KR101017510B1 - 이물검사장치 - Google Patents

이물검사장치 Download PDF

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Publication number
KR101017510B1
KR101017510B1 KR1020080035407A KR20080035407A KR101017510B1 KR 101017510 B1 KR101017510 B1 KR 101017510B1 KR 1020080035407 A KR1020080035407 A KR 1020080035407A KR 20080035407 A KR20080035407 A KR 20080035407A KR 101017510 B1 KR101017510 B1 KR 101017510B1
Authority
KR
South Korea
Prior art keywords
inspection
irradiation
light
detection unit
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020080035407A
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English (en)
Korean (ko)
Other versions
KR20080094581A (ko
Inventor
노리유키 미토메
Original Assignee
캐논 가부시끼가이샤
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Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080094581A publication Critical patent/KR20080094581A/ko
Application granted granted Critical
Publication of KR101017510B1 publication Critical patent/KR101017510B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • H10P74/00—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020080035407A 2007-04-20 2008-04-17 이물검사장치 Expired - Fee Related KR101017510B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007111934A JP5063173B2 (ja) 2007-04-20 2007-04-20 異物検査装置
JPJP-P-2007-00111934 2007-04-20

Publications (2)

Publication Number Publication Date
KR20080094581A KR20080094581A (ko) 2008-10-23
KR101017510B1 true KR101017510B1 (ko) 2011-02-25

Family

ID=39871851

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080035407A Expired - Fee Related KR101017510B1 (ko) 2007-04-20 2008-04-17 이물검사장치

Country Status (4)

Country Link
US (2) US7733471B2 (enExample)
JP (1) JP5063173B2 (enExample)
KR (1) KR101017510B1 (enExample)
TW (1) TWI400440B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010032265A (ja) * 2008-07-25 2010-02-12 Canon Inc 異物検査装置、露光装置及びデバイス製造方法
NL2003263A (en) * 2008-08-20 2010-03-10 Asml Holding Nv Particle detection on an object surface.
KR20110061287A (ko) 2009-12-01 2011-06-09 삼성모바일디스플레이주식회사 표면 검사장치, 이를 이용한 표면 검사방법 및 이를 구비하는 슬릿 코터
KR101330098B1 (ko) * 2012-05-10 2013-11-18 동우 화인켐 주식회사 광학 필름의 결함 판별 방법
WO2015161949A1 (en) * 2014-04-24 2015-10-29 Asml Holding N.V. Compact two-sided reticle inspection system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07229844A (ja) * 1994-02-22 1995-08-29 Nikon Corp 異物検査装置
JP2004156978A (ja) * 2002-11-06 2004-06-03 Hitachi High-Technologies Corp 欠陥検査方法及びその装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5982727A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 異物検出方法及びその装置
US4889998A (en) * 1987-01-29 1989-12-26 Nikon Corporation Apparatus with four light detectors for checking surface of mask with pellicle
JP3432273B2 (ja) * 1993-04-19 2003-08-04 株式会社東芝 異物検査装置及び異物検査方法
JP3253177B2 (ja) * 1993-06-15 2002-02-04 キヤノン株式会社 表面状態検査装置
JP2962972B2 (ja) * 1993-07-29 1999-10-12 キヤノン株式会社 表面状態検査装置及び該装置を備える露光装置
US5581348A (en) * 1993-07-29 1996-12-03 Canon Kabushiki Kaisha Surface inspecting device using bisected multi-mode laser beam and system having the same
US7256885B2 (en) * 2003-01-29 2007-08-14 Yeda Research And Development Company Ltd. Coherently controlled nonlinear Raman spectroscopy and microscopy

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07229844A (ja) * 1994-02-22 1995-08-29 Nikon Corp 異物検査装置
JP2004156978A (ja) * 2002-11-06 2004-06-03 Hitachi High-Technologies Corp 欠陥検査方法及びその装置

Also Published As

Publication number Publication date
TWI400440B (zh) 2013-07-01
TW200907325A (en) 2009-02-16
KR20080094581A (ko) 2008-10-23
JP2008268011A (ja) 2008-11-06
US20100238434A1 (en) 2010-09-23
US20080259319A1 (en) 2008-10-23
US7986403B2 (en) 2011-07-26
JP5063173B2 (ja) 2012-10-31
US7733471B2 (en) 2010-06-08

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