KR100727049B1 - 마이크로전자 디바이스들의 제조시 최적의 공정 목표들을결정하는 방법 - Google Patents

마이크로전자 디바이스들의 제조시 최적의 공정 목표들을결정하는 방법 Download PDF

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KR100727049B1
KR100727049B1 KR1020027008703A KR20027008703A KR100727049B1 KR 100727049 B1 KR100727049 B1 KR 100727049B1 KR 1020027008703 A KR1020027008703 A KR 1020027008703A KR 20027008703 A KR20027008703 A KR 20027008703A KR 100727049 B1 KR100727049 B1 KR 100727049B1
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workpiece
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KR20020087047A (ko
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톱랙안소니제이.
밀러마이클엘.
손더맨토마스
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어드밴스드 마이크로 디바이시즈, 인코포레이티드
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020027008703A 2000-01-04 2000-12-04 마이크로전자 디바이스들의 제조시 최적의 공정 목표들을결정하는 방법 Expired - Lifetime KR100727049B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/477,464 2000-01-04
US09/477,464 US6470230B1 (en) 2000-01-04 2000-01-04 Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication

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KR20020087047A KR20020087047A (ko) 2002-11-21
KR100727049B1 true KR100727049B1 (ko) 2007-06-12

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US (1) US6470230B1 (enExample)
EP (1) EP1245044B1 (enExample)
JP (1) JP5063846B2 (enExample)
KR (1) KR100727049B1 (enExample)
WO (1) WO2001050522A1 (enExample)

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EP1245044A1 (en) 2002-10-02
WO2001050522A1 (en) 2001-07-12
KR20020087047A (ko) 2002-11-21
JP5063846B2 (ja) 2012-10-31
US6470230B1 (en) 2002-10-22
JP2003519922A (ja) 2003-06-24
EP1245044B1 (en) 2011-05-11

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