KR100811641B1 - liquid crystal display devices and manufacturing method of the same - Google Patents

Abstract

The present invention relates to a liquid crystal display device having a wide viewing angle and a manufacturing method thereof.

In order to widen the viewing angle of the liquid crystal display, a structure using a fringe field was formed by forming a slit pattern on the common electrode. In this case, when the secondary electrode is used to strengthen the fringe field, the process is increased and the cost increases and defects may occur. The probability is high and the production yield is reduced.

In the present invention, by forming a slit pattern on the common electrode to form a fringe field between the common electrode and the pixel electrode to improve the viewing angle of the liquid crystal display, two thin film transistors and two pixel electrodes are formed in one pixel region. Auxiliary electrodes can be formed in a process such as data wiring to reduce manufacturing process and reduce cost.

Viewing angle, slit pattern, fringe field

Description

Liquid crystal display devices and manufacturing method of the same             

1 is a plan view of a conventional liquid crystal display device.

FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 1. FIG.

3 is a plan view of a lower substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

4 is a plan view of an upper substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

5 is a cross-sectional view taken along the line V-V in FIGS. 3 and 4.

6 is a cross-sectional view taken along the line VI-VI in FIG. 3.

7A to 7E are cross-sectional views illustrating a manufacturing process of a portion cut along the line VI-VI of FIG. 3.

8 is a plan view of an array substrate for a liquid crystal display according to another exemplary embodiment of the present invention.

9 is a cross-sectional view taken along the line VII-VII of FIG. 8.                 

<Description of Symbols for Main Parts of Drawings>

110: first substrate 122: first gate electrode

123: second gate electrode 130: gate insulating film

141: first active layer 142: second active layer

151 and 152: first ohmic contact layer 153 and 154: second ohmic contact layer

161: data wiring 162: first drain electrode

163: first source electrode 164: second source electrode

165: second drain electrode 170: protective layer

171: first contact hole 172: second contact hole

181: first pixel electrode 182: second pixel electrode

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a wide viewing angle and a manufacturing method thereof.

In general, a liquid crystal display device is formed by arranging two substrates on which electric field generating electrodes are formed so that the surfaces on which the two electrodes are formed face each other, injecting a liquid crystal material between the two substrates, and then applying a voltage to the two electrodes. By moving the liquid crystal molecules by an electric field, the device expresses an image by the transmittance of light that varies accordingly.

The liquid crystal display may be formed in various forms. Currently, an active matrix LCD (AM-LCD) in which a thin film transistor and pixel electrodes connected to the thin film transistor are arranged in a matrix manner has excellent resolution and video performance. It is most noticed.

Such a liquid crystal display has a structure in which a pixel electrode is formed on a lower substrate and a common electrode is formed on an upper substrate. An electric field having a direction substantially perpendicular to the upper substrate and the lower substrate is formed between the pixel electrode and the common electrode, thereby driving liquid crystal powder.

However, since the liquid crystal display has a problem that the viewing angle characteristics are not excellent, various methods have been proposed to overcome this disadvantage.

Among these, an example of a liquid crystal display using a multi-domain technology is presented in US Patent No. 5,608,556, which is illustrated in FIGS. 1 and 2. 1 is a plan view of a conventional liquid crystal display, and FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 1.

1 and 2, the gate wiring 12 including the gate electrode 11 extends in the horizontal direction on the first substrate 10, and the gate electrode 11 and the gate wiring 12 are extended. The gate insulating film 13 is formed on the upper side.

An active layer 14 made of amorphous silicon is formed on the gate insulating layer 13 on the gate electrode 11. An etching stopper 15 is formed on the active layer 14, more specifically, at the portion where the channel of the thin film transistor is to be formed, and an ohmic contact layer 16 is formed thereon. 16 is separated on the etch stopper 15.

The pixel electrode 17 made of a transparent conductive material is formed on the gate insulating layer 13.

Next, a source electrode 19, a drain electrode 18, and a data line 20 are formed on the ohmic contact layer 16 and the pixel electrode 17. Here, the data line 20 extends in the vertical direction to define a pixel area together with the gate line 12, and is connected to the source electrode 19. The source electrode 19 and the drain electrode 18 are spaced apart from the gate electrode 11 and form a thin film transistor together with the gate electrode 11, the active layer 14, and the ohmic contact layer 16. . At this time, the drain electrode 18 is in contact with the pixel electrode 17 is electrically connected.

Next, a protective layer 21 is formed on the data line 20, the source and drain electrodes 19 and 18, and the pixel electrode 17 to cover them.

An orientation control electrode 22 is formed on the passivation layer 21, and the orientation control electrode 22 partially overlaps the edge of the pixel electrode 17 to surround the pixel electrode 17. In the form of

Next, a first alignment layer 23 made of a material such as polyimide is formed on the alignment control electrode 22.

Next, the second substrate 30 is disposed above the first substrate 10 at a predetermined interval and the black matrix 31 is formed below the second substrate 30. The black matrix 31 is positioned at a portion corresponding to the thin film transistor to prevent light from entering the channel of the thin film transistor. Although not shown, the black matrix 31 covers a portion other than the pixel region to prevent light leakage from the portion other than the pixel region.

Subsequently, a common electrode 32 made of a transparent conductive material is formed under the black matrix 31, and the common electrode 32 has slit patterns 33a and 33b in a region corresponding to the pixel electrode 17. The slit patterns 33a and 33b have a diagonal direction of the pixel electrode 17 to form a x shape.

Next, a second alignment layer 34 is formed under the common electrode 32.

Next, the liquid crystal layer 41 is positioned between the first alignment layer 23 and the second alignment layer 34, wherein the first alignment layer 23 and the second alignment layer 34 are vertical alignment layers to form the liquid crystal molecules 40. Has an orientation direction perpendicular to the substrates 10 and 30.

In such a liquid crystal display, the slit patterns 33a and 33b are formed on the common electrode 32. When a voltage is applied to the common electrode 32 and the pixel electrode 17, a fringe field is formed between the two electrodes. ) Is formed. Therefore, since the liquid crystal molecules 40 of the liquid crystal layer 41 have different alignment directions with respect to the slit patterns 33a and 33b, a plurality of regions having different alignment directions of the liquid crystal molecules may be formed without rubbing several times. Can be. At this time, the orientation control electrode 22 serves to strengthen the fringe field.

The array substrate, which is the lower substrate of the liquid crystal display, is formed by repeatedly depositing a thin film material layer and performing photo etching using a mask, wherein the number of masks used represents the number of processes for manufacturing the array substrate.

The photolithography process involves various processes such as cleaning, coating of photoresist, exposure and development, and etching. Therefore, shortening the photolithography process only once can significantly reduce the manufacturing time, reduce the manufacturing cost, and reduce the incidence of defects. Therefore, it is desirable to manufacture the array substrate by reducing the number of masks.

However, in the conventional liquid crystal display device, since the alignment control electrode is formed of a separate conductive material and an etch stopper is formed on the active layer, at least seven masks are required.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which have a wide viewing angle and which can reduce manufacturing processes and costs.

In order to achieve the above object, the present invention, the first substrate and the second substrate; A gate wiring extending in one direction on the first substrate; An auxiliary electrode formed to define a pixel area crossing the gate line; A data line passing through a central portion of the pixel area and formed of the same material on the same layer in parallel with the secondary electrode; First and second thin film transistors connected to the gate line and the data line in the pixel area and formed at both sides of the data line; First and second pixel electrodes connected to the first and second thin film transistors and spaced apart from each other on the data line; A black matrix formed under the second substrate and corresponding to the incident electrode; A common electrode formed under the black matrix and having a slit pattern corresponding to the data line; And a liquid crystal layer formed between the first substrate and the second substrate, wherein the secondary electrode is not electrically connected to the first and second thin film transistors.
The first and second thin film transistors may include first and second active layers, respectively, and the first active layer of the first thin film transistor and the second active layer of the second thin film transistor may be separated or connected. Can be.
A width of the slit pattern may be wider than a gap between the first and second pixel electrodes.
Each of the first and second pixel electrodes may partially overlap the secondary electrode.
The first and second pixel electrodes may partially overlap the data line.
The first and second pixel electrodes may be separately formed between the data line and the auxiliary electrode in the pixel area.
In another aspect, the present invention provides a method of preparing a substrate, comprising: preparing a first substrate and a second substrate; Forming a gate wiring extending in one direction on the first substrate and first and second gate electrodes connected to the gate wiring; Forming a gate insulating layer on the gate wiring and the first and second gate electrodes; Forming first and second active layers on the gate insulating layer, respectively, corresponding to the first and second gate electrodes; Forming an ohmic contact layer on the first and second active layers, respectively; An auxiliary electrode defining a pixel region by crossing the gate wiring with the same material on the gate insulating layer exposed to the outside of the ohmic contact layer, and a data wiring penetrating the central portion of the pixel region and parallel to the auxiliary electrode, Forming first and second source electrodes connected to the data wires and first and second drain electrodes separated from the first and second source electrodes on the ohmic contact layer; Forming a protective layer having first and second contact holes exposing the data line, the first and second source and drain electrodes, and the first and second drain electrodes, respectively; Forming first and second pixel electrodes spaced apart from each other on the data line in the pixel area above the passivation layer; Forming a black matrix on the second substrate; Forming a common electrode having a slit pattern on the black matrix to correspond to the data lines; And forming a liquid crystal between the first substrate on which the first and second pixel electrodes are formed and the second substrate on which the common electrode is formed.
A width of the slit pattern may be wider than a gap between the first and second pixel electrodes.
The first and second source electrodes may be formed such that the data line, the auxiliary electrode, and their ends overlap each other in the region between the data line and the auxiliary electrode in the pixel area.
The first pixel electrode may be connected to the first drain electrode through the first contact hole, and the second pixel electrode may be connected to the second drain electrode through the second contact hole.

delete

delete

delete

delete

delete

delete

delete

delete

As described above, the present invention improves the viewing angle of the liquid crystal display by forming a slit pattern on the common electrode to form a fringe field between the common electrode and the pixel electrode, so that two thin film transistors and two pixel electrodes in one pixel region are provided. And the secondary electrode are formed in a process such as data wiring, thereby reducing the manufacturing process and reducing the cost.

Hereinafter, a liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.

First, FIG. 3 is a plan view of an array substrate for a liquid crystal display device according to an exemplary embodiment of the present invention, and FIG. 4 is a plan view of a color filter substrate for a liquid crystal display device according to the present invention.

As shown in FIG. 3, in the array substrate for a liquid crystal display according to the present invention, gate wirings 121 made of a conductive material such as metal are formed in a horizontal direction, and the first and second gate electrodes 122 and 123 are formed. ) Protrudes from the gate wiring 121.

Next, a data line 161 is formed of a conductive material, such as a metal, to cross the gate line 121 in a vertical direction, and the first and second source electrodes 163 and 164 are formed at both sides of the data line 161. The protrusions overlap the first and second gate electrodes 122 and 123, respectively. Meanwhile, a first drain electrode 162 overlapping the first gate electrode 122 is formed to be spaced apart from the first source electrode 163 on the opposite side of the first source electrode 163, and the second source electrode 164 is formed. ), A second drain electrode 165 overlapping the second gate electrode 123 is formed to be spaced apart from the second source electrode 164. Here, the gate electrodes 122 and 123 form a thin film transistor together with the source electrodes 163 and 164 and the drain electrodes 162 and 165.

The thin film transistor further includes an active layer, and the first gate electrode 122 and the first source and drain electrodes 163 and 162 overlap the first active layer 141, and the second gate electrode 123 and the first gate electrode 122. The second source and drain electrodes 164 and 165 overlap the second active layer 142.

In addition, an auxiliary electrode 166 made of the same material as the data line 161 and extending in the vertical direction is formed between the data lines 161.

Next, first and second pixel electrodes 181 and 182 made of a transparent conductive material are formed in regions defined by the data line 161, the auxiliary electrode 166, and the gate line 121. Edges of the second pixel electrodes 181 and 182 partially overlap the data line 161, the auxiliary electrode 166, and the gate line 121. Here, the first pixel electrode 181 is connected to the first drain electrode 162 through the first contact hole 171, and the second pixel electrode 182 is connected to the second drain through the second contact hole 172. It is connected to the electrode 165.

In the liquid crystal display according to the present invention, the pixel region P is between the incident electrode 166 and the incident electrode 166, and the data line 161 crosses the pixel region P. Symmetric thin film transistors are positioned on both sides of the data line 161, and the same signal is transmitted to the first and second pixel electrodes 181 and 182 connected to each thin film transistor through the same data line 161.

Next, as shown in FIG. 4, a black matrix 220 having an opening 221 is formed in the upper substrate of the liquid crystal display according to the present invention, and the opening 221 is formed in the pixel region P of FIG. 3. Corresponds. Subsequently, one color among the red, green, and blue color filters 231, 232, and 233 is formed to correspond to one opening 221. Although not shown, a transparent common electrode is formed on the entire surface of the substrate, and the common electrode has a slit pattern 241 extending in the vertical direction in the opening 221, that is, in the pixel region P. The slit patterns 241 are formed one by one in the pixel region P. FIG.

The cross section of the liquid crystal display device formed by disposing the substrate of FIGS. 3 and 4 is illustrated in FIG. 5, which corresponds to the cross section taken along the line VV of FIGS. 3 and 4.

As shown in FIG. 5, a gate insulating film 130 made of a silicon nitride film or a silicon oxide film is formed on the first substrate 110, and a data line 161 and an auxiliary electrode 166 are formed thereon. As described above, the data line 161 and the auxiliary electrode 166 extend in the vertical direction and are alternately arranged.

Next, a passivation layer 170 is formed on the data line 161 and the auxiliary electrode 166. The passivation layer 170 may be formed of an organic material having a low dielectric constant, or may be formed of a silicon nitride film or a silicon oxide film. It may be made of an inorganic insulating material. In the case of an organic material, a material such as benzocyclobutene (hereinafter referred to as BCB) or photo-acryl may be used.

Next, first and second pixel electrodes 181 and 182 formed of a transparent conductive material such as indium-tin-oxide are formed on the passivation layer 170. Edges of the first and second pixel electrodes 181 and 182 overlap the data line 161 and the auxiliary electrode 166. As mentioned above, the first and second pixel electrodes 181 and 182 receive a signal through the same data line 161.

Subsequently, a second substrate 210 is disposed on the first substrate 110 and spaced apart from the first substrate 110 at a predetermined interval, and a black matrix 220 is formed below the second substrate 210. Here, the black matrix 220 exposes the pixel electrodes 181 and 182 to prevent light leakage from portions other than the pixel electrodes 181 and 182, and the first and second pixel electrodes are disposed on the secondary electrode 166. (181, 182) is formed so as to cover the edge.

Next, red, green, and blue color filters 231, 232, and 233 are formed under the black matrix 220, and one color corresponds to one pixel area in the color filters 231, 232, and 233. .

Next, a common electrode 240 made of a transparent conductive material such as ITO is formed under the color filters 231, 232, and 233, and the common electrode 240 includes the first pixel electrode 181 and the second in the pixel area. The slit pattern 241 is provided between the pixel electrodes 182, that is, a portion corresponding to the data line 161. In this case, in order to form the fringe field, the width of the slit pattern 241 may have a value larger than the distance between the two pixel electrodes 181 and 182.

Next, the liquid crystal layer 300 is positioned between the pixel electrodes 181 and 182 and the common electrode 240. Although not illustrated, an alignment layer is formed on the pixel electrodes 181 and 182 and the common electrode 240, respectively, to determine the initial alignment direction of the liquid crystal molecules of the liquid crystal layer 300.

In the present invention, the liquid crystal uses a twisted nematic liquid crystal mainly used in a liquid crystal display, and the dielectric anisotropy (Δε) generally used in a method of forming a multi-region by forming a slit pattern in a common electrode is It is also possible to use a vertical alignment mode with negative liquid crystals.

An array substrate and a method of manufacturing the liquid crystal display device according to the present invention are illustrated in FIGS. 6 and 7A to 7E, and FIGS. 6 and 7A to 7E correspond to a cross section taken along line VI-VI in FIG. 3. do.

First, as illustrated in FIG. 6, in the array substrate for a liquid crystal display according to the present invention, first and second gate electrodes 122 and 123 are formed on the first substrate 110, and the gate insulating layer 130 is formed thereon. ) Is formed and covers them. First and second active layers 141 and 142 made of amorphous silicon are formed on the gate insulating layer 130 to correspond to the first and second gate electrodes 122 and 123, respectively. Layers 151 and 152 and second ohmic contact layers 153 and 154 are formed, respectively.

Next, on the ohmic contact layers 151, 152, 153, and 154, a data line 161 made of a conductive material such as metal, a first source electrode 163, a first drain electrode 162, and a second source electrode. 164, a second drain electrode 165, and an auxiliary electrode 166 are formed, and the first source electrode 163 and the second source electrode 164 are positioned at both sides of the same data line 161. .

Subsequently, an inorganic insulating film, BCB, or photoacryl may be disposed on the data line 161, the first and second source electrodes 163 and 164, the first and second drain electrodes 162 and 165, and the incident electrode 166. A protective layer 170 made of an organic material is formed, and the protective layer 170 includes first and second contact holes 171 and 172 partially exposing the first drain electrode 162 and the second drain electrode 165. Each has

Next, first and second pixel electrodes 181 and 182 made of a transparent conductive material are formed on the passivation layer 170, and the first pixel electrode 181 is formed through the first contact hole 171. The second pixel electrode 182 is connected to the drain electrode 162 and the second drain electrode 165 through the second contact hole 172. The edges of the first and second pixel electrodes 181 and 182 partially overlap with the incident electrode 166, but partially overlap with the data line 161 as shown in FIG. 3.

A method of manufacturing the array substrate for a liquid crystal display device according to the present invention will be described with reference to FIGS. 7A to 7E.

As shown in FIG. 7A, a material such as a metal is deposited on the transparent first substrate 110 and patterned with a first mask to form first and second gate electrodes 122 and 123. In this case, as described above, the gate wirings connected to the gate electrodes 122 and 123 are also formed.

Next, as shown in FIG. 7B, a silicon nitride film or a silicon oxide film is deposited on the gate electrodes 122 and 123 to form a gate insulating film 130, and then amorphous silicon and amorphous silicon containing impurities are sequentially deposited thereon. The first and second active layers 141 and 142 and the first and second impurity semiconductor layers 155 and 156 may be formed in correspondence with the gate electrodes 122 and 123 by patterning by a photolithography process using a second mask. Form.

Next, as illustrated in FIG. 7C, a conductive material such as a metal is deposited on the first and second impurity semiconductor layers 155 and 156 and patterned with a third mask to form the data line 161 and the first source and drain electrodes. 163 and 162, second source and drain electrodes 164 and 165, and ancillary electrodes 166 are formed. Subsequently, the exposed impurity semiconductor layers 155 and 156 between the first source and drain electrodes 163 and 162 and the second source and drain electrodes 164 and 165 are removed to form an upper portion of the first active layer 141. The second ohmic contact layers 153 and 154 spaced apart from each other are formed on the first ohmic contact layers 151 and 152 spaced apart from the second active layer 142. Here, the data line 161 crosses the gate line (not shown) and is connected to the first and second source electrodes 163 and 164, and the region between the incident electrodes 166 becomes one pixel.

Next, as shown in FIG. 7D, the passivation layer 161 is disposed on the data line 161, the first source and drain electrodes 163 and 162, the second source and drain electrodes 164 and 165, and the incident electrode 166. 170 is formed and patterned with a fourth mask to form first and second contact holes 171 and 172 exposing the first and second drain electrodes 162 and 165, respectively. The protective layer 170 may be formed of an inorganic insulating film by depositing a silicon nitride film or a silicon oxide film, or may be formed by applying an organic material such as BCB or photo acryl.

Subsequently, as illustrated in FIG. 7E, a transparent conductive material such as ITO is deposited on the protective layer 170 and patterned by a photolithography process using a fifth mask to form the first and second pixel electrodes 181 and 182. Form. Here, the first pixel electrode 181 is connected to the first drain electrode 162 through the first contact hole 171, and the second pixel electrode 182 is connected to the second drain through the second contact hole 172. It is connected to the electrode 165. In addition, the edges of the first and second pixel electrodes 181 and 182 partially overlap the secondary electrodes 166, but partially overlap the data lines 161 although not illustrated.

Meanwhile, in the exemplary embodiment of the present invention, the active layers of the two thin film transistors formed in one pixel are respectively formed, but the active layers may be formed as one.

8 and 9 illustrate an array substrate of a liquid crystal display according to another exemplary embodiment of the present invention. 8 is a plan view of an array substrate for a liquid crystal display according to a second exemplary embodiment of the present invention, and FIG. 9 is a cross-sectional view taken along the line VII-VII of FIG. 8. Here, the same reference numerals are used for the same parts as in the previous embodiment, and description thereof will be omitted.

8 and 9, in the second embodiment of the present invention, the active layer 143 is formed in one pattern on the first gate electrode 122 and the second gate electrode 123. The ohmic contact layer 157 between the first and second source electrodes 163 and 164 is also formed in one pattern.

As described above, in the present invention, a slit pattern is formed on the common electrode to form a fringe field, thereby improving the viewing angle by forming two regions having different arrangements of liquid crystal molecules without the addition of a rubbing process for orientation splitting. By forming in a process such as data wiring, the manufacturing process and cost can be reduced.

The present invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit of the present invention.

In the present invention, by forming a slit pattern on the common electrode to form a fringe field between the common electrode and the pixel electrode, in order to improve the viewing angle of the liquid crystal display, two thin film transistors and the pixel electrode are formed in one pixel area, and the secondary electrode is formed. Can be formed in a process such as data wiring to reduce the manufacturing process and reduce the cost.

Claims (22)

A first substrate and a second substrate; A gate wiring extending in one direction on the first substrate; An auxiliary electrode formed to define a pixel area crossing the gate line; A data line passing through a central portion of the pixel area and formed of the same material on the same layer in parallel with the secondary electrode; First and second thin film transistors connected to the gate line and the data line in the pixel area and formed at both sides of the data line; First and second pixel electrodes connected to the first and second thin film transistors and spaced apart from each other on the data line; A black matrix formed under the second substrate and corresponding to the incident electrode; A common electrode formed under the black matrix and having a slit pattern corresponding to the data line; Liquid crystal layer formed between the first substrate and the second substrate And the auxiliary electrode is not electrically connected to the first and second thin film transistors. delete The method of claim 1, And the first and second thin film transistors include first and second active layers, respectively, and the first active layer of the first thin film transistor and the second active layer of the second thin film transistor are separated. The method of claim 1, And the first and second thin film transistors respectively include first and second active layers, and the first active layer of the first thin film transistor and the second active layer of the second thin film transistor are connected to each other. delete delete The method of claim 1, The width of the slit pattern is wider than the gap between the first and second pixel electrodes. delete The method of claim 1, The first and second pixel electrodes each partially overlap with the incident electrode. delete delete The method of claim 1, And the first and second pixel electrodes are separately formed between the data line and the auxiliary electrode in the pixel area. Preparing a first substrate and a second substrate; Forming a gate wiring extending in one direction on the first substrate and first and second gate electrodes connected to the gate wiring; Forming a gate insulating layer on the gate wiring and the first and second gate electrodes; Forming first and second active layers on the gate insulating layer, respectively, corresponding to the first and second gate electrodes; Forming an ohmic contact layer on the first and second active layers, respectively; An auxiliary electrode defining a pixel region by crossing the gate wiring with the same material on the gate insulating layer exposed to the outside of the ohmic contact layer, and a data wiring penetrating the central portion of the pixel region and parallel to the auxiliary electrode, Forming first and second source electrodes connected to the data wires and first and second drain electrodes separated from the first and second source electrodes on the ohmic contact layer; Forming a protective layer having first and second contact holes exposing the data line, the first and second source and drain electrodes, and the first and second drain electrodes, respectively; Forming first and second pixel electrodes spaced apart from each other on the data line in the pixel area above the passivation layer; Forming a black matrix on the second substrate; Forming a common electrode having a slit pattern on the black matrix to correspond to the data lines; Forming a liquid crystal between a first substrate having the first and second pixel electrodes formed thereon and a second substrate having the common electrode formed thereon; Method of manufacturing a liquid crystal display comprising a. delete The method of claim 13, The width of the slit pattern is wider than the gap between the first and second pixel electrodes. delete delete The method of claim 13, And the first and second source electrodes are formed such that the data line, the secondary electrode, and the ends of the first and second source electrodes overlap each other in a region between the data line and the secondary electrode, respectively, in a pixel region. The method of claim 13, The first pixel electrode is connected to the first drain electrode through the first contact hole, and the second pixel electrode is connected to the second drain electrode through the second contact hole. delete delete delete

Images