KR100827871B1 - 화학 기계 폴리싱을 위한 인시츄 방식의 엔드포인트 검출및 공정 모니터링 방법 및 장치 - Google Patents
화학 기계 폴리싱을 위한 인시츄 방식의 엔드포인트 검출및 공정 모니터링 방법 및 장치 Download PDFInfo
- Publication number
- KR100827871B1 KR100827871B1 KR1020027015632A KR20027015632A KR100827871B1 KR 100827871 B1 KR100827871 B1 KR 100827871B1 KR 1020027015632 A KR1020027015632 A KR 1020027015632A KR 20027015632 A KR20027015632 A KR 20027015632A KR 100827871 B1 KR100827871 B1 KR 100827871B1
- Authority
- KR
- South Korea
- Prior art keywords
- polishing
- substrate
- delete delete
- chemical mechanical
- monitoring system
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/574,008 | 2000-05-19 | ||
US09/574,008 US6924641B1 (en) | 2000-05-19 | 2000-05-19 | Method and apparatus for monitoring a metal layer during chemical mechanical polishing |
US21722800P | 2000-07-10 | 2000-07-10 | |
US60/217,228 | 2000-07-10 | ||
US22166800P | 2000-07-27 | 2000-07-27 | |
US60/221,668 | 2000-07-27 | ||
PCT/US2001/016290 WO2001089765A1 (en) | 2000-05-19 | 2001-05-18 | In-situ endpoint detection and process monitoring method and apparatus for chemical mechanical polishing |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030001529A KR20030001529A (ko) | 2003-01-06 |
KR100827871B1 true KR100827871B1 (ko) | 2008-05-07 |
Family
ID=27396396
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020027015632A KR100827871B1 (ko) | 2000-05-19 | 2001-05-18 | 화학 기계 폴리싱을 위한 인시츄 방식의 엔드포인트 검출및 공정 모니터링 방법 및 장치 |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1294534B2 (ja) |
JP (4) | JP5542293B2 (ja) |
KR (1) | KR100827871B1 (ja) |
AT (1) | ATE315980T1 (ja) |
DE (3) | DE60132385T2 (ja) |
TW (1) | TW496812B (ja) |
WO (1) | WO2001089765A1 (ja) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8485862B2 (en) * | 2000-05-19 | 2013-07-16 | Applied Materials, Inc. | Polishing pad for endpoint detection and related methods |
US7374477B2 (en) | 2002-02-06 | 2008-05-20 | Applied Materials, Inc. | Polishing pads useful for endpoint detection in chemical mechanical polishing |
US6608495B2 (en) | 2001-03-19 | 2003-08-19 | Applied Materials, Inc. | Eddy-optic sensor for object inspection |
US6966816B2 (en) | 2001-05-02 | 2005-11-22 | Applied Materials, Inc. | Integrated endpoint detection system with optical and eddy current monitoring |
US6811466B1 (en) | 2001-12-28 | 2004-11-02 | Applied Materials, Inc. | System and method for in-line metal profile measurement |
JP2005517290A (ja) * | 2002-02-06 | 2005-06-09 | アプライド マテリアルズ インコーポレイテッド | 渦電流モニタリングシステムを備えた化学機械的研磨の為の方法及び装置 |
EP1349199A1 (de) * | 2002-03-28 | 2003-10-01 | Esec Trading S.A. | Einrichtung für die Montage von Halbleiterchips |
DE10310262A1 (de) | 2002-03-28 | 2003-10-23 | Esec Trading Sa | Einrichtung für die Montage von Halbleiterchips |
US7205166B2 (en) * | 2002-06-28 | 2007-04-17 | Lam Research Corporation | Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties |
US7112961B2 (en) | 2002-12-13 | 2006-09-26 | Applied Materials, Inc. | Method and apparatus for dynamically measuring the thickness of an object |
US6788050B2 (en) * | 2002-12-23 | 2004-09-07 | Lam Research Corp. | System, method and apparatus for thin-film substrate signal separation using eddy current |
KR100902893B1 (ko) * | 2003-01-13 | 2009-06-16 | 엘지전자 주식회사 | 광디스크 표면의 기계적 내구성 검사 장치 및 방법 |
US7008296B2 (en) * | 2003-06-18 | 2006-03-07 | Applied Materials, Inc. | Data processing for monitoring chemical mechanical polishing |
JP2005051076A (ja) * | 2003-07-29 | 2005-02-24 | Trecenti Technologies Inc | 半導体装置の製造方法 |
US7112960B2 (en) * | 2003-07-31 | 2006-09-26 | Applied Materials, Inc. | Eddy current system for in-situ profile measurement |
KR100947230B1 (ko) | 2003-09-16 | 2010-03-11 | 엘지전자 주식회사 | 광디스크 표면의 기계적 내구성 검사 장치 및 방법 |
KR101078007B1 (ko) * | 2004-06-21 | 2011-10-28 | 가부시키가이샤 에바라 세이사꾸쇼 | 폴리싱장치 및 폴리싱방법 |
JP2006128563A (ja) * | 2004-11-01 | 2006-05-18 | Toyo Tire & Rubber Co Ltd | 半導体ウエハ研磨用研磨パッドおよび半導体デバイスの製造方法 |
JP2009026850A (ja) * | 2007-07-18 | 2009-02-05 | Elpida Memory Inc | Cmp装置及びcmpによるウェハー研磨方法 |
JP2009033038A (ja) * | 2007-07-30 | 2009-02-12 | Elpida Memory Inc | Cmp装置及びcmpによるウェハー研磨方法 |
JP4319692B2 (ja) | 2007-09-03 | 2009-08-26 | 株式会社東京精密 | 研磨終了時点の予測・検出方法とその装置並びにリアルタイム膜厚モニタ方法とその装置 |
JP5495493B2 (ja) * | 2008-02-07 | 2014-05-21 | 株式会社東京精密 | 膜厚測定装置、及び膜厚測定方法 |
DE102008021569A1 (de) | 2008-04-30 | 2009-11-05 | Advanced Micro Devices, Inc., Sunnyvale | System und Verfahren zur optischen Endpunkterkennung während des CMP unter Anwendung eines substratüberspannenenden Signals |
JP5513795B2 (ja) * | 2009-07-16 | 2014-06-04 | 株式会社荏原製作所 | 研磨方法および装置 |
JP5513821B2 (ja) * | 2009-09-17 | 2014-06-04 | 株式会社荏原製作所 | 渦電流センサ、研磨装置、めっき装置、研磨方法、めっき方法 |
US9023667B2 (en) * | 2011-04-27 | 2015-05-05 | Applied Materials, Inc. | High sensitivity eddy current monitoring system |
US9308618B2 (en) | 2012-04-26 | 2016-04-12 | Applied Materials, Inc. | Linear prediction for filtering of data during in-situ monitoring of polishing |
US9067295B2 (en) * | 2012-07-25 | 2015-06-30 | Applied Materials, Inc. | Monitoring retaining ring thickness and pressure control |
US9205527B2 (en) * | 2012-11-08 | 2015-12-08 | Applied Materials, Inc. | In-situ monitoring system with monitoring of elongated region |
US9636797B2 (en) * | 2014-02-12 | 2017-05-02 | Applied Materials, Inc. | Adjusting eddy current measurements |
JP6423600B2 (ja) | 2014-03-12 | 2018-11-14 | 株式会社荏原製作所 | 膜厚測定装置、及び、研磨装置 |
TW201710029A (zh) | 2015-09-01 | 2017-03-16 | Ebara Corp | 渦電流檢測器 |
JP6779633B2 (ja) | 2016-02-23 | 2020-11-04 | 株式会社荏原製作所 | 研磨装置 |
CN106985059B (zh) * | 2017-04-27 | 2018-12-28 | 厦门大学 | 一种空心球体内外球面研抛方法及装置 |
CN107520740A (zh) * | 2017-09-18 | 2017-12-29 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 一种化学机械抛光中光谱终点的检测方法、装置及系统 |
TWI689081B (zh) | 2018-10-02 | 2020-03-21 | 華邦電子股份有限公司 | 非揮發性記憶體裝置的製造方法 |
US20200276685A1 (en) * | 2019-02-28 | 2020-09-03 | Kevin H. Song | Controlling Chemical Mechanical Polishing Pad Stiffness By Adjusting Wetting in the Backing Layer |
WO2024091314A1 (en) * | 2022-10-27 | 2024-05-02 | Applied Materials, Inc. | Carrier head acoustic monitoring with sensor in platen |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5355083A (en) * | 1988-11-16 | 1994-10-11 | Measurex Corporation | Non-contact sensor and method using inductance and laser distance measurements for measuring the thickness of a layer of material overlaying a substrate |
US5644221A (en) * | 1996-03-19 | 1997-07-01 | International Business Machines Corporation | Endpoint detection for chemical mechanical polishing using frequency or amplitude mode |
US5660672A (en) * | 1995-04-10 | 1997-08-26 | International Business Machines Corporation | In-situ monitoring of conductive films on semiconductor wafers |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4005359A (en) * | 1975-11-07 | 1977-01-25 | Smoot William N | Resonant frequency measuring device for gauging coating thickness |
JPS5842902A (ja) * | 1981-09-08 | 1983-03-12 | Toyo Seikan Kaisha Ltd | プレスの打抜き不良検出装置 |
US4829251A (en) * | 1983-08-31 | 1989-05-09 | Helmut Fischer | Electromagnetic probe for measuring the thickness of thin coatings on magnetic substrates |
JPS63212804A (ja) * | 1987-02-28 | 1988-09-05 | Sumitomo Metal Ind Ltd | 膜厚測定方法 |
DE4002083A1 (de) * | 1990-01-25 | 1991-08-01 | Hoechst Ag | Flaechen- oder schlauchfoermige folie auf basis von cellulosehydrat |
US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
DE69618698T2 (de) * | 1995-03-28 | 2002-08-14 | Applied Materials, Inc. | Verfahren und Vorrichtung zur In-Situ-Kontroll und Bestimmung des Endes von chemisch-mechanischen Planiervorgänge |
US5559428A (en) * | 1995-04-10 | 1996-09-24 | International Business Machines Corporation | In-situ monitoring of the change in thickness of films |
JP3303963B2 (ja) * | 1997-01-20 | 2002-07-22 | 株式会社東京精密 | ウェーハの厚み加工量測定装置 |
JP2973404B2 (ja) * | 1997-07-11 | 1999-11-08 | 株式会社東京精密 | ウェーハ研磨装置 |
JP3001051B2 (ja) * | 1997-08-22 | 2000-01-17 | 日本電気株式会社 | 半導体ウェハ研磨終点検出装置 |
US6068539A (en) * | 1998-03-10 | 2000-05-30 | Lam Research Corporation | Wafer polishing device with movable window |
US6162368A (en) * | 1998-06-13 | 2000-12-19 | Applied Materials, Inc. | Technique for chemical mechanical polishing silicon |
JP3907414B2 (ja) * | 2000-01-17 | 2007-04-18 | 株式会社荏原製作所 | ポリッシング装置 |
JP3916375B2 (ja) * | 2000-06-02 | 2007-05-16 | 株式会社荏原製作所 | ポリッシング方法および装置 |
-
2001
- 2001-05-18 DE DE60132385T patent/DE60132385T2/de not_active Expired - Lifetime
- 2001-05-18 DE DE60116757T patent/DE60116757T4/de not_active Expired - Lifetime
- 2001-05-18 KR KR1020027015632A patent/KR100827871B1/ko active IP Right Grant
- 2001-05-18 JP JP2001585991A patent/JP5542293B2/ja not_active Expired - Fee Related
- 2001-05-18 DE DE60116757A patent/DE60116757D1/de not_active Expired - Lifetime
- 2001-05-18 AT AT01937595T patent/ATE315980T1/de not_active IP Right Cessation
- 2001-05-18 WO PCT/US2001/016290 patent/WO2001089765A1/en active IP Right Grant
- 2001-05-18 EP EP01937595A patent/EP1294534B2/en not_active Expired - Lifetime
- 2001-08-06 TW TW090112035A patent/TW496812B/zh not_active IP Right Cessation
-
2012
- 2012-10-03 JP JP2012221417A patent/JP5778110B2/ja not_active Expired - Lifetime
-
2014
- 2014-06-13 JP JP2014121991A patent/JP6041833B2/ja not_active Expired - Lifetime
- 2014-06-13 JP JP2014121990A patent/JP5980843B2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5355083A (en) * | 1988-11-16 | 1994-10-11 | Measurex Corporation | Non-contact sensor and method using inductance and laser distance measurements for measuring the thickness of a layer of material overlaying a substrate |
US5660672A (en) * | 1995-04-10 | 1997-08-26 | International Business Machines Corporation | In-situ monitoring of conductive films on semiconductor wafers |
US5644221A (en) * | 1996-03-19 | 1997-07-01 | International Business Machines Corporation | Endpoint detection for chemical mechanical polishing using frequency or amplitude mode |
Also Published As
Publication number | Publication date |
---|---|
DE60116757T2 (de) | 2006-07-27 |
JP5980843B2 (ja) | 2016-08-31 |
JP5778110B2 (ja) | 2015-09-16 |
JP6041833B2 (ja) | 2016-12-14 |
JP2014209643A (ja) | 2014-11-06 |
DE60116757T4 (de) | 2007-01-18 |
EP1294534A1 (en) | 2003-03-26 |
ATE315980T1 (de) | 2006-02-15 |
DE60132385T2 (de) | 2008-05-15 |
DE60132385D1 (de) | 2008-02-21 |
TW496812B (en) | 2002-08-01 |
JP2013058762A (ja) | 2013-03-28 |
EP1294534B1 (en) | 2006-01-18 |
JP2003534649A (ja) | 2003-11-18 |
WO2001089765A1 (en) | 2001-11-29 |
KR20030001529A (ko) | 2003-01-06 |
JP5542293B2 (ja) | 2014-07-09 |
JP2014208401A (ja) | 2014-11-06 |
EP1294534B2 (en) | 2006-01-25 |
DE60116757D1 (de) | 2006-04-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100827871B1 (ko) | 화학 기계 폴리싱을 위한 인시츄 방식의 엔드포인트 검출및 공정 모니터링 방법 및 장치 | |
US6869332B2 (en) | Chemical mechanical polishing of a metal layer with polishing rate monitoring | |
US7008297B2 (en) | Combined eddy current sensing and optical monitoring for chemical mechanical polishing | |
US6930478B2 (en) | Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal | |
KR100899717B1 (ko) | 광학적 및 맴돌이전류 모니터링을 하는 통합식 종단점탐지시스템 | |
EP1618991B1 (en) | Polishing pad |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120329 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20130329 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20160330 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20170330 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20190401 Year of fee payment: 12 |