KR100993453B1 - Substrate process apparatus and substrate transfer apparatus - Google Patents

Abstract

The present invention can avoid the enlargement of the transfer chamber, and furthermore, does not widen the opening for substrate transfer of the processing chamber, and does not overload the mechanism, and the substrate processing apparatus equipped with such a substrate transfer apparatus. The purpose is to provide. The board | substrate conveying apparatus has the peak 52 which conveys into the processing chamber 10 in the state which supported the glass substrate, and the main drive mechanism 60 which drives the peak 52, The peak 52 is a base part 56b. ), A plurality of first support members 56a extending from the base portion 56b in a fork shape, and a second support member 57a connected to the first support member 56b so as to be retracted outwardly. The board | substrate is conveyed in the state which comprised the support member which can be stretched by the 1st support member 56a and the 2nd support member 57b, and the support member is extended.

Description

Substrate processing apparatus and substrate conveying apparatus {SUBSTRATE PROCESS APPARATUS AND SUBSTRATE TRANSFER APPARATUS}

Industrial Applicability The present invention provides a processing chamber for performing dry etching or the like on a glass substrate for manufacturing a flat panel display (FPD) such as a liquid crystal display (LCD) or a substrate such as a semiconductor wafer, and a substrate for mounting a substrate in the processing chamber. The board | substrate conveying apparatus which carries out the conveyance, and the board | substrate processing apparatus provided with the conveyance chamber which accommodates a conveying apparatus, and a board | substrate conveying apparatus are provided.

In the manufacturing process of a flat panel display (FPD) represented by a liquid crystal monitor (LCD), a so-called multi-chamber type, which is provided with a plurality of processing chambers for performing predetermined processing such as etching, ashing, and film formation on a glass substrate under vacuum. A substrate processing apparatus is used.

Such a substrate processing apparatus has a conveyance chamber provided with the conveying apparatus which conveys a board | substrate, and the some process chamber provided in the periphery, and the to-be-processed board | substrate is carried in in each process chamber by the conveying apparatus provided in the conveyance chamber, The processed substrate is taken out from the processing chamber of each processing apparatus. The load lock chamber is connected to the transfer chamber, and the plurality of substrates can be processed in a state in which the processing chamber and the transfer chamber are kept in a vacuum state at the time of carrying in and out of the substrate on the atmospheric side. Such a multi-chamber type processing system is disclosed in Patent Document 1, for example.

In such a processing system, when carrying a glass substrate into a processing chamber, a glass substrate is mounted in the peak part of a conveying apparatus, a glass substrate is carried in above the substrate mounting stand in a process chamber, and a lifting pin protrudes from a board mounting stand. Thereby, after mounting a glass substrate on a lifting pin, a peak part is evacuated to a conveyance chamber. Thereafter, the lift pins are lowered to mount the glass substrate on the substrate mounting table. In addition, when carrying out a glass substrate from a process chamber, the glass substrate on a mounting table is raised by a lifting pin, and it transfers to the peak part of a conveying apparatus.

By the way, in recent years, enlargement of a glass substrate advances gradually, and accordingly, enlargement of each chamber in a substrate processing apparatus also advances, and the conveyance distance (inter-chamber conveyance distance) by a conveyance apparatus tends to become long, and the distance Is 5m.

As a result, the stroke of the arm of a conveying apparatus becomes long, and a conveyance chamber becomes large by that stroke. In order to avoid an increase in the size of the transfer chamber, it is effective to cope with the stroke of substrate transfer, for example, by using the transfer apparatus having a structure having multiple stages of stretching arms. It must be forced into, resulting in a wider opening in the processing chamber.

Moreover, when a peak extends in the state which supported the glass substrate, and enters a processing chamber, a peak becomes a cantilever state, and the moment load to the mechanism part of the peak of the base end part becomes large, and a mechanism part becomes large.

[Patent Document 1] Japanese Patent Laid-Open No. 1999-340208

This invention is made | formed in view of such a situation, The board | substrate conveying apparatus which can avoid the enlargement of a conveyance chamber, and also does not widen the opening for conveyance of the board | substrate of a process chamber, and does not apply excessive burden to a mechanism part, and such It is an object to provide a substrate processing apparatus equipped with a substrate transfer apparatus.

MEANS TO SOLVE THE PROBLEM In order to solve the said subject, in the 1st viewpoint of this invention, the processing chamber which performs a predetermined | prescribed process to the board | substrate on a board | substrate mounting stand, the board | substrate conveying apparatus which conveys a board | substrate to the said board | substrate mounting stand, and the said board | substrate conveying apparatus are It accommodates and the conveyance chamber to which the said process chamber is connected is provided, The said substrate conveyance apparatus enters into the said process chamber in the state which supported the board | substrate, and the peak which conveys a board | substrate to the said board mounting base, and the main which drives a peak It has a drive mechanism, The peak has a base portion, a plurality of support members extending in a fork shape from the base portion to support a substrate, and a sub-drive mechanism for stretching the support member to extend the support member, A substrate processing apparatus is characterized in that a substrate is conveyed in a state.

In the first aspect, the support member includes a first member connected to the base portion and a second member provided to be retracted from the first member, and the sub-drive mechanism drives the second member. can do.

Moreover, the said support member has the 1st member connected to the said base part, and the 2nd member provided so that advancing and exiting is possible with respect to the said 1st member, The said sub-drive mechanism can be comprised so that a 2nd member may be driven.

The sub-drive mechanism can be configured to advance-drive the second member in conjunction with the slide movement of the peak by the main drive mechanism. In this case, the substrate conveying apparatus may further have a base on which the peak is slidable, and the peak slides on the base to allow entry into the processing chamber from the conveying chamber. In addition, the peak has a connecting portion connecting the plurality of second members, and the sub-drive mechanism is suspended from the base portion or the first member toward the base and is rotated according to the slide movement of the peak. A pulley, a second pulley disposed on the base portion or the first member and rotating according to the rotation of the first pulley, and disposed on the base portion or the first member, according to the rotation of the second pulley. And a third pulley rotating through the belt, and a clamp member attached to the belt, mechanically connected to the second member, moving in accordance with the movement of the belt, and collectively moving the plurality of second members. You can make it a configuration. In this configuration, a speed reducer may be interposed between the first pulley and the second pulley.

The said sub drive mechanism can be comprised so that the said 2nd member may drive forward independently of the movement of the said peak. In this case, the said sub-drive mechanism is arrange | positioned on the said base part or 1st member, and is arrange | positioned on the expansion-and-contraction cylinder which has a telescopic rod, and the said base part or 1st member, according to the movement of the said telescopic rod. A fourth pulley that rotates, a fifth pulley that is disposed on the base portion or the first member and rotates through the belt according to the rotation of the fourth pulley, and is provided on the belt and mechanically attached to the second member. It can be set as the structure which has a clamp member connected to and moved according to the movement of the said belt, and which moves the said 2nd member. In such a configuration, the fourth pulley can be configured to have a small pulley which rotates in accordance with the movement of the elastic rod, and a large pulley which rotates simultaneously with the small pulley and the belt is extended. In addition, the sub-drive mechanism is disposed on the base portion or the first member to move the second member so that the second member advances from the first member and returns to the first member. It can be set as the structure provided with the expansion-contraction cylinder which has an expansion-contraction rod. In addition, the sub-drive mechanism protrudes from the first member by introducing the pressurized gas, whereby the bellows for advancing the second member from above the first member and the inside of the bellows are depressurized. And a spring which elastically presses so that the said 2nd member may return on a said 1st member. And also in the structure which drives a 2nd member advancing independently of the movement of such a peak, the said board | substrate conveying apparatus further has a base which a said peak can slide, and the said peak slides on the base, and the said It can be set as the structure which can enter into a processing chamber.

In the said 1st viewpoint, the insertion passage space which allows the insertion passage of the lifting pin which raises and lowers from the board | substrate mounting table of the said processing chamber can be formed between the said some support member. Moreover, it can be set as the structure with which the several process chamber is connected to the said transfer chamber.

In a 2nd viewpoint of this invention, the board | substrate conveying apparatus which conveys a board | substrate has a peak which conveys a board | substrate in the state which supported the board | substrate, and the main drive mechanism which drives a peak, The said peak is a base part, and the said base part And a plurality of supporting members extending in a fork shape to support the substrate, and a sub-drive mechanism for stretching the supporting member in a stretchable manner, wherein the substrate is conveyed in a state where the supporting member is extended. do.

In the second aspect, the support member has a first member connected to the base portion, and a second member provided to retract from the first member so that the sub-drive mechanism drives the second member. can do.

Moreover, the said support member has the 1st member connected to the said base part, and the 2nd member provided so that advancing and exiting is possible with respect to the said 1st member, The said sub-drive mechanism can be comprised so that a 2nd member may be driven.

The sub-drive mechanism can be configured to advance-drive the second member in conjunction with the slide movement of the peak by the main drive mechanism. In this case, the peak further has a slidable base, and the peak can be configured to convey the substrate by sliding on the base. The peak has a connecting portion for connecting the plurality of second members, and the sub-drive mechanism is suspended from the base portion or the first member toward the base, and is rotated in accordance with the slide movement of the peak. A first pulley, the second pulley disposed on the base portion or the first member and rotated according to the rotation of the first pulley, and the second pulley disposed on the base portion or the first member, and the rotation of the second pulley. And a third pulley rotating through the belt, and a clamp member installed on the belt and mechanically connected to the second member and moving in accordance with the movement of the belt to collectively move the plurality of second members. It can be set as having a structure. In this configuration, a speed reducer may be interposed between the first pulley and the second pulley.

The said sub drive mechanism can be comprised so that the said 2nd member may drive forward independently of the movement of the said peak. In this case, the said sub-drive mechanism is arrange | positioned on the said base part or 1st member, and is arrange | positioned on the expansion-and-contraction cylinder which has a telescopic rod, and the said base part or 1st member, according to the movement of the said telescopic rod. A fourth pulley that rotates, a fifth pulley that is disposed on the base portion or the first member and rotates through the belt according to the rotation of the fourth pulley, and is provided on the belt and mechanically attached to the second member. It is connected, and it can be set as the structure which has a clamp member which moves according to the movement of the said belt, and moves the said 2nd member. In this configuration, the fourth pulley can be configured to have a small pulley that rotates in accordance with the movement of the elastic rod, a large pulley that rotates together with the small pulley, and the belt is extended. In addition, the sub-drive mechanism is disposed on the base portion or the first member, and moves the second member so that the second member advances from the first member and returns to the first member. It can be set as the structure provided with the expansion-contraction cylinder which has an expansion-contraction rod. In addition, the sub-drive mechanism protrudes from the first member by introducing the pressurized gas, whereby the bellows for advancing the second member from above the first member and the inside of the bellows are depressurized. And a spring which elastically presses so that the said 2nd member may return on a said 1st member. And also in the structure which drives a 2nd member advancing independently of the movement of such a peak, the said peak can further have a base which can slide, and the said peak can be set as the structure which conveys a board | substrate by sliding the said base.

In the said 2nd viewpoint, the insertion passage space which allows the insertion passage of the lifting pin which raises and lowers from the board | substrate mounting table of the said processing chamber can be formed between the said some support member. Moreover, it can be comprised in the conveyance chamber connected to the process chamber which performs a predetermined | prescribed process to the board | substrate on a board | substrate base, and can be comprised so that a board | substrate may be conveyed to the board | substrate mount stand provided in the said process chamber.

According to the present invention, a substrate has a base portion, a plurality of support members extending in a fork shape from the base portion, and a sub-drive mechanism for telescopically moving the support member, and the substrate is mounted in a state in which the support member is extended. Since it is comprised so that a support member may be shortened when a peak is retracted into a conveyance chamber, when a peak enters a process chamber, it can be made to be in the state which advanced. For this reason, since the peak itself can be made small in the conveyance chamber, the conveyance chamber can be reduced in size, and at the time of conveyance of a board | substrate, only the support member itself of a peak needs to be extended, and it is the same as before in a process chamber. There is no need to insert the mechanism for driving the peak, only a simple and thin mechanism is inserted to stretch the support member, and widening the opening of the processing chamber is avoided. In addition, when the peak enters the processing chamber, the amount of advancement of the support member may be a short distance of half or less of its length, and a bending moment is hardly applied to the proximal end of the peak from the support member. The load applied to the mechanism and the like can be made low.

EMBODIMENT OF THE INVENTION Hereinafter, the preferred form of this invention is demonstrated, referring an accompanying drawing. Here, the multi-chamber type plasma etching system equipped with the plasma etching apparatus which performs plasma etching with respect to the glass substrate G for FPD which is one Embodiment of the substrate processing apparatus of this invention is demonstrated as an example. Here, examples of the FPD include a liquid crystal monitor (LCD), an electroluminescence (EL) display, a plasma display panel (PDP), and the like.

1 is a perspective view schematically showing a multi-chamber type plasma etching apparatus according to an embodiment of a substrate processing apparatus of the present invention, and FIG. 2 is a horizontal sectional view schematically showing the inside thereof.

In the plasma etching apparatus 1, a transfer chamber 20 and a load lock chamber 30 are connected to a central portion of the plasma etching apparatus 1. The processing chamber 10 for performing three plasma etching is connected to the circumference | surroundings of the conveyance chamber 20. As shown in FIG.

Between the conveyance chamber 20 and the load lock chamber 30, between the conveyance chamber 20 and each process chamber 10, and in the opening which communicates the load lock chamber 30 and the outside atmosphere, it is airtight between them. Gate valves 22 which are sealed and configured to be opened and closed are respectively inserted.

On the outer side of the load lock chamber 30, two cassette indexers 41 are provided, and cassettes 40 each containing the glass substrate G are mounted thereon. This cassette 40 can accommodate, for example, an untreated substrate on one side thereof and a processed substrate on the other side. These cassettes 40 are liftable by the lift mechanism 42.

Between these two cassettes 40, the conveyance mechanism 43 is provided on the support base 44, and this conveyance mechanism 43 integrates the peaks 45 and 46 provided in two upper and lower stages, and these integrally. The base 47 is supported so that it can be retracted and rotatably supported.

As in the vacuum processing chamber, the conveyance chamber 20 can be maintained in a predetermined pressure-reduced atmosphere, and the conveyance apparatus 50 is arrange | positioned in it, as shown in FIG. And glass substrate G is conveyed between the load lock chamber 30 and the three plasma etching apparatuses 10 by this conveyance apparatus 50. As for the conveying apparatus 50, the two slide peaks 52 and 53 are provided so that back and forth movement is possible on the base 51 which can be rotated and can move up and down. The detailed structure of the conveying apparatus 50 is mentioned later.

The load lock chamber 30 can be maintained in a predetermined reduced pressure atmosphere similarly to the respective processing chambers 10 and the transfer chamber 20. In addition, the load lock chamber 30 is for performing the exchange of the glass substrate G between the cassette 40 in the air atmosphere and the processing chamber 10 in the reduced pressure atmosphere, and the relationship of repeating the air atmosphere and the reduced pressure atmosphere In fact, the inside volume is very small. In addition, the load lock chamber 30 is provided with two stages in which the substrate accommodating part 31 is provided in the upper and lower sides (only the upper end is shown in FIG. 2), and a buffer for supporting the glass substrate G in each substrate accommodating part 31. The positioner 33 which performs position alignment of the 32 and glass substrate G is provided.

The processing chamber 10 is provided with the structure for performing an etching process as shown to sectional drawing of FIG. The processing chamber 10 is, for example, molded into a cylindrical shape made of aluminum whose surface is anodized (anodically oxidized), and the bottom portion of the processing chamber 10 for mounting the glass substrate G, which is the substrate to be processed, is mounted. The susceptor 101 which is a board mounting table is provided. Lifting pins 130 for carrying out the loading and unloading of the glass substrate G thereon are inserted into the susceptor 101 so as to be lifted and lowered. When carrying out the glass substrate G, this lifting pin 130 is raised to the conveyance position above the susceptor 101, and it will be in the state which entered into the susceptor 101 other than that. The susceptor 101 is supported by the bottom of the processing chamber 10 via the insulating member 104, and has a metallic base 102 and an insulating member 103 provided at the periphery of the base 102.

A feed line 123 for supplying high frequency power is connected to the substrate 102 of the susceptor 101, and a matcher 124 and a high frequency power supply 125 are connected to the feed line 123. The high frequency power of 13.56 MHz, for example, is supplied from the high frequency power supply 125 to the susceptor 101.

Above the susceptor 101, a shower head 111 is provided which faces in parallel with the susceptor 101 and functions as an upper electrode. The shower head 111 is supported at the upper portion of the processing chamber 10 and has a plurality of discharge holes 113 having an internal space 112 therein and discharging the processing gas to the surface facing the susceptor 101. Is formed. This shower head 111 is grounded and comprises a pair of parallel flat electrodes simultaneously with the susceptor 101.

A gas inlet 114 is provided on an upper surface of the shower head 111, and a process gas supply pipe 115 is connected to the gas inlet 114, and a valve 116 and a process gas supply pipe 115 are connected to the process gas supply pipe 115. The processing gas supply source 118 is connected via the mass flow controller 117. The processing gas source 118 is supplied with a processing gas for performing etching. As the processing gas, a gas usually used in this field, such as a halogen gas, O ₂ gas, or Ar gas, can be used.

An exhaust pipe 119 is formed at the bottom of the processing chamber 10, and an exhaust device 120 is connected to the exhaust pipe 119. The exhaust device 120 includes a vacuum pump such as a turbomolecular pump, and is thereby configured to be capable of vacuum suction of the inside of the processing chamber 10 to a predetermined reduced pressure atmosphere. Moreover, the board | substrate carrying-in exit 121 is provided in the side wall of the processing chamber 10, and this board | substrate carrying-in outlet 121 is openable by the gate valve 22 mentioned above. And glass substrate G is carried in and out by the conveying apparatus 50 in the conveyance chamber 20 in the state which opened this gate valve 22.

As shown in FIG. 2, each component of the plasma etching apparatus 1 is configured to be controlled by a process controller 70 having a microprocessor. The process controller 70 includes a keyboard on which an operator executes an operation of inputting a command for managing the plasma etching apparatus 1, a display which visualizes and displays the operation status of the plasma etching apparatus 1, and the like. A user interface 71 is connected. In addition, the process controller 70 includes a control program for realizing various processes executed by the plasma etching apparatus 1 under the control of the process controller 70, or predetermined processing in the plasma etching apparatus 1 according to processing conditions. The control unit 72, which stores recipes, various databases, and the like, is connected. The storage unit 72 has a storage medium, and recipes and the like are stored in the storage medium. The storage medium may be a hard disk or a semiconductor memory, and may be portable such as a CDROM, a DVD, a flash memory, or the like. In the plasma etching apparatus 1 under the control of the process controller 70, an arbitrary recipe is called from the storage unit 72 and executed by the process controller 70 as required by the user interface 71. The desired processing of is executed.

The processing operation in the plasma etching apparatus 1 configured as described above will be described below.

First, two peaks 45 and 46 of the conveyance mechanism 43 are driven forward and backward, and two glass substrates G are moved from the two cassettes of the load lock chamber 30 from one cassette 40 containing the untreated substrate. It carries in to the board | substrate accommodation chamber 31.

After the peaks 45 and 46 are withdrawn, the gate valve 22 on the atmospheric side of the load lock chamber 30 is closed. Thereafter, the inside of the load lock chamber 30 is exhausted to reduce the inside pressure to a predetermined degree of vacuum. After completion of vacuum suction, position alignment of glass substrate G is performed by pressurizing a board | substrate with the positioner 33. As shown in FIG.

After being aligned as mentioned above, the gate valve 22 between the conveyance chamber 20 and the load lock chamber 30 is opened, and the board | substrate of the load lock chamber 30 is carried out by the conveyance apparatus 50 in the conveyance chamber 20. The glass substrate G accommodated in the accommodating part 31 is received, carried in to the processing chamber 10, and the glass substrate G is mounted on the susceptor 101. FIG.

Thereafter, the gate valve 22 is closed, and the exhaust device 120 vacuum sucks the inside of the processing chamber 10 to a predetermined degree of vacuum. The shower head is opened through the processing gas supply pipe 115 and the gas inlet 114 while opening the valve 116 and adjusting the flow rate of the processing gas from the processing gas supply source 118 by the mass flow controller 117. It introduces into the internal space 112 of 111, and it discharges uniformly with respect to the board | substrate G through the discharge hole 113, and controls the inside of the processing chamber 10 to predetermined pressure, adjusting the amount of displacement.

In this state, a predetermined process gas is introduced into the chamber 10 from the process gas supply source 118, and high frequency power is applied to the susceptor 104 from the high frequency power supply 125, and the susceptor 101 as a lower electrode is provided. And a high frequency electric field are generated between the shower head 111 as the upper electrode to generate a plasma of the processing gas, and the glass substrate G is etched by the plasma.

In this way, after performing an etching process, application of the high frequency electric power from the high frequency power supply 125 is stopped and process gas introduction is stopped. And the process gas which remained in the process chamber 10 is exhausted, and the glass substrate G is raised to the conveyance position by the lifting pin 130. In this state, the gate valve 22 is opened and the glass substrate G is carried out from the processing chamber 10 to the transfer chamber 20 by the transfer apparatus 50.

The glass substrate G carried out from the processing chamber 10 is conveyed to the load lock chamber 30, and is accommodated in the cassette 40 by the conveyance mechanism 43. At this time, the original cassette 40 may be returned to the original cassette 40 or may be accommodated in the other cassette 40.

The series of operations described above are repeated by the number of sheets of glass substrate G accommodated in the cassette 40, and the processing ends.

Next, the conveying apparatus 50 of the conveyance chamber 20 is demonstrated in detail.

First, the first embodiment will be described.

It is a schematic block diagram which shows the conveying apparatus by which the peak part slides along a 1st Embodiment, and FIG. 5 is the outline at the time of conveying a glass substrate from a conveyance chamber to a processing unit with the conveying apparatus shown in FIG. It is a sectional drawing, and FIG. 6 is a perspective view which shows the conveying apparatus shown in FIG. 4 and FIG. 5, FIG. 6A is a state when a slide peak is located in the origin position in a conveyance chamber, and FIG. 6B is a slide peak of a processing chamber. It shows the state when entering inside.

As shown in FIG. 4, the conveying apparatus 50 includes a long base 51, slide peaks 52 and 53 provided in two stages above and below the base 51 so as to be able to slide independently on the base 51, and the base 51. Control the conveyance of the conveying device by controlling the drive by the drive device 54 and the drive device 54 which drives the rotary peak ( theta drive) and raises and lowers (Z drive) and drives the slide peak 52. It has the conveyance control part 55.

The slide peak 52 moves on the base 51 and is installed in the processing chamber 10 so that the slide peak 52 can move in and out of the main body 56 and the main body 56. Equipped. In addition, the slide peak 53 moves on the base 51 and is installed in the processing chamber 10 so that the slide peak 53 can enter and exit from the main body 256 and the main body 256. ). In addition, since the slide peaks 52 and 53 are comprised similarly, the slide peak 52 is mainly demonstrated below for convenience of description.

As shown in FIG. 6, the main body portion 56 constituting the slide peak 52 extends horizontally in a fork shape from the base portion 56b including the connection portion with the base 51 and the base portion 56b. It has a some 1st support member 56a which comprises the elongate shape which becomes. Further, the advance evacuation portion 57 has a plurality of second support members 57a connected to the plurality of first support members 56a so as to enable evacuation. And the support member which is extensible by the 1st support member 56a and the 2nd support member 57a is comprised, and the glass substrate G is arrange | positioned on the 2nd support member 57a. An insertion passage space 131 is formed between the plurality of first supporting members 56a and the second supporting members 57a to allow the lifting pin 130 to pass through. In addition, the number of support members can be set suitably freely, and part of a support member is abbreviate | omitted in FIG.

The plurality of second supporting members 57a are mechanically connected by the connecting member 57b, and are integrally movable.

Moreover, the main drive mechanism 60 for driving the main body 56 is provided in the base 51. The main drive mechanism 60 is a belt wound around the pulley 62 on the driving side provided at the proximal end of the base 51, the pulley 64 on the driven side provided on the distal end of the base 51, and the pulleys 62, 64. (63) (timing belt) and a clamp member (65) installed on the belt (63) and mechanically connected to the main body portion (56) and moving in accordance with the movement of the belt (63) to move the main body portion (56). ). The drive side pulley 62 is rotated by a motor 61 (see FIG. 7, etc.) belonging to the drive device 54. In addition to the timing belt, the belt 63 may be a steel wire (belt) or the like.

As shown in FIG. 6B, the main body 56 moves by the distance Lm shown, and the advance retreat part 57 moves by the distance Ls shown. When the slide peak 52 enters the processing chamber 10, the advance retreat portion 57 may have a length less than half of the total length thereof advance from the main body portion 56.

Next, the detail of the mechanism part of the slide peak of the conveyance apparatus of 1st Embodiment is demonstrated. 7 and 8 are schematic diagrams showing the mechanism part of the slide peak of the transport apparatus according to the first embodiment of the present invention, and FIG. 7 shows a state in which the slide peak 52 is at the origin position of the transport chamber 20. FIG. 8 is a diagram showing a state in which the slide peak 52 enters the processing chamber 10. 9A is a cross sectional view taken along the line VIIa of FIG. 7, and FIG. 9B is a cross sectional view taken along the line VIIb of FIG. 7. Also in this figure, only the slide peak 52 of the two slide peaks 52, 53 will be described.

In the conveying apparatus 50 of this embodiment, the main drive mechanism 60 mentioned above for driving the main body part 56 of the slide peak 52 is provided in the base 51, and the exit retraction part 57 is provided. The sub-drive mechanism 80 for sliding a drive is provided.

The sub drive mechanism 80 has a base 81 provided in the base portion 56b of the main body portion 56. The sub drive mechanism 80 is suspended from the main body 56 toward the base 51 and has a first pulley 82a that rotates in accordance with the movement of the main body 56. That is, the pair of idlers 82b and 82b installed on the belt 63 of the main drive mechanism 60 rotate while simultaneously moving with the belt 63, whereby the first pulley 82a rotates the belt 63. And rotates as the main body portion 56 moves.

The first pulley 82a is connected to the second pulley 84 disposed on the base 81 via the reducer 83 (see FIG. 9B).

The sub-drive mechanism 80 is also disposed on the base 81, and with the third pulley 86 and belt 85 rotating through the belt 85 (timing belt) in accordance with the rotation of the second pulley 84. ), It is mechanically connected to the advance evacuation part 57, moves along with the movement of the belt 85, and has a clamp member 87 for moving the advancing evacuation part 57. In addition to the timing belt, the belt 85 may be a steel wire (belt) or the like.

9A and 9B, a pair of guide members 88 and 88 are provided between the upper surface of both sides of the base 51 and the lower surface of the base portion 56b of the body portion 56. Intervened. Moreover, a pair of guide members 89a and 89a are interposed between the upper surfaces of both sides of the base 81 of the sub-drive mechanism 80 and the lower surface of the connecting member 57b of the advance retreat portion 57. Thin guide members 89b, ... are interposed between the upper surface of the first supporting member 56a of the main body 56 and the lower surface of the second supporting member 57a.

In the conveying apparatus 50 comprised as mentioned above, as shown in FIG. 5, the slide peak 52 enters into the processing chamber 10 in the state in which the exit retreat part 57 mounted the glass substrate G, The advancing retreat part 57 is brought into the state advancing from the main body part 56.

Next, the lifting pin 130 rises and receives the glass substrate G from the advanced retreat part 57 which advanced. Thereafter, the slide peak 52 is discharged from the processing chamber 10 to the transfer chamber 20, and the lifting pin 130 is lowered to mount the glass substrate G on the susceptor 101. On the other hand, when replacing the processed board | substrate G from the lifting pin 130 to the advance evacuation part 57, it performs by the process opposite to the case mentioned above.

Thus, when conveying glass substrate G to the processing chamber 10 by the conveying apparatus 50, as shown to FIG. 6 and FIG. 7, the motor 61 of the main drive mechanism 60 is driven and pulleys. (62) is rotated, thereby rotating the belt (63) and pulley (64). At this time, the clamp member 65 attached to the belt 63 moves, and the main body 56 of the slide peak 52 mechanically connected to the clamp member 65 moves.

In the present embodiment, the sub-drive mechanism 80 has the same drive source as the main drive mechanism 60 as described above, so that the advance retreat portion 57 moves in conjunction with the movement of the main body portion 56. do.

In addition, the sub-drive mechanism 80 has the same configuration as that of the main drive mechanism 60. However, since the above-described speed reducer 83 is interposed in the power transmission path, the advance drive portion 57 has a main body 56. ), The amount of operation is to proceed as the deceleration.

That is, in the sub drive mechanism 80, the first pulley 82a suspended from the main body 56 in accordance with the movement of the main body 56 moves in accordance with the movement of the belt 63 and the main body 56. While being rotated, the rotation of the first pulley (82a) is decelerated by the reducer (83), is transmitted to the second pulley (84), whereby the belt wound around the second pulley (84) and the third pulley (86) 85 moves, and according to the movement, the clamp member 87 provided on the belt 85 moves, and the advance retreat portion 57 mechanically connected to the clamp member 87 moves, and the main body portion 56 moves. It is advanced from.

Thus, by advancing the advancing evacuation part 57 in which the glass substrate G was mounted, it becomes possible to convey the glass substrate G to the desired position in the processing unit 10.

In this case, when the slide peak 52 is located in the conveyance chamber 20, since the advance evacuation part 57 is located on the main body 56 and these are in a superimposed state, the conveyance chamber 20 Can be miniaturized.

In addition, in this case, when conveying glass substrate G to the processing chamber 10, the advancing evacuation part 57 is advanced and the support which consists of the 1st support member 56a and the 2nd support member 57a is carried out. Since the member itself needs to be elongated, there is no need to insert a mechanism driving a conventional peak into the processing chamber 10, and only a simple and thin mechanism for stretching the support member is inserted into the processing chamber 10. Thus, widening the opening of the processing chamber 10 is avoided.

In addition, when the slide peak 52 enters the processing chamber 10, the advance retreat portion 57 may have a length less than half of the entire length from the main body 56. From 57), the main body 56 only takes a downward load, and the bending moment can be reduced. Therefore, the load on the mechanism part of the sub drive mechanism 80 provided in the main-body part 56 can be made small, and the structure of the sub drive mechanism 80 etc. can be simplified by this.

In addition, since the size and the size of the belt 85 (timing belt) for driving can be reduced by suppressing the load and the resistance of the advance retreat part 57 small, the conveyance mechanism can be miniaturized.

Next, 2nd Embodiment of the conveying apparatus 50 is demonstrated.

In this embodiment, although the schematic structure of a conveying apparatus is the same as that of 1st embodiment, only the structure of the mechanism part of a slide peak differs.

FIG. 10: is a schematic diagram which shows the mechanism part of the slide peak of the conveying apparatus by which a peak part slides along a 2nd embodiment, and shows the state in which a slide peak enters into a processing chamber. In addition, also in this figure, it demonstrates centering on the slide peak 52 among two slide peaks.

In this embodiment, the sub-drive mechanism which is arrange | positioned on the base part 56b of the main-body part 56 of the slide peak 52, and is equipped with the expansion-contraction cylinder 91 (air cylinder) which has the extension rod 91a. (90) is used.

On the base portion 56b of the main body portion 56, a fourth pulley (large pulley) 93 having a pulley 92 and a small pulley 93a is disposed between the pulley 92 and the small pulley 93a. The belt 94 is provided. The stretching rod 91a of the stretching cylinder 91 (air cylinder) is connected to the belt 94.

The sub-drive mechanism 90 is also provided in the belt 96 and the fifth pulley 97 that rotates via the belt 96 (timing belt) in accordance with the rotation of the fourth pulley 93 (large pulley). It is mechanically connected to the advance evacuation part 57, and has the clamp member 98 which moves according to the movement of the belt 96, and moves the advance evacuation part 57. As shown in FIG. In addition to the timing belt, the belt 96 may be a steel wire (belt) or the like.

Therefore, when pressurized air is supplied to the expansion-contraction cylinder 91 (air cylinder), the expansion-contraction rod 91a moves, the belt 94 moves, and the small pulley 93a rotates. As a result, the fourth pulley 93 (large pulley) rotates, and the belt 96 and the fifth pulley 97 rotate. The clamp member 98 provided in the belt 96 moves, and the advance retreat part 57 mechanically connected to this clamp member 98 moves.

In this embodiment, since the drive source is separate from the main drive mechanism 60, the sub-drive mechanism 90 separates the advance retreat part 57 independently of the movement of the main-body part 56 as mentioned above. It is supposed to move.

Moreover, the sub drive mechanism 90 has the above-mentioned 4th pulley 93 (large pulley) and the small pulley 93a in the power transmission path. For this reason, the advance retreat part 57 is made to advance by the 4th pulley 93 (large pulley), the small pulley 93a, and speed-up ratio rather than the operation | movement amount of the telescopic rod 91a.

It is typical sectional drawing of the conveying apparatus in which the peak part slides and moves according to 2nd Embodiment. Here, both of the slide peaks 52 and 53 provided in two stages are shown. As described above, the lower slide peak 52 has a pair of guide members 88 and 88 interposed between the upper surface of both sides of the base 51 and the lower surface of the base portion 56b of the body portion 56. do. Further, a thin guide member 89b,... Is interposed between the upper surface of the first support member 56a of the main body 56 and the lower surface of the second support member 57a of the advance retreat portion 57. It is.

Although not shown in detail, the upper slide peak 53 is provided with a main drive mechanism having the same structure, and is provided with a pair of guide members between the upper surfaces of both sides of the base 51 and the lower surface of the support member 201. (288, 288) are intervened. The main body part 256 is connected to the side of the support member 201 via the structural member 202.

That is, the base part 256b is supported by the structural member 202, and several base support members of the main-body part 256 which are not shown are extended from the base part 256b.

Thin guide members 289b,... Are interposed between the upper surface of the first support member of the main body 256 and the lower surface of the second support member 257a of the advance retreat portion 257.

11, the expansion-contraction cylinder 291 (air cylinder) and the 4th pulley 293 for moving the upper advancing retreat part 257 are shown.

On the left side of the base 51, a cable bare 99b for the air tube 99a for supplying pressurized air to the expansion and contraction cylinder 91 (air cylinder) for the advance retreat portion 57 of the slide peak 52. Is installed.

Similarly, in the right side of the base 51, a cable bare for the air tube 299a for supplying pressurized air to the expansion and contraction cylinder 291 (air cylinder) for the advance retreat portion 257 of the slide peak 53 ( 299b) is installed.

Next, 3rd Embodiment of a conveying apparatus is demonstrated.

12 is a perspective view showing a conveying apparatus in which the peak portion slides according to the third embodiment, in which FIG. 12A shows a state when the slide peak is located at the origin position in the conveying chamber, and FIG. 12B shows the slide peak in the processing chamber. It shows the state when entering. In addition, in this figure, only the slide peak 52 among the slide peaks 52 and 53 is shown.

In the present embodiment, the expansion and contraction cylinder 310 (air) disposed on the base portion 56b of the main body portion 56 and connected to the connecting portion 57b of the advance retracting portion 57 by the expansion rod 311. The sub drive mechanism 300 provided with the cylinder is used.

Therefore, when pressurized air is supplied to the expansion and contracting cylinder 310 (air cylinder), the expansion and contraction rod 311 moves, and the exit retreat part 57 mechanically connected to this expansion rod 311 moves.

In the present embodiment, the sub-drive mechanism 300 moves the advance evacuation portion 57 independently of the movement of the main body portion 56 because the drive source is separate from the main drive mechanism 60 as described above. It is supposed to.

In the region P shown by broken lines in FIG. 12B, a cable bare is provided for an air tube (not shown) for supplying pressurized air to the expansion and contraction cylinder 310 (air cylinder) for the advance evacuation portion 57. .

Next, 4th Embodiment of a conveying apparatus is demonstrated.

FIG. 13 is a perspective view showing a conveying apparatus in which the peak portion slides according to the fourth embodiment, in which FIG. 13A shows a state when the slide peak is located at the origin position in the conveying chamber, and FIG. 13B shows the slide peak in the processing chamber. It shows the state when entering. Also in this figure, only the slide peak 52 among the slide peaks 52, 53 is shown.

In this embodiment, one of the some bellows 410 provided in the some 2nd support member 57a of the advance retreat part 57, and the base end part and the main body part 56 of one 2nd support member 57a. The sub-drive mechanism 400 provided with the spring 420 provided between the proximal end part of the 1st support member 56a of this invention is used.

The bellows 410 is connected to the air pipe 430, and the air pipe 430 is connected to the air supply source 432 and the vacuum pump 433 via the solenoid valve 431.

Therefore, when moving the exit retreat part 57 and entering the process chamber 10, the solenoid valve 431 is switched to the air supply source 432 side. Compressed air is supplied from the air supply source 432 to the bellows 410 via the air pipe 430, etc., and the bellows 410 is advanced from the main body 56 by the pressurized gas (compressed air). The advance retreat portion 57 is moved so as to. In addition, when the advance retreat portion 57 moves to advance, the spring 420 extends in response to the elastic pressing force.

On the other hand, when moving outward retreat part 57 and withdrawing from process chamber 10, solenoid valve 431 is switched to the vacuum pump 433 side. From the vacuum pump 433 to the air pipe 430, the inside of the bellows 410 is depressurized, and the bellows 410 shrinks. At this time, the stretched spring 420 returns the advance retreat portion 57 onto the main body portion 56 by the elastic pressing force.

In the present embodiment, since the drive source is separate from the main drive mechanism 60 as described above, the sub-drive mechanism 400 moves the advance evacuation portion 57 independently of the movement of the main body portion 56. Can be.

In addition, this invention is not limited to the said embodiment, A various deformation | transformation is possible. For example, in the said embodiment, although the some 2nd support member of the advance retreat part is connected by the connection part, when each 2nd support member has a sub drive mechanism, a connection part is unnecessary. Moreover, although the conveyance mechanism which has the slide peak which slides the peak part which supports a board | substrate was used, other conveyance mechanisms, such as the peak of the scalar conveyance mechanism which has a joint, may be sufficient. Moreover, in the said embodiment, although the case where conveyance is performed in vacuum was demonstrated, it is not limited to this, It is also possible to apply to the conveyance apparatus which performs conveyance in air | atmosphere.

In addition, in the said embodiment, although this invention was applied to the etching apparatus, it is needless to say that it is not limited to an etching process and is applicable also to other processes, such as film-forming. In addition, in the said embodiment, although the apparatus of the multi-chamber type was demonstrated as an example, the apparatus of the single chamber type which has only one processing chamber is applicable.

Moreover, although the example which used the glass substrate for FPD as a board | substrate was disclosed in the said embodiment, it is not limited to this, Other board | substrates, such as a semiconductor wafer, may be sufficient.

1 is a perspective view schematically showing a plasma etching apparatus as an embodiment of a substrate processing apparatus of the present invention;

2 is a horizontal cross-sectional view schematically showing the interior of the plasma etching apparatus of FIG.

3 is a cross-sectional view showing a processing chamber used in the plasma etching apparatus of FIG. 1;

4 is a schematic configuration diagram showing a conveying apparatus in which a peak portion slides according to a first embodiment;

FIG. 5 is a schematic sectional view of the glass substrate at the time of conveying the glass substrate from the transport chamber to the processing unit by the transport apparatus shown in FIG. 4; FIG.

Fig. 6 is a perspective view showing the conveying apparatus shown in Figs. 4 and 5, where Fig. 6A shows the state when the slide peak is located at the origin position in the conveying chamber, and Fig. 6B shows the slide peak entering the processing chamber. Drawing showing the state of when,

7 is a schematic diagram showing the mechanism part in the case where the slide peak of the conveying apparatus according to the first embodiment of the present invention is at the origin position of the conveying chamber;

8 is a schematic diagram showing the mechanism part when the slide peak of the conveying apparatus according to the first embodiment of the present invention enters into the processing chamber.

9A is a cross-sectional view taken along the line VIIa of FIG. 7, and FIG. 9B is a cross sectional view taken along the line VIIb of FIG. 7.

10 is a schematic diagram illustrating a mechanism part of a slide peak of a conveying device in which a peak part slides according to a second embodiment;

11 is a schematic sectional view of a conveying apparatus in which a peak portion slides according to a second embodiment;

12 is a perspective view showing a conveying apparatus in which the peak portion slides according to the third embodiment, in which FIG. 12A shows a state where the slide peak is located at the origin position in the conveying chamber, and FIG. 12B shows the slide peak processing chamber. A diagram showing a state when entering the interior,

FIG. 13 is a perspective view showing a conveying apparatus in which the peak portion slides according to the fourth embodiment, in which FIG. 13A shows a state when the slide peak is located at the origin position in the conveying chamber, and FIG. 13B shows the slide peak in the processing chamber. A diagram showing a state when entering.

Explanation of symbols for the main parts of the drawings

One ; Plasma etching apparatus 10; Processing chamber

20; Conveying chamber 22; Gate valve

30; Rodloxil 50; Conveying device

51; Base 52, 53; Slide peak

56; Main body 57; Advanced receding skin

54; Drive device 55; Return control unit

60; Main drive mechanism 70; Process controller

80; Sub-drive mechanism 82a; First pulley

83; Reducer 84; 2nd pulley

85; Belt 86; 3rd pulley

87; Clamp member 90; Sub drive mechanism

91; Telescopic cylinders 93; 4th pulley

96; Belt 97; 5th pulley

98; Clamp member 101; Susceptor

130; Elevating pin 131; Insertion through space

300; Sub drive mechanism 310; Telescopic cylinder

400; Sub-drive mechanism 41 O; Bellows

420; Spring G; Glass substrate

Claims (28)

A processing chamber which performs a predetermined process on the substrate on the substrate mounting table; A substrate transfer device for transferring a substrate to the substrate mounting table; A transfer chamber for receiving the substrate transfer device and to which the processing chamber is connected; The substrate conveying apparatus has a peak entering the processing chamber while supporting the substrate and conveying the substrate to the substrate mounting table, and a main drive mechanism for driving the peak, The peak has a base portion, a plurality of support members extending in a fork shape from the base portion to support the substrate, and a sub-drive mechanism for telescopically operating these support members, and the substrate is conveyed in a state in which the support member is extended. Characterized in that Substrate processing apparatus. The method of claim 1, The support member has a first member connected to the base portion and a second member provided to be retracted with respect to the first member, and the sub-drive mechanism drives the second member. Substrate processing apparatus. The method of claim 2, The sub-drive mechanism drives the second member forward in conjunction with the slide movement of the peak by the main drive mechanism. Substrate processing apparatus. The method of claim 3, wherein The substrate conveying apparatus further has a base on which the peak is slidable, and the peak slides on the base to enter the processing chamber from the conveying chamber. Substrate processing apparatus. The method of claim 4, wherein The peak has a connecting portion connecting the plurality of second members, The sub drive mechanism, A first pulley suspended from the base portion or the first member toward the base and rotating in accordance with the slide movement of the peak; A second pulley disposed on the base portion or the first member and rotating according to the rotation of the first pulley; A third pulley disposed on the base portion or the first member and rotating through the belt in accordance with the rotation of the second pulley; And a clamp member installed on the belt, mechanically connected to the second member, moving in accordance with movement of the belt, and collectively moving the plurality of second members. Substrate processing apparatus. The method of claim 5, A speed reducer is interposed between the first pulley and the second pulley. Substrate processing apparatus. The method of claim 2, The sub-drive mechanism drives the second member outward independently of the movement of the peak. Substrate processing apparatus. The method of claim 7, wherein The sub drive mechanism, An expansion and contraction cylinder disposed on the base portion or the first member and having an expansion rod; A fourth pulley disposed on the base portion or the first member and rotating according to the movement of the elastic rod; A fifth pulley disposed on the base portion or the first member and rotating through the belt according to the rotation of the fourth pulley; And a clamp member installed on the belt, mechanically connected to the second member, and moving in accordance with the movement of the belt to move the second member. Substrate processing apparatus. The method of claim 8, The fourth pulley, A small pulley rotating according to the movement of the elastic rod, Rotating with said small pulley, said belt having a large pulley over it Substrate processing apparatus. The method of claim 7, wherein The sub drive mechanism, An expansion and contracting cylinder disposed on said base portion or said first member, said telescopic cylinder having an elastic rod for moving said second member so that said second member advances from said first member and returns onto said first member. Characterized in that Substrate processing apparatus. The method of claim 7, wherein The sub drive mechanism, A bellows that protrudes from the first member by introducing a pressurized gas, thereby advancing the second member onto the first member, Characterized in that it has a spring that elastically presses the second member to return onto the first member when the inside of the bellows is depressurized. Substrate processing apparatus. The method according to any one of claims 7 to 11, The substrate conveying apparatus further has a base on which the peak is slidable, and the peak slides on the base to enter the processing chamber from the conveying chamber. Substrate processing apparatus. The method according to any one of claims 1 to 11, An insertion passage space is formed between the plurality of supporting members to allow insertion of the lifting pins to be lifted and lowered from the substrate mounting table of the processing chamber. Substrate processing apparatus. The method according to any one of claims 1 to 11, A plurality of processing chambers are connected to the transfer chamber. Substrate processing apparatus. In the substrate conveyance apparatus which conveys a board | substrate, A peak for conveying the substrate while supporting the substrate, It has a main drive mechanism for driving the peak, The peak has a base portion, a plurality of support members extending in a fork shape from the base portion to support the substrate, and a sub-drive mechanism for extending and contracting the support members, wherein the substrate is conveyed in a state where the support member is extended. Characterized in that Substrate transfer device. The method of claim 15, The support member has a first member connected to the base portion, and a second member provided to retract from the first member, wherein the sub-drive mechanism drives the second member. Substrate transfer device. The method of claim 16, The sub-drive mechanism drives the second support member to advance in conjunction with the slide movement of the peak by the main drive mechanism. Substrate transfer device. The method of claim 17, The peak further has a slidable base, wherein the peak slides on the base to convey the substrate. Substrate transfer device. The method of claim 18, The peak has a connecting portion connecting the plurality of second members, The sub drive mechanism, A first pulley suspended from the base portion or the first member toward the base and rotating in accordance with the slide movement of the peak; A second pulley disposed on the base portion or the first member and rotating according to the rotation of the first pulley; A third pulley disposed on the base portion or the first member and rotating through the belt in accordance with the rotation of the second pulley; And a clamp member installed on the belt, mechanically connected to the second member, moving in accordance with movement of the belt, and collectively moving the plurality of second members. Substrate transfer device. The method of claim 19, A speed reducer is interposed between the first pulley and the second pulley. Substrate transfer device. The method of claim 16, The sub-drive mechanism drives the second member outward independently of the movement of the peak. Substrate transfer device. The method of claim 21, The sub drive mechanism, An expansion and contraction cylinder disposed on the base portion or the first member and having an expansion rod; A fourth pulley disposed on the base portion or the first member and rotating according to the movement of the elastic rod; A fifth pulley disposed on the base portion or the first member and rotating through the belt according to the rotation of the fourth pulley; And a clamp member installed on the belt, mechanically connected to the second member, and moving in accordance with the movement of the belt to move the second member. Substrate transfer device. The method of claim 22, The fourth pulley, A small pulley rotating according to the movement of the elastic rod, Rotating with said small pulley, said belt having a large pulley over it Substrate transfer device. The method of claim 21, The sub drive mechanism, An expansion and contracting cylinder disposed on the base portion or the first member and having an elastic rod for moving the second member so that the second member advances from the first member and returns to the first member. We are equipped with Substrate transfer device. The method of claim 21, The sub drive mechanism, A bellows that protrudes from the first member by introducing a pressurized gas, thereby advancing the second member onto the first member, When the inside of the bellows is depressurized, has a spring that elastically presses so that the second member returns to the first member Substrate transfer device. The method according to any one of claims 21 to 25, The peak further has a slidable base, wherein the peak slides on the base to convey the substrate. Substrate transfer device. The method according to any one of claims 15 to 25, An insertion passage space is formed between the plurality of supporting members to allow the passage of the lifting pins to be lifted and lowered from the substrate mounting table of the processing chamber that performs a predetermined process on the substrate on the substrate mounting table. Substrate transfer device. The method according to any one of claims 15 to 25, It is provided in the conveyance chamber connected to the process chamber which performs a predetermined | prescribed process to the board | substrate on a board | substrate base, and conveys a board | substrate to the board | substrate mount base provided in the said process chamber, It characterized by the above-mentioned. Substrate transfer device.

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