KR100996018B1 - 플라즈마 처리 장치 및 플라즈마 처리 방법 - Google Patents
플라즈마 처리 장치 및 플라즈마 처리 방법 Download PDFInfo
- Publication number
- KR100996018B1 KR100996018B1 KR1020030048143A KR20030048143A KR100996018B1 KR 100996018 B1 KR100996018 B1 KR 100996018B1 KR 1020030048143 A KR1020030048143 A KR 1020030048143A KR 20030048143 A KR20030048143 A KR 20030048143A KR 100996018 B1 KR100996018 B1 KR 100996018B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- plasma
- electrode
- processed
- mounting surface
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00206823 | 2002-07-16 | ||
JP2002206823A JP3880896B2 (ja) | 2002-07-16 | 2002-07-16 | プラズマ処理装置およびプラズマ処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040010179A KR20040010179A (ko) | 2004-01-31 |
KR100996018B1 true KR100996018B1 (ko) | 2010-11-22 |
Family
ID=31884270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030048143A KR100996018B1 (ko) | 2002-07-16 | 2003-07-15 | 플라즈마 처리 장치 및 플라즈마 처리 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3880896B2 (ja) |
KR (1) | KR100996018B1 (ja) |
CN (1) | CN100341120C (ja) |
TW (1) | TWI276173B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060054514A (ko) * | 2004-11-16 | 2006-05-22 | 삼성전자주식회사 | 건식 식각 장치 |
JP4839294B2 (ja) * | 2007-10-04 | 2011-12-21 | 株式会社アルバック | 半導体ウエハ保持装置 |
CN102934218B (zh) * | 2010-06-08 | 2016-05-04 | 艾克塞利斯科技公司 | 高温下具有机械夹持能力的受热静电夹头 |
CN105206495B (zh) * | 2015-08-17 | 2018-08-07 | 深圳市华星光电技术有限公司 | 干式蚀刻装置及阵列基板干式蚀刻去除静电方法 |
CN106920730A (zh) * | 2015-12-28 | 2017-07-04 | 中微半导体设备(上海)有限公司 | 一种清洁刻蚀硅基片等离子体处理装置的方法 |
CN106935463B (zh) * | 2017-02-27 | 2018-09-14 | 成都京东方光电科技有限公司 | 用于干法刻蚀的承载装置及干法刻蚀设备 |
WO2019106979A1 (ja) | 2017-11-28 | 2019-06-06 | 東京エレクトロン株式会社 | 処理装置 |
JP7329997B2 (ja) * | 2019-07-09 | 2023-08-21 | 日本特殊陶業株式会社 | 静電チャック装置 |
KR20210109998A (ko) * | 2020-02-28 | 2021-09-07 | 캐논 톡키 가부시키가이샤 | 흡착장치, 성막장치, 흡착방법, 성막방법 및 전자 디바이스의 제조방법 |
KR102637744B1 (ko) * | 2021-09-30 | 2024-02-19 | 주식회사 나이스플라즈마 | 클램프 링이 구비된 클램프 척 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11111830A (ja) * | 1997-10-07 | 1999-04-23 | Tokyo Electron Ltd | 静電吸着装置および静電吸着方法、ならびにそれを用いた処理装置および処理方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0845911A (ja) * | 1994-07-29 | 1996-02-16 | Nippon Steel Corp | プラズマ処理装置用電極 |
US6331754B1 (en) * | 1999-05-13 | 2001-12-18 | Tokyo Electron Limited | Inductively-coupled-plasma-processing apparatus |
JP2001148368A (ja) * | 1999-11-19 | 2001-05-29 | Matsushita Electric Ind Co Ltd | 高周波印加電極とこの電極を用いたプラズマプロセス装置 |
JP2001284328A (ja) * | 2000-03-31 | 2001-10-12 | Taiheiyo Cement Corp | セラミック部品 |
JP4672113B2 (ja) * | 2000-07-07 | 2011-04-20 | 東京エレクトロン株式会社 | 誘導結合プラズマ処理装置 |
-
2002
- 2002-07-16 JP JP2002206823A patent/JP3880896B2/ja not_active Expired - Fee Related
-
2003
- 2003-05-14 TW TW092113111A patent/TWI276173B/zh not_active IP Right Cessation
- 2003-07-15 KR KR1020030048143A patent/KR100996018B1/ko active IP Right Grant
- 2003-07-15 CN CNB031495362A patent/CN100341120C/zh not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11111830A (ja) * | 1997-10-07 | 1999-04-23 | Tokyo Electron Ltd | 静電吸着装置および静電吸着方法、ならびにそれを用いた処理装置および処理方法 |
Also Published As
Publication number | Publication date |
---|---|
CN100341120C (zh) | 2007-10-03 |
KR20040010179A (ko) | 2004-01-31 |
JP2004055585A (ja) | 2004-02-19 |
JP3880896B2 (ja) | 2007-02-14 |
TWI276173B (en) | 2007-03-11 |
CN1477682A (zh) | 2004-02-25 |
TW200403749A (en) | 2004-03-01 |
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