JP2002503871A5 - - Google Patents
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- Publication number
- JP2002503871A5 JP2002503871A5 JP2000531860A JP2000531860A JP2002503871A5 JP 2002503871 A5 JP2002503871 A5 JP 2002503871A5 JP 2000531860 A JP2000531860 A JP 2000531860A JP 2000531860 A JP2000531860 A JP 2000531860A JP 2002503871 A5 JP2002503871 A5 JP 2002503871A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/022,507 | 1998-02-12 | ||
| US09/022,507 US6049086A (en) | 1998-02-12 | 1998-02-12 | Large area silent discharge excitation radiator |
| PCT/US1999/002948 WO1999041767A1 (en) | 1998-02-12 | 1999-02-10 | Large area silent discharge excitation radiator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002503871A JP2002503871A (ja) | 2002-02-05 |
| JP2002503871A5 true JP2002503871A5 (enExample) | 2006-03-30 |
Family
ID=21809943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000531860A Pending JP2002503871A (ja) | 1998-02-12 | 1999-02-10 | 面積の大きい無音放電励起ラジエータ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6049086A (enExample) |
| EP (1) | EP1055251A4 (enExample) |
| JP (1) | JP2002503871A (enExample) |
| KR (1) | KR100647883B1 (enExample) |
| AU (1) | AU2762799A (enExample) |
| WO (1) | WO1999041767A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787787B1 (en) * | 1998-01-23 | 2004-09-07 | Ushiodenki Kabushiki Kaisha | Ultraviolet radiation producing apparatus |
| DE19919363A1 (de) * | 1999-04-28 | 2000-11-09 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Abstandshalter |
| DE19955108A1 (de) * | 1999-11-16 | 2001-05-17 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit verbesserter Temperaturhomogenität |
| DE10005156A1 (de) * | 2000-02-07 | 2001-08-09 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flache Gasentladungslampe mit Abstandselementen |
| JP4095758B2 (ja) * | 2000-06-29 | 2008-06-04 | 株式会社荏原製作所 | オゾン発生装置 |
| US20020067130A1 (en) * | 2000-12-05 | 2002-06-06 | Zoran Falkenstein | Flat-panel, large-area, dielectric barrier discharge-driven V(UV) light source |
| US6597003B2 (en) * | 2001-07-12 | 2003-07-22 | Axcelis Technologies, Inc. | Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
| US6646256B2 (en) * | 2001-12-18 | 2003-11-11 | Agilent Technologies, Inc. | Atmospheric pressure photoionization source in mass spectrometry |
| US20030157000A1 (en) * | 2002-02-15 | 2003-08-21 | Kimberly-Clark Worldwide, Inc. | Fluidized bed activated by excimer plasma and materials produced therefrom |
| KR20030075472A (ko) * | 2002-03-19 | 2003-09-26 | 현대자동차주식회사 | 플라즈마 반응기 및 그 제조방법과 플라즈마 반응기가채용된 차량의 배기가스 저감장치 |
| US7380756B1 (en) | 2003-11-17 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Single dielectric barrier aerodynamic plasma actuation |
| US20070119828A1 (en) * | 2003-12-08 | 2007-05-31 | Ngk Insulators , Ltd. | Plasma generating electrode, its manufacturing method, and plasma reactor |
| FR2864746B1 (fr) * | 2003-12-29 | 2006-05-19 | Brandt Ind | Electrode pour la generation de plasma de decharge a barriere dielectrique |
| KR100595052B1 (ko) | 2004-04-22 | 2006-06-30 | 옥도영 | 액정디스플레이의 백라이트 |
| US20060006804A1 (en) * | 2004-07-06 | 2006-01-12 | Lajos Reich | Dielectric barrier discharge lamp |
| KR100605261B1 (ko) * | 2004-08-10 | 2006-07-28 | 삼성전자주식회사 | 면광원유닛 및 이를 가지는 액정표시장치 |
| KR100639876B1 (ko) * | 2004-09-21 | 2006-10-30 | 미래산업 주식회사 | 평판형 형광램프의 가스 주입구 구조 및 평판형형광램프의 가스 주입구 성형 방법 |
| JP2006134705A (ja) * | 2004-11-05 | 2006-05-25 | Harison Toshiba Lighting Corp | 誘電体バリア放電ランプを用いた光照射装置 |
| US20090039757A1 (en) * | 2005-04-22 | 2009-02-12 | Hiroyoshi Ohshima | Excimer Lamp |
| FR2889886A1 (fr) * | 2005-08-19 | 2007-02-23 | Saint Gobain | Lampe uv plane a decharge coplanaire et utilisations |
| US7495396B2 (en) | 2005-12-14 | 2009-02-24 | General Electric Company | Dielectric barrier discharge lamp |
| JP2007234437A (ja) * | 2006-03-02 | 2007-09-13 | Trinc:Kk | プラズマ放電式除電器 |
| KR100820370B1 (ko) * | 2007-05-02 | 2008-04-08 | (주)엠아이에프피디 | 대향 전극 구조를 갖는 면광원 장치 및 그 제조 방법 |
| WO2009076535A1 (en) * | 2007-12-13 | 2009-06-18 | Academia Sinica | System and method for performing charge-monitoring mass spectrometry |
| CN103250470A (zh) * | 2010-12-09 | 2013-08-14 | 韩国科学技术院 | 等离子体发生器 |
| DE102011000261A1 (de) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck |
| US9220162B2 (en) * | 2011-03-09 | 2015-12-22 | Samsung Electronics Co., Ltd. | Plasma generating apparatus and plasma generating method |
| KR101241049B1 (ko) | 2011-08-01 | 2013-03-15 | 주식회사 플라즈마트 | 플라즈마 발생 장치 및 플라즈마 발생 방법 |
| KR101246191B1 (ko) | 2011-10-13 | 2013-03-21 | 주식회사 윈텔 | 플라즈마 장치 및 기판 처리 장치 |
| DE102013103670A1 (de) * | 2013-04-11 | 2014-10-30 | Dritte Patentportfolio Beteiligungsgesellschaft Mbh & Co.Kg | HF-Lampe mit dielektrischem Wellenleiter |
| JP6726865B2 (ja) * | 2015-06-05 | 2020-07-22 | パナソニックＩｐマネジメント株式会社 | プラズマ生成装置 |
| EP3648145B1 (en) * | 2018-11-05 | 2022-01-05 | Xylem Europe GmbH | Vacuum ultraviolet excimer lamp with an inner axially symmetric wire electrode |
| DE102019202479B4 (de) * | 2019-02-25 | 2021-12-02 | Osram Gmbh | Elektrodenanordnung für eine entladungslampe, gasentladungslampe, schutzfolie und verfahren zum bereitstellen einer schutzfolie an einer elektrodenanordnung |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2925667A1 (de) * | 1979-05-22 | 1980-12-04 | Bbc Brown Boveri & Cie | Vorrichtung zur erzeugung von ozon |
| CH649518A5 (de) * | 1979-08-02 | 1985-05-31 | Bbc Brown Boveri & Cie | Verfahren und schaltungsanordnung zur durchfuehrung von gasentladungsreaktionen. |
| CH642606A5 (de) * | 1980-01-14 | 1984-04-30 | Bbc Brown Boveri & Cie | Ozonisator. |
| DE3162134D1 (en) * | 1980-12-23 | 1984-03-08 | Bbc Brown Boveri & Cie | Apparatus for the production of ozone by electric discharge |
| US5173638A (en) * | 1986-07-22 | 1992-12-22 | Bbc Brown, Boveri Ag | High-power radiator |
| CH670171A5 (enExample) * | 1986-07-22 | 1989-05-12 | Bbc Brown Boveri & Cie | |
| US4843281A (en) * | 1986-10-17 | 1989-06-27 | United Technologies Corporation | Gas plasma panel |
| CH675178A5 (enExample) * | 1987-10-23 | 1990-08-31 | Bbc Brown Boveri & Cie | |
| CH675504A5 (enExample) * | 1988-01-15 | 1990-09-28 | Asea Brown Boveri | |
| CH676168A5 (enExample) * | 1988-10-10 | 1990-12-14 | Asea Brown Boveri | |
| CH677292A5 (enExample) * | 1989-02-27 | 1991-04-30 | Asea Brown Boveri | |
| CH677557A5 (enExample) * | 1989-03-29 | 1991-05-31 | Asea Brown Boveri | |
| US5118989A (en) * | 1989-12-11 | 1992-06-02 | Fusion Systems Corporation | Surface discharge radiation source |
| JPH0680657B2 (ja) * | 1989-12-27 | 1994-10-12 | 株式会社半導体プロセス研究所 | 半導体装置の製造方法 |
| CH680099A5 (enExample) * | 1990-05-22 | 1992-06-15 | Asea Brown Boveri | |
| EP0463815B1 (en) * | 1990-06-22 | 1995-09-27 | Kabushiki Kaisha Toshiba | Vacuum ultraviolet light source |
| JPH0719777B2 (ja) * | 1990-08-10 | 1995-03-06 | 株式会社半導体プロセス研究所 | 半導体装置の製造方法 |
| EP0489184B1 (de) * | 1990-12-03 | 1996-02-28 | Heraeus Noblelight GmbH | Hochleistungsstrahler |
| DE4140497C2 (de) * | 1991-12-09 | 1996-05-02 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
| US5387546A (en) * | 1992-06-22 | 1995-02-07 | Canon Sales Co., Inc. | Method for manufacturing a semiconductor device |
| DE4222130C2 (de) * | 1992-07-06 | 1995-12-14 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
| TW348262B (en) * | 1993-09-08 | 1998-12-21 | Ushio Electric Inc | Dielectric barrier discharge lamp |
| TW260806B (enExample) * | 1993-11-26 | 1995-10-21 | Ushio Electric Inc | |
| US5489553A (en) * | 1995-05-25 | 1996-02-06 | Industrial Technology Research Institute | HF vapor surface treatment for the 03 teos gap filling deposition |
| US5536681A (en) * | 1995-06-23 | 1996-07-16 | Taiwan Semiconductor Manufacturing Company | PE-OX/ozone-TEOS gap filling capability by selective N2 treatment on PE-OX |
| US5760541A (en) * | 1996-02-26 | 1998-06-02 | Hewlett-Packard Company | Electrode for external electrode fluorescent lamp providing improved longitudinal stability of intensity striations |
| JP3635849B2 (ja) * | 1997-04-07 | 2005-04-06 | ウシオ電機株式会社 | 希ガス放電灯 |
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1998
- 1998-02-12 US US09/022,507 patent/US6049086A/en not_active Expired - Fee Related
-
1999
- 1999-02-10 EP EP99908120A patent/EP1055251A4/en not_active Withdrawn
- 1999-02-10 WO PCT/US1999/002948 patent/WO1999041767A1/en not_active Ceased
- 1999-02-10 JP JP2000531860A patent/JP2002503871A/ja active Pending
- 1999-02-10 AU AU27627/99A patent/AU2762799A/en not_active Abandoned
- 1999-02-10 KR KR1020007008882A patent/KR100647883B1/ko not_active Expired - Fee Related