KR100909324B1 - β-시아노 에스테르기를 함유한 유기 규소 화합물의제조방법 - Google Patents
β-시아노 에스테르기를 함유한 유기 규소 화합물의제조방법 Download PDFInfo
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- KR100909324B1 KR100909324B1 KR1020060124951A KR20060124951A KR100909324B1 KR 100909324 B1 KR100909324 B1 KR 100909324B1 KR 1020060124951 A KR1020060124951 A KR 1020060124951A KR 20060124951 A KR20060124951 A KR 20060124951A KR 100909324 B1 KR100909324 B1 KR 100909324B1
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- compound
- silane
- reaction
- platinum
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 150000003961 organosilicon compounds Chemical class 0.000 title abstract description 12
- 238000006243 chemical reaction Methods 0.000 claims abstract description 46
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- -1 Vinyl siloxane Chemical class 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000004122 cyclic group Chemical group 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- CGMFKBXPQJJHBR-UHFFFAOYSA-N [SiH3]O[SiH](C=C)C=C Chemical compound [SiH3]O[SiH](C=C)C=C CGMFKBXPQJJHBR-UHFFFAOYSA-N 0.000 claims description 2
- NVTWVEYLZAIQET-UHFFFAOYSA-N bis(ethenyl)-disilyloxysilane Chemical compound C(=C)[Si](O[SiH3])(O[SiH3])C=C NVTWVEYLZAIQET-UHFFFAOYSA-N 0.000 claims description 2
- DDJSWKLBKSLAAZ-UHFFFAOYSA-N cyclotetrasiloxane Chemical compound O1[SiH2]O[SiH2]O[SiH2]O[SiH2]1 DDJSWKLBKSLAAZ-UHFFFAOYSA-N 0.000 claims description 2
- PWCWAWBYXZHVKL-UHFFFAOYSA-N ethenyl-[ethenyl(silyloxy)silyl]oxy-silyloxysilane Chemical compound C(=C)[SiH](O[SiH3])O[SiH](O[SiH3])C=C PWCWAWBYXZHVKL-UHFFFAOYSA-N 0.000 claims description 2
- DCSZWJQOHDKICC-UHFFFAOYSA-N CCO[SiH](OCC)OCC.CCO[SiH](OCC)OCC Chemical compound CCO[SiH](OCC)OCC.CCO[SiH](OCC)OCC DCSZWJQOHDKICC-UHFFFAOYSA-N 0.000 claims 1
- DNILDUCUFPMRGQ-UHFFFAOYSA-N CO[SiH](OC)OC.CO[SiH](OC)OC Chemical compound CO[SiH](OC)OC.CO[SiH](OC)OC DNILDUCUFPMRGQ-UHFFFAOYSA-N 0.000 claims 1
- SXPIXEVFSRSINF-UHFFFAOYSA-N C[Si](OC)(OC)C.C[SiH](OC)OC Chemical compound C[Si](OC)(OC)C.C[SiH](OC)OC SXPIXEVFSRSINF-UHFFFAOYSA-N 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- AUZQDIKJBDMKSM-UHFFFAOYSA-N methoxy(dimethyl)silane Chemical compound C[SiH](OC)C.C[SiH](OC)C AUZQDIKJBDMKSM-UHFFFAOYSA-N 0.000 claims 1
- 239000006227 byproduct Substances 0.000 abstract description 11
- 239000003054 catalyst Substances 0.000 abstract description 11
- 238000006459 hydrosilylation reaction Methods 0.000 abstract description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 6
- 229910000077 silane Inorganic materials 0.000 abstract description 5
- 230000000977 initiatory effect Effects 0.000 abstract description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000004817 gas chromatography Methods 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- WXKCRCGKCOKJEF-UHFFFAOYSA-N prop-2-enyl 2-cyanoacetate Chemical compound C=CCOC(=O)CC#N WXKCRCGKCOKJEF-UHFFFAOYSA-N 0.000 description 9
- 229910052697 platinum Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- SYJRVVFAAIUVDH-UHFFFAOYSA-N ipa isopropanol Chemical compound CC(C)O.CC(C)O SYJRVVFAAIUVDH-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- XWERYQNBEFQKJM-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-cyanoacetate Chemical compound CO[Si](OC)(OC)CCCOC(=O)CC#N XWERYQNBEFQKJM-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001916 cyano esters Chemical class 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (11)
- 백금-비닐 실록산(vinyl siloxane) 착체의 존재 하에 하기 화학식 1의 화합물을 하기 화학식 2의 화합물과 반응시켜 하기 화학식 3의 화합물을 제조하는 방법.[화학식 1][화학식 2]HSi(OR2)n(R3)3-n[화학식 3]상기 식에서,R1은 수소 또는 탄소수 1 ∼ 3의 알킬기를 나타내고,X는 NR4, 산소 원자 또는 황 원자를 나타내며,여기서, R4는 수소 또는 탄소수 1 ~ 3의 알킬기를 나타내고,R2 및 R3은 각각 독립적으로 탄소수 1 ~ 6의 알킬기를 나타내며,p는 1 ~ 8의 정수이고,n은 1 ~ 3의 정수이며,q는 3 ~ 10의 정수이다.
- 제 1 항에 있어서,R1은 수소 또는 메틸기를 나타내고,X는 NR4 또는 산소 원자를 나타내며, 여기서 R4는 메틸기를 나타내고,R2 및 R3은 각각 독립적으로 메틸기 또는 에틸기를 나타내며,p는 1 또는 2이고, n은 2 또는 3 이며, q는 3 또는 4 인 것을 특징으로 하는 제조방법.
- 제 2 항에 있어서,R1은 수소를 나타내고,X는 산소 원자를 나타내며,R2 및 R3은 각각 독립적으로 메틸기 또는 에틸기를 나타내고,p는 1이며, n은 2 또는 3 이고, q는 3인 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,화학식 2의 화합물이 트리 메톡시 실란(trimethoxy silane), 트리 에톡시 실란(triethoxy silane), 메틸 디메톡시 실란(methyl dimethoxy silane), 또는 디메틸 메톡시 실란(dimethyl methoxy silane)인 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,비닐 실록산(vinyl siloxane)은 환상구조, 비환상 구조 및 이들의 혼합물로부터 선택되고, 비닐기를 가지는 규소원자가 2 ~ 4개인 것을 특징으로 하는 제조방법.
- 제 6 항에 있어서,비닐 실록산(vinyl siloxane)은 디비닐디실록산, 디비닐 트리 실록산, 디비닐 테트라 실록산, 테트라 비닐 시클로 테트라 실록산, 또는 1,3-디비닐-1,1,3,3,-테트라메틸실록산을 포함하는 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,화학식 1의 화합물에 대한 화학식 2의 화합물의 반응비율은 1 : 0.8 ~ 1.2 몰인 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,백금-실록산 착체의 사용량은 화학식 1의 화합물 1 몰에 대하여 10-6 ~ 10-3 몰인 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,반응온도가 60~100℃인 것을 특징으로 하는 제조방법.
- 제 1 항에 있어서,화학식 1의 화합물 및 배금-비닐실록산 착체의 존재 하에 화학식 2의 화합물을 적하시키는 것을 특징으로 하는 제조방법.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060124951A KR100909324B1 (ko) | 2006-12-08 | 2006-12-08 | β-시아노 에스테르기를 함유한 유기 규소 화합물의제조방법 |
JP2009540140A JP5333971B2 (ja) | 2006-12-08 | 2007-12-03 | β−シアノエステル基を含有する有機ケイ素化合物の製造方法 |
CN2007800454110A CN101595112B (zh) | 2006-12-08 | 2007-12-03 | 具有β-氰基酯基团的有机硅烷化合物的制备方法 |
US12/312,920 US8461368B2 (en) | 2006-12-08 | 2007-12-03 | Process for preparing organic silane compounds having beta-cyano ester group |
PCT/KR2007/006182 WO2008069515A1 (en) | 2006-12-08 | 2007-12-03 | Process for preparing organic silane compounds having beta-cyano ester group |
EP07834447A EP2099809B1 (en) | 2006-12-08 | 2007-12-03 | Process for preparing organic silane compounds having beta-cyano ester group |
TW096146707A TWI347324B (en) | 2006-12-08 | 2007-12-07 | Process for preparing organic silane compounds having 帣-cyano ester group |
Applications Claiming Priority (1)
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KR1020060124951A KR100909324B1 (ko) | 2006-12-08 | 2006-12-08 | β-시아노 에스테르기를 함유한 유기 규소 화합물의제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20080053034A KR20080053034A (ko) | 2008-06-12 |
KR100909324B1 true KR100909324B1 (ko) | 2009-07-24 |
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KR1020060124951A KR100909324B1 (ko) | 2006-12-08 | 2006-12-08 | β-시아노 에스테르기를 함유한 유기 규소 화합물의제조방법 |
Country Status (7)
Country | Link |
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US (1) | US8461368B2 (ko) |
EP (1) | EP2099809B1 (ko) |
JP (1) | JP5333971B2 (ko) |
KR (1) | KR100909324B1 (ko) |
CN (1) | CN101595112B (ko) |
TW (1) | TWI347324B (ko) |
WO (1) | WO2008069515A1 (ko) |
Families Citing this family (4)
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JP5644515B2 (ja) * | 2011-01-07 | 2014-12-24 | 信越化学工業株式会社 | 不飽和結合含有シリル基保護アミノ酸化合物及びその製造方法 |
JP6463663B2 (ja) * | 2015-11-02 | 2019-02-06 | 信越化学工業株式会社 | 接着促進剤、付加硬化型オルガノポリシロキサン樹脂組成物及び半導体装置 |
JP6610474B2 (ja) | 2016-09-06 | 2019-11-27 | 信越化学工業株式会社 | 2−シアノエチル基含有オルガノキシシラン化合物及びシルセスキオキサン並びにこれらの製造方法 |
EP4209484B1 (en) | 2022-07-11 | 2024-05-15 | Aeardis Ltd. | Process for preparing electron-deficient olefin monomers |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4360686A (en) | 1981-09-03 | 1982-11-23 | The Dow Chemical Company | Silylation of organic compounds |
US5616763A (en) | 1996-01-29 | 1997-04-01 | Dow Corning Corporation | Aldehydes as accelerators for hydrosilation |
US5994570A (en) | 1997-10-31 | 1999-11-30 | Shin-Etsu Chemical Co., Ltd. | Platinum complex catalyst |
EP1085022A1 (en) | 1998-09-14 | 2001-03-21 | Dow Corning Asia, Ltd. | A method of manufacturing an acyloxysilane compound having functional groups bonded to silicon atoms via Si-C- bonds |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9103191D0 (en) * | 1991-02-14 | 1991-04-03 | Dow Corning | Platinum complexes and use thereof |
JP3856087B2 (ja) * | 2000-08-16 | 2006-12-13 | 信越化学工業株式会社 | 3―アミノプロピルモノオルガノジオルガノオキシシランの製造方法 |
US6417381B1 (en) * | 2001-11-15 | 2002-07-09 | Crompton Corporation | Process for preparing bis(silylorgano)amines |
JP4310639B2 (ja) * | 2004-04-30 | 2009-08-12 | 信越化学工業株式会社 | β−ケトエステル構造含有有機ケイ素化合物の製造方法 |
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2006
- 2006-12-08 KR KR1020060124951A patent/KR100909324B1/ko active IP Right Grant
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2007
- 2007-12-03 CN CN2007800454110A patent/CN101595112B/zh active Active
- 2007-12-03 JP JP2009540140A patent/JP5333971B2/ja active Active
- 2007-12-03 WO PCT/KR2007/006182 patent/WO2008069515A1/en active Application Filing
- 2007-12-03 EP EP07834447A patent/EP2099809B1/en active Active
- 2007-12-03 US US12/312,920 patent/US8461368B2/en active Active
- 2007-12-07 TW TW096146707A patent/TWI347324B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4360686A (en) | 1981-09-03 | 1982-11-23 | The Dow Chemical Company | Silylation of organic compounds |
US5616763A (en) | 1996-01-29 | 1997-04-01 | Dow Corning Corporation | Aldehydes as accelerators for hydrosilation |
US5994570A (en) | 1997-10-31 | 1999-11-30 | Shin-Etsu Chemical Co., Ltd. | Platinum complex catalyst |
EP1085022A1 (en) | 1998-09-14 | 2001-03-21 | Dow Corning Asia, Ltd. | A method of manufacturing an acyloxysilane compound having functional groups bonded to silicon atoms via Si-C- bonds |
Also Published As
Publication number | Publication date |
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CN101595112B (zh) | 2012-10-10 |
EP2099809B1 (en) | 2013-03-06 |
EP2099809A1 (en) | 2009-09-16 |
EP2099809A4 (en) | 2011-09-21 |
TW200837069A (en) | 2008-09-16 |
JP5333971B2 (ja) | 2013-11-06 |
US20100113812A1 (en) | 2010-05-06 |
CN101595112A (zh) | 2009-12-02 |
KR20080053034A (ko) | 2008-06-12 |
TWI347324B (en) | 2011-08-21 |
JP2010511695A (ja) | 2010-04-15 |
US8461368B2 (en) | 2013-06-11 |
WO2008069515A1 (en) | 2008-06-12 |
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