KR100952087B1 - 패터닝된 기판의 메가소닉 세정을 위한 방법 및 장치 - Google Patents

패터닝된 기판의 메가소닉 세정을 위한 방법 및 장치 Download PDF

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Publication number
KR100952087B1
KR100952087B1 KR1020057015366A KR20057015366A KR100952087B1 KR 100952087 B1 KR100952087 B1 KR 100952087B1 KR 1020057015366 A KR1020057015366 A KR 1020057015366A KR 20057015366 A KR20057015366 A KR 20057015366A KR 100952087 B1 KR100952087 B1 KR 100952087B1
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KR
South Korea
Prior art keywords
acoustic energy
substrate
cleaning
megasonic
semiconductor substrate
Prior art date
Application number
KR1020057015366A
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English (en)
Korean (ko)
Other versions
KR20050100405A (ko
Inventor
존 엠 보이드
마이클 래브킨
프레드 씨 리데커
랜돌프 이 트루
윌리엄 티
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/371,603 external-priority patent/US7040330B2/en
Priority claimed from US10/377,943 external-priority patent/US7040332B2/en
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20050100405A publication Critical patent/KR20050100405A/ko
Application granted granted Critical
Publication of KR100952087B1 publication Critical patent/KR100952087B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0288—Ultra or megasonic jets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR1020057015366A 2003-02-20 2004-02-04 패터닝된 기판의 메가소닉 세정을 위한 방법 및 장치 KR100952087B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/371,603 2003-02-20
US10/371,603 US7040330B2 (en) 2003-02-20 2003-02-20 Method and apparatus for megasonic cleaning of patterned substrates
US10/377,943 US7040332B2 (en) 2003-02-28 2003-02-28 Method and apparatus for megasonic cleaning with reflected acoustic waves
US10/377,943 2003-02-28

Publications (2)

Publication Number Publication Date
KR20050100405A KR20050100405A (ko) 2005-10-18
KR100952087B1 true KR100952087B1 (ko) 2010-04-13

Family

ID=32911940

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057015366A KR100952087B1 (ko) 2003-02-20 2004-02-04 패터닝된 기판의 메가소닉 세정을 위한 방법 및 장치

Country Status (5)

Country Link
EP (1) EP1599298A4 (fr)
JP (1) JP4733012B2 (fr)
KR (1) KR100952087B1 (fr)
TW (1) TWI290729B (fr)
WO (1) WO2004074931A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7235814B2 (en) 1997-07-01 2007-06-26 Semiconductor Energy Laboratory Co., Ltd. Active matrix display device and method of manufacturing the same

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006033372B4 (de) * 2006-02-17 2010-04-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ultraschallaktor zur Reinigung von Objekten
WO2010027583A1 (fr) * 2008-09-03 2010-03-11 Universal Display Corporation Matières phosphorescentes
JP5420336B2 (ja) * 2009-07-23 2014-02-19 大日本スクリーン製造株式会社 基板洗浄装置および基板洗浄方法
KR101639635B1 (ko) 2010-06-03 2016-07-25 삼성전자주식회사 메가소닉 세정 방법 및 세정 장치
JP5183777B2 (ja) * 2011-07-12 2013-04-17 株式会社カイジョー 超音波洗浄装置及び超音波洗浄方法
DE102013020518A1 (de) * 2013-12-11 2015-06-11 Forschungszentrum Jülich GmbH Fachbereich Patente Verfahren und Vorrichtung zur Polymerisation einer Zusammensetzung enthaltend Hydridosilane und anschließenden Verwendung der Polymerisate zur Herstellung von siliziumhaltigen Schichten
US11141762B2 (en) 2015-05-15 2021-10-12 Acm Research (Shanghai), Inc. System for cleaning semiconductor wafers
JP6704714B2 (ja) * 2015-11-25 2020-06-03 株式会社ディスコ 切削装置
WO2019095126A1 (fr) * 2017-11-15 2019-05-23 Acm Research (Shanghai) Inc. Procédé de nettoyage de tranches semi-conductrices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09271729A (ja) * 1996-04-05 1997-10-21 Sonic Fueroo Kk 洗浄方法
US6276370B1 (en) 1999-06-30 2001-08-21 International Business Machines Corporation Sonic cleaning with an interference signal
US20020139389A1 (en) 2001-03-30 2002-10-03 Treur Randolph E. Angular spin, rinse, and dry module and methods for making and implementing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60249331A (ja) * 1984-05-24 1985-12-10 Nec Corp 半導体ウエハ洗浄装置
JP2519869B2 (ja) * 1993-08-26 1996-07-31 株式会社プレテック 高周波洗浄装置
JPH10323635A (ja) * 1997-05-26 1998-12-08 Sony Corp 超音波洗浄装置
US6085764A (en) * 1997-07-22 2000-07-11 Tdk Corporation Cleaning apparatus and method
JP3787024B2 (ja) * 1997-12-26 2006-06-21 株式会社カイジョー 超音波洗浄装置
EP1057546A1 (fr) * 1999-06-01 2000-12-06 Applied Materials, Inc. Dispositif de nettoyage mégasonique
US6468362B1 (en) * 1999-08-25 2002-10-22 Applied Materials, Inc. Method and apparatus for cleaning/drying hydrophobic wafers
US6188162B1 (en) * 1999-08-27 2001-02-13 Product Systems Incorporated High power megasonic transducer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09271729A (ja) * 1996-04-05 1997-10-21 Sonic Fueroo Kk 洗浄方法
US6276370B1 (en) 1999-06-30 2001-08-21 International Business Machines Corporation Sonic cleaning with an interference signal
US20020139389A1 (en) 2001-03-30 2002-10-03 Treur Randolph E. Angular spin, rinse, and dry module and methods for making and implementing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7235814B2 (en) 1997-07-01 2007-06-26 Semiconductor Energy Laboratory Co., Ltd. Active matrix display device and method of manufacturing the same

Also Published As

Publication number Publication date
EP1599298A2 (fr) 2005-11-30
KR20050100405A (ko) 2005-10-18
EP1599298A4 (fr) 2007-05-02
WO2004074931A2 (fr) 2004-09-02
TWI290729B (en) 2007-12-01
WO2004074931A3 (fr) 2005-01-27
TW200425231A (en) 2004-11-16
JP2006518550A (ja) 2006-08-10
JP4733012B2 (ja) 2011-07-27

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