KR101016464B1 - 그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 - Google Patents
그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 Download PDFInfo
- Publication number
- KR101016464B1 KR101016464B1 KR1020060026088A KR20060026088A KR101016464B1 KR 101016464 B1 KR101016464 B1 KR 101016464B1 KR 1020060026088 A KR1020060026088 A KR 1020060026088A KR 20060026088 A KR20060026088 A KR 20060026088A KR 101016464 B1 KR101016464 B1 KR 101016464B1
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- film
- mask
- gray tone
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00082500 | 2005-03-22 | ||
JP2005082500A JP4693451B2 (ja) | 2005-03-22 | 2005-03-22 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060102524A KR20060102524A (ko) | 2006-09-27 |
KR101016464B1 true KR101016464B1 (ko) | 2011-02-24 |
Family
ID=37015388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060026088A Expired - Fee Related KR101016464B1 (ko) | 2005-03-22 | 2006-03-22 | 그레이톤 마스크 및 박막 트랜지스터 기판의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4693451B2 (enrdf_load_stackoverflow) |
KR (1) | KR101016464B1 (enrdf_load_stackoverflow) |
CN (2) | CN1837956B (enrdf_load_stackoverflow) |
TW (1) | TW200702935A (enrdf_load_stackoverflow) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4809752B2 (ja) * | 2006-11-01 | 2011-11-09 | 株式会社エスケーエレクトロニクス | 中間調フォトマスク及びその製造方法 |
JP5044262B2 (ja) * | 2007-04-10 | 2012-10-10 | 株式会社エスケーエレクトロニクス | 多階調フォトマスク及びその製造方法 |
JP5089362B2 (ja) * | 2007-12-13 | 2012-12-05 | 信越化学工業株式会社 | フォトマスクおよび露光方法 |
KR101295235B1 (ko) * | 2008-08-15 | 2013-08-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 그레이톤 마스크 블랭크, 그레이톤 마스크, 및 제품 가공 표지 또는 제품 정보 표지의 형성방법 |
US8512918B2 (en) * | 2009-03-26 | 2013-08-20 | Hoya Corporation | Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same |
JP5306391B2 (ja) * | 2011-03-02 | 2013-10-02 | 株式会社東芝 | フォトマスク |
JP2011186506A (ja) * | 2011-07-01 | 2011-09-22 | Sk Electronics:Kk | 中間調フォトマスク |
CN104718496B (zh) * | 2012-12-27 | 2019-06-28 | 爱发科成膜株式会社 | 相移掩膜的制造方法 |
JP2015212720A (ja) * | 2014-05-01 | 2015-11-26 | Hoya株式会社 | 多階調フォトマスクの製造方法、多階調フォトマスク及び表示装置の製造方法 |
TWI710850B (zh) * | 2018-03-23 | 2020-11-21 | 日商Hoya股份有限公司 | 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法 |
JP7314523B2 (ja) * | 2019-02-14 | 2023-07-26 | 大日本印刷株式会社 | レーザ露光用フォトマスク及びフォトマスクブランクス |
US20220390833A1 (en) * | 2021-06-03 | 2022-12-08 | Viavi Solutions Inc. | Method of replicating a microstructure pattern |
US12353128B2 (en) | 2021-06-03 | 2025-07-08 | Viavi Solutions Inc. | Method of replicating a microstructure pattern |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0149221B1 (ko) * | 1994-06-27 | 1999-02-01 | 김주용 | 반도체 제조용 포토 마스크 |
JP2002189282A (ja) * | 2000-12-21 | 2002-07-05 | Hitachi Ltd | ハーフトーン位相シフトマスクおよびそれを用いた半導体装置の製造方法 |
KR100390801B1 (ko) * | 2001-05-24 | 2003-07-12 | 엘지.필립스 엘시디 주식회사 | 포토 반투과 마스크 제조방법 |
KR20050002661A (ko) * | 2003-06-30 | 2005-01-10 | 호야 가부시키가이샤 | 그레이 톤 마스크의 제조 방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002189281A (ja) * | 2000-12-19 | 2002-07-05 | Hoya Corp | グレートーンマスク及びその製造方法 |
JP4410951B2 (ja) * | 2001-02-27 | 2010-02-10 | Nec液晶テクノロジー株式会社 | パターン形成方法および液晶表示装置の製造方法 |
JP2003255510A (ja) * | 2002-03-01 | 2003-09-10 | Hitachi Ltd | 電子装置の製造方法 |
JP2004341139A (ja) * | 2003-05-14 | 2004-12-02 | Canon Inc | グレートーンマスク及びその製造方法 |
JP4393290B2 (ja) * | 2003-06-30 | 2010-01-06 | Hoya株式会社 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
JP4108662B2 (ja) * | 2004-10-04 | 2008-06-25 | Nec液晶テクノロジー株式会社 | 薄膜半導体装置の製造方法、レジストパターン形成方法及びこれらの方法に使用するフォトマスク |
-
2005
- 2005-03-22 JP JP2005082500A patent/JP4693451B2/ja not_active Expired - Lifetime
-
2006
- 2006-03-20 TW TW095109428A patent/TW200702935A/zh unknown
- 2006-03-22 CN CN2006100654561A patent/CN1837956B/zh not_active Expired - Fee Related
- 2006-03-22 KR KR1020060026088A patent/KR101016464B1/ko not_active Expired - Fee Related
- 2006-03-22 CN CN201010189553A patent/CN101833236A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0149221B1 (ko) * | 1994-06-27 | 1999-02-01 | 김주용 | 반도체 제조용 포토 마스크 |
JP2002189282A (ja) * | 2000-12-21 | 2002-07-05 | Hitachi Ltd | ハーフトーン位相シフトマスクおよびそれを用いた半導体装置の製造方法 |
KR100390801B1 (ko) * | 2001-05-24 | 2003-07-12 | 엘지.필립스 엘시디 주식회사 | 포토 반투과 마스크 제조방법 |
KR20050002661A (ko) * | 2003-06-30 | 2005-01-10 | 호야 가부시키가이샤 | 그레이 톤 마스크의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JP2006267262A (ja) | 2006-10-05 |
JP4693451B2 (ja) | 2011-06-01 |
CN1837956B (zh) | 2010-10-20 |
KR20060102524A (ko) | 2006-09-27 |
TW200702935A (en) | 2007-01-16 |
CN101833236A (zh) | 2010-09-15 |
CN1837956A (zh) | 2006-09-27 |
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