KR20080094581A - 이물검사장치 - Google Patents
이물검사장치 Download PDFInfo
- Publication number
- KR20080094581A KR20080094581A KR1020080035407A KR20080035407A KR20080094581A KR 20080094581 A KR20080094581 A KR 20080094581A KR 1020080035407 A KR1020080035407 A KR 1020080035407A KR 20080035407 A KR20080035407 A KR 20080035407A KR 20080094581 A KR20080094581 A KR 20080094581A
- Authority
- KR
- South Korea
- Prior art keywords
- inspection
- light
- detection unit
- reticle
- irradiation
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95676—Masks, reticles, shadow masks
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (8)
- 피검사면에 조사광을 경사입사시켜서 상기 피검사면 상에 직선형상의 조사 영역을 형성하는 조사유닛; 및상기 피검사면에 대해서 상기 조사유닛과 동일한 측에 배치되고, 상기 피검사면 상의 이물에 의해 발생된 산란광을 검출하는 제 1 및 제 2 검출유닛을 구비한 이물검사장치로서,상기 제 1 및 제 2 검출유닛은 상기 직선형상의 조사영역을 포함한 평면에 관해서 서로 반대측에 배치되어 있는 것을 특징으로 하는 이물검사장치.
- 제 1 항에 있어서,상기 조사유닛은 상기 조사광으로서 직선 편광광을 조사시켜서 상기 피검사면에 입사시키고,상기 조사유닛은 상기 피검사면에 입사시키는 직선 편광광의 편광방향을 변경하는 변경부를 가지는 것을 특징으로 하는 이물검사장치.
- 제 1 항에 있어서,상기 제 1 검출유닛과 상기 제 2 검출유닛은 선택적으로 사용되는 것을 특징으로 하는 이물검사장치.
- 제 2 항에 있어서,상기 제 1 검출유닛과 상기 제 2 검출유닛은 한번에 상기 검출유닛 중의 하나가 사용되도록 선택적으로 사용되고,상기 변경부는 사용된 검출유닛에 따라서 상기 직선 편광광의 편광방향을 변경하는 것을 특징으로 하는 이물검사장치.
- 제 4 항에 있어서,피검사면을 조사광에 의해 스캔하기 위해서, 상기 조사유닛, 상기 제 1 검출유닛, 및 상기 제 2 검출유닛을 일체로서 배치해서, 상기 피검사면에 대해서 제 1 방향 및 상기 제 1 방향과 역방향인 제 2 방향으로 이동시키고,상기 제 1 방향에의 스캔시에는 상기 제 1 검출유닛에 의해 상기 산란광을 검출하고,상기 제 2 방향에의 스캔시에는 상기 제 2 검출유닛에 의해 상기 산란광을 검출하고,상기 제 1 방향에의 스캔기간과 상기 제 2 방향에의 스캔기간 사이에, 상기 피검사면에 입사시키는 직선 편광광의 편광방향이 변경되는 것을 특징으로 하는 이물검사장치.
- 제 1 항에 있어서,상기 피검사면은 패턴을 가지는 레티클의 표면이며,상기 직선형상의 조사영역은 상기 레티클의 측면에 대해서 경사져 있는 것을 특징으로 하는 이물검사장치.
- 제 1 항에 있어서,상기 제 1 및 제 2 검출유닛의 검사결과를 비교하여 최종적인 검사결과를 얻는 것을 특징으로 하는 이물검사장치.
- 제 7 항에 있어서,상기 피검사면의 좌표마다 상기 제 1 및 제 2 검출유닛의 검사결과를 비교하고, 검출된 입자크기 중 작은 쪽을 최종적인 검사결과로서 채용하는 것을 특징으로 하는 이물검사장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007111934A JP5063173B2 (ja) | 2007-04-20 | 2007-04-20 | 異物検査装置 |
JPJP-P-2007-00111934 | 2007-04-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080094581A true KR20080094581A (ko) | 2008-10-23 |
KR101017510B1 KR101017510B1 (ko) | 2011-02-25 |
Family
ID=39871851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080035407A KR101017510B1 (ko) | 2007-04-20 | 2008-04-17 | 이물검사장치 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7733471B2 (ko) |
JP (1) | JP5063173B2 (ko) |
KR (1) | KR101017510B1 (ko) |
TW (1) | TWI400440B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8643845B2 (en) | 2009-12-01 | 2014-02-04 | Samsung Display Co., Ltd. | Interferometric surface inspection using a slit-shaped reference beam from inspection surface |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010032265A (ja) * | 2008-07-25 | 2010-02-12 | Canon Inc | 異物検査装置、露光装置及びデバイス製造方法 |
NL2003263A (en) * | 2008-08-20 | 2010-03-10 | Asml Holding Nv | Particle detection on an object surface. |
KR101330098B1 (ko) * | 2012-05-10 | 2013-11-18 | 동우 화인켐 주식회사 | 광학 필름의 결함 판별 방법 |
NL2014399A (en) * | 2014-04-24 | 2015-11-02 | Asml Holding Nv | Compact two-sided reticle inspection system. |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5982727A (ja) * | 1982-11-04 | 1984-05-12 | Hitachi Ltd | 異物検出方法及びその装置 |
US4889998A (en) | 1987-01-29 | 1989-12-26 | Nikon Corporation | Apparatus with four light detectors for checking surface of mask with pellicle |
JP3432273B2 (ja) * | 1993-04-19 | 2003-08-04 | 株式会社東芝 | 異物検査装置及び異物検査方法 |
JP3253177B2 (ja) | 1993-06-15 | 2002-02-04 | キヤノン株式会社 | 表面状態検査装置 |
JP2962972B2 (ja) * | 1993-07-29 | 1999-10-12 | キヤノン株式会社 | 表面状態検査装置及び該装置を備える露光装置 |
US5581348A (en) | 1993-07-29 | 1996-12-03 | Canon Kabushiki Kaisha | Surface inspecting device using bisected multi-mode laser beam and system having the same |
JPH07229844A (ja) * | 1994-02-22 | 1995-08-29 | Nikon Corp | 異物検査装置 |
JP3878107B2 (ja) * | 2002-11-06 | 2007-02-07 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びその装置 |
US7256885B2 (en) * | 2003-01-29 | 2007-08-14 | Yeda Research And Development Company Ltd. | Coherently controlled nonlinear Raman spectroscopy and microscopy |
-
2007
- 2007-04-20 JP JP2007111934A patent/JP5063173B2/ja active Active
-
2008
- 2008-04-17 TW TW097113962A patent/TWI400440B/zh active
- 2008-04-17 US US12/105,194 patent/US7733471B2/en not_active Expired - Fee Related
- 2008-04-17 KR KR1020080035407A patent/KR101017510B1/ko active IP Right Grant
-
2010
- 2010-05-28 US US12/790,614 patent/US7986403B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8643845B2 (en) | 2009-12-01 | 2014-02-04 | Samsung Display Co., Ltd. | Interferometric surface inspection using a slit-shaped reference beam from inspection surface |
Also Published As
Publication number | Publication date |
---|---|
US7733471B2 (en) | 2010-06-08 |
US20080259319A1 (en) | 2008-10-23 |
US7986403B2 (en) | 2011-07-26 |
JP2008268011A (ja) | 2008-11-06 |
US20100238434A1 (en) | 2010-09-23 |
TWI400440B (zh) | 2013-07-01 |
JP5063173B2 (ja) | 2012-10-31 |
TW200907325A (en) | 2009-02-16 |
KR101017510B1 (ko) | 2011-02-25 |
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