KR101016464B1 - 그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 - Google Patents

그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 Download PDF

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Publication number
KR101016464B1
KR101016464B1 KR1020060026088A KR20060026088A KR101016464B1 KR 101016464 B1 KR101016464 B1 KR 101016464B1 KR 1020060026088 A KR1020060026088 A KR 1020060026088A KR 20060026088 A KR20060026088 A KR 20060026088A KR 101016464 B1 KR101016464 B1 KR 101016464B1
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KR
South Korea
Prior art keywords
pattern
film
mask
gray tone
mark
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KR1020060026088A
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English (en)
Korean (ko)
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KR20060102524A (ko
Inventor
미치아키 사노
Original Assignee
호야 가부시키가이샤
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Publication of KR20060102524A publication Critical patent/KR20060102524A/ko
Application granted granted Critical
Publication of KR101016464B1 publication Critical patent/KR101016464B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Thin Film Transistor (AREA)
KR1020060026088A 2005-03-22 2006-03-22 그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 KR101016464B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00082500 2005-03-22
JP2005082500A JP4693451B2 (ja) 2005-03-22 2005-03-22 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法

Publications (2)

Publication Number Publication Date
KR20060102524A KR20060102524A (ko) 2006-09-27
KR101016464B1 true KR101016464B1 (ko) 2011-02-24

Family

ID=37015388

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060026088A KR101016464B1 (ko) 2005-03-22 2006-03-22 그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법

Country Status (4)

Country Link
JP (1) JP4693451B2 (zh)
KR (1) KR101016464B1 (zh)
CN (2) CN1837956B (zh)
TW (1) TW200702935A (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4809752B2 (ja) * 2006-11-01 2011-11-09 株式会社エスケーエレクトロニクス 中間調フォトマスク及びその製造方法
JP5044262B2 (ja) * 2007-04-10 2012-10-10 株式会社エスケーエレクトロニクス 多階調フォトマスク及びその製造方法
JP5089362B2 (ja) * 2007-12-13 2012-12-05 信越化学工業株式会社 フォトマスクおよび露光方法
KR101295235B1 (ko) * 2008-08-15 2013-08-12 신에쓰 가가꾸 고교 가부시끼가이샤 그레이톤 마스크 블랭크, 그레이톤 마스크, 및 제품 가공 표지 또는 제품 정보 표지의 형성방법
US8512918B2 (en) * 2009-03-26 2013-08-20 Hoya Corporation Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same
JP5306391B2 (ja) * 2011-03-02 2013-10-02 株式会社東芝 フォトマスク
JP2011186506A (ja) * 2011-07-01 2011-09-22 Sk Electronics:Kk 中間調フォトマスク
KR101785177B1 (ko) * 2012-12-27 2017-11-06 알박 세이마쿠 가부시키가이샤 위상 시프트 마스크 및 그의 제조방법
JP2015212720A (ja) * 2014-05-01 2015-11-26 Hoya株式会社 多階調フォトマスクの製造方法、多階調フォトマスク及び表示装置の製造方法
TWI710850B (zh) * 2018-03-23 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法
JP7314523B2 (ja) * 2019-02-14 2023-07-26 大日本印刷株式会社 レーザ露光用フォトマスク及びフォトマスクブランクス
US20220390833A1 (en) * 2021-06-03 2022-12-08 Viavi Solutions Inc. Method of replicating a microstructure pattern

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0149221B1 (ko) * 1994-06-27 1999-02-01 김주용 반도체 제조용 포토 마스크
JP2002189282A (ja) * 2000-12-21 2002-07-05 Hitachi Ltd ハーフトーン位相シフトマスクおよびそれを用いた半導体装置の製造方法
KR100390801B1 (ko) * 2001-05-24 2003-07-12 엘지.필립스 엘시디 주식회사 포토 반투과 마스크 제조방법
KR20050002661A (ko) * 2003-06-30 2005-01-10 호야 가부시키가이샤 그레이 톤 마스크의 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002189281A (ja) * 2000-12-19 2002-07-05 Hoya Corp グレートーンマスク及びその製造方法
JP4410951B2 (ja) * 2001-02-27 2010-02-10 Ｎｅｃ液晶テクノロジー株式会社 パターン形成方法および液晶表示装置の製造方法
JP2003255510A (ja) * 2002-03-01 2003-09-10 Hitachi Ltd 電子装置の製造方法
JP2004341139A (ja) * 2003-05-14 2004-12-02 Canon Inc グレートーンマスク及びその製造方法
JP4393290B2 (ja) * 2003-06-30 2010-01-06 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法
JP4108662B2 (ja) * 2004-10-04 2008-06-25 Ｎｅｃ液晶テクノロジー株式会社 薄膜半導体装置の製造方法、レジストパターン形成方法及びこれらの方法に使用するフォトマスク

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0149221B1 (ko) * 1994-06-27 1999-02-01 김주용 반도체 제조용 포토 마스크
JP2002189282A (ja) * 2000-12-21 2002-07-05 Hitachi Ltd ハーフトーン位相シフトマスクおよびそれを用いた半導体装置の製造方法
KR100390801B1 (ko) * 2001-05-24 2003-07-12 엘지.필립스 엘시디 주식회사 포토 반투과 마스크 제조방법
KR20050002661A (ko) * 2003-06-30 2005-01-10 호야 가부시키가이샤 그레이 톤 마스크의 제조 방법

Also Published As

Publication number Publication date
TW200702935A (en) 2007-01-16
CN1837956A (zh) 2006-09-27
CN1837956B (zh) 2010-10-20
CN101833236A (zh) 2010-09-15
JP4693451B2 (ja) 2011-06-01
JP2006267262A (ja) 2006-10-05
KR20060102524A (ko) 2006-09-27

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