KR100872082B1 - 구동장치, 노광 장치 및 디바이스 제조 방법 - Google Patents

구동장치, 노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR100872082B1
KR100872082B1 KR1020070047380A KR20070047380A KR100872082B1 KR 100872082 B1 KR100872082 B1 KR 100872082B1 KR 1020070047380 A KR1020070047380 A KR 1020070047380A KR 20070047380 A KR20070047380 A KR 20070047380A KR 100872082 B1 KR100872082 B1 KR 100872082B1
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KR
South Korea
Prior art keywords
coil
swap
area
exposure
drive
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Expired - Fee Related
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KR1020070047380A
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English (en)
Korean (ko)
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KR20070112001A (ko
Inventor
노부시게 코레나가
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캐논 가부시끼가이샤
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Publication of KR20070112001A publication Critical patent/KR20070112001A/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020070047380A 2006-05-18 2007-05-16 구동장치, 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR100872082B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006139465A JP2007312516A (ja) 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法
JPJP-P-2006-00139465 2006-05-18

Publications (2)

Publication Number Publication Date
KR20070112001A KR20070112001A (ko) 2007-11-22
KR100872082B1 true KR100872082B1 (ko) 2008-12-05

Family

ID=38711360

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070047380A Expired - Fee Related KR100872082B1 (ko) 2006-05-18 2007-05-16 구동장치, 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US7508099B2 (https=)
JP (1) JP2007312516A (https=)
KR (1) KR100872082B1 (https=)
TW (1) TW200813643A (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5416104B2 (ja) * 2007-06-27 2014-02-12 ブルックス オートメーション インコーポレイテッド セルフベアリングモータ用位置フィードバック
KR101659931B1 (ko) 2007-06-27 2016-09-26 브룩스 오토메이션 인코퍼레이티드 다차원 위치 센서
US9752615B2 (en) 2007-06-27 2017-09-05 Brooks Automation, Inc. Reduced-complexity self-bearing brushless DC motor
US8823294B2 (en) 2007-06-27 2014-09-02 Brooks Automation, Inc. Commutation of an electromagnetic propulsion and guidance system
US8283813B2 (en) 2007-06-27 2012-10-09 Brooks Automation, Inc. Robot drive with magnetic spindle bearings
CN101855811B (zh) 2007-06-27 2013-11-20 布鲁克斯自动化公司 具有提升能力和减少的齿槽特性的电机定子
WO2009012396A2 (en) 2007-07-17 2009-01-22 Brooks Automation, Inc. Substrate processing apparatus with motors integral to chamber walls
US8358039B2 (en) 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
NL2006714A (en) * 2010-06-07 2011-12-08 Asml Netherlands Bv Displacement device, lithographic apparatus and positioning method.
US8593016B2 (en) * 2010-12-03 2013-11-26 Sri International Levitated micro-manipulator system
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor

Citations (4)

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Publication number Priority date Publication date Assignee Title
KR870001000A (ko) * 1985-07-26 1987-03-10 히로시 데라마찌 리니어 모우터 부착 xy테이블
KR20020000528A (ko) * 2000-06-23 2002-01-05 미다라이 후지오 노광장치의 이동기구 및 이 이동기구를 가진 노광장치
KR100369730B1 (ko) 1997-06-26 2003-03-17 캐논 가부시끼가이샤 리니어모터와스테이지장치및이것을이용한주사형노광장치및디바이스제조방법
KR20060044654A (ko) * 2004-03-24 2006-05-16 캐논 가부시끼가이샤 스테이지장치 및 노광장치

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DE19601018A1 (de) * 1995-01-27 1996-08-01 Zeiss Carl Fa Linear verstellbarer Präzisionstisch
JP3815750B2 (ja) * 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JPH11287880A (ja) * 1998-04-01 1999-10-19 Canon Inc ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3907357B2 (ja) * 1998-11-12 2007-04-18 キヤノン株式会社 段差付きコイル製造方法
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
JP2001230305A (ja) * 2000-02-18 2001-08-24 Canon Inc 支持装置
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
EP1300932B1 (en) * 2001-10-05 2013-12-18 Canon Kabushiki Kaisha Linear motor, stage apparatus, and exposure apparatus
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4323759B2 (ja) * 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
US6841956B2 (en) * 2002-09-17 2005-01-11 Nikon Corporation Actuator to correct for off center-of-gravity line of force
JP2004172557A (ja) * 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP4194383B2 (ja) * 2003-02-13 2008-12-10 キヤノン株式会社 リニアモータ
JP2005005393A (ja) * 2003-06-10 2005-01-06 Canon Inc ステージ装置、露光装置、およびデバイス製造方法
JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2005253179A (ja) * 2004-03-03 2005-09-15 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2005327993A (ja) * 2004-05-17 2005-11-24 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2005353969A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR870001000A (ko) * 1985-07-26 1987-03-10 히로시 데라마찌 리니어 모우터 부착 xy테이블
KR100369730B1 (ko) 1997-06-26 2003-03-17 캐논 가부시끼가이샤 리니어모터와스테이지장치및이것을이용한주사형노광장치및디바이스제조방법
KR20020000528A (ko) * 2000-06-23 2002-01-05 미다라이 후지오 노광장치의 이동기구 및 이 이동기구를 가진 노광장치
KR20060044654A (ko) * 2004-03-24 2006-05-16 캐논 가부시끼가이샤 스테이지장치 및 노광장치

Also Published As

Publication number Publication date
JP2007312516A (ja) 2007-11-29
TW200813643A (en) 2008-03-16
US20070267920A1 (en) 2007-11-22
KR20070112001A (ko) 2007-11-22
US7508099B2 (en) 2009-03-24

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