KR100574567B1 - Fluid supply device for the manufacturing apparatus of liquid crystal display devices - Google Patents

Abstract

The fluid supply apparatus of a liquid crystal display element manufacturing apparatus is disclosed. Fluid supply apparatus according to an embodiment of the present invention is a storage tank integrated bath for collecting and storing the fluid discharged from the processing unit, for replenishing the fluid flowing out of the manufacturing apparatus with the substrate from the processing unit A plurality of pumps for supplying the process unit with a fluid replenishment unit, a fluid stored in the storage tank integral bath and / or a fluid replenished from the fluid replenishment unit, and a plurality of connecting tanks with the storage tank unitary bath, fluid replenishment unit and the process unit, respectively And a piping line connecting the process unit and the pump with a first heater. According to the present invention, it is possible to manufacture a small-sized fluid supply device which reduces production cost and production cost by reducing the pipe line, and can effectively supply the desired process fluid to the process unit.

LCD, Fluid Supply, Storage Tank Integral Bath, Heater

Description

Fluid supply device for the manufacturing apparatus of liquid crystal display devices

1 is a schematic configuration diagram showing a configuration of a fluid supply apparatus according to the prior art,

2 is a block diagram showing the configuration of a fluid supply device according to the prior art used in the cleaning device,

3 is a schematic configuration diagram showing a configuration of a fluid supply device according to the present invention;

4A is a block diagram showing the configuration of a fluid supply device according to an embodiment of the present invention for use in a cleaning device;

4B is a block diagram showing the configuration of a fluid supply device according to another embodiment of the present invention for use in a cleaning device;

5A and 5B illustrate a first heater included in the fluid supply device of FIG. 4B.

<Description of the symbols for the main parts of the drawings>

111, 112, 113: 1st, 2nd, 3rd process unit

121, 122, 123: first, second and third baths

130, 230: storage tank 135, 235: heater

140, 240, 340, 440: pump 150, 250, 350, 450: fluid replenishment

320, 420: Storage tank integrated bath

211, 410: cleaning device 261, 461: valve

262, 462: filter 263, 463: regulator

264, 464: flow meter

370, 470: first heater 570: filter integrated first heater

572: filter 574a, 574b: filter housing

576a, 576b: heating means

The present invention relates to a fluid supply device, and more particularly, to a fluid supply device used in a liquid crystal display (LCD) device manufacturing apparatus.

Currently, LCD panels have become larger and can support high resolution in large screens. In addition, technical problems such as high contrast and wide viewing angle have been solved, thereby replacing the existing cathode ray tube (CRT). This trend is accelerating as an active matrix driving thin film transistor ("TFT") LCD has been developed and its application field has been expanded. The active matrix drive type TFT-LCD makes a switch element called TFT in each pixel and can control each pixel individually.

In the process of manufacturing a transistor or the like formed in each pixel of the TFT-LCD element, that is, a thin film transistor process, glass is used as the substrate material. Since the glass has a low melting point, the thin film transistor process is limited to a process temperature of 300 to 500 ° C. This is different from the semiconductor manufacturing process which generally uses a silicon substrate. However, the thin film transistor process is not different from using a silicon substrate in that a predetermined circuit is formed on a glass substrate by repeating a conventional semiconductor manufacturing unit process. Therefore, there are many processes using a fluid in the thin film transistor process. For example, a fluid is used for a cleaning process, a wet etching process or a developing process.

1 schematically shows a configuration of a fluid supply apparatus according to the prior art used for manufacturing an LCD element.

Referring to FIG. 1, a fluid supply device includes a plurality of baths 121, 122, and 123, a storage tank 130 including a heater 135, a pump 140, and a fluid supplement 150, and a connection thereof. Piping lines (not shown) and the like. In addition, the fluid supply apparatus is connected to a plurality of process units 111, 112, and 113 through which piping, such as a washing process, an etching process, or a developing process, is performed.

In the process units 111, 112, and 113 in which the cleaning process, the etching process, or the developing process is performed, baths 121, 122, and 123 are installed at the bottom to complete the process for each process unit and collect the discharged fluid. It is. The discharged fluid may contain by-products of each process such as contaminants, etch residues, development residues and the like. Fluids collected in the baths 121, 122, and 123 are collected and stored in the storage tank 130 through a pipe line. Although the drawing shows three process units, the number of process units is not limited. The size of the storage tank 130 and the actual arrangement of each process unit are determined according to the number of process units, but in general, each process has a structure that can minimize the pressure loss or heat loss of the supply fluid by minimizing the piping line. The unit is deployed.

The storage tank 130 is typically equipped with a heater 135. The heater 135 allows the fluid to be at the optimum process temperature so that the process can be efficiently performed at the process units 111, 112, and 113. The fluid heated in the storage tank 130 is supplied to each process unit through the pump 140. A valve line (not shown), a filter (not shown), a regulator (not shown) and the like are installed in a pipe line connecting the pump 140 and the process units 111, 112, and 113.

Fluid is also supplied from the fluid replenishment unit 150. Since the fluid is attached to the substrate and flows out of the process units 111, 112, and 113 together with the substrate during the progress of the process, such as the cleaning process, the fluid replenishing unit 150 supplements and supplies the fluid to the fluid supply device. It plays a role. The fluid refill unit 150 may be provided with a heater.

FIG. 2 is a view in which the fluid supply device having the configuration of FIG. 1 is applied to a cleaning device, and illustrates a case in which only one processing unit 211 is provided. The valve 261, the filter 262, the regulator 263, and the flow meter 264 installed in the configuration of the cleaning apparatus and the piping line shown in FIG. 2 simplify the actual cleaning apparatus to provide a schematic configuration. It is shown arbitrarily. Therefore, the configuration of the fluid supply device and the installation of the piping line in the actual cleaning device may be different.

As can be seen from Figures 1 and 2, the conventional fluid supply device is provided with one bath for each process unit, one storage tank is provided separately for a plurality of these baths. Thus, the distance between the bath and the storage tank and the distance between the storage tank and the processing unit are relatively long. As a result, the temperature decreases while the fluid passes through the long piping line, and the pressure also decreases.

In order to supply the fluid with the optimum process temperature to the process unit, it is necessary to take this into account and supply more heat to the heater. In this case, unnecessary cost is required. In addition, it is not easy to ensure that the fluid supplied is at an optimal temperature state. In addition, since a large amount of fluid is supplied, a large capacity pump is required to supply a fluid having an appropriate pressure.

In addition, the length of the piping line connecting each component is long, and its structure is also complicated. For example, essential construction means such as filters, valves, elbows, radiators and tees are not only widely used but also arranged intricately. In particular, when the process fluid is a highly toxic chemical (eg hydrochloric acid or nitric acid), each element installed in the piping line is expensive. In this case, the cost of the fluid supply device and the cost required for maintenance, repair, etc. are increased by the essential construction means installed in the pipe line.

In addition, in the case of the fluid supply device according to the prior art, the amount of fluid replenished from the fluid replenishment is considerably smaller than the amount of fluid used in the actual processing unit. As the process proceeds, the turbidity of the fluid stored in the storage tank increases because the fluid contains more contaminants. When the amount of process fluid is large, it is difficult to prevent the turbidity of the fluid from increasing even if it is supplemented with clean fluid from the outside. Increasing turbidity of the fluid can contaminate the substrate and cause failure of the finished LCD device. Therefore, when using the fluid supply apparatus according to the prior art, it is necessary to periodically replace all the fluid stored in the storage tank with a new fluid.

The technical problem to be achieved by the present invention is to simplify the configuration of the fluid supply device, thereby preventing the heat loss and pressure loss from the fluid, thereby providing a fluid supply device of the liquid crystal display device manufacturing apparatus that can reduce the cost It is.

Another technical problem to be achieved by the present invention is to provide a fluid supply device for a liquid crystal display device manufacturing apparatus that can extend the service life of the fluid without having to replace the remaining fluid on a regular basis by allowing the process fluid to be circulated smoothly To provide.

Another object of the present invention is to provide a fluid supply apparatus of a liquid crystal display device manufacturing apparatus capable of supplying a process fluid having an optimal temperature state to a process unit to a process unit.

The fluid supply device of the liquid crystal display device manufacturing apparatus according to the present invention for achieving the above technical problem is integral with the fluid storage tank and the fluid collection bath, and further increase the temperature of the supply fluid in the piping line connected to the process unit A heater is provided.

A fluid supply device according to a preferred aspect of the present invention is a bath for collecting fluid discharged from a processing unit, wherein the bath is a storage tank integrated bath in which a fluid storage tank is integrated. A fluid replenishment for replenishing the fluid flowing out of the process unit with the substrate, a pump for supplying fluid stored in the storage tank integral bath and / or a fluid replenished from the fluid replenishment to the processing unit And a plurality of piping lines connecting the fluid replenishment and the processing unit to the pump, respectively, wherein the piping lines connecting the process unit and the pump are equipped with a first heater.

The pipe line connecting the pump and the processing unit of the fluid supply device is provided with a filter, the first heater may be a filter-integrated first heater mounted on the filter. Here, the filter-integrated first heater includes a filter for filtering impurities and a filter housing while passing the fluid, and the heating means may be mounted on the outer wall of the filter housing or embedded in the inner wall of the filter housing. Can be.

It is preferable that the said 1st heater of the said fluid supply apparatus is installed in the lower part of the piping line which connects a pump and a process unit.

According to another preferred aspect of the present invention, the pipe line connecting the pump and the processing unit of the fluid supply device is provided with a fluid deceleration means for reducing the flow of the supply fluid, the first heater is a fluid deceleration means It is preferably installed in.

The storage tank integrated bath of the fluid supply device may include a second heater for heating the fluid to a constant temperature, and a third for heating the fluid replenished to the fluid replenishment to a constant temperature. A heater may be installed.

The fluid supply apparatus according to the embodiment of the present invention may be provided in a cleaning apparatus, an etching apparatus or a developing apparatus of the liquid crystal display device manufacturing apparatus.

Hereinafter, exemplary embodiments to which the present invention is specifically applied will be described in detail with reference to the accompanying drawings. However, the invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments introduced herein are provided by way of example so that the technical spirit of the present invention can be thoroughly and completely disclosed, and to fully convey the spirit of the present invention to those skilled in the art. In the drawings, each component is shown briefly to the extent necessary for the understanding of the present invention. Like numbers refer to like elements throughout the specification.

Figure 3 shows a schematic configuration of the fluid supply apparatus according to the present invention used in the liquid crystal display device manufacturing apparatus. 4A and 4B show a schematic configuration of the fluid supply apparatus according to the preferred embodiment of the present invention, which is used in the cleaning apparatus, respectively. In FIG. 4A, the first heater 470 is connected to the filter 462. While mounted separately, FIG. 4B shows that the first heater 470 is integral with the filter.

3, 4A, and 4B, the fluid supply device includes a storage tank integrated bath 320, 420, a pump 340, 440, a fluid supplement 350, 450, and a first heater 370, 470. It includes, and has a pipe line (connecting pipe, valve and regulator, etc.) for connecting these components.

The fluid supply apparatus according to the embodiment of the present invention does not have a storage tank, and instead, the storage tank integrated baths 320 and 420 serve as the tank. The fluid that completes the process and is discharged from the process units 310 and 410 is collected in the storage tank integrated bath 320 and 420, and the pumps 340 and 440 and the piping line are connected to the fluid, such as the cleaning unit 410. Fluid is supplied to the process unit 310. One process unit 310, 410 is provided with one storage tank integrated bath 320, 420, and does not need to increase the size of the storage tank integrated bath. In addition, according to the present embodiment, there is no need for a piping line serving as a fluid passage between the bath and the storage tank as in the prior art.

In the fluid supply apparatus according to the embodiment of the present invention, the first heaters 370, 470, and 570 are mounted on a pipe line and the like. As mentioned above, since the storage tank integrated baths 320 and 420 are small in size, it may not be easy to install a heater depending on the installation. In addition, since the supply fluid may lose heat while passing through the piping line or the like, it is preferable that the distance between the heater and the processing unit is short. To this end, as shown, the first heaters 370, 470, and 570 are installed in a pipe line. And, in order to reduce heat loss, it is preferable to install between the pump (340, 440) and the processing unit (310, 410). In addition, depending on the installation, the second heater 465 may also be installed in the storage tank integrated baths 320 and 420.

 Fluid collected in the storage tank integrated baths 320 and 420 and the fluid replenished from the fluid replenishing units 350 and 450 are supplied to the process units 310 and 410 through the pumps 340 and 440 at a predetermined pressure. It is heated to a predetermined temperature while passing through the first heaters 370 and 470. The heating temperature is determined as the most suitable temperature for the process, and the type of process and the characteristics of the fluid should be considered.

As shown in FIG. 4A, the first heater 470 may be installed independently of the piping components. In this case, the first heater 470 should have a structure capable of supplying enough heat to the working fluid. For example, as the working fluid passes through the first heater 470, the speed may be reduced. As the speed of the working fluid decreases, the passage time becomes long, and heat can be supplied sufficiently. If necessary, a pump (not shown) may be installed or additionally installed between the first heater 470 and the processing unit 410 to compensate for the pressure drop.

Various kinds of first heaters 470 may be used. For example, a heat pipe may be inserted into a piping line, or may have a structure in which a heating wire is wound inside or outside the piping line. In this case, when the process fluid is an explosive substance, care should be taken so that the heating device of the first heater 470 does not come into contact with air. That is, it is preferable to install the first heater 470 in the lower portion of the pipe line so that the heat generating device is always surrounded by the fluid.

Unlike FIG. 4A, as shown in FIG. 4B, the first heater 570 is a filter-integrated first unit in which the heating means 570a and 570b are integrated with the filter by being mounted on a piping component such as a filter installed in the piping line. It may be a heater 570. In the filter, the passage speed of the working fluid is slower than in other places. Therefore, by providing the heating means 570a and 570b in the filter, heat can be efficiently supplied to the working fluid. However, it can also be mounted on other piping components in addition to the filter.

Specific examples of the filter-integrated first heater 570 according to a preferred embodiment of the present invention are shown in FIGS. 5A and 5B.

Referring to FIG. 5A, the filter-integrated first heater 570 includes a filter 572 that filters impurities while passing the process fluid, a filter housing 574a that surrounds and protects the filter 572, and an outer wall of the filter housing 574a. Heating means 576a attached directly to the wall.

Process fluid supplied into the filter-integrated first heater 570 through the piping line passes through the filter 572 to filter out impurities. There is a sufficient space for the process fluid to stay between the filter 572 and the filter housing 574a, so that the flow of the process fluid is relatively slow in this space. Therefore, the heating means 576a can be operated to heat the process fluid while the process fluid stays in this space for a predetermined time. By adjusting the volume of the space, the supply speed of the process fluid, the calorific value of the heating means 576a, the process fluid can be heated to a desired temperature. At this time, in consideration of the heat generation of the heating means 576a, a material having suitable heat resistance should be selected as the material of the filter 572 and the filter housing 574a. In addition, the filter housing 574a must be of adequate thermal conductivity to effectively transfer heat from the heating means 576a to the process fluid. As a result, the process fluid to be applied to the flat panel display surface is heated to a predetermined temperature while filtering impurities while passing through the filter-integrated first heater 570, which is a single device.

On the other hand, the process fluid is generally used as a chemical liquid, but may be applied without limitation in the case of a gas. The chemical liquid includes various cleaning solutions, developing solutions, etching solutions or deionized water, and the gas is, for example, air or nitrogen. Of course, the type of filter 572 having an appropriate filtration function should be selected according to the type of cleaning fluid.

5B is a diagram illustrating a filter-integrated first heater 570 according to another embodiment of the present invention. Arrows in the drawings indicate the flow of the process fluid, the same reference numerals are given to the elements having the same function as the elements shown in Figure 5a and a detailed description thereof will be omitted. The present embodiment differs from the above-described embodiment in that the heater is not mounted on the filter housing outer wall but is embedded in the filter housing inner wall.

3, 4A, and 4B, the pipe line connecting the pumps 340, 440 and the processing units 310, 410 includes a valve 461, a regulator 463, and / or a flow meter ( 464) and the like. In addition, a third heater (not shown) may also be installed in the fluid replenishing units 350 and 450 to increase the temperature of the fluid replenished to a certain degree and supply the fluid.

In the fluid supply apparatus according to the present invention, one storage tank integrated bath is provided for each processing unit. Therefore, unlike a fluid supply according to the prior art, a large storage tank is not necessary. Therefore, the fluid supply apparatus can be manufactured on a small scale. And a pump does not need to install a large pump.

In addition, since the ratio of the replenishment fluid to the total process fluid used in the process is relatively large, the circulation of the process fluid is smooth. Therefore, depending on the progress of the process, it is possible to prevent the turbidity of the process fluid from continuously increasing, and to stop the increase in turbidity below a certain level. In the liquid crystal display device manufacturing apparatus including the fluid supply device of the present invention, it is not necessary to replace all the process fluids regularly.

In addition, the overall length of the piping line is shorter than in the prior art, and in particular, the distance from the pump to the processing unit is considerably short. Since the piping lines are short from the pumps 320 and 420 to the processing units 310 and 410, components of the piping such as filters, valves, elbows, radiators, tees, and the like can be minimized. In addition, pressure loss and heat loss due to friction or the like in the pipe line are small. Therefore, the production cost of the fluid supply device can be saved, and energy consumption is low even when using this device.

 And a heater can be attached to piping lines. Therefore, it is possible to supply a working fluid of a desired temperature suitable for the process to the process unit while keeping the size of the storage tank integrated bath small. And since this heater can be provided by piping components, such as a filter, and a separate component, it can be modified and used for various apparatus.

Claims (9)

A bath for aggregating fluid discharged from a processing unit, wherein the bath includes a storage tank integrated bath having a fluid storage tank integrated therein; A fluid replenishment for replenishing fluid flowing out of the processing unit together with the substrate; A pump for supplying the process unit with the fluid stored in the storage tank integrated bath and / or the fluid replenished from the fluid replenishment unit; A plurality of piping lines connecting the storage tank integrated bath, the fluid replenishment unit and the process unit to the pump, respectively; And It includes a filter integrated first heater provided in the piping line connecting the process unit and the pump, The filter integrated first heater includes a filter for filtering impurities while passing through the fluid; A housing protecting the filter; And Fluid supply apparatus of the liquid crystal display device manufacturing apparatus comprising a heating means. delete The filter assembly of claim 1, wherein a space in which the fluid flows is secured between the filter and the housing of the first filter-integrated heater, and the heating means of the first filter-integrated heater is mounted on an outer wall of the filter housing. The fluid supply apparatus of the liquid crystal display element manufacturing apparatus characterized by the above-mentioned. The filter assembly of claim 1, wherein a space in which the fluid flows is secured between the filter and the housing of the first filter-integrated heater, and the heating means of the first filter-integrated heater is embedded in an inner wall of the filter housing. The fluid supply apparatus of the liquid crystal display element manufacturing apparatus characterized by the above-mentioned. The fluid supply apparatus of a liquid crystal display device manufacturing apparatus according to claim 1, wherein the first heater is provided at a lower portion of the piping line connecting the pump and the processing unit. delete The fluid supply apparatus of claim 1, wherein the liquid crystal display device manufacturing apparatus is a cleaning device, an etching device or a developing device. The fluid supply apparatus of claim 1, wherein the storage tank integrated bath is provided with a second heater for heating the fluid to a predetermined temperature. The fluid supply apparatus of claim 1, wherein the fluid replenishing unit is provided with a third heater for heating the fluid to be replenished to a constant temperature.

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