KR101088568B1 - 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 - Google Patents

갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 Download PDF

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Publication number
KR101088568B1
KR101088568B1 KR1020050039700A KR20050039700A KR101088568B1 KR 101088568 B1 KR101088568 B1 KR 101088568B1 KR 1020050039700 A KR1020050039700 A KR 1020050039700A KR 20050039700 A KR20050039700 A KR 20050039700A KR 101088568 B1 KR101088568 B1 KR 101088568B1
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KR
South Korea
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group
composition
component
organic solvent
weight
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Expired - Lifetime
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KR1020050039700A
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English (en)
Korean (ko)
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KR20060110712A (ko
Inventor
세이지 이나오카
Original Assignee
아반토르 퍼포먼스 머티리얼스, 인크.
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Publication of KR20060110712A publication Critical patent/KR20060110712A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3703—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3723—Polyamines or polyalkyleneimines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Golf Clubs (AREA)
  • Pens And Brushes (AREA)
KR1020050039700A 2005-04-19 2005-05-12 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 Expired - Lifetime KR101088568B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67292305P 2005-04-19 2005-04-19
US60/672,923 2005-04-19

Publications (2)

Publication Number Publication Date
KR20060110712A KR20060110712A (ko) 2006-10-25
KR101088568B1 true KR101088568B1 (ko) 2011-12-05

Family

ID=36754183

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050039700A Expired - Lifetime KR101088568B1 (ko) 2005-04-19 2005-05-12 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼

Country Status (20)

Country Link
US (1) US20080280235A1 (enExample)
EP (1) EP1877870B1 (enExample)
JP (1) JP4677030B2 (enExample)
KR (1) KR101088568B1 (enExample)
CN (1) CN101164016B (enExample)
AT (1) ATE498859T1 (enExample)
BR (1) BRPI0610852A2 (enExample)
CA (1) CA2605236A1 (enExample)
DE (1) DE602006020125D1 (enExample)
DK (1) DK1877870T3 (enExample)
ES (1) ES2361271T3 (enExample)
IL (1) IL186565A0 (enExample)
MY (1) MY145299A (enExample)
NO (1) NO20075935L (enExample)
PL (1) PL1877870T3 (enExample)
PT (1) PT1877870E (enExample)
SG (1) SG161273A1 (enExample)
TW (1) TW200700549A (enExample)
WO (1) WO2006112994A1 (enExample)
ZA (1) ZA200706296B (enExample)

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JP5236217B2 (ja) * 2006-06-22 2013-07-17 東進セミケム株式会社 レジスト除去用組成物
US7851655B2 (en) * 2006-12-19 2010-12-14 Nalco Company Functionalized amine-based corrosion inhibitors for galvanized metal surfaces and method of using same
EP2268765A4 (en) * 2008-03-07 2011-10-26 Advanced Tech Materials UNSELECTIVE OXIDIZE WET CLEANING AGENT AND USE
JP4903242B2 (ja) * 2008-10-28 2012-03-28 アバントール パフォーマンス マテリアルズ， インコーポレイテッド 多金属デバイス処理のためのグルコン酸含有フォトレジスト洗浄組成物
US8110535B2 (en) * 2009-08-05 2012-02-07 Air Products And Chemicals, Inc. Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
US8518865B2 (en) * 2009-08-31 2013-08-27 Air Products And Chemicals, Inc. Water-rich stripping and cleaning formulation and method for using same
WO2013118013A1 (en) * 2012-02-06 2013-08-15 Basf Se A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid
CN103389627A (zh) * 2012-05-11 2013-11-13 安集微电子科技(上海)有限公司 一种光刻胶清洗液
US11168288B2 (en) * 2018-02-14 2021-11-09 Merck Patent Gmbh Photoresist remover compositions
JP7176089B2 (ja) 2018-07-20 2022-11-21 インテグリス・インコーポレーテッド 腐食防止剤を含む洗浄組成物
CN109557774A (zh) * 2019-01-22 2019-04-02 上海华虹宏力半导体制造有限公司 光刻胶去除方法及铝制程工艺方法
CN110967946A (zh) * 2019-12-04 2020-04-07 苏州博洋化学股份有限公司 一种高效碱性光刻胶剥离液
TW202437031A (zh) 2023-03-13 2024-09-16 台灣芯電應用科技股份有限公司 剝離劑組成物以及清洗方法
EP4440252A1 (en) * 2023-03-31 2024-10-02 Atotech Deutschland GmbH & Co. KG Method for removing an organic resin from a surface of a substrate

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JP2006505629A (ja) 2002-01-09 2006-02-16 エア　プロダクツ　アンド　ケミカルズ　インコーポレイテッド 水性ストリッピング及びクリーニング組成物

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JP2002012897A (ja) 2000-02-25 2002-01-15 Shipley Co Llc ポリマー除去用組成物
JP2006505629A (ja) 2002-01-09 2006-02-16 エア　プロダクツ　アンド　ケミカルズ　インコーポレイテッド 水性ストリッピング及びクリーニング組成物

Also Published As

Publication number Publication date
EP1877870A1 (en) 2008-01-16
CA2605236A1 (en) 2006-10-26
KR20060110712A (ko) 2006-10-25
MY145299A (en) 2012-01-13
SG161273A1 (en) 2010-05-27
JP2008537182A (ja) 2008-09-11
PL1877870T3 (pl) 2011-07-29
WO2006112994A1 (en) 2006-10-26
EP1877870B1 (en) 2011-02-16
NO20075935L (no) 2008-01-18
ZA200706296B (en) 2008-09-25
DK1877870T3 (da) 2011-05-02
CN101164016B (zh) 2010-12-01
ES2361271T3 (es) 2011-06-15
IL186565A0 (en) 2008-01-20
US20080280235A1 (en) 2008-11-13
PT1877870E (pt) 2011-05-24
JP4677030B2 (ja) 2011-04-27
BRPI0610852A2 (pt) 2010-08-03
TW200700549A (en) 2007-01-01
CN101164016A (zh) 2008-04-16
ATE498859T1 (de) 2011-03-15
DE602006020125D1 (de) 2011-03-31

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