KR100651258B1 - Multi-nozzle Crucible Apparatus for Organic Thin Film Deposition Process - Google Patents

Multi-nozzle Crucible Apparatus for Organic Thin Film Deposition Process Download PDF

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KR100651258B1
KR100651258B1 KR1020040080960A KR20040080960A KR100651258B1 KR 100651258 B1 KR100651258 B1 KR 100651258B1 KR 1020040080960 A KR1020040080960 A KR 1020040080960A KR 20040080960 A KR20040080960 A KR 20040080960A KR 100651258 B1 KR100651258 B1 KR 100651258B1
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crucible
thin film
nozzle
organic
substrate
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KR20060031965A (en
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황창훈
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두산디앤디 주식회사
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Priority to PCT/KR2005/000249 priority patent/WO2006041239A1/en
Priority to JP2007535591A priority patent/JP4545797B2/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

본 발명은 유기 박막 소자의 증착 공정용 증발소스 내에서 사용되는 도가니 장치에 관한 것으로서 특히, 도가니를 가열하여 도가니 내에 담긴 유기 물질을 증발하여 대면적의 기판에 증착시켜 유기 박막을 제작함에 있어서, 증발되는 유기 물질을 기판에 균일하게 증착시키기 위하여, 유기 증발 물질의 증발 방향과 증발 양을 제어하는 멀티 노즐부(40)와, 상측이 개구된 원통형 도가니(50)가 결합되어 구성되어, 특히 대면적 기판의 유기박막 제작 시에 기판에 증착되는 유기물 박막의 두께의 균일성을 더욱 향상시키고, 유기물질의 사용율을 높이기 위한 것이다. The present invention relates to a crucible apparatus used in an evaporation source for an evaporation process of an organic thin film device. In particular, in the manufacture of an organic thin film by heating a crucible and evaporating organic substances contained in the crucible to a large-area substrate, evaporation is performed. In order to uniformly deposit the organic material on the substrate, the multi-nozzle part 40 for controlling the evaporation direction and the amount of evaporation of the organic evaporation material and the cylindrical crucible 50 having the upper side are combined and constituted, in particular, a large area. In order to further improve the uniformity of the thickness of the organic material thin film deposited on the substrate during fabrication of the organic thin film of the substrate, and to increase the use rate of the organic material.

멀티 노즐, 도가니, 유기 박막Multi nozzle, crucible, organic thin film

Description

유기 박막 증착 공정용 멀티 노즐 도가니 장치{Multi-nozzle crucible assembly for OLED deposition process}Multi-nozzle crucible assembly for OLED deposition process

도 1은 종래의 유기 박막 증착 공정용 도가니의 사용예을 나타내는 개략도, 1 is a schematic view showing an example of use of a crucible for a conventional organic thin film deposition process,

도 2는 종래의 유기 박막 증착 공정용 도가니의 다른 사용예를 나타내는 개략도, 2 is a schematic view showing another example of use of a crucible for a conventional organic thin film deposition process;

도 3a는 본 발명의 유기 박막 증착 공정용 멀티 노즐부의 평면 구조를 나타내는 개략도, 3A is a schematic view showing a planar structure of a multi-nozzle portion for an organic thin film deposition process of the present invention;

도 3b는 본 발명의 유기 박막 증착 공정용 멀티 노즐부의 정면 구조를 나타내는 개략도, 3B is a schematic view showing a front structure of a multi-nozzle portion for an organic thin film deposition process of the present invention;

도 4는 본 발명의 유기 박막 증착 공정용 원통형 도가니의 정면 구조를 나타내는 개략도, 4 is a schematic view showing a front structure of a cylindrical crucible for an organic thin film deposition process of the present invention;

도 5는 본 발명의 유기 박막 증착 공정용 멀티 노즐 도가니의 입체 구조를 나타내는 개략도,5 is a schematic view showing a three-dimensional structure of the multi-nozzle crucible for the organic thin film deposition process of the present invention,

도 6은 본 발명의 유기 박막 증착 공정용 멀티 노즐 도가니에 사용되는 노즐 마개의 개략도, 6 is a schematic view of a nozzle stopper used in a multi-nozzle crucible for an organic thin film deposition process of the present invention;

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for main parts of the drawings>

10: 도가니 11: 도가니 A10: crucible 11: crucible A

12: 도가니 B 20: 기판12: crucible B 20: substrate

30: 기판 회전 장치 40: 멀티 노즐부 30: substrate rotating apparatus 40: multi nozzle unit

41: 원통형 노즐 42: 열면적 홈41: cylindrical nozzle 42: opening area groove

50: 원통형 도가니 51: 온도 측정선 고정 홈50: cylindrical crucible 51: temperature measuring line fixing groove

52: 도가니 내부 돌출부 60: 노즐 마개52: crucible inner protrusion 60: nozzle stopper

본 발명은 유기EL 소자의 유기 박막의 제작에 있어서, 박막의 증착 공정용 증발소스 내부에 설치되는 도가니 장치에 관한 것으로서, 증착 공정을 위해 증발원 내의 도가니를 가열하고, 도가니에 담긴 유기 물질을 증발하여 대면적 기판에 증착 시킴에 있어서, 증발되는 물질이 기판에 균일하게 증착 되도록 하기 위한 것이다.The present invention relates to a crucible apparatus installed in an evaporation source for the deposition process of a thin film in the manufacture of an organic thin film of an organic EL device, and to heating a crucible in an evaporation source for evaporation process and evaporating the organic material contained in the crucible. In depositing on a large area substrate, the vaporizing material is to be uniformly deposited on the substrate.

유기EL 디스플레이 소자의 유기 박막 제작에 주로 사용되고 있는 방법은 고진공 증착 방법으로서, 유기 화학 물질을 대면적의 기판에 증착 코팅하기 위하여, 유기 화학 물질이 들어있는 도가니 주위를 가열하여 유기물질을 증발시켜 도가니의 상부에 위치한 글라스 기판에 증착되게 하여 글라스 위에 얇은 박막을 제작하는 방법이며, 이때 유기물의 오염을 방지하고, 소자의 수명을 장기화하기 위함은 물론, 적당한 증착율의 조절을 위하여 주로 고진공 분위기의 진공 용기 내에서 공정을 하게 된다. The method commonly used in the manufacture of organic thin films of organic EL display devices is a high vacuum deposition method. In order to deposit and coat organic chemicals on a large-area substrate, the organic material is evaporated by heating around a crucible containing organic chemicals. It is a method of manufacturing a thin film on the glass by being deposited on the glass substrate located in the upper portion of the glass, at this time, to prevent contamination of organic matter, to prolong the life of the device, as well as to control the appropriate deposition rate of the vacuum vessel mainly in a high vacuum atmosphere You will be fair within.

도 1에는 주로 사용되는 포인트 소스(point source) 또는 점 증발원을 사용 하는 경우의 증착 방법을 개략적으로 나타내고 있으며, 주로 파우더의 형태인 유기 물질을 담는 포인트 소스용 도가니(10)가 진공 챔버 내 하부에 위를 보고 위치하고, 상측에 밑을 향하여 놓인 기판(20)이 설치된다. 가열된 도가니로부터 증발되어 나오는 유기 기체는 기판까지 비행하여 기판위에 응고되면서 박막이 형성되는 것이다. 이러한 포인트 소스의 도가니는 손쉽게 제작하여 사용할 수 있기 때문에 연구용으로 널리 사용되어 왔지만, 대면적의 유기 박막 기판의 양산 제작 시에는 기판(20) 중앙에는 유기 기체가 많이 날라가 증착되고, 기판의 가장자리부분은 유기물질이 적게 날라가 증착되므로, 가운데가 볼록한 유기 박막이 형성되어, 유기 박막의 균일도가 매우 좋지 않은 것(15% 이상)으로 알려져 있다. FIG. 1 schematically shows a deposition method in the case of using a point source or a point evaporation source, which is mainly used, and a crucible 10 for a point source containing an organic material mainly in the form of a powder is provided at the bottom of the vacuum chamber. It is located looking upwards, and the substrate 20 placed downwards is installed on the upper side. The organic gas evaporated from the heated crucible flows to the substrate and solidifies on the substrate to form a thin film. The crucible of the point source has been widely used for research because it can be easily manufactured and used, but during mass production of a large-area organic thin film substrate, a large amount of organic gas is blown to the center of the substrate 20, and the edge portion of the substrate is deposited. It is known that the organic thin film is convex in the middle because less silver organic material is deposited and the uniformity of the organic thin film is not very good (15% or more).

상기 문제점을 개선하기 위해, 도 2에 도시한 바와 같이, 기판(20)을 기판 회전 장치(30)에 올려놓아, 기판의 회전이 가능하도록 하고, 도가니(A)(11)를 가진 포인트 소스를 기판의 중심축으로부터 일정거리를 가지는 오프셋 거리(X) 만큼 떨어트려 증착공정을 수행한다. 이때, 유기 박막의 균일도를 가지도록 도가니부터 기판까지의 거리를 일정의 증착 높이(Y)를 유지하도록 하기도 한다. 더욱 좋은 박막의 균일도(5% 이하)를 얻기 위하여, 또 다른 도가니(B)(12)를 가지는 포인트소스를 설치하여 기판의 중심위치로부터 일정거리를 떨어트려 또는 증착높이를 더욱 멀리 떨어뜨려 설치하고, 대면적의 기판을 회전하여 유기 박막의 균일도를 향상시키고 있으나, 이때 도가니들이 중심축과 기판으로 부터 너무 멀리 떨어져 있어, 유기물질의 사용률의 저하와 고진공 챔버의 크기가 매우 커지는 등의 문제점을 가지고 있다. In order to remedy the above problem, as shown in FIG. 2, the substrate 20 is placed on the substrate rotating apparatus 30 so that the substrate can be rotated, and a point source having a crucible (A) 11 is provided. The deposition process is performed by dropping the offset distance X having a predetermined distance from the central axis of the substrate. In this case, the distance from the crucible to the substrate may be maintained at a constant deposition height Y to have a uniformity of the organic thin film. In order to obtain better uniformity (5% or less) of the thin film, install a point source with another crucible (B) (12) away from the center position of the substrate, or away from the deposition height. In this case, the uniformity of the organic thin film is improved by rotating the large-area substrate. However, the crucibles are too far from the central axis and the substrate, so that the utilization rate of the organic material and the size of the high vacuum chamber are very large. have.

본 발명은 상기의 문제점을 해소하기 위한 것으로, 유기 박막의 증착 공정에 있어서, 증발원에 사용되는 멀티 노즐 도가니 장치로서, 특히 대면적 기판의 유기 박막 제작 시에 기판에 증착되는 유기 박막의 두께의 균일도를 향상시키고, 유기 물질의 사용율을 높이기 위한 유기 박막 증착 공정용 도가니의 구조를 제공하고자 한다. The present invention is to solve the above problems, the multi-nozzle crucible apparatus used in the evaporation source in the deposition process of the organic thin film, in particular, the uniformity of the thickness of the organic thin film deposited on the substrate during the production of the organic thin film of a large area substrate To improve the, and to provide a structure of the crucible for the organic thin film deposition process to increase the use rate of the organic material.

이러한 본 발명은 유기 기체의 증발방향을 결정하는 원뿔형의 노즐들이 균일하게 분포된 멀티 노즐부(40)와, 상측이 개구된 원통으로서, 유기 파우더를 담을 수 있는 용기인 도가니(50)로 형성되고, 멀티 노즐부와 도가니에 전달된 열이 도가니 내부의 유기 파우더에 전달되어 유기물이 증발되도록 하기 위한 발명인 것이다. The present invention is formed of a multi-nozzle portion 40 in which the cone-shaped nozzles for determining the evaporation direction of the organic gas is uniformly distributed, and a crucible 50, which is a container in which organic powder is contained, as a cylinder having an open upper side. , The invention is for the heat to be transferred to the multi-nozzle portion and the crucible is transferred to the organic powder inside the crucible to evaporate the organic matter.

본 발명의 실시예를 첨부 도면을 참고하여 상세히 설명하면 다음과 같다. An embodiment of the present invention will be described in detail with reference to the accompanying drawings.

도 3은 본 발명의 유기 박막 증착 공정용 멀티 노즐 도가니 장치의 멀티 노즐부(40) 나타내는 단면도이고, 도 4는 원통형 도가니의 단면도이고, 도 5는 본 발명의 멀티노즐 도가니의 실시예를 나타내는 개략도로서, 본 발명은, 다수개의 작은 원통형의 노즐(41)들을 가지며 하측이 개구된 원통형의 멀티 노즐부(40)와, 상측이 개구되고 하나의 큰 원통형으로 형성되어 상기 멀티 노즐부가 결합되도록 하는 도가니(50)로 구성되는 것을 기술상의 특징으로 한다.3 is a cross-sectional view showing a multi-nozzle portion 40 of a multi-nozzle crucible apparatus for an organic thin film deposition process of the present invention, FIG. 4 is a cross-sectional view of a cylindrical crucible, and FIG. 5 is a schematic view showing an embodiment of a multi-nozzle crucible of the present invention. As the present invention, there is provided a cylindrical multi-nozzle portion 40 having a plurality of small cylindrical nozzles 41 having a lower side, and a crucible having an upper side opened and formed in one large cylindrical shape so that the multi-nozzle portion is coupled. It consists of technical features that consist of 50.

도 3(a)는 멀티 노즐부의(40) 평면도로서, 다수개의 원통형의 노즐들이 원통 형의 모서리를 따라 균일하게 형성되고, 노즐들 사이에 열면적 홈(42)을 내어 주위의 열선으로 부터 보다 많은 열을 흡수할 수 있도록 단면적을 가급적 많이 확보하도록 한다. 즉, 멀티 노즐부가 도가니보다 높은 온도를 유지하도록 하여, 유기 기체가 노즐을 통하여 분출될 시, 노즐의 벽에 응고되어, 노즐이 막히는 현상을 방지하도록 하는 것이다. 일반적으로 유기물은 자신의 증발 온도보다 낮은 분위기에서는 응고되는 현상이 있다.FIG. 3 (a) is a plan view of the multi-nozzle portion 40, in which a plurality of cylindrical nozzles are formed uniformly along the cylindrical edges, and a hot area groove 42 is formed between the nozzles to see from the surrounding heating wire. Try to secure as much cross-sectional area as possible to absorb as much heat. That is, the multi-nozzle portion is to maintain a higher temperature than the crucible, so that when the organic gas is ejected through the nozzle, it is solidified on the wall of the nozzle, preventing the nozzle from clogging. In general, organic matter is coagulated in an atmosphere lower than its evaporation temperature.

도 3(b)는 멀티 노즐부(40)의 측면을 나타내는 단면도로서, 상기에 언급된 열면적 홈(42)들이 멀티노즐부의 외부 측면에 파여진 형상을 나타내 준다. 멀티노즐부의 한부는 개구되어 있어, 원통형의 도가니의 상부와 결합하도록 한다.FIG. 3B is a cross-sectional view showing the side surface of the multi-nozzle portion 40, and shows the shape of the above-described heat-area grooves 42 excavated on the outer side of the multi-nozzle portion. One portion of the multinozzle portion is open to engage the top of the cylindrical crucible.

도 4는 원통형 도가니(50)의 측면도로서, 도가니는 유기 분말 물질을 담을 수 있도록 상부가 개구된 원통형의 구조로서, 도가니의 하부 바닥에는, 도가니의 중앙을 향하여 원통형의 온도 측정선 고정 홈(51)을 가지도록 하여, 도가니를 가열 시 온도 측정선을 홈으로 밀어넣어 도가니 바닥에 닿게 함으로써 도가니 표면의 온도를 측정하고, 온도신호를 열 제어기에 보내어 도가니에 공급하는 열의 양을 제어하도록 한다. 또한, 상기 원통형 도가니(50)의 내부에는, 상부 중앙을 향하여 원통형의 돌출부(52)를 가지도록 하여 돌출부로부터 내부에 담긴 유기 파우더 내부에 골고루 열이 전달되도록 하여 유기 파우더의 균일한 증발을 하도록 한다. FIG. 4 is a side view of the cylindrical crucible 50. The crucible is a cylindrical structure having an open top to contain an organic powder material. The bottom of the crucible has a cylindrical temperature measuring line fixing groove 51 toward the center of the crucible. When the crucible is heated, the temperature measuring line is pushed into the groove to reach the bottom of the crucible to measure the temperature of the crucible surface and send a temperature signal to the thermal controller to control the amount of heat supplied to the crucible. In addition, in the interior of the cylindrical crucible 50, to have a cylindrical protrusion 52 toward the upper center to allow even heat transfer evenly from the protrusion to the inside of the organic powder contained therein to uniform evaporation of the organic powder. .

도 5에는 상기 멀티노즐부의 하부(40)와 원통형 도가니의 상부(50)가 결합된 상태를 나타내는 실시도로서, 원통형 도가니와 멀티 노즐부 사이는 증발되는 유기물질이 새어 나오는 것을 방지하기 위해, 걸림턱이나 나사산을 이용하여 돌려서 잠그도록 하면 연결부위를 밀폐시킬 수 있다. 5 is a view showing a state in which the lower portion 40 of the multi-nozzle portion and the upper portion 50 of the cylindrical crucible are coupled to each other. Between the cylindrical crucible and the multi-nozzle portion, the organic material is evaporated to prevent leakage. Tightening with a jaw or screw thread can be used to seal the connection.

상기 멀티 노즐부(40)에 구성된 다수 개의 노즐(41)들은 내부와 통하도록 형성되어, 각 노즐의 중심축과 상기 멀티 노즐부 중심축사이의 각도가 0°에서 90°이내에서 사선의 방향을 가지고 형성되도록 함으로써, 각도와 노즐의 크기를 다르게 하여, 노즐로부터 분출되는 유기물 기체의 방향등을 제어하도록 하여, 대면적 유기박막의 두께의 균일도를 향상시킬 수 있다. 이때, 노즐들의크기는 길이 방향으로 증가하는 폭을 가지도록 하는 것이 바람직하다. The plurality of nozzles 41 formed in the multi-nozzle portion 40 are formed to communicate with the inside, and the angle between the central axis of each nozzle and the central axis of the multi-nozzle portion has a diagonal direction within 0 ° to 90 °. By forming it, the angle and the size of the nozzle can be changed to control the direction and the like of the organic gas ejected from the nozzle, thereby improving the uniformity of the thickness of the large-area organic thin film. At this time, the size of the nozzles is preferably to have a width increasing in the longitudinal direction.

이하, 상기 멀티 노즐부(40)를 이용하여 유기 박막의 증착되는 두께의 균일도를 확보할 수 있는 동작원리를 설명하면 다음과 같다. Hereinafter, the operation principle of ensuring the uniformity of the thickness of the organic thin film deposited using the multi-nozzle unit 40 will be described.

일반적인 포인트 소스의 도가니의 경우를 살펴보면, 증발물질이 한 점과 같은 개구부를 통하여 증발하여 도가니의 개구 방향을 중심으로 방사형으로 퍼져나가는 원리를 가진다. 이때, 개구의 외부를 향하는 중심선 방향으로 사선방향보다 훨씬 많은 증발물질이 퍼져나가므로 실제 증착이 이루어지는 유리 기판의 중앙에서 바깥부분으로 갈수록, 증발원과의 거리가 멀어지며, 증발물질의 퍼짐 방향과 기판 면과의 각도가 커지기 때문에, 기판중앙에서의 증착박막의 두께가 바깥부분보다 두꺼워져서 기판전체의 증착 박막 두께의 균일도를 얻기가 어렵다. 이 경우 박막두께를 균일하게 얻기 위하여 기판을 회전하거나, 포인트 소스의 위치를 눕혀서 사용하기도 하지만, 물질의 사용효율이 현저히 낮아진다. Referring to the case of a crucible of a general point source, the evaporation material evaporates through the same opening and spreads radially around the opening direction of the crucible. At this time, since much more evaporated material spreads in the direction of the center line toward the outside of the opening than the oblique direction, the distance from the evaporation source is farther away from the center of the glass substrate on which the actual deposition is performed, and the evaporation material spreads from the substrate. Since the angle with the surface becomes large, the thickness of the deposited thin film in the center of the substrate becomes thicker than the outer portion, making it difficult to obtain uniformity of the deposited thin film thickness of the entire substrate. In this case, the substrate may be rotated or the point source may be laid down to obtain a thin film thickness, but the use efficiency of the material may be significantly lowered.

도 3에 도시한, 본 발명에 따른 멀티 노즐 도가니 장치를 사용하는 증발소스의 경우, 멀티 노즐부(40)의 노즐(41)들이, 기판의 바깥부분을 향하도록 원통형이나 원뿔의 형태로 제작하면, 노즐의 각도와 크기에 따라 유기 증발 물질의 증발 방향과 양을 조절하는 효과가 생기므로, 기판의 바깥부분에는 더욱 많은 증발물질이 방사형으로 증발되어 증착 되고, 증발 물질의 퍼지는 방향과 기판과의 각도에 의한 영향은 기판의 중앙부분을 적당히 두껍게 제어하는 효과를 가지게 하기 때문에, 점 증발원용 도가니를 사용 할 때와 같이, 기판을 회전하지 않고도 대면적 기판에 전체적으로 균일한 증착 박막의 두께를 얻을 수 있다. In the case of the evaporation source using the multi-nozzle crucible apparatus shown in FIG. 3, when the nozzles 41 of the multi-nozzle portion 40 are manufactured in the form of a cylinder or a cone to face the outer portion of the substrate, In addition, since the evaporation direction and amount of organic evaporation material are controlled according to the angle and size of the nozzle, more evaporation material is evaporated and deposited radially on the outer part of the substrate. The influence of the angle has the effect of moderately thickening the central portion of the substrate, so that the thickness of the deposited film can be uniformly deposited on the large-area substrate without rotating the substrate as in the case of using a point evaporation crucible. have.

도 6에 도시한 바와 같은 노즐마개(60)를 사용하여 멀티 노즐부(40)의 특정한 노즐을 막음으로서, 분출되는 유기물의 방향과 양을 조절하기도 하여, 특정한 노즐만을 통하여, 유기 기체가 나오도록 함으로써, 도가니와 기판사이의 증착 높이(Y)가 너무 멀지 않고, 도가니의 오프셋거리(X)가 너무 멀지않도록 적당히 조절하면서, 기판 전체의 균일한 박막두께를 얻을 수 있으며, 유기 물질의 사용량을 개선할 수도 있다. By blocking the specific nozzle of the multi-nozzle part 40 using the nozzle stopper 60 as shown in FIG. 6, the direction and the amount of the organic substance ejected may be adjusted, so that the organic gas comes out through only the specific nozzle. As a result, a uniform thin film thickness of the entire substrate can be obtained while appropriately adjusting the deposition height Y between the crucible and the substrate not too far and the offset distance X of the crucible not too far, thereby improving the amount of organic material used. You may.

이상과 같은 본 발명은 유기 박막 증착 공정에 사용되는 증발소스에 사용되는 멀티 노즐 도가니의 장치로서, 멀티 노즐의 각도와 크기 및 숫자들을 조절함으로써, 특히 대면적 유기 박막 기판의 제작 시에 글라스 기판에 증착되는 유기 박막의 두께의 균일성을 향상시키고, 유기물질의 사용율을 더욱 높이고, 증착 높이와 오프셋거리가 너무 멀지 않도록 하기 위한 효과가 있는 발명인 것이다.
The present invention as described above is a device of a multi-nozzle crucible used for the evaporation source used in the organic thin film deposition process, by adjusting the angle, size and number of the multi-nozzle, especially in the production of large area organic thin film substrate The invention is effective to improve the uniformity of the thickness of the organic thin film to be deposited, to further increase the use rate of the organic material, and not to be too far from the deposition height and the offset distance.

Claims (8)

상면 모서리를 따라 원통형 또는 원뿔형 또는 직경이 서로 다른 원뿔형 중 선택되는 어느 하나의 노즐(41)들이 일정하게 관통 형성되고 상기 노즐(41)에 선택적으로 결합되어 분출되는 유기물의 방향과 양을 조절할 수 있도록 노즐 마개(60)가 구비되며 하측이 개구된 원통형의 멀티 노즐부(40)와,Along the top edge, any one of the nozzles 41 selected from a cylindrical or conical shape or a conical shape having different diameters is constantly formed and selectively coupled to the nozzle 41 to adjust the direction and amount of the organic material to be ejected. A cylindrical multi-nozzle portion 40 provided with a nozzle stopper 60 and opened at a lower side thereof, 상측이 개구된 원통형으로 형성되어 상단에 상기 멀티 노즐부(40)가 결합되고 내부 바닥에 상부 중앙을 향하여 형성되는 원통형의 돌출부(52)가 형성되는 도가니(50)로 구성되는 유기 박막 증착 공정용 멀티 노즐 도가니 장치.The organic thin film deposition process comprising a crucible 50 having an upper side formed in a cylindrical shape, the multi-nozzle portion 40 coupled to an upper end, and a cylindrical protrusion 52 formed on an inner bottom toward the upper center. Multi nozzle crucible device. 삭제delete 삭제delete 삭제delete 삭제delete 제 1항에 있어서, 상기 원통형 도가니(50)의 하부 바닥에는, 도가니의 중앙을 향하여 원통형의 온도 측정선 고정 홈(51)을 가지는 것을 특징으로 하는 유기 박막 증착 공정용 멀티 노즐 도가니 장치.The multi-nozzle crucible apparatus for an organic thin film deposition process according to claim 1, wherein the lower bottom of the cylindrical crucible has a cylindrical temperature measuring line fixing groove 51 toward the center of the crucible. 삭제delete 삭제delete
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