JP2002503871A - 面積の大きい無音放電励起ラジエータ - Google Patents
面積の大きい無音放電励起ラジエータInfo
- Publication number
- JP2002503871A JP2002503871A JP2000531860A JP2000531860A JP2002503871A JP 2002503871 A JP2002503871 A JP 2002503871A JP 2000531860 A JP2000531860 A JP 2000531860A JP 2000531860 A JP2000531860 A JP 2000531860A JP 2002503871 A JP2002503871 A JP 2002503871A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- electrode
- radiator
- electrodes
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/067—Main electrodes for low-pressure discharge lamps
- H01J61/0672—Main electrodes for low-pressure discharge lamps characterised by the construction of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
- H01J61/26—Means for absorbing or adsorbing gas, e.g. by gettering; Means for preventing blackening of the envelope
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/305—Flat vessels or containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
- H01J61/523—Heating or cooling particular parts of the lamp
- H01J61/526—Heating or cooling particular parts of the lamp heating or cooling of electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2437—Multilayer systems
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/022,507 US6049086A (en) | 1998-02-12 | 1998-02-12 | Large area silent discharge excitation radiator |
| US09/022,507 | 1998-02-12 | ||
| PCT/US1999/002948 WO1999041767A1 (en) | 1998-02-12 | 1999-02-10 | Large area silent discharge excitation radiator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002503871A true JP2002503871A (ja) | 2002-02-05 |
| JP2002503871A5 JP2002503871A5 (enExample) | 2006-03-30 |
Family
ID=21809943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000531860A Pending JP2002503871A (ja) | 1998-02-12 | 1999-02-10 | 面積の大きい無音放電励起ラジエータ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6049086A (enExample) |
| EP (1) | EP1055251A4 (enExample) |
| JP (1) | JP2002503871A (enExample) |
| KR (1) | KR100647883B1 (enExample) |
| AU (1) | AU2762799A (enExample) |
| WO (1) | WO1999041767A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006134705A (ja) * | 2004-11-05 | 2006-05-25 | Harison Toshiba Lighting Corp | 誘電体バリア放電ランプを用いた光照射装置 |
| JP2017004930A (ja) * | 2015-06-05 | 2017-01-05 | パナソニックIpマネジメント株式会社 | プラズマ生成装置 |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787787B1 (en) * | 1998-01-23 | 2004-09-07 | Ushiodenki Kabushiki Kaisha | Ultraviolet radiation producing apparatus |
| DE19919363A1 (de) * | 1999-04-28 | 2000-11-09 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Abstandshalter |
| DE19955108A1 (de) * | 1999-11-16 | 2001-05-17 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit verbesserter Temperaturhomogenität |
| DE10005156A1 (de) * | 2000-02-07 | 2001-08-09 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flache Gasentladungslampe mit Abstandselementen |
| JP4095758B2 (ja) * | 2000-06-29 | 2008-06-04 | 株式会社荏原製作所 | オゾン発生装置 |
| US20020067130A1 (en) * | 2000-12-05 | 2002-06-06 | Zoran Falkenstein | Flat-panel, large-area, dielectric barrier discharge-driven V(UV) light source |
| US6597003B2 (en) * | 2001-07-12 | 2003-07-22 | Axcelis Technologies, Inc. | Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
| US6646256B2 (en) * | 2001-12-18 | 2003-11-11 | Agilent Technologies, Inc. | Atmospheric pressure photoionization source in mass spectrometry |
| US20030157000A1 (en) * | 2002-02-15 | 2003-08-21 | Kimberly-Clark Worldwide, Inc. | Fluidized bed activated by excimer plasma and materials produced therefrom |
| KR20030075472A (ko) * | 2002-03-19 | 2003-09-26 | 현대자동차주식회사 | 플라즈마 반응기 및 그 제조방법과 플라즈마 반응기가채용된 차량의 배기가스 저감장치 |
| US7380756B1 (en) | 2003-11-17 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Single dielectric barrier aerodynamic plasma actuation |
| JPWO2005055678A1 (ja) * | 2003-12-08 | 2007-12-06 | 日本碍子株式会社 | プラズマ発生電極及びその製造方法、並びにプラズマ反応器 |
| FR2864746B1 (fr) * | 2003-12-29 | 2006-05-19 | Brandt Ind | Electrode pour la generation de plasma de decharge a barriere dielectrique |
| KR100595052B1 (ko) | 2004-04-22 | 2006-06-30 | 옥도영 | 액정디스플레이의 백라이트 |
| US20060006804A1 (en) * | 2004-07-06 | 2006-01-12 | Lajos Reich | Dielectric barrier discharge lamp |
| KR100605261B1 (ko) * | 2004-08-10 | 2006-07-28 | 삼성전자주식회사 | 면광원유닛 및 이를 가지는 액정표시장치 |
| KR100639876B1 (ko) * | 2004-09-21 | 2006-10-30 | 미래산업 주식회사 | 평판형 형광램프의 가스 주입구 구조 및 평판형형광램프의 가스 주입구 성형 방법 |
| KR20080002851A (ko) * | 2005-04-22 | 2008-01-04 | 호야 칸데오 옵트로닉스 가부시키가이샤 | 엑시머 램프 |
| FR2889886A1 (fr) * | 2005-08-19 | 2007-02-23 | Saint Gobain | Lampe uv plane a decharge coplanaire et utilisations |
| US7495396B2 (en) | 2005-12-14 | 2009-02-24 | General Electric Company | Dielectric barrier discharge lamp |
| JP2007234437A (ja) * | 2006-03-02 | 2007-09-13 | Trinc:Kk | プラズマ放電式除電器 |
| KR100820370B1 (ko) * | 2007-05-02 | 2008-04-08 | (주)엠아이에프피디 | 대향 전극 구조를 갖는 면광원 장치 및 그 제조 방법 |
| JP5477295B2 (ja) * | 2007-12-13 | 2014-04-23 | アカデミア シニカ | 電荷監視質量分析を行うためのシステムおよび方法 |
| WO2012077843A1 (ko) * | 2010-12-09 | 2012-06-14 | 한국과학기술원 | 플라즈마 발생 장치 |
| DE102011000261A1 (de) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck |
| US9220162B2 (en) * | 2011-03-09 | 2015-12-22 | Samsung Electronics Co., Ltd. | Plasma generating apparatus and plasma generating method |
| KR101241049B1 (ko) | 2011-08-01 | 2013-03-15 | 주식회사 플라즈마트 | 플라즈마 발생 장치 및 플라즈마 발생 방법 |
| KR101246191B1 (ko) | 2011-10-13 | 2013-03-21 | 주식회사 윈텔 | 플라즈마 장치 및 기판 처리 장치 |
| DE102013103670A1 (de) * | 2013-04-11 | 2014-10-30 | Dritte Patentportfolio Beteiligungsgesellschaft Mbh & Co.Kg | HF-Lampe mit dielektrischem Wellenleiter |
| EP3648145B1 (en) * | 2018-11-05 | 2022-01-05 | Xylem Europe GmbH | Vacuum ultraviolet excimer lamp with an inner axially symmetric wire electrode |
| DE102019202479B4 (de) * | 2019-02-25 | 2021-12-02 | Osram Gmbh | Elektrodenanordnung für eine entladungslampe, gasentladungslampe, schutzfolie und verfahren zum bereitstellen einer schutzfolie an einer elektrodenanordnung |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2925667A1 (de) * | 1979-05-22 | 1980-12-04 | Bbc Brown Boveri & Cie | Vorrichtung zur erzeugung von ozon |
| CH649518A5 (de) * | 1979-08-02 | 1985-05-31 | Bbc Brown Boveri & Cie | Verfahren und schaltungsanordnung zur durchfuehrung von gasentladungsreaktionen. |
| CH642606A5 (de) * | 1980-01-14 | 1984-04-30 | Bbc Brown Boveri & Cie | Ozonisator. |
| DE3162134D1 (en) * | 1980-12-23 | 1984-03-08 | Bbc Brown Boveri & Cie | Apparatus for the production of ozone by electric discharge |
| US5173638A (en) * | 1986-07-22 | 1992-12-22 | Bbc Brown, Boveri Ag | High-power radiator |
| CH670171A5 (enExample) * | 1986-07-22 | 1989-05-12 | Bbc Brown Boveri & Cie | |
| US4843281A (en) * | 1986-10-17 | 1989-06-27 | United Technologies Corporation | Gas plasma panel |
| CH675178A5 (enExample) * | 1987-10-23 | 1990-08-31 | Bbc Brown Boveri & Cie | |
| CH675504A5 (enExample) * | 1988-01-15 | 1990-09-28 | Asea Brown Boveri | |
| CH676168A5 (enExample) * | 1988-10-10 | 1990-12-14 | Asea Brown Boveri | |
| CH677292A5 (enExample) * | 1989-02-27 | 1991-04-30 | Asea Brown Boveri | |
| CH677557A5 (enExample) * | 1989-03-29 | 1991-05-31 | Asea Brown Boveri | |
| US5118989A (en) * | 1989-12-11 | 1992-06-02 | Fusion Systems Corporation | Surface discharge radiation source |
| JPH0680657B2 (ja) * | 1989-12-27 | 1994-10-12 | 株式会社半導体プロセス研究所 | 半導体装置の製造方法 |
| CH680099A5 (enExample) * | 1990-05-22 | 1992-06-15 | Asea Brown Boveri | |
| DE69113332T2 (de) * | 1990-06-22 | 1996-03-14 | Toshiba Kawasaki Kk | Vakuum-Ultraviolettlichtquelle. |
| JPH0719777B2 (ja) * | 1990-08-10 | 1995-03-06 | 株式会社半導体プロセス研究所 | 半導体装置の製造方法 |
| EP0489184B1 (de) * | 1990-12-03 | 1996-02-28 | Heraeus Noblelight GmbH | Hochleistungsstrahler |
| DE4140497C2 (de) * | 1991-12-09 | 1996-05-02 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
| US5387546A (en) * | 1992-06-22 | 1995-02-07 | Canon Sales Co., Inc. | Method for manufacturing a semiconductor device |
| DE4222130C2 (de) * | 1992-07-06 | 1995-12-14 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
| TW348262B (en) * | 1993-09-08 | 1998-12-21 | Ushio Electric Inc | Dielectric barrier discharge lamp |
| TW260806B (enExample) * | 1993-11-26 | 1995-10-21 | Ushio Electric Inc | |
| US5489553A (en) * | 1995-05-25 | 1996-02-06 | Industrial Technology Research Institute | HF vapor surface treatment for the 03 teos gap filling deposition |
| US5536681A (en) * | 1995-06-23 | 1996-07-16 | Taiwan Semiconductor Manufacturing Company | PE-OX/ozone-TEOS gap filling capability by selective N2 treatment on PE-OX |
| US5760541A (en) * | 1996-02-26 | 1998-06-02 | Hewlett-Packard Company | Electrode for external electrode fluorescent lamp providing improved longitudinal stability of intensity striations |
| JP3635849B2 (ja) * | 1997-04-07 | 2005-04-06 | ウシオ電機株式会社 | 希ガス放電灯 |
-
1998
- 1998-02-12 US US09/022,507 patent/US6049086A/en not_active Expired - Fee Related
-
1999
- 1999-02-10 JP JP2000531860A patent/JP2002503871A/ja active Pending
- 1999-02-10 KR KR1020007008882A patent/KR100647883B1/ko not_active Expired - Fee Related
- 1999-02-10 AU AU27627/99A patent/AU2762799A/en not_active Abandoned
- 1999-02-10 EP EP99908120A patent/EP1055251A4/en not_active Withdrawn
- 1999-02-10 WO PCT/US1999/002948 patent/WO1999041767A1/en not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006134705A (ja) * | 2004-11-05 | 2006-05-25 | Harison Toshiba Lighting Corp | 誘電体バリア放電ランプを用いた光照射装置 |
| JP2017004930A (ja) * | 2015-06-05 | 2017-01-05 | パナソニックIpマネジメント株式会社 | プラズマ生成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2762799A (en) | 1999-08-30 |
| KR20010040954A (ko) | 2001-05-15 |
| WO1999041767A1 (en) | 1999-08-19 |
| EP1055251A1 (en) | 2000-11-29 |
| US6049086A (en) | 2000-04-11 |
| EP1055251A4 (en) | 2005-02-16 |
| KR100647883B1 (ko) | 2006-12-13 |
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