KR100587896B1 - 포지티브 감광성 조성물 - Google Patents

포지티브 감광성 조성물 Download PDF

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Publication number
KR100587896B1
KR100587896B1 KR1019990061728A KR19990061728A KR100587896B1 KR 100587896 B1 KR100587896 B1 KR 100587896B1 KR 1019990061728 A KR1019990061728 A KR 1019990061728A KR 19990061728 A KR19990061728 A KR 19990061728A KR 100587896 B1 KR100587896 B1 KR 100587896B1
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KR
South Korea
Prior art keywords
group
acid
photosensitive composition
positive photosensitive
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR1019990061728A
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English (en)
Korean (ko)
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KR20000048397A (ko
Inventor
코다마쿠니히코
사토켄이치로오
아오아이토시아키
카와베야수마사
Original Assignee
후지 샤신 필름 가부시기가이샤
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Application filed by 후지 샤신 필름 가부시기가이샤 filed Critical 후지 샤신 필름 가부시기가이샤
Publication of KR20000048397A publication Critical patent/KR20000048397A/ko
Application granted granted Critical
Publication of KR100587896B1 publication Critical patent/KR100587896B1/ko
Assigned to 후지필름 가부시키가이샤 reassignment 후지필름 가부시키가이샤 권리의 전부이전등록 Assignors: 후지필름 홀딩스 가부시끼가이샤
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
KR1019990061728A 1998-12-24 1999-12-24 포지티브 감광성 조성물 Expired - Lifetime KR100587896B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP36761998A JP3961139B2 (ja) 1998-12-24 1998-12-24 ポジ型感光性組成物
JP98-367619 1998-12-24

Publications (2)

Publication Number Publication Date
KR20000048397A KR20000048397A (ko) 2000-07-25
KR100587896B1 true KR100587896B1 (ko) 2006-06-09

Family

ID=18489771

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990061728A Expired - Lifetime KR100587896B1 (ko) 1998-12-24 1999-12-24 포지티브 감광성 조성물

Country Status (3)

Country Link
US (1) US6699635B1 (https=)
JP (1) JP3961139B2 (https=)
KR (1) KR100587896B1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110025105A (ko) * 2009-09-01 2011-03-09 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물 및 그것을 사용한 패턴형성방법

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576737B2 (ja) * 2000-06-09 2010-11-10 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
CN1496496A (zh) * 2000-11-29 2004-05-12 纳幕尔杜邦公司 聚合物中的保护基,光刻胶及微细光刻的方法
KR100795109B1 (ko) * 2001-02-23 2008-01-17 후지필름 가부시키가이샤 포지티브 감광성 조성물
JP4839522B2 (ja) * 2001-04-12 2011-12-21 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4574067B2 (ja) * 2001-06-08 2010-11-04 ルネサスエレクトロニクス株式会社 レジスト組成物
JP4262422B2 (ja) * 2001-06-28 2009-05-13 富士フイルム株式会社 ポジ型フォトレジスト組成物及びそれを用いたパターン形成方法
TW588218B (en) * 2001-08-21 2004-05-21 Fuji Photo Film Co Ltd Stimulation-sensitive composition and compound
KR101266564B1 (ko) * 2005-08-03 2013-05-22 제이에스알 가부시끼가이샤 도금 조형물 제조용 포지티브형 감방사선성 수지 조성물,전사 필름 및 도금 조형물의 제조 방법
JP2019160004A (ja) 2018-03-15 2019-09-19 富士フイルム株式会社 画像判別装置，画像判別方法ならびに画像判別装置のプログラムおよびそのプログラムを格納した記録媒体

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258257A (en) * 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
EP0537524A1 (en) * 1991-10-17 1993-04-21 Shipley Company Inc. Radiation sensitive compositions and methods
JP3317576B2 (ja) * 1994-05-12 2002-08-26 富士写真フイルム株式会社 ポジ型感光性樹脂組成物
KR100206664B1 (ko) * 1995-06-28 1999-07-01 세키사와 다다시 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법
JP3125678B2 (ja) * 1996-04-08 2001-01-22 信越化学工業株式会社 化学増幅ポジ型レジスト材料
WO1998037458A1 (fr) * 1997-02-20 1998-08-27 Nippon Zeon Co., Ltd. Composition d'un agent de reserve
JPH11218927A (ja) * 1998-02-04 1999-08-10 Nippon Zeon Co Ltd レジスト組成物
US6103447A (en) * 1998-02-25 2000-08-15 International Business Machines Corp. Approach to formulating irradiation sensitive positive resists
KR100610165B1 (ko) * 1998-12-07 2006-08-09 후지 샤신 필름 가부시기가이샤 포지티브 포토레지스트 조성물
JP4019403B2 (ja) * 1999-03-08 2007-12-12 Ｊｓｒ株式会社 レジストパターンの形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110025105A (ko) * 2009-09-01 2011-03-09 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물 및 그것을 사용한 패턴형성방법
KR101727105B1 (ko) * 2009-09-01 2017-04-14 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물 및 그것을 사용한 패턴형성방법

Also Published As

Publication number Publication date
US6699635B1 (en) 2004-03-02
JP2000187329A (ja) 2000-07-04
JP3961139B2 (ja) 2007-08-22
KR20000048397A (ko) 2000-07-25

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