TW200902579A - Colored photosensitive composition - Google Patents

Colored photosensitive composition Download PDF

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TW200902579A
TW200902579A TW097124909A TW97124909A TW200902579A TW 200902579 A TW200902579 A TW 200902579A TW 097124909 A TW097124909 A TW 097124909A TW 97124909 A TW97124909 A TW 97124909A TW 200902579 A TW200902579 A TW 200902579A
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Taiwan
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compound
photosensitive composition
resin
epoxy compound
acid
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TW097124909A
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Chinese (zh)
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TWI374155B (en
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Masaru Shida
Mitsuru Kondo
Dai Shiota
Tetsuya Kato
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Tokyo Ohka Kogyo Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1494Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The present invention provides a colored photosensitive composition having sufficient sensitivity, good adhesion in linearity and forming a pattern excellent in contour and shape. The colored photosensitivity composition comprises a photopolymerizable material (A); a photopolymerizable initiator (B); and a colorant (C), wherein the photopolymerizable compound (A) comprises a resin (A1) obtained by reacting a reaction product of an epoxy compound (a-1) and an ethylenic unsaturated group-containing carboxylic acid compound (a-2) with a polybasic acid anhydride (a-3), and the A1 comprises the unit derived from the epoxy compound having the biphenyl group framework and the unit derived from the epoxy compound having the cardo framework.

Description

200902579 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種著色感光性組成物,尤其關於一 可用於形成遮光性膜之著色感光性組成物,該遮光性模 被使用於彩色濾光片的黑色矩陣等之中。 【先前技術】 先前,作為使用顏料之彩色濾光片的製造方法,已 有染色法、電沉積法、喷墨法、顏料分散法等。於顏料 散法之情形時,係將於利用分散劑等將顏料分散而得之 色組成物中,添加黏合劑樹脂、光聚合起始劑、光聚合 單體等而成為感光化之感光性著色樹脂組成物,塗佈於 璃基板上,使之乾燥後,進行曝光、顯影,藉此而形成 色圖案。其後,進行加熱,將圖案固著而形成像素。對 種顏色反覆實施該等步驟,而形成彩色濾光片。 對於用於形成此種彩色濾光片的影像之感光性著色 脂組成物,要求其具有充分之解析性、與基板之密著性 顯影殘渣少等特性。並且,於顏料分散法之情形時,由 要供應至光微影步驟,故而業界一直在謀求:於顯影步 之除去部分不會產生殘渣或版污;除去部分具有充分之 解性;提高圖案邊緣(edge )之清晰性等像素形成性。 而,近年來隨著所使用之基板的大型化,開始要求顯影 度(margin)較大。 尤其是如黑色矩陣般要求於光的全波長區域具有遮 種 是 知 分 著 性 玻 著 每 樹 、 於 驟 溶 進 裕 光 5200902579 IX. Description of the Invention: [Technical Field] The present invention relates to a color-sensitive photosensitive composition, and more particularly to a color-sensitive photosensitive composition which can be used for forming a light-shielding film which is used for color filter Among the black matrix of the piece, etc. [Prior Art] Conventionally, as a method of producing a color filter using a pigment, a dyeing method, an electrodeposition method, an inkjet method, a pigment dispersion method, and the like have been known. In the case of the pigment dispersion method, a photosensitive resin obtained by dispersing a pigment by a dispersant or the like is added with a binder resin, a photopolymerization initiator, a photopolymerizable monomer, etc., to obtain a photosensitive coloring. The resin composition is applied onto a glass substrate, dried, and then exposed and developed to form a color pattern. Thereafter, heating is performed to fix the pattern to form a pixel. These steps are repeated for the colors to form a color filter. The photosensitive coloring grease composition for forming an image of such a color filter is required to have sufficient analytical properties and adhesion to a substrate and a small amount of development residue. Moreover, in the case of the pigment dispersion method, it is required to supply to the photolithography step, so the industry has been striving that no residue or segregation is generated in the removed portion of the development step; the removed portion has sufficient solubility; (edge) clarity and other pixel formation. Further, in recent years, as the size of the substrate to be used has increased, the development of the margin has been demanded. In particular, as in the case of black matrices, it is required to cover the whole wavelength region of light. It is known that the branching is perforated, and each tree is dissolved into the light.

200902579 能力之情形時,非常難以設置曝光部分與未曝光部分 的交聯密度之差異。因此,即使於曝光部分,亦會產 光照射面側雖然充分硬化,但在基底面側則未硬化等 題。並且,由於大量調配有不溶於顯影液之黑色色料 而亦產生顯影性明顯降低之問題。 因此,為了解決此種問題,目前揭示有使用具有 之盼搭環氧丙烯酸酯(novolac epoxy acrylate)來作為黏合 脂之感光性著色樹脂組成物(例如,參照專利文獻1 並且揭示有使用具有羧基之丙烯酸系樹脂與含脂 環氧基之不飽和化合物的反應物來作為黏合劑樹脂之 性組成物(例如,參照專利文獻2)。 進而揭示有,含有使酸酐,與具有2個環氧基之 化合物與單羧酸的反應物進行反應而獲得之多元羧酸 的樹脂組成物(參照專利文獻3 )。 [專利文獻1 ]日本專利特開平U-84 1 26號公報 [專利文獻2 ]日本專利特開平1 - 2 8 9 8 2 0號公報 [專利文獻3]日本專利特開2 0 04-43 5 73號公報 【發明内容】 [發明所欲解決之問題] 然而,上述專利文獻1〜3中所揭示之樹脂組成拍 在靈敏度不充分,細線密著性不良且容易剝落,並且 殘留殘渣等問題。並且,由於顯影裕度小,故而存在 影而剝離至曝光部,使得圖案邊緣不平整等問題。 之間 生在 之問 ,故 羧基 劑樹 )。 環式 感光 環氧 樹脂 ,存 容易 因顯 6 200902579 本發明係鑒於如上所述之課題而成者,其目的在 供一種著色感光性組成物,其具有充分之靈敏度,細 著性良好,並且可形成輪廓形狀優異之圖案。 [解決問題之手段] 本發明者等人為解決上述課題而反覆進行潛心研 結果發現,利用如下著色感光性組成物可解決上述課 從而完成了本發明,該著色感光性組成物,含有藉由 有特定結構之環氧化合物(a -1 )與含乙烯性不飽和基 酸化合物(a-2)之反應物,進而與多元酸酐(a-3) 反應而獲得之樹脂(A1 )。 更詳細而言,本發明係提供一種著色感光性組成 其含有光聚合性化合物(A )、光聚合起始劑(B )、及 劑(C),其特徵在於:上述光聚合性化合物(A),含 由使環氧化合物(a -1 )與含乙烯性不飽和基之羧酸化 (a-2)之反應物,進而與多元酸酐(a-3)進行反應 得之樹脂(A1);上述(a-1)含有具有聯苯基骨架之 化合物、及具有叶· D朵(C a r d 〇 )骨架之環氧化合物。 [功效] 根據本發明,藉由調配具有不同骨架之樹脂,可 靈敏度,而形成直線性優異之圖案。並且,可容易地 板上形成無細線剝落或殘渣,顯影時不會形成 (undercut)形狀,且輪廓形狀優異之良好的黑色矩陣圖 於提 線密 究。 題, 使具 之羧 進行 物, 著色 有藉 合物 而獲 環氧 無損 在基 底切 案。 200902579 由於在顯影時不會形成底切形狀,故而可容易地提供 1 ο # m以下之細線密著性變得良好、對比度高,且 R、G、Β 之顯色美觀的液晶顯示器用彩色濾光片。並且,於色料之 濃度高之情形時,亦可提供影像形成性優異之彩色濾光片 用感光性著色樹脂組成物、以及使用該感光性著色樹脂組 成物之彩色濾光片及液晶顯示裝置。進而,藉由將特定之 黏合劑樹脂與分散劑進行組合,可提供靈敏度及溶解性之 平衡性優異,並且像素邊緣之清晰性、密著性優異的彩色 渡光片用感光性著色樹脂組成物。 【實施方式】 以下,對本發明之實施形態進行詳細說明。本發明之 著色感光性組成物含有光聚合性化合物(A )、光聚合起始 劑(B )、及著色劑(C )。 <光聚合性化合物(A ) > 光聚合性化合物(A )係受到紫外線等光之照射而進行 聚合,從而進行硬化之物質。具體而言,光聚合性化合物 (A)含有藉由使環氧化合物(a-Ι)與含乙烯性不飽和基 之羧酸化合物(a-2)之反應物進而與多元酸酐(a-3)進 行反應而獲得之樹脂(A1)。並且,環氧化合物(a-Ι)含 有具有聯苯基骨架之環氧化合物、及具有咔哚(Car do)骨架 之環氧化合物。 上述樹脂(A1 )可採用以下兩種態樣。於第一態樣中, 樹脂(A1 )含有:藉由使作為(a -1 )成分之具有聯苯基骨 8 200902579 架之環氧化合物與(a-2)成分之反應物,進而與(a 成分進行反應而獲得之樹脂(A 1 -1 );以及藉由使作為( 成分之具有咔哚骨架之環氧化合物與(a-2)成分之 物,進而與(a - 3 )成分進行反應而獲得之樹脂(A卜 換言之,樹脂(A 1 )含有樹脂(A卜1 )與樹脂(A 1 - 2 樹脂混合物,該樹脂(A 1 -1 )含有由具有聯苯基骨架 氧化合物所衍生之單元,且該樹脂(A 1 - 2 )含有由具 朵骨架之環氧化合物所衍生之單元。 另外,於第二態樣中,樹脂(A1 )含有:藉由使 (a-Ι)成分之具有聯苯基骨架之環氧化合物及具有咔 架之環氧化合物與(a-2)成分之反應物,進而與(a 成分進行反應而獲得之樹脂(A卜3 )。換言之,樹脂 含有樹脂(A 1 - 3 ),該樹脂(A卜3 )含有由具有聯苯基 之環氧化合物所衍生之單元、及由具有0f °朵骨架之環 合物所衍生之單元。 由上述具有聯苯基骨架之環氧化合物(a -1 )所衍 單元,與由具有0朵骨架之環氧化合物所衍生之單元 量比較好的是1: 99〜80: 20,更好的是5: 95〜30: 藉由將具有聯苯基骨架之環氧化合物(a -1 )所衍生之 與由具有咔哚骨架之環氧化合物所衍生之單元的質量 在該範圍内,可使圖案之直線性及顯影後之輪廓變得 良好。 〔環氧化合物(a - 1 )〕 本發明中所使用之環氧化合物(a -1 )係具有聯苯 -3 ) a -1 ) 反應 2) ° )之 之環 有咔 作為 哚骨 -3 ) (A1 ) 骨架 氧化 生之 的質 70 ° tto 一 早兀 比設 更加 基骨 9 200902579 架之環氧化合物及具有咔哚骨架之環氧化合物。 [具有聯苯基骨架之環氧化合物] 具有聯苯基骨架之環氧化合物,於主鏈中具有1個以 上之以下述化學式(4)表示之聯苯基骨架,且具有1個以 上之環氧基。作為環氧化合物(a -1 ),較好的是具有2個 以上之環氧基者,該環氧化合物(a - 1 )可單獨使用,或將 2種以上組合使用。 [化1]In the case of 200902579, it is very difficult to set the difference in crosslink density between the exposed portion and the unexposed portion. Therefore, even in the exposed portion, the side of the light-emitting surface is sufficiently hardened, but it is not cured on the side of the base surface. Further, since a large amount of black coloring material which is insoluble in the developer is blended, there is a problem that developability is remarkably lowered. Therefore, in order to solve such a problem, a photosensitive colored resin composition having a novolac epoxy acrylate as a binder has been disclosed (for example, refer to Patent Document 1 and discloses the use of a carboxyl group. A reaction product of an acrylic resin and an aliphatic epoxy group-containing unsaturated compound is used as a binder resin composition (for example, see Patent Document 2). Further, it is disclosed that an acid anhydride is contained and two epoxy groups are contained. A resin composition of a polyvalent carboxylic acid obtained by reacting a compound with a reaction product of a monocarboxylic acid (see Patent Document 3). [Patent Document 1] Japanese Patent Laid-Open Publication No. U-84 No. 1-26 [Patent Document 2] Japanese Patent [Patent Document 3] Japanese Patent Laid-Open Publication No. JP-A No. WO 04-43 The composition of the resin disclosed in the above is insufficient in sensitivity, poor in fine line adhesion, easy to peel off, and residual residue, etc. Moreover, since the development margin is small, there is a shadow and peeling off. To the exposure part, the edge of the pattern is not flat, etc. The problem arises between the two, so the carboxyl group tree). The present invention is based on the above-mentioned problems, and aims to provide a color-sensitive photosensitive composition which has sufficient sensitivity and good fineness and can be used. A pattern having an excellent contour shape is formed. [Means for Solving the Problem] The present inventors have found that the present invention has been accomplished by solving the above problems in order to solve the above problems, and the present invention has been completed by the following coloring photosensitive composition, and the colored photosensitive composition is contained therein. A resin (A1) obtained by reacting a specific compound epoxy compound (a-1) with a reaction product containing an ethylenically unsaturated acid compound (a-2) and further with a polybasic acid anhydride (a-3). More specifically, the present invention provides a coloring photosensitive composition containing a photopolymerizable compound (A), a photopolymerization initiator (B), and a component (C), characterized in that the photopolymerizable compound (A) a resin (A1) obtained by reacting an epoxy compound (a-1) with a carboxylated (a-2) group containing an ethylenically unsaturated group, and further reacting with a polybasic acid anhydride (a-3); The above (a-1) contains a compound having a biphenyl skeleton and an epoxy compound having a leaf D (C ard 〇) skeleton. [Efficacy] According to the present invention, by blending resins having different skeletons, it is possible to form a pattern excellent in linearity with sensitivity. Further, it is possible to easily form a fine line-free peeling or residue on the sheet, and an undercut shape is formed during development, and a good black matrix pattern excellent in contour shape is used for the wiring. The problem is that the carboxylic acid is carried out, and the coloring is compounded to obtain a non-destructive epoxy substrate. 200902579 Since the undercut shape is not formed during development, it is easy to provide a color filter for liquid crystal displays with good fineness of 1 ο # m or less, high contrast, and excellent color rendering of R, G, and 液晶. Light film. Further, when the concentration of the color material is high, a photosensitive coloring resin composition for a color filter excellent in image formation property, a color filter using the photosensitive colored resin composition, and a liquid crystal display device can be provided. . Further, by combining a specific binder resin and a dispersing agent, it is possible to provide a photosensitive colored resin composition for a color light-passing sheet which is excellent in balance between sensitivity and solubility and which is excellent in sharpness and adhesion of pixel edges. . [Embodiment] Hereinafter, embodiments of the present invention will be described in detail. The colored photosensitive composition of the present invention contains a photopolymerizable compound (A), a photopolymerization initiator (B), and a color former (C). <Photopolymerizable Compound (A) > The photopolymerizable compound (A) is a substance which is polymerized by irradiation with light such as ultraviolet rays to be cured. Specifically, the photopolymerizable compound (A) contains a reaction product of an epoxy compound (a-fluorene) and an ethylenically unsaturated group-containing carboxylic acid compound (a-2) and a polybasic acid anhydride (a-3). The resin (A1) obtained by carrying out the reaction. Further, the epoxy compound (a-fluorene) contains an epoxy compound having a biphenyl skeleton and an epoxy compound having a Car do skeleton. The above resin (A1) can be used in the following two aspects. In the first aspect, the resin (A1) contains: by reacting the epoxy compound having the biphenyl bone 8 200902579 frame with the component (a-2) as the (a-1) component, a resin (A 1 -1 ) obtained by reacting a component; and by reacting the (a - 3 ) component as an (epoxy compound having an anthracene skeleton and a component (a-2) as a component Resin obtained by the reaction (In other words, the resin (A 1 ) contains a resin (A 1 ) and a resin (A 1 - 2 resin mixture, the resin (A 1 -1 ) contains a compound having a biphenyl skeleton oxygen compound) a unit derived therefrom, and the resin (A 1 - 2 ) contains a unit derived from an epoxy compound having a skeleton. Further, in the second aspect, the resin (A1 ) contains: by making (a-Ι) a resin having a biphenyl skeleton and a reaction product of a ruthenium epoxy compound and a component (a-2), and further a resin obtained by reacting a component (Ab 3 ). In other words, a resin Containing a resin (A 1 - 3 ) containing the epoxy compound having a biphenyl group a unit, and a unit derived from a cyclone having a skeleton of 0f °. The unit derived from the above epoxy compound (a-1) having a biphenyl skeleton, and derived from an epoxy compound having 0 skeleton The unit amount is preferably 1:99 to 80:20, more preferably 5:95 to 30: by having an epoxy compound (a-1) having a biphenyl skeleton derived from The mass of the unit derived from the epoxy compound of the skeleton is within this range, and the linearity of the pattern and the contour after development can be made good. [Epoxy compound (a-1)] The epoxy compound used in the present invention (a -1 ) has a biphenyl-3) a -1 ) reaction 2) °) The ring has yttrium as the tibia-3) (A1) The skeleton is oxidized to produce 70 ° tto Bone 9 200902579 Epoxy compound and epoxy compound with anthracene skeleton. [Epoxy compound having a biphenyl skeleton] An epoxy compound having a biphenyl skeleton, having one or more biphenyl skeletons represented by the following chemical formula (4) in the main chain, and having one or more rings Oxygen. The epoxy compound (a-1) is preferably one having two or more epoxy groups, and the epoxy compound (a-1) may be used singly or in combination of two or more. [Chemical 1]

〔式(4 )中,複數個R1分別獨立,表示氫原子、碳 數1〜12之烷基、i素原子、或可具有取代基之苯基,1 表示1〜4之整數。〕 具有聯苯基骨架之環氧化合物之中,較好的是使用以 下述式(1)表示之環氧化合物,尤其好的是使用以下述式 (2)表示之環氧化合物。藉由使用式(2)之環氧化合物, 可提供靈敏度及溶解性之平衡性優異,進而像素邊緣之清 晰性、密著性優異的著色感光性組成物。 [化2]In the formula (4), a plurality of R1's are each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an i atom or a phenyl group which may have a substituent, and 1 represents an integer of 1 to 4. Among the epoxy compounds having a biphenyl skeleton, an epoxy compound represented by the following formula (1) is preferably used, and an epoxy compound represented by the following formula (2) is particularly preferably used. By using the epoxy compound of the formula (2), it is possible to provide a color-sensitive photosensitive composition which is excellent in balance between sensitivity and solubility, and which is excellent in clarity and adhesion of the pixel edge. [Chemical 2]

〔式(1 )中,複數個R1分別獨立,表示氫原子、碳 10 (1) 200902579 數1〜12之烷基、i素原子、或可具有取代基之笨基,η 表示1〜4之整數。m為平均值,表示0〜10之數字,較好 的是小於1。〕 [化3][In the formula (1), a plurality of R1 are each independently, and represent a hydrogen atom, carbon 10 (1) 200902579, an alkyl group of 1 to 12, an i atom, or a stupid group which may have a substituent, and η represents a 1-4. Integer. m is an average value and represents a number from 0 to 10, preferably less than one. 〕 [Chemical 3]

〔式(2)中,m為平均值,表示0〜10之數字,較好 的是小於1。〕 並且,具有聯苯基骨架之環氧化合物之中,亦以使用 以下述式(5)表示之環氧化合物較佳。藉由使用式(5) 之環氧化合物,可提供靈敏度及溶解性之平衡性優異,進 而像素邊緣之清晰性、密著性優異的著色感光性組成物。 [化4][In the formula (2), m is an average value, and represents a number of 0 to 10, preferably less than 1. Further, among the epoxy compounds having a biphenyl skeleton, an epoxy compound represented by the following formula (5) is preferably used. By using the epoxy compound of the formula (5), it is possible to provide a color-sensitive photosensitive composition which is excellent in balance between sensitivity and solubility, and which is excellent in sharpness and adhesion of the edge of the pixel. [Chemical 4]

〔式(5 )中,複數個R3分別獨立,表示氫原子、碳 數1〜12之烷基、鹵素原子、或可具有取代基之苯基。m 為平均值,表示0〜10之數字,較好的是小於1。〕 [具有咔哚骨架之環氧化合物] 具有咔哚骨架之環氧化合物係於咔哚骨架中具有2個 環氧基之化合物,具體而言,較好的是以下述化學式(3) 11 200902579 表示之化合物。In the formula (5), a plurality of R3's are each independently, and represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent. m is an average value representing a number from 0 to 10, preferably less than one. [Epoxy compound having an anthracene skeleton] The epoxy compound having an anthracene skeleton is a compound having two epoxy groups in the anthracene skeleton, and specifically, it is preferably the following chemical formula (3) 11 200902579 Expressed as a compound.

[化5 ][化5]

⑶ 如式(3)表示之具有叶哚骨架之環氧化合物,由於 有咔哚結構,故而耐熱性、耐化學藥品性高。因此,藉 調配具有咔哚骨架之環氧化合物,可提高著色感光性組 物之财熱性及财化學藥品性。 〔含乙烯性不飽和基之羧酸化合物(a - 2 )〕 作為含乙烯性不飽和基之羧酸化合物(a - 2 ),較好 是分子中含有丙烯基或曱基丙烯基等之反應性乙烯性雙 的單羧酸化合物。作為此種含乙烯性不飽和基之羧酸化 物(a - 2 ),可列舉:丙烯酸、曱基丙烯酸、/3 -苯乙烯基 烯酸、/3-糠基丙烯酸、α -氰基桂皮酸、桂皮酸等。該 乙烯性不飽和基之羧酸化合物(a-2)可單獨使用,或網 種以上組合使用。 作為使上述環氧化合物(a- 1 )與含乙烯性不飽和基 羧酸化合物(a - 2 )進行反應之方法,可使用先前公知之 法。例如,可列舉如下方法:以三乙基胺、苄基乙基胺 三級胺,十二烷基三曱基氯化銨、四曱基氣化銨、四乙 氯化銨、苄基三乙基氣化銨等四級銨鹽,吡啶、三苯基 等作為觸媒,使環氧化合物(a -1 )與含乙烯性不飽和基 具 由 成 的 鍵 合 丙 含 2 之 方 等 基 膦 之 12(3) The epoxy compound having a spider raft skeleton represented by the formula (3) has high heat resistance and chemical resistance due to the ruthenium structure. Therefore, by blending an epoxy compound having an anthracene skeleton, the heat sensitivity and chemical properties of the coloring photosensitive composition can be improved. [The carboxylic acid compound (a - 2 ) containing an ethylenically unsaturated group] The carboxylic acid compound (a - 2 ) containing an ethylenically unsaturated group preferably contains a propylene group or a mercapto propylene group in the molecule. A mono-vinyl carboxylic acid compound. Examples of such an ethylenically unsaturated group-containing carboxylate (a - 2 ) include acrylic acid, mercaptoacrylic acid, /3-styryl acid, /3-mercaptoacrylic acid, and α-cyanocinnamic acid. , cinnamic acid, etc. The ethylenically unsaturated group carboxylic acid compound (a-2) may be used singly or in combination of two or more kinds. As a method of reacting the above epoxy compound (a-1) with the ethylenically unsaturated carboxylic acid compound (a-2), a conventionally known method can be used. For example, the following methods may be mentioned: triethylamine, benzylethylamine tertiary amine, dodecyltrimethylammonium chloride, tetradecyl ammonium sulfate, tetraethylammonium chloride, benzyltriethyl a quaternary ammonium salt such as a vaporized ammonium, a pyridine, a triphenyl group or the like as a catalyst, and the epoxy compound (a-1) and the ethylenically unsaturated group are bonded to each other. 12

200902579 羧酸化合物(a - 2 ),於有機溶劑中,以 5 0〜1 5 0 °C之 溫度反應數小時至數十小時。 環氧化合物(a-1)與含乙稀性不飽和基之叛酸化 (a - 2 )之反應中的使用量比例,以環氧化合物(a - 1 環氧當量與含乙晞性不飽和基之缓酸化合物(a - 2 )之 當量的比例計,通常為1 : 0 · 5〜1 : 2,較好的是1 : 〜1 : 1. 2 5,更好的是1 : 1。藉由將環氧化合物(a -1 環氧當量與含乙稀性不飽和基之叛酸化合物(a - 2 )之 當量的比例設在上述範圍内,有提高交聯效率的傾向 而較佳。 〔多元酸酐(a - 3 )〕 作為多元酸酐(a-3),可使用:含有為具有2個 之羧基之羧酸的酸酐,且具有至少2個苯環之化合物 作為此種多元酸酐(a - 3 ),例如可列舉:如以下述式 表示之具有聯苯基骨架的酸酐、如以下述式(7)表示 個苯環以有機基鍵結的酸酐。 反應 合物 )之 羧酸 0.8 )之 羧酸 ,故 以上 者。 (6) 之2200902579 The carboxylic acid compound (a - 2 ) is reacted in an organic solvent at a temperature of from 50 to 150 ° C for several hours to several tens of hours. The ratio of the amount of the epoxy compound (a-1) to the reaction of the acid-containing (a - 2 ) containing ethylenically unsaturated groups, in the case of an epoxy compound (a - 1 epoxy equivalent and ethylidene-containing unsaturated) The ratio of the equivalent of the acid-lowering compound (a - 2 ) is usually 1:0 · 5 to 1: 2, preferably 1: 1 : 1. 2 5 , more preferably 1:1. When the ratio of the equivalent of the epoxy compound (a -1 epoxy equivalent to the ethylenically unsaturated group-containing tarenic acid compound (a - 2 )) is within the above range, the crosslinking efficiency tends to be improved. [Polyhydric anhydride (a-3)] As the polybasic acid anhydride (a-3), a compound containing at least two benzene rings as an acid anhydride of a carboxylic acid having two carboxyl groups can be used as such a polybasic acid anhydride ( Examples of a - 3 ) include an acid anhydride having a biphenyl skeleton represented by the following formula, and an acid anhydride having an organic group bonded to each of the benzene rings represented by the following formula (7). ) carboxylic acid, so the above. (6) of 2

〇 〇 II 4 II C—-Ο—-R4—Ο—C〇 〇 II 4 II C—ΟΟ—R4—Ο—C

Ο ⑺ 13 200902579 〔式(7)中,R4表示可具有碳數1〜10之取代基的伸 烧基。〕 藉由使用上述具有2個以上之羧基之羧酸的酸酐,可 於光聚合性化合物(A )中導入至少2個苯環。Ο (7) 13 200902579 [In the formula (7), R4 represents an exudation group which may have a substituent having 1 to 10 carbon atoms. At least two benzene rings can be introduced into the photopolymerizable compound (A) by using an acid anhydride of a carboxylic acid having two or more carboxyl groups.

並且,多元酸酐(a-3)除含有上述具有至少2個苯環 之酸酐以外,亦可含有其他多元酸酐。作為其他多元酸酐, 例如可列舉:順丁烯二酸酐、琥珀酸酐、伊康酸酐、鄰苯 二甲酸酐、四氫鄰苯二曱酸酐、六氫鄰苯二甲酸酐、曱基 六氫鄰苯二曱酸酐、甲基四氫鄰苯二甲酸酐、偏苯三曱酸 酐、焦蜜石酸酐、二苯曱酮四曱酸二酐、3 -甲基六氫鄰苯 二甲酸酐、4 -甲基六氫鄰苯二甲酸酐、3 -乙基六氫鄰苯二 甲酸酐、4 -乙基六氫鄰苯二曱酸酐、四氫鄰苯二曱酸酐、 3 -曱基四氫鄰笨二曱酸酐、4 -甲基四氫鄰苯二甲酸酐、3-乙基四氫鄰苯二曱酸酐、4 -乙基四氫鄰苯二曱酸酐。該等 多元酸酐可單獨使用,或將2種以上組合使用。 作為使環氧化合物(a - 1 )與含乙烯性不飽和基之羧酸 化合物(a - 2 )進行反應後,進而與多元酸酐(a - 3 )進行 反應的方法,可使用先前公知之方法。並且,以環氧化合 物(a-Ι)與含乙烤性不飽和基之羧酸化合物(a-2)之反 應物中之0H基的莫耳數,與多元酸酐(a-3)之酸酐基的 當量比計,使用量比例通常為1 : 1〜1 : 0. 1,較好的是1 : 0.8〜1: 0.2。藉由將環氧化合物(a-Ι)與含乙稀性不飽 和基之缓酸化合物(a-2)之反應物中之OH基的莫耳數與 多元酸酐(a-3)之酸酐基的當量比設在上述範圍内,有使 14 200902579 於顯影液中之溶解性變得適度的傾向,故而較佳。Further, the polybasic acid anhydride (a-3) may contain other polybasic acid anhydrides in addition to the above-mentioned acid anhydride having at least two benzene rings. Examples of the other polybasic acid anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and mercaptohexahydroorthophenylene. Diphthalic anhydride, methyltetrahydrophthalic anhydride, trimellitic anhydride, pyrogallic anhydride, benzophenone tetradecanoic dianhydride, 3-methylhexahydrophthalic anhydride, 4-methyl Hexahydrophthalic anhydride, 3-ethylhexahydrophthalic anhydride, 4-ethylhexahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-mercaptotetrahydrobutanyl Anthracene anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethyltetrahydrophthalic anhydride, 4-ethyltetrahydrophthalic anhydride. These polybasic acid anhydrides may be used singly or in combination of two or more. As a method of reacting the epoxy compound (a-1) with the ethylenically unsaturated group-containing carboxylic acid compound (a-2) and further reacting with the polybasic acid anhydride (a-3), a previously known method can be used. . Further, the molar number of the OH group in the reaction of the epoxy compound (a-fluorene) with the carboxylic acid compound (a-2) containing the ethylenically unsaturated group, and the anhydride of the polybasic acid anhydride (a-3) The ratio of the equivalent ratio of the base is usually 1: 1 to 1: 0. 1, preferably 1: 0.8 to 1: 0.2. The molar number of the OH group in the reaction of the epoxy compound (a-fluorene) with the ethylenic unsaturated group-containing slow acid compound (a-2) and the acid anhydride group of the polybasic acid anhydride (a-3) The equivalent ratio is set within the above range, and the solubility of 14 200902579 in the developer tends to be moderate, which is preferable.

藉由使環氧化合物(a -1 )與含乙烯性不飽和基之羧酸 化合物(a-2)之反應物,進而與多元酸酐(a-3)進行反 應而獲得之樹脂(A1 )的酸值,以樹脂固形分計較好的是 10〜150 mgKOH/g,更好的是70〜110 mgKOH/g。藉由將樹 脂(A1 )之酸值設為1 0 mgKOH/g以上,可獲得於顯影液中 之充分之溶解性。並且,藉由將樹脂(A 1 )之酸值設為1 5 0 mgKOH/g以下,可獲得充分之硬化性,且可使表面性變得 良好。 另外,樹脂(A 1 )之重量平均分子量較好的是1 , 0 0 0 〜1 5 , 0 0 0,更好的是2,0 0 0〜1 3 , 0 0 0。藉由將樹脂(A1 ) 之重量平均分子量設為1,0 0 0以上,可提高耐熱性、膜強 度。並且,藉由將樹脂(A1 )之重量平均分子量設為1 5,0 0 0 以下,可獲得於顯影液中之充分之溶解性。 〔含乙烯性不飽和基之單體〕 本發明中所使用之光聚合性化合物(A )較好的是含有 含乙稀性不餘和基之單體。含乙烯性不飽和基之單體,有 單官能單體及多官能單體,作為單官能單體,可列舉:(曱 基)丙烯醯胺、羥甲基(甲基)丙烯醯胺、曱氧基甲基(曱基) 丙烯醯胺、乙氧基曱基(甲基)丙烯醯胺、丙氧基曱基(甲基) 丙烯醯胺、丁氧基曱氧基曱基(曱基)丙烯醯胺、N -羥曱基 (甲基)丙烯醯胺、N -羥基曱基(曱基)丙烯醯胺、(甲基)丙 烯酸、反丁烯二酸、順丁烯二酸、順丁烯二酸酐、伊康酸、 伊康酸酐、擰康酸、檸康酸酐、巴豆酸、2 -丙烯醯胺-2 - 15 200902579a resin (A1) obtained by reacting an epoxy compound (a-1) with a carboxylic acid compound (a-2) containing an ethylenically unsaturated group, and further reacting with a polybasic acid anhydride (a-3) The acid value is preferably from 10 to 150 mgKOH/g, more preferably from 70 to 110 mgKOH/g, based on the resin solid content. By setting the acid value of the resin (A1) to 10 mgKOH/g or more, sufficient solubility in the developer can be obtained. Further, by setting the acid value of the resin (A 1 ) to 150 mgKOH/g or less, sufficient curability can be obtained, and surface properties can be improved. Further, the weight average molecular weight of the resin (A 1 ) is preferably 1,0 0 0 to 1 5 , 0 0 0, more preferably 2,0 0 0 to 1 3 , 0 0 0. By setting the weight average molecular weight of the resin (A1) to 1,0 0 or more, heat resistance and film strength can be improved. Further, by setting the weight average molecular weight of the resin (A1) to 15 or less, sufficient solubility in the developer can be obtained. [The monomer containing an ethylenically unsaturated group] The photopolymerizable compound (A) used in the present invention preferably contains a monomer having an ethylidene group and a group. The monomer having an ethylenically unsaturated group may be a monofunctional monomer or a polyfunctional monomer. Examples of the monofunctional monomer include (mercapto) acrylamide, hydroxymethyl (meth) acrylamide, hydrazine. Oxymethyl (mercapto) acrylamide, ethoxylated (meth) acrylamide, propoxy fluorenyl (methyl) acrylamide, butoxy methoxy fluorenyl (fluorenyl) Acrylamide, N-hydroxydecyl (meth) acrylamide, N-hydroxyindenyl (decyl) acrylamide, (meth)acrylic acid, fumaric acid, maleic acid, cis-butane Alkylene dianhydride, itaconic acid, itaconic anhydride, thiconic acid, citraconic anhydride, crotonic acid, 2-propenylamine-2 - 15 200902579

曱基丙磺酸、第三丁基丙烯醯胺磺酸、c甲基)丙烯酸甲酯、 (曱基)丙烯酸乙酯、(曱基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯、(曱基)丙烯酸2 -羥基乙 酯、(甲基)丙烯酸 2 -羥基丙酯、(甲基)丙烯酸 2 -羥基丁 酯、(曱基)丙烯酸 2 -笨氧基-2 -羥基丙酯、鄰苯二甲酸 2-(甲基)丙烯醯氧基-2-羥基丙酯、甘油單(甲基)丙烯酸 酯、(曱基)丙烯酸四氫糠酯、(甲基)丙烯酸二曱基胺基酯、 (曱基)丙烯酸縮水甘油酯、(甲基)丙烯酸 2,2, 2 -三氟乙 酯、(甲基)丙烯酸2, 2, 3, 3 -四氟丙酯、鄰苯二曱酸衍生物 之(曱基)丙烯酸半酯等。該等單官能單體可單獨使用,或 將2種以上組合使用。 另一方面,作為多官能單體,可列舉:乙二醇二(曱基) 丙烯酸酯、二乙二醇二(曱基)丙烯酸酯、四乙二醇二(甲基) 丙烯酸酯、丙二醇二(曱基)丙烯酸酯、聚丙二醇二(曱基) 丙烯酸酯、丁二醇二(甲基)丙烯酸酯、新戊二醇二(曱基) 丙烯酸酯、1,6 -己二醇二(甲基)丙烯酸酯、三羥曱基丙烷 三(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、季戊四醇三 丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、 二季戊四醇六丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季 戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、 二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(曱基)丙烯 酸酯、2, 2-雙(4-(曱基)丙烯醯氡基二乙氡基苯基)丙烷、 2, 2-雙(4-(曱基)丙烯醯氧基聚乙氧基苯基)丙烷、(曱基) 丙烯酸 2 -羥基- 3- (甲基)丙烯醯氧基丙酯、乙二醇二縮水 16 200902579Mercaptopropanesulfonic acid, tert-butyl propylene sulfanilide, methyl methyl acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethyl methacrylate Ester, cyclohexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, (mercapto)acrylic acid 2 -Phenoxy-2-hydroxypropyl ester, 2-(methyl)propenyloxy-2-hydroxypropyl phthalate, glycerol mono(meth)acrylate, tetrahydrofurfuryl (meth) acrylate , (di) dimethyl (meth) acrylate, glycidyl (meth) acrylate, 2, 2, 2 - trifluoroethyl (meth) acrylate, 2, 2, 3, 3 (meth) acrylate - tetrafluoropropyl ester, (mercapto) acrylate half ester of phthalic acid derivative, and the like. These monofunctional monomers may be used singly or in combination of two or more. On the other hand, examples of the polyfunctional monomer include ethylene glycol di(decyl)acrylate, diethylene glycol di(decyl)acrylate, tetraethylene glycol di(meth)acrylate, and propylene glycol II. (fluorenyl) acrylate, polypropylene glycol bis(indenyl) acrylate, butanediol di(meth) acrylate, neopentyl glycol bis(indenyl) acrylate, 1,6-hexanediol di(a) Acrylate, trihydroxymercaptopropane tri(meth)acrylate, glycerol di(meth)acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol Di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 2, 2- Bis(4-(indenyl)propenyldiethoxyphenyl)propane, 2,2-bis(4-(indenyl)propenyloxypolyethoxyphenyl)propane, (fluorenyl) 2-hydroxy-3-(2-methyl) acrylate Bing Xixi group, propyl glycol diglycidyl 16200902579

甘油醚二(甲基)丙烯酸酯、二乙二醇二縮水甘油醚二(曱基) 丙烯酸酯、鄰苯二曱酸二縮水甘油酯二(甲基)丙烯酸酯、 甘油三丙烯酸酯、甘油多縮水甘油醚聚(曱基)丙烯酸酯、 胺基曱酸乙酯(曱基)丙烯酸酯(即,甲苯二異氰酸酯)、三 曱基六亞甲二異氰酸酯及六亞曱二異氰酸酯等與(甲基)丙 烯酸2-羥基乙酯之反應物、亞曱基雙(曱基)丙烯醯胺、(曱 基)丙烯醯胺亞曱基醚、多元醇與 N -羥曱基(曱基)丙烯醯 胺之縮合物等多官能單體,或三丙烯酸曱縮酸'(triacryl forma 1 )等。該等多官能單體可單獨使用,或將2種以上組 合使用。 該含乙烯性不飽和基之單體量相對於著色感光性組成 物之固形分,較好的是5〜50質量%,更好的是10〜40質 量%之範圍。藉由將該含乙烯性不飽和基之單體量相對於著 色感光性組成物之固形分設在上述範圍内,有容易取得靈 敏度、顯影性、解析性之平衡的傾向,故而較佳。 上述光聚合性化合物(A )之含量相對於著色感光性組 成物之固形分,較好的是5〜50質量%,更好的是10〜40 質量%之範圍。藉由將上述光聚合性化合物(A )之含量相 對於著色感光性組成物之固形分設在上述範圍内,有容易 取得靈敏度、顯影性、解析性之平衡的傾向,故而較佳。 <光聚合起始劑(B ) > 作為光聚合起始劑(B ),可列舉:1 -羥基環己基苯基 酮、2-羥基-2-曱基-卜苯基丙烷-卜酮、1-[4-(2-羥基乙氧 基)苯基]-2-羥基-2-曱基-1-丙烷-卜酮、1-(4-異丙基苯 17 200902579 基)-2 -經基-甲基丙烧-I-嗣、1-(4 —h二统基苯基)-2-經基_2 -曱基丙烧-I-酮、2, 2 -二曱氧基-1,2 -二苯基乙烧 -1-酮、雙(4 -二甲基胺基苯基)酮、2 -曱基- :l-[4-(甲基硫 基)苯基]-2 -味琳基丙院-1- ( 2-methy 卜 l-[4-(methylthio)phenyl] -2- morpholinopropane-1-one)、2 -苄基-2-二甲基胺基-1-(4 -咮 啉基苯基)-丁烷-卜酮、乙酮-卜[9 -乙基- 6-(2 -甲基苯甲醯 基)-9H -咔唑-3-基]-1-(0 -乙醯肟)、2, 4,6 -三甲基苯曱醯 基二笨基氧化膦、4 -苯甲醢基- 4’-甲基二甲硫醚、4 -二甲 基胺基苯曱酸、4 -二曱基胺基苯甲酸曱酯、4 -二甲基胺基 苯曱酸乙酯、4-二甲基胺基苯甲酸丁酯、苯甲酸4-二甲基 胺基-2-乙基己酯、4 -二曱基胺基-2-異戊基苯曱酸、苄基-yS -曱氧基乙基縮醛、苄基二甲基縮酮、1-苯基-1,2 -丙二 酮- 2- (0 -乙氧基羰基)肟、0 -苯曱醢基苯曱酸甲酯、2,4-二乙基噻噸酮、2 -氣噻噸酮、2, 4 -二曱基噻噸酮、1-氯-4-丙氧基噻噸酮、噻噸、2 -氣噻噸、2,4 -二乙基噻噸、2 -甲 基噻噸、2 -異丙基噻噸、2 -乙基蒽醌、八甲基蒽醌、1, 2 -笨幷蒽醌、2,3 -二苯基蒽醌、偶氮二異丁腈、過氧化笨甲 醯、過氧化異丙笨、2 -巯基苯幷咪唑、2 - Μ基苯幷#唑 (2-mercapto benzoxazole)、2-疏基苯幷 °塞。坐、2-(0-氣 苯基)-4, 5-二(間曱氧基苯基)咪唑基二聚物、二苯曱酮、 2-氣二苯甲酮、p,p’-雙(二曱基胺基)二苯曱酮、4, 4’-雙 (二乙基胺基)二苯甲酮、4, 4’-二氯二苯甲酮、3, 3-二甲基 -4 -甲氧基二苯曱酮、苯曱醯、安息香、安息香甲醚、安息 香乙醚、安息香異丙醚、安息香正丁醚、安息香異丁醚、 18 200902579 安息香丁醚、苯乙酮、2, 2 -二乙氧基苯乙酮、對二曱基苯 乙酮、對二曱基胺基苯丙酮、二氯苯乙酮、三氯苯乙酮、 對第三丁基苯乙酮、對二甲基胺基苯乙酮、對第三丁基三 氯苯乙酮、對第三丁基二氯苯乙酮、α,α -二氣-4-笨氧基 苯乙酮、噻噸酮、2 -甲基噻噸酮、2 -異丙基噻噸酮、二苯 幷環庚酮、4 -二曱基胺基苯曱酸戊酯、9 -苯基吖啶、1,7-雙- (9-吖啶基)庚烷、1,5 -雙- (9-吖啶基)戊烷、1,3 -雙- (9-吖0定基)丙烧、對甲氧基三°井(p-methoxy triazine)、 2, 4, 6-三(三氯甲基)均三=井、2 -甲基-4, 6-雙(三氯甲基) 均三_、2-[2-(5-曱基呋喃-2-基)乙烯基]-4,6-雙(三氯 甲基)均三味、2-[2-(呋喃-2-基)乙烯基]-4,6-雙(三氣曱 基)均三_、2-[2-(4 -二乙基胺基-2-甲基苯基)乙稀基] -4,6-雙(三氣甲基)均三。并、2-[2-(3,4-二曱氧基苯基)乙 烯基]-4,6-雙(三氣甲基)均三*、2-(4-曱氧基苯基)-4,6-雙(三氯甲基)均三。井、2-(4 -乙氧基苯乙烯基)-4,6-雙(三 氣曱基)均三_、2-(4-正丁氧基苯基)-4,6-雙(三氯曱基) 均三。井、2, 4-雙-三氯曱基-6-(3-溴-4-曱氧基)苯基均三 味、2, 4 -雙-三氣曱基- 6- (2 -溴-4-曱氧基)苯基均三味、 2,4-雙-三氯曱基-6-(3 -漠-4-甲氧基)苯乙稀基苯基均三 _、2, 4-雙-三氣甲基-6-(2-溴-4-曱氧基)苯乙烯基苯基 均三-丼等。該等光聚合起始劑可單獨使用,或將2種以上 組合使用。其中,就靈敏度方面而言,尤其好的是使用肟 系起始劑。 光聚合起始劑(B )之含量相對於著色感光性組成物之 19Glycerol ether di(meth)acrylate, diethylene glycol diglycidyl ether di(indenyl) acrylate, phthalic acid diglycidyl di(meth)acrylate, glycerin triacrylate, glycerol Glycidyl ether poly(indenyl) acrylate, amino decyl acrylate (ie, toluene diisocyanate), trimethyl hexamethylene diisocyanate, hexamethylene diisocyanate, etc. a reaction of 2-hydroxyethyl acrylate, anthracenyl bis(indenyl) acrylamide, (mercapto) acrylamide decyl ether, polyol and N-hydroxydecyl (decyl) acrylamide A polyfunctional monomer such as a condensate or triacryl forma 1 or the like. These polyfunctional monomers may be used singly or in combination of two or more. The amount of the monomer containing the ethylenically unsaturated group is preferably from 5 to 50% by mass, more preferably from 10 to 40% by mass, based on the solid content of the coloring photosensitive composition. When the amount of the monomer containing the ethylenically unsaturated group is within the above range with respect to the solid content of the colored photosensitive composition, the balance of sensitivity, developability, and resolution tends to be easily obtained, which is preferable. The content of the photopolymerizable compound (A) is preferably from 5 to 50% by mass, more preferably from 10 to 40% by mass, based on the solid content of the coloring photosensitive composition. When the content of the photopolymerizable compound (A) is within the above range with respect to the solid content of the coloring photosensitive composition, it is preferable to obtain a balance between sensitivity, developability, and analytical property. <Photopolymerization initiator (B) > As the photopolymerization initiator (B), 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-mercapto-p-phenylpropane- ketone , 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-mercapto-1-propane-butanone, 1-(4-isopropylbenzene 17 200902579 base)-2 - Benzyl-methylpropan-I-oxime, 1-(4-h-dioxophenyl)-2-yl-2-ylidenepropan-I-one, 2,2-dimethoxy- 1,2-diphenylethen-1-one, bis(4-dimethylaminophenyl)one, 2-indenyl-:l-[4-(methylthio)phenyl]-2 - 2-methyib-1-(morphoinopropane-1-one), 2-benzyl-2-dimethylamino-1-() 4-Phenylphenyl)butane-butanone, ethyl ketone-bu [9-ethyl-6-(2-methylbenzomethyl)-9H-indazol-3-yl]-1- (0-acetamidine), 2,4,6-trimethylphenylnonyldiphenylphosphine oxide, 4-benzylidene-4'-methyldimethyl sulfide, 4-dimethylamine Benzophthalic acid, decyl 4-didecylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamine benzoate Base-2 -ethylhexyl ester, 4-didecylamino-2-isopentylbenzoic acid, benzyl-yS-decyloxyethyl acetal, benzyldimethylketal, 1-phenyl-1 ,2-propylenedione-2-(0-ethoxycarbonyl)anthracene, methyl 0-phenylmercaptobenzoate, 2,4-diethylthioxanthone, 2-air thioxanthone, 2 , 4 - Dimercaptothioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthene, 2-air thioxanthene, 2,4-diethyl thioxanthene, 2-methylthioxanthene, 2 -isopropyl thioxanthene, 2-ethyl hydrazine, octamethyl hydrazine, 1, 2 - alum, 2,3 - diphenyl fluorene, azobisisobutyronitrile, peroxide醯, isopropyl peroxide, 2-mercaptobenzimidazole, 2-mercapto benzoxazole, 2-mercaptobenzoquinone. Sodium, 2-(0-phenylphenyl)-4,5-bis(metamethoxyphenyl)imidazolyl dimer, dibenzophenone, 2-benzophenone, p,p'-double (didecylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl- 4-methoxybenzophenone, benzoquinone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, 18 200902579 benzoin butyl ether, acetophenone, 2, 2-diethoxyacetophenone, p-dimercaptoacetophenone, p-didecylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, p-pair Methylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α,α-diox-4-phenyloxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, diphenylguanidinone, amyl 4-didecylaminobenzoate, 9-phenyl acridine, 1,7-double- (9-Acridine)heptane, 1,5-bis-(9-acridinyl)pentane, 1,3-bis-(9-fluorenyl)propane, p-methoxy-3° well P-methoxy Triazine), 2, 4, 6-tris(trichloromethyl)-all three = well, 2-methyl-4,6-bis(trichloromethyl) all three _, 2-[2-(5-曱Furfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-all three-flavor, 2-[2-(furan-2-yl)vinyl]-4,6-bis (trioxane) The base is tris-, 2-[2-(4-diethylamino-2-methylphenyl)ethenyl]-,4,6-bis(tris). And 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trimethylmethyl)-all-*, 2-(4-decyloxyphenyl)- 4,6-bis(trichloromethyl) is three. Well, 2-(4-ethoxystyryl)-4,6-bis(triseodecyl)-tetra-, 2-(4-n-butoxyphenyl)-4,6-bis (three Chloroguanidine) is three. Well, 2,4-bis-trichloroindolyl-6-(3-bromo-4-indolyloxy)phenyl, tris, 2,4-di-tris-methyl- 6-(2-bromo-4 -decyloxy)phenyl benzene, 2,4-bis-trichloroindolyl-6-(3-oxa-4-methoxy)phenylethylphenyl ternary, _, 4-bis- Tris-methyl-6-(2-bromo-4-indolyloxy)styrylphenyl is tris-fluorene or the like. These photopolymerization initiators may be used singly or in combination of two or more. Among them, in terms of sensitivity, it is particularly preferable to use a lanthanide initiator. The content of the photopolymerization initiator (B) is relative to the coloring photosensitive composition.

200902579 固形分,較好的是0.5〜30質量%,更好的是1〜20 I 之範圍。藉由將含量設在上述範圍内,可獲得充分之 性、财化學藥品性,並且可提高塗膜形成能力,抑制 化不良。 <著色劑(C ) > 作為著色劑(C ),可列舉:碳黑或鈦黑等遮光劑 外,亦可使用:Cu、Fe、Mn、Cr、Co、Ni、V、Zn、Se、 Ca ' Sr ' Ba ' Pd ' Ag ' Cd ' In' Sn、Sb、Hg' Pb' Bi、 及A1等的各種金屬氧化物;複合氧化物;金屬硫化物 屬硫酸鹽;或金屬碳酸鹽等無機顏料。 該等著色劑(C )之中,較好的是使用黑色顏料。 黑色顏料,可列舉碳黑。作為碳黑,可使用:槽黑、爐 熱裂碳黑、燈黑等熟知之碳黑,尤其是槽黑由於在遮 方面優異,故而可適合使用。另外,亦可使用經樹脂 之碳黑。具體而言可列舉:將碳黑以及與碳黑表面所 之羧基、羥基、羰基具有反應性之樹脂進行混合,於 3 8 0度進行加熱而獲得之經樹脂包覆之碳黑;或者將 性單體分散於水-有機溶劑混合系或水-界面活性劑混 中,於聚合起始劑之存在下,使其進行自由基聚合或 基共聚合而獲得之經樹脂包覆之碳黑等。由於該經樹 覆之碳黑的導電性低於未經樹脂包覆之碳黑,故而於 液晶顯示器等之彩色濾光片之情形時,可製成漏電少 靠性高之低耗電之顯示器。 作為著色劑,亦可於上述無機顏料中加入有機顏 r量% 耐熱 光硬 。另 Mg、 Si、 •,金 作為 黑、 光性 包覆 存在 50〜 乙烯 合系 自由 脂包 用作 、可 料作 20 200902579 為輔助顏料。藉由適當選擇加入呈現出無機顏料之補色的 有機顏料,可獲得如下效果。例如,碳黑呈現出帶紅色之 黑色。因此,籍由於碳黑中加入呈現出紅色之補色即藍色 的有機顏料作為輔助顏料,可使碳黑之紅色消失,而使整 體呈現出更好的黑色。有機顏料相對於無機顏料與有機顏 料之合計,較好的是以1 0〜8 0質量%之範圍使用,更好的 是20〜60質量%、更好的是20〜40質量%之範圍。200902579 The solid fraction is preferably from 0.5 to 30% by mass, more preferably from 1 to 20 I. By setting the content within the above range, sufficient properties and chemical properties can be obtained, and the coating film forming ability can be improved to suppress the deterioration. <Colorant (C) > Examples of the colorant (C) include a light-shielding agent such as carbon black or titanium black, and may also be used: Cu, Fe, Mn, Cr, Co, Ni, V, Zn, Se. , various metal oxides such as Ca ' Sr ' Ba ' Pd ' Ag ' Cd ' In' Sn, Sb, Hg' Pb' Bi, and A1; composite oxide; metal sulfide sulphate; or metal carbonate Inorganic pigments. Among these colorants (C), it is preferred to use a black pigment. Black pigments include carbon black. As the carbon black, well-known carbon black such as channel black, furnace black carbon black, or lamp black can be used, and in particular, the groove black is excellent in hiding, so that it can be suitably used. Alternatively, a resin black carbon black can be used. Specifically, a carbon black and a resin reactive with a carboxyl group, a hydroxyl group, or a carbonyl group on the surface of carbon black are mixed, and the resin-coated carbon black obtained by heating at 380 degrees is used; or The monomer is dispersed in a water-organic solvent mixture or a water-surfactant mixture, and is subjected to radical polymerization or base copolymerization to obtain a resin-coated carbon black or the like in the presence of a polymerization initiator. Since the conductivity of the tree-coated carbon black is lower than that of the carbon black not coated with the resin, in the case of a color filter such as a liquid crystal display, it is possible to manufacture a low-power-consumption display with less leakage and high reliability. . As the coloring agent, it is also possible to add an organic pigment amount to heat-resistant light hardness to the above inorganic pigment. In addition, Mg, Si, and gold are used as black and optical coatings. 50~ Ethylene free grease is used as the auxiliary pigment. By appropriately selecting and adding an organic pigment which exhibits a complementary color of an inorganic pigment, the following effects can be obtained. For example, carbon black exhibits a reddish black color. Therefore, since the carbon black is added as an auxiliary pigment which exhibits a red complementary color, that is, a blue color, the red color of the carbon black disappears, and the whole body exhibits a better black color. The organic pigment is preferably used in an amount of from 10 to 80% by mass, more preferably from 20 to 60% by mass, even more preferably from 20 to 40% by mass, based on the total of the inorganic pigment and the organic pigment.

作為上述無機顏料及有機顏料,可使用:利用分散劑, 將顏料以適當之濃度進行分散而得的溶液。例如,作為無 機顏料,可列舉:御國色素製造之碳分散液CF B 1 ack (碳 濃度為 20%)、御國色素製造之碳分散液CF Black (含有 24%之高電阻碳)、御國色素製造之鈦黑分散液CF Black(含 有2 0 %之鈦黑顏料)。另外,作為有機顏料,例如可列舉: 御國色素製造之藍色顏料分散液CFBlue(含有20 %之藍色 顏料)、御國色素製造之紫色顏料分散液(含有1 0%之紫色 顏料)等。另外,作為分散劑,較好的是使用:聚乙稀亞 胺系、胺基甲酸乙酯樹脂系、丙烯酸系樹脂系之高分子分 散劑。 著色劑(C )之含量相對於著色感光性組成物之固形 分,較好的是1 0〜7 0質量%。藉由將含量設在7 0質量%以 下,可抑制光硬化不良,並且,藉由將含量設在10質量% 以上,可獲得充分之遮光性。另外,於如下所述使用本發 明之著色感光性組成物而成膜為黑色矩陣時,著色劑(C ) 之濃度較好的是以每1仁m膜厚之OD(OpticalDensity, 21As the inorganic pigment and the organic pigment, a solution obtained by dispersing a pigment at an appropriate concentration using a dispersing agent can be used. For example, as the inorganic pigment, CF B 1 ack (carbon concentration: 20%), a carbon dispersion made of Royal Chinese pigment, CF Black (containing 24% of high-resistance carbon), Titanium black dispersion CF Black (containing 20% titanium black pigment) manufactured by National Pigment. In addition, examples of the organic pigment include a blue pigment dispersion liquid CFBlue (containing 20% blue pigment) manufactured by Yuki Co., Ltd., and a purple pigment dispersion liquid (containing 10% purple pigment) produced by Yuki Co., Ltd., and the like. . Further, as the dispersing agent, a polyethylene dispersant, a urethane resin or an acrylic resin dispersant is preferably used. The content of the colorant (C) is preferably from 10 to 70% by mass based on the solid content of the coloring photosensitive composition. By setting the content to 70% by mass or less, the photocuring failure can be suppressed, and by setting the content to 10% by mass or more, sufficient light blocking property can be obtained. Further, when the colored photosensitive composition of the present invention is used as a black matrix as described below, the concentration of the colorant (C) is preferably an OD per film thickness (Optical Density, 21).

200902579 光密度)值達到1.5以上之方式進行調整。若每1 // 厚之0 D值為1 . 5以上,則將其用於液晶顯示器之黑色 之情形時,可獲得充分之對比度。 <溶劑> 本發明之著色感光性組成物,較好的是含有用於 之溶劑。作為該溶劑,例如可列舉:乙二醇單甲醚、 醇單乙醚、乙二醇單正丙醚、乙二醇單正丁醚、二乙 單曱醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙 單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二 甲醚、丙二醇單乙醚、丙二醇單正丙醚、丙二醇單正丁 二丙二醇單曱醚、二丙二醇單乙醚、二丙二醇單正丙 二丙二醇單正丁醚、三丙二醇單曱醚、三丙二醇單乙 (聚)烷二醇單烷基醚類;乙二醇單甲醚乙酸酯、乙二 乙醚乙酸酯、二乙二醇單曱醚乙酸酯、二乙二醇單乙 酸酯、丙二醇單曱醚乙酸酯、丙二醇單乙醚乙酸酯等 烷二醇單烷基醚乙酸酯類;二乙二醇二曱醚、二乙二 乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類;曱基 酮、環己酮、2 -庚酮、3 -庚酮等酮類;2 -羥基丙酸甲 2 -羥基丙酸乙酯等乳酸烷基酯類;2 -羥基-2 -曱基丙 酯、3 -甲氧基丙酸曱酯、3 -曱氧基丙酸乙酯、3 -乙氧 酸甲酯、3 -乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基 乙酯' 2 -羥基-3-曱基丁酸甲酯、乙酸3 -曱氧基丁酯 酸3 -曱基-3-曱氧基丁酯、丙酸3 -甲基-3-甲氧基丁醋 酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙 m膜 矩陣 稀釋 乙二 二醇 二醇 醇單 驗、 鍵、 醚等 醇單 醚乙 (聚) 醇曱 乙基 酉旨、 酸乙 基丙 乙酸 、乙 、乙 酸異 22 200902579 丁酯、曱酸正戊酯、乙酸異戍酯、丙酸正丁酯、丁酸乙酯、 丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸曱酯、丙 酮酸乙酯、丙酮酸正丙酯、乙醯乙酸曱酯、乙醯乙酸乙酯、 2 -側氧基丁酸乙酯等其他酯類;甲苯、二甲苯等芳香族烴 類;N -曱基吡咯啶酮、N,N -二甲基甲醯胺、N,N -二曱基乙 醯胺等醯胺類等。該等溶劑可單獨使用,或將2種以上組 合使用。The 200902579 optical density) value is adjusted by 1.5 or more. If the value of 0 D per 1 // thickness is 1.5 or more, a sufficient contrast can be obtained when it is used for the black color of the liquid crystal display. <Solvent> The colored photosensitive composition of the present invention preferably contains a solvent. Examples of the solvent include ethylene glycol monomethyl ether, alcohol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethyl ether monoether, diethylene glycol monoethyl ether, and diethyl ether. Glycol mono-n-propyl ether, di-n-butyl-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, dimethyl dimethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl dipropylene glycol Monoterpene ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propylene dipropylene glycol mono-n-butyl ether, tripropylene glycol monoterpene ether, tripropylene glycol mono-(poly)alkylene glycol monoalkyl ether; ethylene glycol monomethyl ether Alkanediol monoalkane such as acid ester, ethylene diethyl ether acetate, diethylene glycol monoterpene ether acetate, diethylene glycol monoacetate, propylene glycol monoterpene ether acetate, propylene glycol monoethyl ether acetate Ether ether acetate; diethylene glycol dioxime ether, diethyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; mercapto ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc. Ketones; alkyl lactate such as 2-hydroxypropionic acid ethyl 2-hydroxypropionate; 2-hydroxy-2-mercaptopropyl ester, 3-methoxypropionate , 3-methoxypropionic acid ethyl ester, 3-ethoxyethoxy acid methyl ester, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyethyl ester '2-hydroxy-3-mercaptobutyric acid Methyl ester, 3-mercapto-3-oxoxybutyl 3-acetoxybutyrate, ethyl 3-methyl-3-methoxybutyrate propionate, n-propyl acetate, isopropyl acetate Ester, n-butyl acetate, ethylene matrix, diluted ethylene glycol monool, single bond, ether, ether, etc., alcohol monoether B (poly) alcohol oxime ethyl ester, acid ethyl propionic acid, B, acetic acid 22 200902579 Butyl ester, n-amyl phthalate, isodecyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, decyl pyruvate, Other esters such as ethyl pyruvate, n-propyl pyruvate, decyl acetate, ethyl acetate, 2-ethyloxybutyrate, etc.; aromatic hydrocarbons such as toluene and xylene; N-曱A guanamine such as a pyrrolidone, N,N-dimethylformamide or N,N-dimercaptoacetamide. These solvents may be used singly or in combination of two or more.

溶劑之含量相對於著色感光性組成物之固形分1 0 0質 量份,較好的是50〜500質量份。 <其他成分> 本發明之著色感光性組成物中可視需要而含有添加 劑。作為添加劑,可列舉:熱聚合抑制劑、消泡劑、界面 活性劑、增感劑、硬化促進劑、光交聯劑、光敏化劑、分 散劑、分散助劑、填充劑、密著促進劑、抗氧化劑、紫外 線吸收劑、抗凝劑等。 <著色感光性組成物之製備方法> 本發明之著色感光性組成物可藉由以攪拌機將上述各 成分全部混合而獲得。此外,亦可使用過濾器進行過濾, 以使所獲得之混合物變得均勻。 <彩色濾光片之製造方法> 以下,對使用本發明之著色感光性組成物而形成彩色 濾光片之方法進行說明。 〔黑色矩陣之形成〕 首先,使用輥塗機、反向塗佈機、棒式塗佈機等接觸 23 200902579 轉印型塗佈裝置,或旋塗機(旋轉式塗佈裝置)、淋幕式塗 佈機等非接觸型塗佈裝置,將本發明之著色感光性組成物 塗佈於基板上。基板係使用具有透光性之基板。The content of the solvent is preferably from 50 to 500 parts by mass based on 100 parts by mass of the solid content of the coloring photosensitive composition. <Other components> The colored photosensitive composition of the present invention may contain an additive as needed. Examples of the additive include a thermal polymerization inhibitor, an antifoaming agent, a surfactant, a sensitizer, a hardening accelerator, a photocrosslinking agent, a photosensitizer, a dispersing agent, a dispersing aid, a filler, and a adhesion promoter. , antioxidants, UV absorbers, anticoagulants, etc. <Preparation method of coloring photosensitive composition> The colored photosensitive composition of the present invention can be obtained by mixing all of the above components with a stirrer. Further, it is also possible to filter using a filter to make the obtained mixture uniform. <Manufacturing Method of Color Filter> Hereinafter, a method of forming a color filter using the colored photosensitive composition of the present invention will be described. [Formation of black matrix] First, use a roll coater, a reverse coater, a bar coater, etc., contact 23 200902579 transfer type coating device, or spin coater (rotary coating device), shower curtain type A non-contact type coating device such as a coater applies the colored photosensitive composition of the present invention to a substrate. As the substrate, a substrate having light transmissivity is used.

繼而,將所塗佈之著色感光性組成物乾燥而形成塗 膜。乾燥方法並無特別限定,例如可使用如下中之任一方 法:(1 )利用加熱板,於8 0〜1 2 0 °C、較好的是 9 0〜1 0 0 °C之溫度乾燥6 0〜1 2 0秒的方法;(2 )於室溫放置數小時 至數天的方法;(3)於暖風加熱器或紅外線加熱器中放置 數十分鐘至數小時而除去溶劑的方法。 繼而,經由負型光罩,對該塗膜照射紫外線、準分子 雷射光等活性能量線,而進行部分曝光。所照射之能量線 的量根據著色感光性組成物之組成而有所不同,例如較好 的是30〜2000 mJ/cm2左右。 繼而,利用顯影液對曝光後之膜進行顯影,藉此而形 成所需形狀之圖案。顯影方法並無特別限定,例如可使用 浸潰法、噴霧法等。作為顯影液,可列舉:單乙醇胺、二 乙醇胺、三乙醇胺等有機系顯影液,或氫氧化鈉、氫氧化 鉀、碳酸鈉、氨水、四級銨鹽等之水溶液。 繼而,於 2 0 0 °C左右之溫度對顯影後之圖案進行後烘 烤處理。此時,較好的是對所形成之圖案進行全面曝光。 藉由以上處理,可形成具有規定圖案形狀之黑色矩陣。 〔藉由微影方式形成彩色濾光片〕 使用分別含有R、G、B之3原色之著色劑的著色感光 性紕成物,針對每個顏色,以與形成上述黑色矩陣相同之 24 200902579 方式,於形成有上述黑色矩陣之基板上依序形成著色 藉此可形成彩色濾光片。 〔藉由噴墨方式形成彩色濾光片〕 自噴墨頭,將R、G、B各色之墨水噴至由以上述 形成之黑色矩陣所劃分的各個區域,再利用加熱或光 所蓄積之墨水硬化。藉此可形成彩色濾光片。 [實施例] 以下,對本發明之實施例進行說明,但本發明並 定於該等實施例。 <光聚合性化合物之合成> (合成例1 )Then, the applied colored photosensitive composition is dried to form a coating film. The drying method is not particularly limited. For example, any of the following methods may be used: (1) drying at a temperature of 80 to 1 20 ° C, preferably 90 to 100 ° C, using a hot plate. Method of 0 to 1 20 seconds; (2) Method of leaving at room temperature for several hours to several days; (3) Method of removing the solvent by placing it in a warm air heater or an infrared heater for several tens of minutes to several hours. Then, the coating film is irradiated with an active energy ray such as ultraviolet rays or excimer laser light through a negative mask to perform partial exposure. The amount of the energy ray to be irradiated varies depending on the composition of the coloring photosensitive composition, and is preferably, for example, about 30 to 2,000 mJ/cm2. Then, the exposed film is developed with a developing solution, thereby forming a pattern of a desired shape. The developing method is not particularly limited, and for example, a dipping method, a spraying method, or the like can be used. Examples of the developer include an organic developer such as monoethanolamine, diethanolamine or triethanolamine, or an aqueous solution of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia or a quaternary ammonium salt. Then, the developed pattern is post-baked at a temperature of about 200 °C. At this time, it is preferred to perform a full exposure of the formed pattern. By the above processing, a black matrix having a predetermined pattern shape can be formed. [Forming a color filter by lithography] Using a color-sensitive photosensitive composition containing a coloring agent of three primary colors of R, G, and B, for each color, the same method as the formation of the black matrix described above is used. A color filter can be formed by sequentially forming a color on the substrate on which the black matrix is formed. [Formation of Color Filter by Inkjet Method] From the inkjet head, inks of respective colors of R, G, and B are ejected to respective regions divided by the black matrix formed as described above, and ink accumulated by heating or light is used. hardening. Thereby, a color filter can be formed. [Examples] Hereinafter, examples of the invention will be described, but the invention is also set forth in the examples. <Synthesis of photopolymerizable compound> (Synthesis Example 1)

於500 ml之四口燒瓶中,裝入以下述化學式(8 示之雙酚苐型環氧樹脂2 3 5 g (環氧當量為2 3 5 )與四 氯化銨110 mg、2, 6-二第三丁基-4-曱基笨酚100 mg 稀酸72. 0g,一面以25ml /分之速度向其中吹入空氣 面於 9 0〜1 0 0 °C進行加熱溶解。繼而,於溶液為白濁 態下緩慢升溫,加熱至1 2 0 °C,使其完全溶解。此處 液逐漸變得透明黏稠,於此狀態下持續進行攪拌。其 測定酸值,持續進行加熱攪拌,直至酸值達到小於 mgKOH/g為止。酸值達到目標值需要1 2小時。繼而, 至室溫,獲得無色透明且固體狀之雙酚苐型環氧丙烯IIn a 500 ml four-necked flask, the bisphenolphthalein type epoxy resin represented by the following formula (8 is shown as 2 3 5 g (epoxy equivalent of 2 3 5 ) and ammonium tetrachloride 110 mg, 2, 6- Di-tert-butyl-4-mercaptophenol 100 mg dilute acid 72. 0g, one side is blown into the air at a rate of 25 ml / min, and is heated and dissolved at 90 ° to 0 0 ° C. Then, in solution It is slowly heated in a white turbid state, heated to 120 ° C, and completely dissolved. Here, the liquid gradually becomes transparent and viscous, and stirring is continued in this state. The acid value is measured, and heating and stirring are continued until the acid value It is less than mgKOH/g. It takes 12 hours for the acid value to reach the target value. Then, to room temperature, a colorless transparent and solid bisphenol oxime type epoxy propylene I is obtained.

[化7] 層。 方式 照使 不限 )表 曱基 及丙 之狀 ,溶 間, 1. 0 冷卻 t酉旨。 25 200902579[Chem. 7] Layer. The method is not limited to) 曱 及 and C, 溶, 1. 0 冷却 t酉. 25 200902579

繼而,於如此而獲得之上述雙酚葬型環氧丙烯 307. 0g中,加入乙酸3 -甲氧基丁酯600g,將其溶每 混合入二苯甲酮四曱酸二酐8 0. 5 g及四乙基溴化銨 缓慢升溫,於1 1 0〜1 1 5 °C使其反應。其後,混合入1, 2, 四氫鄰苯二甲酸酐38. Og,於90 °C使其反應,而獲得 物 A - 1。酸酐基之消失係藉由紅外光譜進行確認。該 物A-1藉由GPC所測定之重量平均分子量為5 0 0 0。 (合成例2) 作為具有聯苯基骨架之環氧化合物,將以下述化 (9)表示之 Epikote YX4000H ( Japan Epoxy Resins 製造,環氧當量為192) 400 g,與三笨基膦4 g、丙 153 g、乙酸3-曱氧基丁醋600 g進行混合,於90〃 °C使其反應。其後,加入四氫鄰苯二甲酸酐4 0 g及聯 四曱酸二酐360 g作為多元酸酐,進而使其反應,藉 得具有聯苯基骨架之化合物 A - 2。酸酐基之消失係藉 外光譜進行確認。該化合物A-2藉由GPC所測定之重 均分子量為7 0 0 0。 [化8] 酸酯 L後, 1 g, 3, 6-化合 化合 學式 公司 烯酸 ^ 100 苯基 此獲 由紅 量平 26 200902579Then, in the above-mentioned bisphenol borne epoxy propylene 307.0 g, 600 g of 3-methoxybutyl acetate was added, and the solution was mixed into benzophenone tetradecanoic dianhydride 80. 5 g and tetraethylammonium bromide were slowly warmed up and reacted at 110 ° 1 1 5 °C. Thereafter, the mixture was reacted with 1,2, tetrahydrophthalic anhydride (38. Og) and allowed to react at 90 ° C to obtain an A-1. The disappearance of the acid anhydride group was confirmed by infrared spectroscopy. The weight average molecular weight of the substance A-1 as measured by GPC was 5,000. (Synthesis Example 2) As an epoxy compound having a biphenyl skeleton, Epikote YX4000H (manufactured by Japan Epoxy Resins, epoxy equivalent: 192) represented by the following (9), 400 g, and trisylphosphine 4 g, 153 g of propylene and 600 g of 3-methoxybutyl vinegar acetate were mixed and reacted at 90 ° C. Thereafter, 40 g of tetrahydrophthalic anhydride and 360 g of tetrahydrophthalic acid dianhydride were added as a polybasic acid anhydride, and further reacted to obtain a compound A-2 having a biphenyl skeleton. The disappearance of the acid anhydride group was confirmed by an external spectrum. The compound A-2 had a weight average molecular weight of 700% as determined by GPC. [8] After acid ester L, 1 g, 3, 6-chemical compound formula company olefinic acid ^ 100 phenyl this obtained by red amount flat 26 200902579

(合成例3 )(Synthesis Example 3)

除使用以下述化學式(10)表示之 NC-3000 (日本化 藥公司製造,環氧當量為188) 520g作為具有聯苯基骨架 之環氧化合物,且使用6 5 0 g之乙酸3 -曱氧基丁酯以外, 以與合成例2相同之方式合成化合物A - 3。該化合物A - 3 藉由GPC所測定之重量平均分子量為6 0 0 0。 [化9]Except that NC-3000 (manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent: 188) represented by the following chemical formula (10) was used as an epoxy compound having a biphenyl skeleton, and 650 g of acetic acid 3-oxime was used. Compound A-3 was synthesized in the same manner as in Synthesis Example 2 except for the butyl butyl ester. The weight average molecular weight of the compound A-3 as determined by GPC was 6,000. [Chemistry 9]

(合成例4)(Synthesis Example 4)

除使用雙盼A型環氧樹脂即Epikote 82 8( Japan Epoxy Resins公司製造,環氧當量為190) 390 g作為環氧化合 物以外,以與合成例2相同之方式合成化合物A - 4。該化 合物A-4藉由GPC所測定之重量平均分子量為40 0 0。 <實施例及比較例> 關於本實施例及比較例之著色感光性組成物,以表1 所示之質量比使用150g之化合物A-1〜A-4,進而利用授 拌機,將其與二季戊四醇六丙烯酸酯30g、乙酮,1-[9 -乙 基- 6-(2 -曱基苯曱醯基)-9H -咔唑-3-基]-l-(0 -乙醯肟) (商品名:IRGACURE 0XE 02 , Ciba Specialty Chemicals 27Compound A-4 was synthesized in the same manner as in Synthesis Example 2 except that epochene 82-type epoxy resin (manufactured by Japan Epoxy Resins Co., Ltd., epoxy equivalent: 190) 390 g was used as the epoxide. The weight average molecular weight of this compound A-4 as measured by GPC was 4,000. <Examples and Comparative Examples> With respect to the colored photosensitive compositions of the examples and the comparative examples, 150 g of the compounds A-1 to A-4 were used in the mass ratio shown in Table 1, and further, the mixer was used. It is combined with dipentaerythritol hexaacrylate 30g, ethyl ketone, 1-[9-ethyl-6-(2-mercaptophenyl)-9H-indazol-3-yl]-l-(0-acetamidine)肟) (trade name: IRGACURE 0XE 02 , Ciba Specialty Chemicals 27

200902579 公司製造)1 2 g、巯基苯幷咪唑 6 g、2,4 -雙( 基)-6-(3 -溪-4 -曱氧基)苯基均三喷 4 g、顏料液 名:CF Black,含有24%之碳,御國色素公司製造) 乙酸3 -甲氧基丁酯5 0 0 g混合2小時後,以5 # m 器進行過濾,藉此製備著色感光性組成物。 [表1 ] 光聚合性化合物(質量比) 實施例1 A-l/A-3 = 15/85 實施例2 A-l/A-3=40/60 實施例3 A-l/A-2-15/85 實施例4 A-l/A-2 = 50/50 實施例5 A-2/A-3=85/15 比較例1 A-3 = 100 比較例2 A-l = 100 比較例3 A-2=100 比較例4 A-4 = 100 比較例5 A - l/A-4 = 50/50 比較例6 A-2/A-4 = 50/50 比較例7 A-3/A-4 = 50/50 <圖案形成方法> 使用旋轉塗佈機(TR2 5 0 0 0 :東京應化(股): 以乾燥膜厚為1. 2 g m之方式,將實施例及比較例 色感光性組成物塗佈於厚度為1 mm之具有潔淨表面 基板上,將其於9 0 °C乾燥2分鐘而獲得著色感光性 之膜(感光層)。繼而,經由負型光罩,對該膜選擇 射紫外線。其後,以0. 5質量%碳酸納水溶液,於 行6 0秒之噴霧顯影,藉此形成含有線之黑色矩陣B 後,於循環式烘箱中,於2 2 (TC進行3 0分鐘之後烘:i 此外,所製作之各黑色矩陣之膜厚為 1. 0 # m。曝 三氯曱 (商品 7 0 0 g、 之膜濾 【造), 中之著 的玻璃 組成物 性地照 2 5°C 進 案。其 卜處理。 光量係 28 200902579 以5 mJ為單位自10 mJ/cm2階段性增加至180 mJ/cm: 進行顯影。 <評價> 〔CD靈敏度〕 於上述圖案形成方法中,作為「Bias+1.0 對20 /zm之光罩而形成之黑色光罩圖案(線)的線寬 20 //m+1 時,將此時之曝光量作為CD靈敏度而 r, 評價。由於本發明中之著色感光性組成物係負型光阻 \ ; 而曝光量越大,CD (Critical Dimension,臨界尺寸 得越大。通常,批量生產之目標線寬為光罩線寬+ 1〜 m。若可以更低之曝光量進行圖案化,則可縮短曝光時 從而可提高生產線之產量。 〔細線密著性〕 以上述線之線寬成為8 /ZD1之方式形成圖案,藉d 觀察,對圖案之密著性進行評價。將無圖案剝落者記i 將雖有少量圖案剝落但於實際應用方面無問題者記為 Q 〔圖案直線性〕 藉由SEM觀察,對將曝光量設為65 mJ/cm2而形 線寬為2 0 /z m的線圖案之直線性進行評價。將線圖案 緣平整者記為「良好」,將不平整者記為「不良」。 〔顯影後輪廓〕 藉由SEM觀察,對將曝光量設為65 mJ/cm2而形 線寬為2 0 # m的圖案之輪廓形狀進行評價。該圖案係 後且後烘烤處理前之圖案。將大致為矩形者記為「良 ,而 ,於 成為 進行 ,故 )變 2 β 間, j SEM i; ◎, 〇。 成之 之邊 成之 顯影 好」, 29 200902579 將產生底切等而未形成矩形者記為「不良」。 〔顯影後圖案缺損〕 藉由SEM觀察,對將曝光量設為65 mJ/cm2而形成之 線寬為2 0 μ m之圖案缺損進行評價。該圖案係顯影後且後 烘烤處理前之圖案。 〔至產生底切為止之時間〕200902579 Manufactured by the company) 1 2 g, mercaptobenzimidazole 6 g, 2,4-bis(yl)-6-(3-xi-4-decyloxy)phenyl tetra-spray 4 g, pigment liquid name: CF Black, containing 24% of carbon, manufactured by Royal National Colors Co., Ltd.) 3-methoxybutyl acetate 500 g was mixed for 2 hours, and then filtered with a 5 #m apparatus to prepare a colored photosensitive composition. [Table 1] Photopolymerizable compound (mass ratio) Example 1 Al/A-3 = 15/85 Example 2 Al/A-3 = 40/60 Example 3 Al/A-2-15/85 Example 4 Al/A-2 = 50/50 Example 5 A-2/A-3=85/15 Comparative Example 1 A-3 = 100 Comparative Example 2 Al = 100 Comparative Example 3 A-2=100 Comparative Example 4 A -4 = 100 Comparative Example 5 A - l/A-4 = 50/50 Comparative Example 6 A-2/A-4 = 50/50 Comparative Example 7 A-3/A-4 = 50/50 <pattern formation Method> Using a spin coater (TR2500: Tokyo Tokako Co., Ltd.), the examples and the comparative color photosensitive compositions were applied to a thickness of 1. 2 gm. On a clean surface substrate of 1 mm, it was dried at 90 ° C for 2 minutes to obtain a film (photosensitive layer) of coloring sensitivity. Then, the film was selectively irradiated with ultraviolet rays via a negative mask. Thereafter, 0. 5 mass% aqueous sodium carbonate solution, spray development for 60 seconds, thereby forming a black matrix B containing a line, and then baking in a circulating oven at 2 2 (TC for 30 minutes: i. The film thickness of each black matrix produced is 1. 0 # m. Exposure to trichloropyrene (commodity 700 g, Filtration [made], the glass composition of the material is taken at 2 5 ° C. The treatment is carried out. Light quantity system 28 200902579 Increased from 10 mJ/cm2 to 180 mJ/cm in units of 5 mJ: Development <Evaluation> [CD Sensitivity] In the pattern forming method described above, when the line width of the black mask pattern (line) formed by the Bias+1.0 pair of 20/zm mask is 20 // m+1, The exposure amount at this time is evaluated as the CD sensitivity and r. Since the coloring photosensitive composition in the present invention is a negative photoresist, the larger the exposure amount, the larger the CD (Critical Dimension). Generally, The target line width for mass production is the mask line width + 1 to m. If the pattern can be formed with a lower exposure amount, the exposure can be shortened to increase the production line. [Thin line adhesion] When the width is 8 / ZD1, the pattern is formed, and the adhesion of the pattern is evaluated by d observation. The pattern-free flaking is recorded as a Q with a small amount of pattern peeling off, but no problem in practical application. Sexuality] By SEM observation, the exposure is set to 6 The linearity of the line pattern of 5 mJ/cm 2 and the line width of 2 0 /z m was evaluated. The line pattern edge was marked as "good", and the unevenness was marked as "bad". [Contour after development] The outline shape of the pattern having an exposure amount of 65 mJ/cm 2 and a line width of 20 # m was evaluated by SEM observation. This pattern is the pattern before and after the baking treatment. The person who is roughly rectangular is said to be "good, but it is changed, so it is changed to 2 β, j SEM i; ◎, 〇. The development of the edge is good", 29 200902579 will produce undercuts etc. Those who form a rectangle are marked as "bad". [Pattern defect after development] A pattern defect having a line width of 20 μm formed by setting the exposure amount to 65 mJ/cm 2 was evaluated by SEM observation. This pattern is the pattern before development and after the post-baking treatment. [to the time until the undercut is generated]

針對顯影時自出現圖案至產生底切為止的時間(秒) 進行評價。具體而言,以上述顯影時出現圖案之時刻作為 基準,進而每隔5秒進行顯影,並藉由SEM觀察進行評價。 將以上述方式而獲得之上述各實施例及各比較例之黑 色矩陣圖案的評價結果示於表2。 [表2 ] CD靈敏度 (mJ/cm2) 細線密著 圖案直線性 顯影後輪廓 顯影後圖案 缺損 至產生底切為 止之時間(秒) 實施例1 65 〇 良好 良好 無 25 實施例2 60 〇 良好 良好 無 25 實施例3 65 〇 非常良好 良好 無 30 實施例4 60 ◎ 非常良好 良好 無 30 實施例5 70 〇 良好 良好 有若干 25 比較例1 70 〇 若干不良 不良 無 20 比較例2 60 〇 良好 不良 有 15 比較例3 70 〇 若干不良 良好 無 20 比較例4 100 X 不良 不良 有 10 比較例5 90 Δ 不良 不良 有 10 比較例6 95 Δ 不良 不良 有 15 比較例7 95 Δ 不良 不良 有 15 由表2可知:使用含有由具有聯苯基骨架之環氧化合 物所衍生之單元、及由具有咔哚骨架之環氧化合物所衍生 之單元之環氧化合物(a - 1 )的本實施例,與比較例相比, 於CD靈敏度、細線密著、圖案直線性、顯影後輪廓、顯影 30 200902579 後圖案缺損、至產生底切為止之時間方面,均為良好之結 果。 【圖式簡單說明】 無 【主要元件符號說明】 無The evaluation was performed for the time (seconds) from the appearance of the pattern to the generation of the undercut at the time of development. Specifically, the development was carried out every 5 seconds using the time at which the pattern was developed during the development, and the evaluation was performed by SEM observation. The evaluation results of the black matrix patterns of the above respective examples and comparative examples obtained in the above manner are shown in Table 2. [Table 2] CD sensitivity (mJ/cm2) Thin line adhesion pattern Linear development time After pattern development after pattern development until the undercut occurs (seconds) Example 1 65 〇Good good No 25 Example 2 60 〇 Good and good None 25 Example 3 65 〇 Very good and good No 30 Example 4 60 ◎ Very good and good No 30 Example 5 70 〇 Good and good There are some 25 Comparative Example 1 70 〇 Some bad defects No 20 Comparative Example 2 60 〇 Good bad 15 Comparative Example 3 70 〇 Some bad good No 20 Comparative Example 4 100 X Bad defect 10 Comparative Example 5 90 Δ Bad defect 10 Comparative Example 6 95 Δ Bad defect 15 Comparative Example 7 95 Δ Bad defect 15 Table 2 It is understood that this embodiment using an epoxy compound (a-1) containing a unit derived from an epoxy compound having a biphenyl skeleton and a unit derived from an epoxy compound having an anthracene skeleton, and a comparative example In contrast, CD sensitivity, fine line adhesion, pattern linearity, post-development contour, development pattern after 30200902579, and when the undercut is generated Aspects, the results are good. [Simple diagram description] None [Main component symbol description] None

Claims (1)

200902579 十、申請專利範圍: 1. 一種著色感光性組成物,其含有光聚合性化合物( 光聚合起始劑(B )、及著色劑(C ),其特徵在於:上 聚合性化合物(A ),含有藉由使環氧化合物(a -1 )與 烯性不飽和基之缓酸化合物(a - 2 )之反應物,進而與 酸酐(a - 3 )進行反應而獲得之樹脂(A1 );上述環氧 物(a-Ι),含有具有聯苯基骨架之環氧化合物、及具 °朵(Cardo)骨架之環氧化合物。 2. 如申請專利範圍第1項所述之著色感光性組成物 中上述樹脂(A1)含有:藉由使作為上述(a-Ι)成分 有聯苯基骨架之環氧化合物與上述(a-2)成分之反應 進而與上述(a-3)成分進行反應而獲得之樹脂(A1-以及藉由使作為上述(a-Ι)成分之具有。卡°朵骨架之環 合物與上述(a-2)成分之反應物,進而與上述(a-3 分進行反應而獲得之樹脂(A 1 - 2 )。 3. 如申請專利範圍第1項所述之著色感光性組成物 中上述樹脂(A 1 )含有:藉由使作為上述(a -1 )成分 有聯苯基骨架之環氧化合物及具有咔哚骨架之環氧化 與上述(a-2)成分之反應物,進而與上述(a-3)成 行反應而獲得之樹脂(A 1 - 3 )。 A)、 述光 含乙 多元 化合 有咔 ,其 之具 物, 1 ); 氧化 )成 ,其 之具 合物 分進 32 200902579 4. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述具有聯苯基骨架之環氧化合物,係以下述化學式(1 ) 表示之化合物, [化1]200902579 X. Patent application scope: 1. A color-sensitive photosensitive composition containing a photopolymerizable compound (photopolymerization initiator (B), and a color former (C), characterized in that an upper polymerizable compound (A) a resin (A1) obtained by reacting an epoxy compound (a-1) with an ethylenically unsaturated group of a slow acid compound (a-2) and further reacting with an acid anhydride (a-3); The epoxy (a-oxime) contains an epoxy compound having a biphenyl skeleton and an epoxy compound having a Cardo skeleton. 2. The coloring photosensitive composition as described in claim 1 The resin (A1) contains a reaction between the epoxy compound which has a biphenyl skeleton as the (a-Ι) component and the component (a-2), and further reacts with the component (a-3). And the obtained resin (A1) and a reaction product of the above-mentioned (a-2) component by the above-mentioned (a-Ι) component, and the above-mentioned (a-2) component, and the above (a-3 The resin (A 1 - 2 ) obtained by the reaction. 3. The coloring as described in claim 1 In the optical composition, the resin (A 1 ) contains an epoxy compound having a biphenyl skeleton as the component (a -1 ) and an epoxidation having an anthracene skeleton and the above component (a-2). a reactant (A 1 - 3 ) obtained by reacting the reaction with the above (a-3). A), the light containing B is a mixture of ruthenium, and its constituents, 1); oxidized), The coloring photosensitive composition as described in claim 1, wherein the epoxy compound having a biphenyl skeleton is a compound represented by the following chemical formula (1). ] 〔式(1 )中,複數個R1分別獨立,表示氫原子、碳 數1〜12之烷基、鹵素原子、或可具有取代基之苯基,m 為平均值,表示0〜10之數字,η表示1〜4之整數〕。 5. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述具有聯苯基骨架之環氧化合物,係以下述化學式(2 ) 表示之化合物, [化2][In the formula (1), a plurality of R1 are each independently, and represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent, and m is an average value, and represents a number of 0 to 10, η represents an integer of 1 to 4]. 5. The colored photosensitive composition according to claim 1, wherein the epoxy compound having a biphenyl skeleton is a compound represented by the following chemical formula (2), [Chemical 2] 〔式(2)中,m為平均值,表示0〜10之數字〕。 6. 如申請專利範圍第4項或第5項所述之著色感光性組 成物,其中上述m之值小於1。 33 200902579 7. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述具有咔哚骨架之環氧化合物,係以下述化學式(3 ) 表示之化合物,[In the formula (2), m is an average value, which represents a number from 0 to 10]. 6. The colored photosensitive composition of claim 4, wherein the value of m is less than 1. The coloring photosensitive composition according to the first aspect of the invention, wherein the epoxy compound having an anthracene skeleton is a compound represented by the following chemical formula (3), 8. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述樹脂(A1 )之酸值,以固形分換算為1 0 mgKOH/g〜 150 mgKOH/g ° 9. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述樹脂(A1)之重量平均分子量為1,000〜15, 000。 10. 如申請專利範圍第1項所述之著色感光性組成物,其 中上述光聚合性化合物(A )進而含有含乙烯性不飽和基之 單體。 1 1.如申請專利範圍第1項所述之著色感光性組成物,其 中上述著色劑(C )係黑色顏料。 34 200902579 七、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: 無 八、本案若有化學式時,請揭示最能顯示發 明特徵的化學式:8. The colored photosensitive composition according to claim 1, wherein the acid value of the resin (A1) is converted into a solid content of 10 mgKOH/g to 150 mgKOH/g ° 9. The colored photosensitive composition according to Item 1, wherein the resin (A1) has a weight average molecular weight of 1,000 to 15,000. 10. The coloring photosensitive composition according to the first aspect of the invention, wherein the photopolymerizable compound (A) further contains a monomer containing an ethylenically unsaturated group. 1. The colored photosensitive composition according to claim 1, wherein the coloring agent (C) is a black pigment. 34 200902579 VII. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: None 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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