KR100838936B1 - 복사에 의해 현상, 경화될 수 있는 폴리우레탄 및 그를함유하는 포토레지스트 조성물 - Google Patents

복사에 의해 현상, 경화될 수 있는 폴리우레탄 및 그를함유하는 포토레지스트 조성물 Download PDF

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Publication number
KR100838936B1
KR100838936B1 KR1020070056652A KR20070056652A KR100838936B1 KR 100838936 B1 KR100838936 B1 KR 100838936B1 KR 1020070056652 A KR1020070056652 A KR 1020070056652A KR 20070056652 A KR20070056652 A KR 20070056652A KR 100838936 B1 KR100838936 B1 KR 100838936B1
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KR
South Korea
Prior art keywords
group
polyurethane
acid
weight
ester
Prior art date
Application number
KR1020070056652A
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English (en)
Korean (ko)
Inventor
쥬이-밍 창
잉-젠 천
홍-예 링
웨이-흐시앙 후앙
리-충 창
천-훙 궈
Original Assignee
에이지아이 코포레이션
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Application filed by 에이지아이 코포레이션 filed Critical 에이지아이 코포레이션
Application granted granted Critical
Publication of KR100838936B1 publication Critical patent/KR100838936B1/ko

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83Chemically modified polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/42Polycondensates having carboxylic or carbonic ester groups in the main chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04Polyurethanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
KR1020070056652A 2007-03-21 2007-06-11 복사에 의해 현상, 경화될 수 있는 폴리우레탄 및 그를함유하는 포토레지스트 조성물 KR100838936B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW096109678A TWI353488B (en) 2007-03-21 2007-03-21 Radiation curable and developable polyurethane
TW096109678 2007-03-21

Publications (1)

Publication Number Publication Date
KR100838936B1 true KR100838936B1 (ko) 2008-06-16

Family

ID=39771625

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070056652A KR100838936B1 (ko) 2007-03-21 2007-06-11 복사에 의해 현상, 경화될 수 있는 폴리우레탄 및 그를함유하는 포토레지스트 조성물

Country Status (3)

Country Link
JP (1) JP2008231393A (ja)
KR (1) KR100838936B1 (ja)
TW (1) TWI353488B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011136286A1 (ja) * 2010-04-28 2011-11-03 富士フイルム株式会社 感光性組成物、並びに感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
TWI412542B (zh) * 2010-09-17 2013-10-21 Agi Corp 輻射可固化及可顯影之樹枝狀分散劑

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0780989B2 (ja) * 1987-12-26 1995-08-30 東亞合成株式会社 紫外線または放射線硬化型樹脂組成物の製造方法
JP2000137325A (ja) * 1998-11-04 2000-05-16 Kansai Paint Co Ltd 有機溶剤型感光性レジスト組成物及びレジストパターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH068337B2 (ja) * 1985-03-15 1994-02-02 大日本印刷株式会社 新規ウレタン化合物及びその製造方法
JP2007002030A (ja) * 2005-06-21 2007-01-11 Fujifilm Holdings Corp エラストマー、感光性ソルダーレジスト組成物及び感光性ソルダーレジストフィルム、並びに、永久パターン及びその形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0780989B2 (ja) * 1987-12-26 1995-08-30 東亞合成株式会社 紫外線または放射線硬化型樹脂組成物の製造方法
JP2000137325A (ja) * 1998-11-04 2000-05-16 Kansai Paint Co Ltd 有機溶剤型感光性レジスト組成物及びレジストパターン形成方法

Also Published As

Publication number Publication date
JP2008231393A (ja) 2008-10-02
TW200839446A (en) 2008-10-01
TWI353488B (en) 2011-12-01

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