TW200813643A - Driving apparatus, exposure apparatus, and device manufacturing method - Google Patents

Driving apparatus, exposure apparatus, and device manufacturing method Download PDF

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Publication number
TW200813643A
TW200813643A TW096117076A TW96117076A TW200813643A TW 200813643 A TW200813643 A TW 200813643A TW 096117076 A TW096117076 A TW 096117076A TW 96117076 A TW96117076 A TW 96117076A TW 200813643 A TW200813643 A TW 200813643A
Authority
TW
Taiwan
Prior art keywords
coil
movable
exposure
region
drive
Prior art date
Application number
TW096117076A
Other languages
English (en)
Chinese (zh)
Inventor
Nobushige Korenaga
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200813643A publication Critical patent/TW200813643A/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096117076A 2006-05-18 2007-05-14 Driving apparatus, exposure apparatus, and device manufacturing method TW200813643A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006139465A JP2007312516A (ja) 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
TW200813643A true TW200813643A (en) 2008-03-16

Family

ID=38711360

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096117076A TW200813643A (en) 2006-05-18 2007-05-14 Driving apparatus, exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
US (1) US7508099B2 (https=)
JP (1) JP2007312516A (https=)
KR (1) KR100872082B1 (https=)
TW (1) TW200813643A (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5416104B2 (ja) * 2007-06-27 2014-02-12 ブルックス オートメーション インコーポレイテッド セルフベアリングモータ用位置フィードバック
KR101659931B1 (ko) 2007-06-27 2016-09-26 브룩스 오토메이션 인코퍼레이티드 다차원 위치 센서
US9752615B2 (en) 2007-06-27 2017-09-05 Brooks Automation, Inc. Reduced-complexity self-bearing brushless DC motor
US8823294B2 (en) 2007-06-27 2014-09-02 Brooks Automation, Inc. Commutation of an electromagnetic propulsion and guidance system
US8283813B2 (en) 2007-06-27 2012-10-09 Brooks Automation, Inc. Robot drive with magnetic spindle bearings
CN101855811B (zh) 2007-06-27 2013-11-20 布鲁克斯自动化公司 具有提升能力和减少的齿槽特性的电机定子
WO2009012396A2 (en) 2007-07-17 2009-01-22 Brooks Automation, Inc. Substrate processing apparatus with motors integral to chamber walls
US8358039B2 (en) 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
NL2006714A (en) * 2010-06-07 2011-12-08 Asml Netherlands Bv Displacement device, lithographic apparatus and positioning method.
US8593016B2 (en) * 2010-12-03 2013-11-26 Sri International Levitated micro-manipulator system
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor

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JPS6228146A (ja) * 1985-07-26 1987-02-06 Hiroshi Teramachi リニアモ−タ付ｘｙテ−ブル
DE19601018A1 (de) * 1995-01-27 1996-08-01 Zeiss Carl Fa Linear verstellbarer Präzisionstisch
JP3815750B2 (ja) * 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JP3155936B2 (ja) 1997-06-26 2001-04-16 キヤノン株式会社 リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JPH11287880A (ja) * 1998-04-01 1999-10-19 Canon Inc ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3907357B2 (ja) * 1998-11-12 2007-04-18 キヤノン株式会社 段差付きコイル製造方法
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
JP2001230305A (ja) * 2000-02-18 2001-08-24 Canon Inc 支持装置
JP4474020B2 (ja) * 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
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JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4323759B2 (ja) * 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
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JP2004172557A (ja) * 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
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JP2005253179A (ja) * 2004-03-03 2005-09-15 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP4418699B2 (ja) * 2004-03-24 2010-02-17 キヤノン株式会社 露光装置
JP2005327993A (ja) * 2004-05-17 2005-11-24 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2005353969A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

Also Published As

Publication number Publication date
JP2007312516A (ja) 2007-11-29
KR100872082B1 (ko) 2008-12-05
US20070267920A1 (en) 2007-11-22
KR20070112001A (ko) 2007-11-22
US7508099B2 (en) 2009-03-24

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