KR100863082B1 - 고순도 액체 물질용 저장 용기 - Google Patents

고순도 액체 물질용 저장 용기 Download PDF

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Publication number
KR100863082B1
KR100863082B1 KR1020010086977A KR20010086977A KR100863082B1 KR 100863082 B1 KR100863082 B1 KR 100863082B1 KR 1020010086977 A KR1020010086977 A KR 1020010086977A KR 20010086977 A KR20010086977 A KR 20010086977A KR 100863082 B1 KR100863082 B1 KR 100863082B1
Authority
KR
South Korea
Prior art keywords
storage container
vessel
container
connection
line
Prior art date
Application number
KR1020010086977A
Other languages
English (en)
Korean (ko)
Other versions
KR20020077031A (ko
Inventor
크리스토프 숄츠
Original Assignee
씨에스 크린 시스템즈 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP01108033A external-priority patent/EP1245527B1/de
Application filed by 씨에스 크린 시스템즈 아게 filed Critical 씨에스 크린 시스템즈 아게
Publication of KR20020077031A publication Critical patent/KR20020077031A/ko
Application granted granted Critical
Publication of KR100863082B1 publication Critical patent/KR100863082B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020010086977A 2001-03-29 2001-12-28 고순도 액체 물질용 저장 용기 KR100863082B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01108033A EP1245527B1 (de) 2001-03-29 2001-03-29 Vorratsbehälter für flüssige, hochreine Substanzen mit einer Einrichtung zur Reinigung der Anschlussstücke und Rohrleitungen des Vorratsbehälters
EP01108033.0 2001-03-29

Publications (2)

Publication Number Publication Date
KR20020077031A KR20020077031A (ko) 2002-10-11
KR100863082B1 true KR100863082B1 (ko) 2008-10-13

Family

ID=8176998

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010086977A KR100863082B1 (ko) 2001-03-29 2001-12-28 고순도 액체 물질용 저장 용기

Country Status (5)

Country Link
JP (1) JP4146148B2 (de)
KR (1) KR100863082B1 (de)
CN (1) CN1214956C (de)
AT (1) ATE227242T1 (de)
SG (1) SG104305A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005131632A (ja) 2003-10-08 2005-05-26 Adeka Engineering & Consutruction Co Ltd 流体供給装置
CN103184412A (zh) * 2011-12-27 2013-07-03 鸿富锦精密工业（深圳）有限公司 真空镀膜机清洗设备
CN107448273B (zh) * 2017-07-18 2021-02-19 中国电建集团河南工程公司 一种管道系统冲洗设备及燃机油系统化学清洗方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4723967A (en) * 1987-04-27 1988-02-09 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
US5108015A (en) * 1990-07-06 1992-04-28 Fluoroware, Inc. Multiple tube to bung coupling
EP0548570A1 (de) * 1991-12-21 1993-06-30 BURDOSA Ing. Herwig Burgert i.K. Befüll- und Entleerungsvorrichtung
EP0926094A1 (de) * 1997-12-25 1999-06-30 Nisso Engineering Co., Ltd. Flacher Füll- und Entleerungskopf mit mindestens zwei Fluidanschlüssen und Verfahren zu seiner Anwendung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4723967A (en) * 1987-04-27 1988-02-09 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
US5108015A (en) * 1990-07-06 1992-04-28 Fluoroware, Inc. Multiple tube to bung coupling
EP0548570A1 (de) * 1991-12-21 1993-06-30 BURDOSA Ing. Herwig Burgert i.K. Befüll- und Entleerungsvorrichtung
EP0926094A1 (de) * 1997-12-25 1999-06-30 Nisso Engineering Co., Ltd. Flacher Füll- und Entleerungskopf mit mindestens zwei Fluidanschlüssen und Verfahren zu seiner Anwendung

Also Published As

Publication number Publication date
CN1214956C (zh) 2005-08-17
JP2002343719A (ja) 2002-11-29
JP4146148B2 (ja) 2008-09-03
CN1378966A (zh) 2002-11-13
ATE227242T1 (de) 2002-11-15
KR20020077031A (ko) 2002-10-11
SG104305A1 (en) 2004-06-21

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