KR100719153B1 - 리소그래피 장치 및 디바이스 제조방법 - Google Patents

리소그래피 장치 및 디바이스 제조방법 Download PDF

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Publication number
KR100719153B1
KR100719153B1 KR1020050040434A KR20050040434A KR100719153B1 KR 100719153 B1 KR100719153 B1 KR 100719153B1 KR 1020050040434 A KR1020050040434 A KR 1020050040434A KR 20050040434 A KR20050040434 A KR 20050040434A KR 100719153 B1 KR100719153 B1 KR 100719153B1
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KR
South Korea
Prior art keywords
projection system
gas flow
substrate
generally
flow
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020050040434A
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English (en)
Korean (ko)
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KR20060047923A (ko
Inventor
니콜라 알방 랄르망
마르티누스 코르넬리스 마리아 베르하겐
마르첼 벡커스
로날드 스툴티엔스
파스칼 안토니우스 스미츠
블라디미르 프란시스쿠스 게라르두스 마리아 헤어토크
다비드 테오도루스 빌리 반 데르 플라스
슈테판 코엘링크
헨크 크뤼스
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20060047923A publication Critical patent/KR20060047923A/ko
Application granted granted Critical
Publication of KR100719153B1 publication Critical patent/KR100719153B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050040434A 2004-05-17 2005-05-16 리소그래피 장치 및 디바이스 제조방법 Expired - Fee Related KR100719153B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US57153404P 2004-05-17 2004-05-17
US60/571,534 2004-05-17
US60/876,760 2004-06-28
US10/876,760 US7072021B2 (en) 2004-05-17 2004-06-28 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20060047923A KR20060047923A (ko) 2006-05-18
KR100719153B1 true KR100719153B1 (ko) 2007-05-17

Family

ID=34938280

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050040434A Expired - Fee Related KR100719153B1 (ko) 2004-05-17 2005-05-16 리소그래피 장치 및 디바이스 제조방법

Country Status (6)

Country Link
US (2) US7072021B2 (enExample)
EP (1) EP1600818A1 (enExample)
JP (1) JP4332137B2 (enExample)
KR (1) KR100719153B1 (enExample)
SG (1) SG117570A1 (enExample)
TW (1) TWI305295B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7148951B2 (en) 2004-10-25 2006-12-12 Asml Netherlands B.V. Lithographic apparatus
JP3977377B2 (ja) * 2005-03-04 2007-09-19 キヤノン株式会社 露光装置およびデバイス製造方法
JP2006245400A (ja) * 2005-03-04 2006-09-14 Canon Inc 光学装置およびデバイス製造方法。
US7728951B2 (en) 2005-09-29 2010-06-01 Asml Netherlands B.V. Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus
US7420299B2 (en) * 2006-08-25 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008147577A (ja) * 2006-12-13 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
JP6660179B2 (ja) * 2015-12-28 2020-03-11 キヤノン株式会社 露光装置、および物品の製造方法
JP6742870B2 (ja) * 2016-09-16 2020-08-19 キヤノン株式会社 露光装置、及び物品製造方法
JP7033168B2 (ja) * 2020-06-30 2022-03-09 キヤノン株式会社 露光装置、および物品の製造方法
JP7512131B2 (ja) * 2020-08-27 2024-07-08 キヤノン株式会社 露光装置、及び物品の製造方法
JP7766542B2 (ja) 2022-03-30 2025-11-10 キヤノン株式会社 露光装置、露光装置の調整方法、および物品製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0122957A2 (de) * 1983-03-09 1984-10-31 Metalegno Stabilimento Lattenrost mit drehbar gelagerten Federleisten
US20020191163A1 (en) * 2001-06-15 2002-12-19 Canon Kabushiki Kaisha Exposure apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001006548A1 (en) * 1999-07-16 2001-01-25 Nikon Corporation Exposure method and system
JP2001358056A (ja) 2000-06-15 2001-12-26 Canon Inc 露光装置
WO2002054460A1 (fr) 2000-12-27 2002-07-11 Nikon Corporation Dispositif d'exposition
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
CN1650401B (zh) * 2002-04-09 2010-04-21 株式会社尼康 曝光方法与曝光装置、以及器件的制造方法
DE10239344A1 (de) * 2002-08-28 2004-03-11 Carl Zeiss Smt Ag Vorrichtung zum Abdichten einer Projektionsbelichtungsanlage
SG115613A1 (en) * 2003-02-12 2005-10-28 Asml Netherlands Bv Lithographic apparatus comprising a gas flushing system
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
DE102004018659A1 (de) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Abschlussmodul für eine optische Anordnung
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0122957A2 (de) * 1983-03-09 1984-10-31 Metalegno Stabilimento Lattenrost mit drehbar gelagerten Federleisten
US20020191163A1 (en) * 2001-06-15 2002-12-19 Canon Kabushiki Kaisha Exposure apparatus

Also Published As

Publication number Publication date
JP2005333152A (ja) 2005-12-02
US7072021B2 (en) 2006-07-04
US7271873B2 (en) 2007-09-18
KR20060047923A (ko) 2006-05-18
SG117570A1 (en) 2005-12-29
JP4332137B2 (ja) 2009-09-16
US20050254025A1 (en) 2005-11-17
TW200600979A (en) 2006-01-01
US20060232754A1 (en) 2006-10-19
TWI305295B (en) 2009-01-11
EP1600818A1 (en) 2005-11-30

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