KR100755582B1 - 고정밀 거울 및 그 제조 방법 - Google Patents
고정밀 거울 및 그 제조 방법 Download PDFInfo
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- KR100755582B1 KR100755582B1 KR1020057015523A KR20057015523A KR100755582B1 KR 100755582 B1 KR100755582 B1 KR 100755582B1 KR 1020057015523 A KR1020057015523 A KR 1020057015523A KR 20057015523 A KR20057015523 A KR 20057015523A KR 100755582 B1 KR100755582 B1 KR 100755582B1
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- 238000004519 manufacturing process Methods 0.000 title abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 239000010409 thin film Substances 0.000 claims abstract description 24
- 229910052782 aluminium Inorganic materials 0.000 claims description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 15
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 9
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 229910000838 Al alloy Inorganic materials 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 17
- 238000005498 polishing Methods 0.000 abstract description 8
- 238000007516 diamond turning Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 71
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- 229910021417 amorphous silicon Inorganic materials 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910000755 6061-T6 aluminium alloy Inorganic materials 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 229910003460 diamond Inorganic materials 0.000 description 6
- 239000010432 diamond Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 238000007736 thin film deposition technique Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 238000005275 alloying Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000007514 turning Methods 0.000 description 2
- PRPINYUDVPFIRX-UHFFFAOYSA-N 1-naphthaleneacetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CC=CC2=C1 PRPINYUDVPFIRX-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Physical Vapour Deposition (AREA)
- Glass Compositions (AREA)
Abstract
Description
Claims (32)
- 표면을 갖는 기판과,상기 기판의 상기 표면 위에 배치되고, 상기 기판으로부터 대향되는 그 일 측면 상에 표면의 마무리를 개선하도록 연마된 표면을 갖는 박막 마무리층과,상기 마무리층의 상기 표면으로부터 외향으로 제공되는 반사층을 포함하는 거울을 포함하는 장치.
- 제1항에 있어서, 상기 마무리층은 충분히 얇아서, 온도 변화에 반응하여, 상기 거울은 상기 기판 및 상기 마무리층에 대한 열 팽창 계수의 차이로 인해 실질적으로 만곡이 이루어지지 않는 장치.
- 제1항에 있어서, 상기 마무리층은 대략 0.00254 mm(0.0001 인치) 미만의 두께를 갖는 장치.
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- 표면을 갖는 기판과,상기 기판의 상기 표면 위에 제공되고, 상기 기판으로부터 대향되는 그 일 측면 상에 표면의 마무리를 개선하도록 연마된 표면을 갖는 박막 마무리층과,상기 기판 및 상기 마무리층 사이에 배치되는 박막 중간층을 포함하는 거울을 포함하는 장치.
- 삭제
- 제1항에 있어서, 상기 반사층은 상기 마무리층의 상기 표면 위에 구비된 박막 반사층을 포함하는 장치.
- 표면을 갖는 기판과,상기 기판의 상기 표면으로부터 외향으로 배치되는 박막 중간층과,상기 중간층으로부터 외향으로 배치되는 박막 마무리층과,상기 마무리층의 표면으로부터 외향으로 배치되는 반사층을 포함하고,상기 마무리 층은 상기 중간층으로부터 대향되는 일 측면을 가지며, 상기 측면은 상기 마무리 층의 표면의 마무리를 개선하도록 연마된 마무리 층 표면을 갖는 장치.
- 제11항에 있어서, 상기 마무리 층은 충분히 얇아서, 온도 변화에 반응하여, 상기 거울은 상기 기판 및 상기 마무리층에 대한 열 팽창 계수의 차이로 인해 실질적으로 만곡이 이루어지지 않는 장치.
- 제11항에 있어서, 상기 마무리층은 대략 0.0001 인치 미만의 두께를 갖는 장치.
- 제11항에 있어서, 상기 마무리층은 실리콘을 포함하는 장치.
- 제11항에 있어서, 상기 마무리층은 니켈-크롬을 포함하는 장치.
- 제11항에 있어서, 상기 중간층은 실리콘을 포함하는 장치.
- 제11항에 있어서, 상기 중간층은 대략 0.0001 인치 미만의 두께를 갖는 장치.
- 제11항에 있어서, 상기 반사층은 금, 은 및 알루미늄 중 하나를 포함하는 장치.
- 제11항에 있어서, 상기 기판의 표면은 다이아몬드-지점-선삭 마무리를 갖는 장치.
- 제11항에 있어서, 상기 기판은 알루미늄 합금을 포함하는 장치.
- 제11항에 있어서, 상기 마무리층의 표면의 상기 마무리는 대략 25 옹스트롬 RMS 미만의 마무리인 장치.
- 제11항에 있어서, 상기 마무리층의 표면의 상기 마무리는 대략 20 옹스트롬 RMS 미만의 마무리인 장치.
- 제11항에 있어서, 상기 마무리층의 표면의 상기 마무리는 대략 15 옹스트롬 RMS 미만의 마무리인 장치.
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/373,448 US6921177B2 (en) | 2003-02-24 | 2003-02-24 | High precision mirror, and a method of making it |
US10/373,448 | 2003-02-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050110638A KR20050110638A (ko) | 2005-11-23 |
KR100755582B1 true KR100755582B1 (ko) | 2007-09-06 |
Family
ID=32868709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057015523A KR100755582B1 (ko) | 2003-02-24 | 2004-02-24 | 고정밀 거울 및 그 제조 방법 |
Country Status (11)
Country | Link |
---|---|
US (1) | US6921177B2 (ko) |
EP (1) | EP1597614B1 (ko) |
JP (1) | JP4664277B2 (ko) |
KR (1) | KR100755582B1 (ko) |
AT (1) | ATE476676T1 (ko) |
AU (1) | AU2004214919B2 (ko) |
CA (1) | CA2500309C (ko) |
DE (1) | DE602004028443D1 (ko) |
IL (1) | IL167673A (ko) |
TW (1) | TWI288247B (ko) |
WO (1) | WO2004077114A1 (ko) |
Families Citing this family (26)
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US20070121104A1 (en) * | 2003-04-18 | 2007-05-31 | Hendrix James L | Techniques for reducing optical noise in metrology systems |
US8062096B2 (en) * | 2005-06-30 | 2011-11-22 | Cabot Microelectronics Corporation | Use of CMP for aluminum mirror and solar cell fabrication |
US7641350B2 (en) * | 2005-11-28 | 2010-01-05 | Jds Uniphase Corporation | Front surface mirror for providing white color uniformity for polarized systems with a large range of incidence angles |
DE102006011973B4 (de) * | 2006-03-15 | 2011-04-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Spiegel mit einer Silberschicht |
WO2009024181A1 (en) * | 2007-08-20 | 2009-02-26 | Optosic Ag | Method of manufacturing and processing silicon carbide scanning mirrors |
DE102009039400A1 (de) * | 2009-08-31 | 2011-03-03 | Carl Zeiss Laser Optics Gmbh | Reflektives optisches Element zur Verwendung in einem EUV-System |
DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
US8398251B2 (en) * | 2009-11-04 | 2013-03-19 | Raytheon Canada Limited | Method and apparatus for fabricating a precision optical surface |
DE102010039927A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
DE102011002953A1 (de) * | 2011-01-21 | 2012-07-26 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
US9575223B2 (en) | 2011-05-13 | 2017-02-21 | Raytheon Company | Magnesium mirrors and methods of manufacture thereof |
US9488760B2 (en) | 2013-02-28 | 2016-11-08 | Corning Incorporated | Enhanced, durable silver coating stacks for highly reflective mirrors |
US9971073B2 (en) * | 2014-04-14 | 2018-05-15 | Corning Incorporated | Enhanced performance metallic based optical mirror substrates |
US20160097885A1 (en) | 2014-10-03 | 2016-04-07 | Corning Incorporated | Mirror substrates with highly finishable corrosion-resistant coating |
KR20160061548A (ko) * | 2014-11-21 | 2016-06-01 | 삼성디스플레이 주식회사 | 어레이 테스트 모듈레이터 및 이를 포함하는 박막트랜지스터 기판 검사 장치 |
DE102015218702A1 (de) * | 2015-09-29 | 2017-03-30 | Dr. Johannes Heidenhain Gmbh | Optisches Schichtsystem |
US20170269265A1 (en) * | 2016-03-18 | 2017-09-21 | Corning Incorporated | Graphite substrates for reflective optics |
US10816702B2 (en) * | 2016-03-18 | 2020-10-27 | Corning Incorporated | Reflective optical element with high stiffness substrate |
CN108468029B (zh) * | 2018-02-12 | 2020-01-21 | 中国科学院国家天文台南京天文光学技术研究所 | 用于碳化硅光学镜面改性与面形提升的磁控溅射扫描方法 |
EP3791218A1 (de) | 2018-05-09 | 2021-03-17 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Spiegelträger für einen optischen spiegel aus einem verbundwerkstoff und verfahren zu dessen herstellung |
US20200009701A1 (en) * | 2018-07-09 | 2020-01-09 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Polishing protocol for zirconium diboride based ceramics to be implemented into optical systems |
US20200132894A1 (en) * | 2018-10-31 | 2020-04-30 | Corning Incorporated | Support for reflective optical element |
US11385383B2 (en) * | 2018-11-13 | 2022-07-12 | Raytheon Company | Coating stress mitigation through front surface coating manipulation on ultra-high reflectors or other optical devices |
US11619764B2 (en) | 2020-03-27 | 2023-04-04 | Raytheon Company | High-performance optical surface |
US11698477B2 (en) * | 2020-07-15 | 2023-07-11 | Raytheon Company | Visible quality additive manufactured aluminum mirror finishing |
US20220019001A1 (en) * | 2020-07-15 | 2022-01-20 | Raytheon Company | Visible quality mirror finishing |
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2003
- 2003-02-24 US US10/373,448 patent/US6921177B2/en not_active Expired - Lifetime
-
2004
- 2004-02-24 KR KR1020057015523A patent/KR100755582B1/ko active IP Right Grant
- 2004-02-24 DE DE602004028443T patent/DE602004028443D1/de not_active Expired - Lifetime
- 2004-02-24 AT AT04714156T patent/ATE476676T1/de not_active IP Right Cessation
- 2004-02-24 TW TW093104709A patent/TWI288247B/zh not_active IP Right Cessation
- 2004-02-24 WO PCT/US2004/005494 patent/WO2004077114A1/en active Application Filing
- 2004-02-24 AU AU2004214919A patent/AU2004214919B2/en not_active Ceased
- 2004-02-24 JP JP2006503844A patent/JP4664277B2/ja not_active Expired - Lifetime
- 2004-02-24 EP EP04714156A patent/EP1597614B1/en not_active Expired - Lifetime
- 2004-02-24 CA CA2500309A patent/CA2500309C/en not_active Expired - Fee Related
-
2005
- 2005-03-24 IL IL167673A patent/IL167673A/en active IP Right Grant
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US6495272B1 (en) * | 2000-07-06 | 2002-12-17 | B-Con Engineering Inc. | High quality optical surface and method of producing same |
Also Published As
Publication number | Publication date |
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US6921177B2 (en) | 2005-07-26 |
KR20050110638A (ko) | 2005-11-23 |
TWI288247B (en) | 2007-10-11 |
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EP1597614A1 (en) | 2005-11-23 |
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DE602004028443D1 (de) | 2010-09-16 |
AU2004214919B2 (en) | 2006-12-21 |
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CA2500309A1 (en) | 2004-09-10 |
TW200428022A (en) | 2004-12-16 |
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JP2006518883A (ja) | 2006-08-17 |
US20040165296A1 (en) | 2004-08-26 |
JP4664277B2 (ja) | 2011-04-06 |
IL167673A (en) | 2009-12-24 |
CA2500309C (en) | 2010-08-24 |
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