JP4332137B2 - リソグラフ装置及びデバイス製造方法 - Google Patents

リソグラフ装置及びデバイス製造方法 Download PDF

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Publication number
JP4332137B2
JP4332137B2 JP2005172914A JP2005172914A JP4332137B2 JP 4332137 B2 JP4332137 B2 JP 4332137B2 JP 2005172914 A JP2005172914 A JP 2005172914A JP 2005172914 A JP2005172914 A JP 2005172914A JP 4332137 B2 JP4332137 B2 JP 4332137B2
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JP
Japan
Prior art keywords
gas flow
projection system
lithographic apparatus
flow
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005172914A
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English (en)
Japanese (ja)
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JP2005333152A (ja
JP2005333152A5 (enExample
Inventor
アルバン ラルレマント ニコラス
コーネリス マリア フェルハーゲン マルティヌス
ベッカーズ マルセル
シュトゥルタインス ロナルド
アントニウス スミッツ パスカル
フランシスクス ゲラルデュス マリア ヘルトグ ヴラディミール
テオドルス ウィリー ファン デル プラス デビッド
コエリンク ステファン
クルーズ ヘンク
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2005333152A publication Critical patent/JP2005333152A/ja
Publication of JP2005333152A5 publication Critical patent/JP2005333152A5/ja
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Publication of JP4332137B2 publication Critical patent/JP4332137B2/ja
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005172914A 2004-05-17 2005-05-17 リソグラフ装置及びデバイス製造方法 Expired - Fee Related JP4332137B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57153404P 2004-05-17 2004-05-17
US10/876,760 US7072021B2 (en) 2004-05-17 2004-06-28 Lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2005333152A JP2005333152A (ja) 2005-12-02
JP2005333152A5 JP2005333152A5 (enExample) 2007-06-21
JP4332137B2 true JP4332137B2 (ja) 2009-09-16

Family

ID=34938280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005172914A Expired - Fee Related JP4332137B2 (ja) 2004-05-17 2005-05-17 リソグラフ装置及びデバイス製造方法

Country Status (6)

Country Link
US (2) US7072021B2 (enExample)
EP (1) EP1600818A1 (enExample)
JP (1) JP4332137B2 (enExample)
KR (1) KR100719153B1 (enExample)
SG (1) SG117570A1 (enExample)
TW (1) TWI305295B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7148951B2 (en) 2004-10-25 2006-12-12 Asml Netherlands B.V. Lithographic apparatus
JP3977377B2 (ja) * 2005-03-04 2007-09-19 キヤノン株式会社 露光装置およびデバイス製造方法
JP2006245400A (ja) * 2005-03-04 2006-09-14 Canon Inc 光学装置およびデバイス製造方法。
US7728951B2 (en) 2005-09-29 2010-06-01 Asml Netherlands B.V. Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus
US7420299B2 (en) * 2006-08-25 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008147577A (ja) * 2006-12-13 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
JP6660179B2 (ja) * 2015-12-28 2020-03-11 キヤノン株式会社 露光装置、および物品の製造方法
JP6742870B2 (ja) * 2016-09-16 2020-08-19 キヤノン株式会社 露光装置、及び物品製造方法
JP7033168B2 (ja) * 2020-06-30 2022-03-09 キヤノン株式会社 露光装置、および物品の製造方法
JP7512131B2 (ja) * 2020-08-27 2024-07-08 キヤノン株式会社 露光装置、及び物品の製造方法
JP7766542B2 (ja) 2022-03-30 2025-11-10 キヤノン株式会社 露光装置、露光装置の調整方法、および物品製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3308292A1 (de) * 1983-03-09 1984-09-13 Metalegno Stabilimento, Vaduz Lattenrost mit drehbar gelagerten federleisten
WO2001006548A1 (en) * 1999-07-16 2001-01-25 Nikon Corporation Exposure method and system
JP2001358056A (ja) 2000-06-15 2001-12-26 Canon Inc 露光装置
WO2002054460A1 (fr) 2000-12-27 2002-07-11 Nikon Corporation Dispositif d'exposition
JP2002373852A (ja) 2001-06-15 2002-12-26 Canon Inc 露光装置
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
CN1650401B (zh) * 2002-04-09 2010-04-21 株式会社尼康 曝光方法与曝光装置、以及器件的制造方法
DE10239344A1 (de) * 2002-08-28 2004-03-11 Carl Zeiss Smt Ag Vorrichtung zum Abdichten einer Projektionsbelichtungsanlage
SG115613A1 (en) * 2003-02-12 2005-10-28 Asml Netherlands Bv Lithographic apparatus comprising a gas flushing system
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
DE102004018659A1 (de) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Abschlussmodul für eine optische Anordnung
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP2005333152A (ja) 2005-12-02
US7072021B2 (en) 2006-07-04
US7271873B2 (en) 2007-09-18
KR20060047923A (ko) 2006-05-18
SG117570A1 (en) 2005-12-29
KR100719153B1 (ko) 2007-05-17
US20050254025A1 (en) 2005-11-17
TW200600979A (en) 2006-01-01
US20060232754A1 (en) 2006-10-19
TWI305295B (en) 2009-01-11
EP1600818A1 (en) 2005-11-30

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