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1494—Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020080063448A 2007-07-04 2008-07-01 착색 감광성 조성물 Active KR101117997B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00176087 2007-07-04
JP2007176087A JP5096814B2 (ja) 2007-07-04 2007-07-04 着色感光性組成物

Publications (2)

Publication Number Publication Date
KR20090004647A KR20090004647A (ko) 2009-01-12
KR101117997B1 true KR101117997B1 (ko) 2012-02-24

Family

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Family Applications (1)

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KR1020080063448A Active KR101117997B1 (ko) 2007-07-04 2008-07-01 착색 감광성 조성물

Country Status (3)

Country Link
JP (1) JP5096814B2 (enrdf_load_stackoverflow)
KR (1) KR101117997B1 (enrdf_load_stackoverflow)
TW (1) TW200902579A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9268217B2 (en) 2013-08-09 2016-02-23 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011170334A (ja) * 2010-01-20 2011-09-01 Fujifilm Corp ウエハレベルレンズ用黒色硬化性組成物、及びウエハレベルレンズ
JP2012159657A (ja) * 2011-01-31 2012-08-23 Asahi Kasei E-Materials Corp 光硬化型樹脂組成物及びそれを用いたパターン形成された基材の製造方法、並びに該基材を備える電子部品
JP5981159B2 (ja) * 2011-02-22 2016-08-31 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP6181907B2 (ja) * 2011-11-15 2017-08-16 互応化学工業株式会社 カルボキシル基含有樹脂及びソルダーレジスト用樹脂組成物
JP2015134844A (ja) * 2012-05-15 2015-07-27 日本化薬株式会社 反応性ポリエステル化合物、それを用いた活性エネルギー線硬化型樹脂組成物
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
CN103885291A (zh) 2012-12-21 2014-06-25 第一毛织株式会社 光敏树脂组合物及使用其的光阻挡层
CN105849639B (zh) * 2013-11-28 2019-10-22 日本化药株式会社 活性能量射线固化型树脂组合物以及使用该组合物的显示元件用间隔物和/或滤色片保护膜
TWI554567B (zh) * 2014-11-18 2016-10-21 Chi Mei Corp Alkali soluble resin and its photosensitive resin composition and its application
JP2018070724A (ja) * 2016-10-27 2018-05-10 ナガセケムテックス株式会社 不飽和基含有アルカリ可溶性樹脂及びアルカリ可溶型感放射線性樹脂組成物
KR101848567B1 (ko) 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
WO2022230792A1 (ja) 2021-04-28 2022-11-03 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004043573A (ja) 2002-07-10 2004-02-12 Sumitomo Chem Co Ltd 樹脂組成物
KR20040092434A (ko) * 2003-04-24 2004-11-03 스미또모 가가꾸 고교 가부시끼가이샤 흑색 감광성 수지 조성물
KR20050021902A (ko) * 2003-08-28 2005-03-07 신닛테츠가가쿠 가부시키가이샤 감광성 수지조성물 및 그것을 사용한 컬러필터
KR20070121551A (ko) * 2006-06-22 2007-12-27 토쿄오오카코교 가부시기가이샤 착색 감광성 수지 조성물

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101142528B (zh) * 2005-04-13 2011-12-28 株式会社田村制作所 感光性树脂组合物、印刷电路板以及半导体封装基板
JP5343410B2 (ja) * 2007-06-11 2013-11-13 三菱化学株式会社 カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004043573A (ja) 2002-07-10 2004-02-12 Sumitomo Chem Co Ltd 樹脂組成物
KR20040092434A (ko) * 2003-04-24 2004-11-03 스미또모 가가꾸 고교 가부시끼가이샤 흑색 감광성 수지 조성물
KR20050021902A (ko) * 2003-08-28 2005-03-07 신닛테츠가가쿠 가부시키가이샤 감광성 수지조성물 및 그것을 사용한 컬러필터
KR20070121551A (ko) * 2006-06-22 2007-12-27 토쿄오오카코교 가부시기가이샤 착색 감광성 수지 조성물

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9268217B2 (en) 2013-08-09 2016-02-23 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same

Also Published As

Publication number Publication date
JP5096814B2 (ja) 2012-12-12
KR20090004647A (ko) 2009-01-12
TWI374155B (enrdf_load_stackoverflow) 2012-10-11
TW200902579A (en) 2009-01-16
JP2009014970A (ja) 2009-01-22

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