KR100661977B1 - 중온 화학증착 방법 - Google Patents

중온 화학증착 방법 Download PDF

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Publication number
KR100661977B1
KR100661977B1 KR1020017011047A KR20017011047A KR100661977B1 KR 100661977 B1 KR100661977 B1 KR 100661977B1 KR 1020017011047 A KR1020017011047 A KR 1020017011047A KR 20017011047 A KR20017011047 A KR 20017011047A KR 100661977 B1 KR100661977 B1 KR 100661977B1
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South Korea
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coating
deposition process
substrate
process gas
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Expired - Fee Related
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KR1020017011047A
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English (en)
Korean (ko)
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KR20010105364A (ko
Inventor
케니쓰 이. 언더코퍼
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켄나메탈 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Glass Compositions (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)
KR1020017011047A 1999-03-02 2000-02-24 중온 화학증착 방법 Expired - Fee Related KR100661977B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/261,001 1999-03-02
US09/261,001 US6146697A (en) 1999-03-02 1999-03-02 MT CVD process

Publications (2)

Publication Number Publication Date
KR20010105364A KR20010105364A (ko) 2001-11-28
KR100661977B1 true KR100661977B1 (ko) 2006-12-27

Family

ID=22991551

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017011047A Expired - Fee Related KR100661977B1 (ko) 1999-03-02 2000-02-24 중온 화학증착 방법

Country Status (11)

Country Link
US (1) US6146697A (https=)
EP (1) EP1157143B1 (https=)
JP (2) JP4728486B2 (https=)
KR (1) KR100661977B1 (https=)
CN (1) CN1342216A (https=)
AT (1) ATE227358T1 (https=)
CA (1) CA2360713A1 (https=)
DE (2) DE60000725T2 (https=)
ES (1) ES2184704T3 (https=)
IL (1) IL144500A0 (https=)
WO (1) WO2000052224A1 (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process
US6352014B1 (en) * 1999-12-15 2002-03-05 International Business Machines Corporation Method for making punches using multi-layer ceramic technology
US6533910B2 (en) * 2000-12-29 2003-03-18 Lam Research Corporation Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
JP2002289616A (ja) * 2001-03-28 2002-10-04 Mitsubishi Heavy Ind Ltd 成膜方法及び成膜装置
DE10122329B4 (de) * 2001-05-08 2004-06-03 Tinox Gmbh Wärmetauscher-Vorrichtung mit einer oberflächenbeschichteten Wand, die Medium 1 von Medium 2 trennt
KR20030052468A (ko) * 2001-12-21 2003-06-27 한국야금 주식회사 내마모성 공구용 박막 및 이를 이용하는 피복부재
AT503050B1 (de) * 2005-11-17 2007-09-15 Boehlerit Gmbh & Co Kg Metallcarbonitridschicht
PT1948842E (pt) * 2005-11-17 2011-10-11 Boehlerit Gmbh & Co Kg Camada de carbonitreto de titânio e processo de produção de uma camada de carbonitreto de titânio
KR100791112B1 (ko) * 2005-12-23 2008-01-04 한국야금 주식회사 절삭공구용 고경도 ｃｖｄ 다원소 복합막
JP4753249B2 (ja) * 2006-01-13 2011-08-24 株式会社神戸製鋼所 ガラス成形用金型
ES2426582T5 (es) * 2006-09-05 2016-11-22 Tungaloy Corporation Herramienta de corte recubierta y método para producirla
US8734070B2 (en) 2010-10-20 2014-05-27 Kennametal Inc. Toolholder with externally-mounted dynamic absorber
US8524360B2 (en) 2011-08-29 2013-09-03 Kennametal Inc. Cutting insert with a titanium oxycarbonitride coating and method for making the same
JP6022228B2 (ja) 2011-09-14 2016-11-09 株式会社日立国際電気 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム
AT13091U1 (de) 2012-02-27 2013-06-15 Ceratizit Austria Gmbh Verfahren zur Herstellung einer Hartstoffschicht auf einem Substrat, Hartstoffschicht sowie Zerspanwerkzeug
KR101456685B1 (ko) 2013-03-08 2014-11-12 부산대학교 산학협력단 금속 부품의 고경도 표면코팅 방법
US11939670B2 (en) 2018-09-28 2024-03-26 Corning Incorporated Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same
US11464102B2 (en) * 2018-10-06 2022-10-04 Fermi Research Alliance, Llc Methods and systems for treatment of superconducting materials to improve low field performance
EP3976849B1 (en) * 2019-05-27 2023-03-08 AB Sandvik Coromant A coated cutting tool
JP7425990B2 (ja) * 2020-03-19 2024-02-01 三菱マテリアル株式会社 表面被覆切削工具の製造方法
CN117660924A (zh) * 2022-08-31 2024-03-08 中国石油天然气集团有限公司 一种TiCN梯度结构阻氢涂层及其制备方法
CN116162918B (zh) * 2023-04-26 2023-07-14 赣州澳克泰工具技术有限公司 一种高硬度高韧性的刀具涂层及制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846162A (en) * 1968-10-21 1974-11-05 Texas Instruments Inc Metal carbonitride coatings
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
JP3109272B2 (ja) * 1992-08-04 2000-11-13 三菱マテリアル株式会社 耐欠損性および耐摩耗性にすぐれた表面被覆炭窒化チタン基サーメット製切削工具
US5436071A (en) * 1990-01-31 1995-07-25 Mitsubishi Materials Corporation Cermet cutting tool and process for producing the same
JP2585470B2 (ja) * 1991-01-14 1997-02-26 日本碍子株式会社 ハニカム構造体押出用口金の製造方法
DE4239234A1 (de) * 1992-11-21 1994-06-09 Krupp Widia Gmbh Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers
US5681651A (en) * 1992-11-27 1997-10-28 Mitsubishi Materials Corporation Multilayer coated hard alloy cutting tool
SE514737C2 (sv) * 1994-03-22 2001-04-09 Sandvik Ab Belagt skärverktyg av hårdmetall
US5652045A (en) * 1994-10-20 1997-07-29 Mitsubishi Materials Corporation Coated tungsten carbide-based cemented carbide blade member
US5786069A (en) * 1995-09-01 1998-07-28 Sandvik Ab Coated turning insert
JPH09310179A (ja) * 1996-05-20 1997-12-02 Mitsubishi Materials Corp 減圧式縦型化学蒸着装置および化学蒸着方法
SE510778C2 (sv) * 1996-07-11 1999-06-21 Sandvik Ab Belagt skär för finfräsning av grått gjutjärn
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process

Also Published As

Publication number Publication date
JP2002538308A (ja) 2002-11-12
DE60000725T2 (de) 2003-08-21
WO2000052224A1 (en) 2000-09-08
ES2184704T3 (es) 2003-04-16
ATE227358T1 (de) 2002-11-15
DE60000725D1 (de) 2002-12-12
JP4728486B2 (ja) 2011-07-20
EP1157143B1 (en) 2002-11-06
IL144500A0 (en) 2002-05-23
CA2360713A1 (en) 2000-09-08
KR20010105364A (ko) 2001-11-28
JP2011137238A (ja) 2011-07-14
DE1157143T1 (de) 2002-07-04
CN1342216A (zh) 2002-03-27
EP1157143A1 (en) 2001-11-28
US6146697A (en) 2000-11-14

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