JP5063173B2 - 異物検査装置 - Google Patents

異物検査装置 Download PDF

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Publication number
JP5063173B2
JP5063173B2 JP2007111934A JP2007111934A JP5063173B2 JP 5063173 B2 JP5063173 B2 JP 5063173B2 JP 2007111934 A JP2007111934 A JP 2007111934A JP 2007111934 A JP2007111934 A JP 2007111934A JP 5063173 B2 JP5063173 B2 JP 5063173B2
Authority
JP
Japan
Prior art keywords
detection means
inspected
light
detection
foreign matter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007111934A
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English (en)
Japanese (ja)
Other versions
JP2008268011A5 (enExample
JP2008268011A (ja
Inventor
範行 見留
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007111934A priority Critical patent/JP5063173B2/ja
Priority to US12/105,194 priority patent/US7733471B2/en
Priority to TW097113962A priority patent/TWI400440B/zh
Priority to KR1020080035407A priority patent/KR101017510B1/ko
Publication of JP2008268011A publication Critical patent/JP2008268011A/ja
Priority to US12/790,614 priority patent/US7986403B2/en
Publication of JP2008268011A5 publication Critical patent/JP2008268011A5/ja
Application granted granted Critical
Publication of JP5063173B2 publication Critical patent/JP5063173B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • H10P74/00—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2007111934A 2007-04-20 2007-04-20 異物検査装置 Expired - Fee Related JP5063173B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007111934A JP5063173B2 (ja) 2007-04-20 2007-04-20 異物検査装置
US12/105,194 US7733471B2 (en) 2007-04-20 2008-04-17 Foreign substance inspection apparatus
TW097113962A TWI400440B (zh) 2007-04-20 2008-04-17 異物檢查裝置
KR1020080035407A KR101017510B1 (ko) 2007-04-20 2008-04-17 이물검사장치
US12/790,614 US7986403B2 (en) 2007-04-20 2010-05-28 Foreign substance inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007111934A JP5063173B2 (ja) 2007-04-20 2007-04-20 異物検査装置

Publications (3)

Publication Number Publication Date
JP2008268011A JP2008268011A (ja) 2008-11-06
JP2008268011A5 JP2008268011A5 (enExample) 2010-06-03
JP5063173B2 true JP5063173B2 (ja) 2012-10-31

Family

ID=39871851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007111934A Expired - Fee Related JP5063173B2 (ja) 2007-04-20 2007-04-20 異物検査装置

Country Status (4)

Country Link
US (2) US7733471B2 (enExample)
JP (1) JP5063173B2 (enExample)
KR (1) KR101017510B1 (enExample)
TW (1) TWI400440B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010032265A (ja) * 2008-07-25 2010-02-12 Canon Inc 異物検査装置、露光装置及びデバイス製造方法
NL2003263A (en) * 2008-08-20 2010-03-10 Asml Holding Nv Particle detection on an object surface.
KR20110061287A (ko) 2009-12-01 2011-06-09 삼성모바일디스플레이주식회사 표면 검사장치, 이를 이용한 표면 검사방법 및 이를 구비하는 슬릿 코터
KR101330098B1 (ko) * 2012-05-10 2013-11-18 동우 화인켐 주식회사 광학 필름의 결함 판별 방법
WO2015161949A1 (en) * 2014-04-24 2015-10-29 Asml Holding N.V. Compact two-sided reticle inspection system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5982727A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 異物検出方法及びその装置
US4889998A (en) * 1987-01-29 1989-12-26 Nikon Corporation Apparatus with four light detectors for checking surface of mask with pellicle
JP3432273B2 (ja) * 1993-04-19 2003-08-04 株式会社東芝 異物検査装置及び異物検査方法
JP3253177B2 (ja) * 1993-06-15 2002-02-04 キヤノン株式会社 表面状態検査装置
JP2962972B2 (ja) * 1993-07-29 1999-10-12 キヤノン株式会社 表面状態検査装置及び該装置を備える露光装置
US5581348A (en) * 1993-07-29 1996-12-03 Canon Kabushiki Kaisha Surface inspecting device using bisected multi-mode laser beam and system having the same
JPH07229844A (ja) * 1994-02-22 1995-08-29 Nikon Corp 異物検査装置
JP3878107B2 (ja) * 2002-11-06 2007-02-07 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
US7256885B2 (en) * 2003-01-29 2007-08-14 Yeda Research And Development Company Ltd. Coherently controlled nonlinear Raman spectroscopy and microscopy

Also Published As

Publication number Publication date
TWI400440B (zh) 2013-07-01
TW200907325A (en) 2009-02-16
KR20080094581A (ko) 2008-10-23
JP2008268011A (ja) 2008-11-06
US20100238434A1 (en) 2010-09-23
US20080259319A1 (en) 2008-10-23
US7986403B2 (en) 2011-07-26
KR101017510B1 (ko) 2011-02-25
US7733471B2 (en) 2010-06-08

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