KR100647883B1 - 광역 무음 방전 여기 방사기 - Google Patents

광역 무음 방전 여기 방사기 Download PDF

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Publication number
KR100647883B1
KR100647883B1 KR1020007008882A KR20007008882A KR100647883B1 KR 100647883 B1 KR100647883 B1 KR 100647883B1 KR 1020007008882 A KR1020007008882 A KR 1020007008882A KR 20007008882 A KR20007008882 A KR 20007008882A KR 100647883 B1 KR100647883 B1 KR 100647883B1
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KR
South Korea
Prior art keywords
discharge
electrodes
electrode
delete delete
gas
Prior art date
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Expired - Fee Related
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KR1020007008882A
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English (en)
Korean (ko)
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KR20010040954A (ko
Inventor
포기아토지오바니안토니오
벨리코브레오니드브이.
만리쿠에즈랄프에프.
칸아쉬래프알.
Original Assignee
캐논 유.에스.에이. 인코포레이티드
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Publication of KR20010040954A publication Critical patent/KR20010040954A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/067—Main electrodes for low-pressure discharge lamps
    • H01J61/0672—Main electrodes for low-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J61/26—Means for absorbing or adsorbing gas, e.g. by gettering; Means for preventing blackening of the envelope
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/305—Flat vessels or containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H01J61/523—Heating or cooling particular parts of the lamp
    • H01J61/526—Heating or cooling particular parts of the lamp heating or cooling of electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020007008882A 1998-02-12 1999-02-10 광역 무음 방전 여기 방사기 Expired - Fee Related KR100647883B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/022,507 1998-02-12
US09/022,507 US6049086A (en) 1998-02-12 1998-02-12 Large area silent discharge excitation radiator

Publications (2)

Publication Number Publication Date
KR20010040954A KR20010040954A (ko) 2001-05-15
KR100647883B1 true KR100647883B1 (ko) 2006-12-13

Family

ID=21809943

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007008882A Expired - Fee Related KR100647883B1 (ko) 1998-02-12 1999-02-10 광역 무음 방전 여기 방사기

Country Status (6)

Country Link
US (1) US6049086A (enExample)
EP (1) EP1055251A4 (enExample)
JP (1) JP2002503871A (enExample)
KR (1) KR100647883B1 (enExample)
AU (1) AU2762799A (enExample)
WO (1) WO1999041767A1 (enExample)

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US6787787B1 (en) * 1998-01-23 2004-09-07 Ushiodenki Kabushiki Kaisha Ultraviolet radiation producing apparatus
DE19919363A1 (de) * 1999-04-28 2000-11-09 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Entladungslampe mit Abstandshalter
DE19955108A1 (de) * 1999-11-16 2001-05-17 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Entladungslampe mit verbesserter Temperaturhomogenität
DE10005156A1 (de) * 2000-02-07 2001-08-09 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Flache Gasentladungslampe mit Abstandselementen
JP4095758B2 (ja) * 2000-06-29 2008-06-04 株式会社荏原製作所 オゾン発生装置
US20020067130A1 (en) * 2000-12-05 2002-06-06 Zoran Falkenstein Flat-panel, large-area, dielectric barrier discharge-driven V(UV) light source
US6597003B2 (en) * 2001-07-12 2003-07-22 Axcelis Technologies, Inc. Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers
US6646256B2 (en) * 2001-12-18 2003-11-11 Agilent Technologies, Inc. Atmospheric pressure photoionization source in mass spectrometry
US20030157000A1 (en) * 2002-02-15 2003-08-21 Kimberly-Clark Worldwide, Inc. Fluidized bed activated by excimer plasma and materials produced therefrom
KR20030075472A (ko) * 2002-03-19 2003-09-26 현대자동차주식회사 플라즈마 반응기 및 그 제조방법과 플라즈마 반응기가채용된 차량의 배기가스 저감장치
US7380756B1 (en) 2003-11-17 2008-06-03 The United States Of America As Represented By The Secretary Of The Air Force Single dielectric barrier aerodynamic plasma actuation
US20070119828A1 (en) * 2003-12-08 2007-05-31 Ngk Insulators , Ltd. Plasma generating electrode, its manufacturing method, and plasma reactor
FR2864746B1 (fr) * 2003-12-29 2006-05-19 Brandt Ind Electrode pour la generation de plasma de decharge a barriere dielectrique
KR100595052B1 (ko) 2004-04-22 2006-06-30 옥도영 액정디스플레이의 백라이트
US20060006804A1 (en) * 2004-07-06 2006-01-12 Lajos Reich Dielectric barrier discharge lamp
KR100605261B1 (ko) * 2004-08-10 2006-07-28 삼성전자주식회사 면광원유닛 및 이를 가지는 액정표시장치
KR100639876B1 (ko) * 2004-09-21 2006-10-30 미래산업 주식회사 평판형 형광램프의 가스 주입구 구조 및 평판형형광램프의 가스 주입구 성형 방법
JP2006134705A (ja) * 2004-11-05 2006-05-25 Harison Toshiba Lighting Corp 誘電体バリア放電ランプを用いた光照射装置
US20090039757A1 (en) * 2005-04-22 2009-02-12 Hiroyoshi Ohshima Excimer Lamp
FR2889886A1 (fr) * 2005-08-19 2007-02-23 Saint Gobain Lampe uv plane a decharge coplanaire et utilisations
US7495396B2 (en) 2005-12-14 2009-02-24 General Electric Company Dielectric barrier discharge lamp
JP2007234437A (ja) * 2006-03-02 2007-09-13 Trinc:Kk プラズマ放電式除電器
KR100820370B1 (ko) * 2007-05-02 2008-04-08 (주)엠아이에프피디 대향 전극 구조를 갖는 면광원 장치 및 그 제조 방법
WO2009076535A1 (en) * 2007-12-13 2009-06-18 Academia Sinica System and method for performing charge-monitoring mass spectrometry
CN103250470A (zh) * 2010-12-09 2013-08-14 韩国科学技术院 等离子体发生器
DE102011000261A1 (de) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck
US9220162B2 (en) * 2011-03-09 2015-12-22 Samsung Electronics Co., Ltd. Plasma generating apparatus and plasma generating method
KR101241049B1 (ko) 2011-08-01 2013-03-15 주식회사 플라즈마트 플라즈마 발생 장치 및 플라즈마 발생 방법
KR101246191B1 (ko) 2011-10-13 2013-03-21 주식회사 윈텔 플라즈마 장치 및 기판 처리 장치
DE102013103670A1 (de) * 2013-04-11 2014-10-30 Dritte Patentportfolio Beteiligungsgesellschaft Mbh & Co.Kg HF-Lampe mit dielektrischem Wellenleiter
JP6726865B2 (ja) * 2015-06-05 2020-07-22 パナソニックＩｐマネジメント株式会社 プラズマ生成装置
EP3648145B1 (en) * 2018-11-05 2022-01-05 Xylem Europe GmbH Vacuum ultraviolet excimer lamp with an inner axially symmetric wire electrode
DE102019202479B4 (de) * 2019-02-25 2021-12-02 Osram Gmbh Elektrodenanordnung für eine entladungslampe, gasentladungslampe, schutzfolie und verfahren zum bereitstellen einer schutzfolie an einer elektrodenanordnung

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US5049777A (en) * 1989-03-29 1991-09-17 Asea Brown Boveri Limited High-power radiator
US5118989A (en) * 1989-12-11 1992-06-02 Fusion Systems Corporation Surface discharge radiation source

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US5118989A (en) * 1989-12-11 1992-06-02 Fusion Systems Corporation Surface discharge radiation source

Also Published As

Publication number Publication date
KR20010040954A (ko) 2001-05-15
JP2002503871A (ja) 2002-02-05
WO1999041767A1 (en) 1999-08-19
EP1055251A1 (en) 2000-11-29
US6049086A (en) 2000-04-11
AU2762799A (en) 1999-08-30
EP1055251A4 (en) 2005-02-16

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