JP2008123986A - 有機電界発光表示装置 - Google Patents
有機電界発光表示装置 Download PDFInfo
- Publication number
- JP2008123986A JP2008123986A JP2007079454A JP2007079454A JP2008123986A JP 2008123986 A JP2008123986 A JP 2008123986A JP 2007079454 A JP2007079454 A JP 2007079454A JP 2007079454 A JP2007079454 A JP 2007079454A JP 2008123986 A JP2008123986 A JP 2008123986A
- Authority
- JP
- Japan
- Prior art keywords
- pixel electrode
- thin film
- light emitting
- pixel
- data line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims abstract description 67
- 239000010408 film Substances 0.000 claims abstract description 47
- 230000002093 peripheral effect Effects 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 14
- 230000007423 decrease Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 33
- 239000004065 semiconductor Substances 0.000 description 11
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 2
- -1 molybdenum-tungsten nitride Chemical class 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78633—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8051—Anodes
- H10K59/80518—Reflective anodes, e.g. ITO combined with thick metallic layers
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
【解決手段】複数の画素領域が設定される基板、前記複数の画素領域毎にそれぞれ形成された複数の薄膜トランジスタ、前記複数の画素領域毎に一側周縁に沿って配列されたデータライン、前記複数の画素領域毎に他側周縁に沿って配列され、前記データラインと実質的に平行な共通電源ライン、前記複数の薄膜トランジスタのうちの何れか一つの薄膜トランジスタと電気的に連結され、前記複数の画素領域毎にそれぞれ形成された第1画素電極、前記第1画素電極上に形成された有機膜、及び、前記有機膜上に形成された第2画素電極を含み、前記第1画素電極は前記データラインと近い一側周縁が前記データラインと重なる。これにより、薄膜トランジスタの駆動特性低下を防止でき、有機発光素子で発生した光が反射して、薄膜トランジスタのチャンネル領域に流入することを遮断できる。
【選択図】図1
Description
20 第2薄膜トランジスタ
70 有機発光素子
80 蓄電素子
131、132 第1及び第2半導体層
140 絶縁膜
151 ゲートライン
152、155 第1及び第2ゲート電極
158 第1維持電極
171 データライン
172 共通電源ライン
173、176 第1及び第2ソース電極
174、177 第1及び第2ドレーン電極
178 第2維持電極
180 平坦化膜
181 平坦化ドレーンコンタクトホール
190 画素定義膜
710 第1画素電極
720 有機膜
901 有機電界発光表示装置
Claims (6)
- 複数の画素領域が設定される基板、
前記複数の画素領域毎にそれぞれ形成された複数の薄膜トランジスタ、
前記複数の画素領域毎に一側周縁に沿って配列されたデータライン、
前記複数の画素領域毎に他側周縁に沿って配列され、前記データラインと実質的に平行な共通電源ライン、
前記複数の薄膜トランジスタのうちの何れか一つの薄膜トランジスタと電気的に連結され、前記複数の画素領域毎にそれぞれ形成された第1画素電極、
前記第1画素電極上に形成された有機膜、及び、
前記有機膜上に形成された第2画素電極、を含み、
前記第1画素電極は、前記データラインと近い一側周縁が前記データラインと重なった、有機電界発光表示装置。 - 前記データラインと重なった前記第1画素電極の一側周縁は、前記データラインと交差形成された、請求項1に記載の有機電界発光表示装置。
- 前記第1画素電極は、前記共通電源ラインと近く、前記一側と対向する他側周縁が前記共通電源ラインと重なった、請求項2に記載の有機電界発光表示装置。
- 前記データラインと交差形成された前記第1画素電極の一側周縁は、その終端が隣接した画素領域に対応する前記共通電源ラインと重なった、請求項3に記載の有機電界発光表示装置。
- 前記第1画素電極は、前記複数の薄膜トランジスタと重なった、請求項3に記載の有機電界発光表示装置。
- 前記第1画素電極は、導電性反射物質を含む素材で作られ、
前記第2画素電極は、導電性透過物質を含む素材で作られた、請求項1に記載の有機電界発光表示装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060111153A KR100740132B1 (ko) | 2006-11-10 | 2006-11-10 | 유기 전계 발광 표시 장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008123986A true JP2008123986A (ja) | 2008-05-29 |
Family
ID=38498838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007079454A Pending JP2008123986A (ja) | 2006-11-10 | 2007-03-26 | 有機電界発光表示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7982386B2 (ja) |
JP (1) | JP2008123986A (ja) |
KR (1) | KR100740132B1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010050081A (ja) * | 2008-08-20 | 2010-03-04 | Samsung Mobile Display Co Ltd | 有機発光表示装置及びその製造方法 |
JP2017010041A (ja) * | 2016-09-01 | 2017-01-12 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
KR20170080820A (ko) * | 2015-12-30 | 2017-07-11 | 엘지디스플레이 주식회사 | 표시 패널과 이를 포함하는 표시 장치 및 표시 장치의 구동 방법 |
JP2018055118A (ja) * | 2017-11-16 | 2018-04-05 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4518123B2 (ja) * | 2007-09-12 | 2010-08-04 | ソニー株式会社 | 表示パネル及びパネル検査装置 |
KR101540341B1 (ko) * | 2008-10-17 | 2015-07-30 | 삼성전자주식회사 | 패널 구조체, 패널 구조체를 포함하는 표시장치 및 이들의 제조방법 |
KR102000642B1 (ko) * | 2012-12-12 | 2019-07-17 | 엘지디스플레이 주식회사 | 고 휘도 유기발광 다이오드 표시장치 |
KR20170085157A (ko) * | 2016-01-13 | 2017-07-24 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
KR101764409B1 (ko) * | 2017-01-13 | 2017-08-02 | 주식회사 라임디스플레이 | 투명 pcb 기반의 fled 디스플레이 장치 및 이의 제조방법 |
KR102515814B1 (ko) * | 2017-05-25 | 2023-03-31 | 삼성디스플레이 주식회사 | 표시 장치 |
KR102431788B1 (ko) * | 2017-12-13 | 2022-08-10 | 엘지디스플레이 주식회사 | 표시장치 |
KR102513535B1 (ko) | 2018-03-14 | 2023-03-24 | 삼성디스플레이 주식회사 | 표시 패널 및 이를 포함하는 표시 장치 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4180690B2 (ja) * | 1998-06-05 | 2008-11-12 | 東芝松下ディスプレイテクノロジー株式会社 | 液晶表示装置 |
US6858898B1 (en) * | 1999-03-23 | 2005-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
JP4592989B2 (ja) | 2001-03-26 | 2010-12-08 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
JP3605823B2 (ja) | 2001-08-03 | 2004-12-22 | 日本電気株式会社 | 薄膜トランジスタ・アレイ基板およびアクティブマトリックス型液晶表示装置 |
KR100834346B1 (ko) * | 2001-12-28 | 2008-06-02 | 엘지디스플레이 주식회사 | 능동행렬 유기전기발광소자 |
JP3718770B2 (ja) * | 2002-01-11 | 2005-11-24 | 株式会社日立製作所 | アクティブマトリックス型の表示装置 |
JP4310984B2 (ja) * | 2002-02-06 | 2009-08-12 | 株式会社日立製作所 | 有機発光表示装置 |
KR100560782B1 (ko) * | 2003-08-25 | 2006-03-13 | 삼성에스디아이 주식회사 | 유기 전계 발광 표시 장치 |
JP2005099317A (ja) | 2003-09-24 | 2005-04-14 | Sharp Corp | 表示装置 |
JP4497881B2 (ja) * | 2003-09-30 | 2010-07-07 | 三洋電機株式会社 | 有機el素子および有機elパネル |
KR101006436B1 (ko) * | 2003-11-18 | 2011-01-06 | 삼성전자주식회사 | 표시 장치용 박막 트랜지스터 표시판 |
JP4287337B2 (ja) | 2003-11-24 | 2009-07-01 | 三星モバイルディスプレイ株式會社 | 有機電界発光表示装置及びその製造方法 |
KR100684825B1 (ko) * | 2003-11-24 | 2007-02-20 | 삼성에스디아이 주식회사 | 유기 전계발광 표시 장치 및 그 제조 방법 |
KR101026812B1 (ko) * | 2003-11-28 | 2011-04-04 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그의 제조 방법 |
KR101090245B1 (ko) * | 2003-12-10 | 2011-12-06 | 삼성전자주식회사 | 박막 트랜지스터 표시판 |
JP4736013B2 (ja) | 2003-12-16 | 2011-07-27 | 日本電気株式会社 | 発光表示装置の製造方法 |
KR100669728B1 (ko) * | 2004-09-20 | 2007-01-16 | 삼성에스디아이 주식회사 | 분할된 화소전극을 구비한 유기전계 발광표시장치 |
-
2006
- 2006-11-10 KR KR1020060111153A patent/KR100740132B1/ko active IP Right Grant
-
2007
- 2007-03-26 JP JP2007079454A patent/JP2008123986A/ja active Pending
- 2007-03-26 US US11/728,628 patent/US7982386B2/en active Active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010050081A (ja) * | 2008-08-20 | 2010-03-04 | Samsung Mobile Display Co Ltd | 有機発光表示装置及びその製造方法 |
US8258692B2 (en) | 2008-08-20 | 2012-09-04 | Samsung Mobile Display Co., Ltd. | Organic light emitting diode display and method for manufacturing the same |
KR20170080820A (ko) * | 2015-12-30 | 2017-07-11 | 엘지디스플레이 주식회사 | 표시 패널과 이를 포함하는 표시 장치 및 표시 장치의 구동 방법 |
KR102388241B1 (ko) | 2015-12-30 | 2022-04-19 | 엘지디스플레이 주식회사 | 표시 패널과 이를 포함하는 표시 장치 및 표시 장치의 구동 방법 |
JP2017010041A (ja) * | 2016-09-01 | 2017-01-12 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
JP2018055118A (ja) * | 2017-11-16 | 2018-04-05 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
Also Published As
Publication number | Publication date |
---|---|
US7982386B2 (en) | 2011-07-19 |
US20080111475A1 (en) | 2008-05-15 |
KR100740132B1 (ko) | 2007-07-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10446613B2 (en) | Method of manufacturing an organic light emitting diode display having an auxiliary member in contact with an upper surface of an auxiliary electrode | |
JP2008123986A (ja) | 有機電界発光表示装置 | |
US9478591B2 (en) | Organic light emitting display device and repair method thereof | |
EP3346501B1 (en) | Organic light emitting display device having a connecting clad electrode | |
JP2020074460A (ja) | 発光装置 | |
KR100879294B1 (ko) | 유기 발광 표시 장치 | |
US8866706B2 (en) | Organic electroluminescent display device and manufacturing method of the same | |
KR20190029860A (ko) | 표시 장치 | |
US20100193778A1 (en) | Organic light emitting diode display and method of manufacturing the same | |
JP2007287354A (ja) | 有機el表示装置 | |
KR20150079094A (ko) | 유기전계발광표시장치 및 그 제조방법 | |
KR20110080905A (ko) | 유기 발광 표시 장치 | |
US10553660B2 (en) | Light emitting display device | |
US8841832B2 (en) | Organic light emitting diode display having improved strength by preventing the exfoliation of a sealant | |
JP4287337B2 (ja) | 有機電界発光表示装置及びその製造方法 | |
KR101820166B1 (ko) | 화이트 유기발광다이오드 표시소자 및 그 제조방법 | |
JP4639588B2 (ja) | 電気光学装置、電気光学装置の製造方法 | |
KR100778443B1 (ko) | 유기 발광 표시 장치 | |
JP4856680B2 (ja) | 有機電界発光表示装置及びその製造方法 | |
US8288182B2 (en) | Method for manufacturing thin film transistor and display device | |
KR101717075B1 (ko) | 유기전기발광소자 | |
KR100739645B1 (ko) | 유기 발광 표시 장치 | |
KR100739579B1 (ko) | 유기 발광 표시 장치 및 그 제조 방법 | |
US20240215357A1 (en) | Display device | |
KR100786847B1 (ko) | 유기 전계 발광 표시 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20081208 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090225 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20091019 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091027 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100122 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100223 |