KR100740132B1 - 유기 전계 발광 표시 장치 - Google Patents
유기 전계 발광 표시 장치 Download PDFInfo
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- KR100740132B1 KR100740132B1 KR1020060111153A KR20060111153A KR100740132B1 KR 100740132 B1 KR100740132 B1 KR 100740132B1 KR 1020060111153 A KR1020060111153 A KR 1020060111153A KR 20060111153 A KR20060111153 A KR 20060111153A KR 100740132 B1 KR100740132 B1 KR 100740132B1
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- Prior art keywords
- pixel electrode
- thin film
- pixel
- light emitting
- data line
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- 239000010409 thin film Substances 0.000 claims abstract description 64
- 239000010408 film Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 13
- 239000012044 organic layer Substances 0.000 claims description 13
- 239000012780 transparent material Substances 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 abstract description 3
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 61
- 239000004065 semiconductor Substances 0.000 description 12
- 238000002347 injection Methods 0.000 description 9
- 239000007924 injection Substances 0.000 description 9
- 239000011229 interlayer Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 2
- -1 molybdenum-tungsten nitride Chemical class 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78633—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8051—Anodes
- H10K59/80518—Reflective anodes, e.g. ITO combined with thick metallic layers
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (6)
- 복수의 화소 영역이 설정되는 기판 부재,상기 복수의 화소 영역마다 각각 형성된 다수의 박막 트랜지스터,상기 복수의 화소 영역마다 일측 가장자리를 따라 배열된 데이터 라인,상기 복수의 화소 영역마다 타측 가장자리를 따라 배열되며 상기 데이터 라인과 실질적으로 평행한 공통 전원 라인,상기 다수의 박막 트랜지스터 중에서 어느 하나의 박막 트랜지스터와 전기적으로 연결되며 상기 복수의 화소 영역마다 각각 형성된 제1 화소 전극,상기 제1 화소 전극 상에 형성된 유기막, 그리고상기 유기막 상에 형성된 제2 화소 전극을 포함하며,상기 제1 화소 전극은 상기 데이터 라인과 가까운 일측 가장자리가 상기 데이터 라인과 중첩된 유기 전계 발광 표시 장치.
- 제1항에서,상기 데이터 라인과 중첩된 상기 제1 화소 전극의 일측 가장자리는 상기 데이터 라인과 교차 형성된 유기 전계 발광 표시 장치.
- 제2항에서,상기 제1 화소 전극은 상기 공통 전원 라인과 가까우며 상기 일측과 대향하는 타측 가장자리가 상기 공통 전원 라인과 중첩된 유기 전계 발광 표시 장치.
- 제3항에서,상기 데이터 라인과 교차 형성된 상기 제1 화소 전극의 일측 가장자리는 그 끝단이 이웃한 화소 영역에 대응하는 상기 공통 전원 라인과 중첩된 유기 전계 발광 표시 장치.
- 제3항에서,상기 제1 화소 전극은 상기 다수의 박막 트랜지스터와 중첩된 유기 전계 발광 표시 장치.
- 제1항에서,상기 제1 화소 전극은 도전성 반사 물질을 포함한 소재로 만들어지며,상기 제2 화소 전극은 도전성 투과 물질을 포함한 소재로 만들어진 유기 전계 발광 표시 장치.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060111153A KR100740132B1 (ko) | 2006-11-10 | 2006-11-10 | 유기 전계 발광 표시 장치 |
JP2007079454A JP2008123986A (ja) | 2006-11-10 | 2007-03-26 | 有機電界発光表示装置 |
US11/728,628 US7982386B2 (en) | 2006-11-10 | 2007-03-26 | Organic light emitting display device with opaque electrodes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020060111153A KR100740132B1 (ko) | 2006-11-10 | 2006-11-10 | 유기 전계 발광 표시 장치 |
Publications (1)
Publication Number | Publication Date |
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KR100740132B1 true KR100740132B1 (ko) | 2007-07-16 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020060111153A KR100740132B1 (ko) | 2006-11-10 | 2006-11-10 | 유기 전계 발광 표시 장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7982386B2 (ko) |
JP (1) | JP2008123986A (ko) |
KR (1) | KR100740132B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101764409B1 (ko) * | 2017-01-13 | 2017-08-02 | 주식회사 라임디스플레이 | 투명 pcb 기반의 fled 디스플레이 장치 및 이의 제조방법 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4518123B2 (ja) * | 2007-09-12 | 2010-08-04 | ソニー株式会社 | 表示パネル及びパネル検査装置 |
KR100932989B1 (ko) | 2008-08-20 | 2009-12-21 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
KR101540341B1 (ko) * | 2008-10-17 | 2015-07-30 | 삼성전자주식회사 | 패널 구조체, 패널 구조체를 포함하는 표시장치 및 이들의 제조방법 |
KR102000642B1 (ko) * | 2012-12-12 | 2019-07-17 | 엘지디스플레이 주식회사 | 고 휘도 유기발광 다이오드 표시장치 |
KR102388241B1 (ko) * | 2015-12-30 | 2022-04-19 | 엘지디스플레이 주식회사 | 표시 패널과 이를 포함하는 표시 장치 및 표시 장치의 구동 방법 |
KR20170085157A (ko) * | 2016-01-13 | 2017-07-24 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
JP6245326B2 (ja) * | 2016-09-01 | 2017-12-13 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
KR102515814B1 (ko) * | 2017-05-25 | 2023-03-31 | 삼성디스플레이 주식회사 | 표시 장치 |
JP6477838B2 (ja) * | 2017-11-16 | 2019-03-06 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
KR102431788B1 (ko) * | 2017-12-13 | 2022-08-10 | 엘지디스플레이 주식회사 | 표시장치 |
KR102513535B1 (ko) | 2018-03-14 | 2023-03-24 | 삼성디스플레이 주식회사 | 표시 패널 및 이를 포함하는 표시 장치 |
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JP4736013B2 (ja) | 2003-12-16 | 2011-07-27 | 日本電気株式会社 | 発光表示装置の製造方法 |
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2006
- 2006-11-10 KR KR1020060111153A patent/KR100740132B1/ko active IP Right Grant
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2007
- 2007-03-26 US US11/728,628 patent/US7982386B2/en active Active
- 2007-03-26 JP JP2007079454A patent/JP2008123986A/ja active Pending
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KR20000005852A (ko) * | 1998-06-05 | 2000-01-25 | 니시무로 타이죠 | 액정표시장치 |
KR20030067547A (ko) * | 2002-02-06 | 2003-08-14 | 가부시키가이샤 히타치세이사쿠쇼 | 유기 발광 표시 장치 |
KR20050021718A (ko) * | 2003-08-25 | 2005-03-07 | 삼성에스디아이 주식회사 | 유기 전계 발광 표시 장치 |
KR20050050015A (ko) * | 2003-11-24 | 2005-05-27 | 삼성에스디아이 주식회사 | 유기 전계발광 표시 장치 및 그 제조 방법 |
KR20060026243A (ko) * | 2004-09-20 | 2006-03-23 | 삼성에스디아이 주식회사 | 분할된 화소전극을 구비한 유기전계 발광표시장치 |
Cited By (1)
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KR101764409B1 (ko) * | 2017-01-13 | 2017-08-02 | 주식회사 라임디스플레이 | 투명 pcb 기반의 fled 디스플레이 장치 및 이의 제조방법 |
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US20080111475A1 (en) | 2008-05-15 |
JP2008123986A (ja) | 2008-05-29 |
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