JP2995179B1 - Immersion liquid constant temperature supply system - Google Patents

Abstract

An immersion liquid constant temperature supply system for maintaining an immersion liquid in an immersion liquid supply tank at a constant temperature. SOLUTION: A constant temperature supply tank 20 having an inlet 213 and an outlet 211, and a heat extending into the constant temperature supply tank 20 and heating the immersion liquid in the constant temperature supply tank 20 using the deionized water. Using an exchange device 23, a temperature sensor 27 provided in the constant temperature supply tank 20 to detect the temperature of the immersion liquid in the constant temperature supply tank 20, and utilizing temperature detection data generated by the temperature sensor 27. A control unit 25 for controlling the flow rate of the heat exchange device 23 to maintain the temperature of the immersion liquid in the constant temperature supply tank 20 within a certain range is included.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a type of immersion liquid thermostat.
Power supply systems, and in particular Eha
Immersion liquid replenisher for etching process or similar process
Is used to supply a constant temperature immersion liquid.
Time can be saved by heating the immersion liquid in the semiconductor process
About the system.

[0002]

2. Description of the Related Art In a semiconductor wafer manufacturing process, chemical
Etching using a reaction is an important step. Well-known
The equipment for the chemical etching process is as shown in FIG.
The acid bath 1 is a wet etch for a wafer.
Used in the process, with sufficient immersion liquid
(For example, ethylene glycol)
(Usually, about 75 ° C.), the chemical reaction proceeds. Constant times
After etching several wafers, immersion in the acid bath 1
Maintain the efficiency of the etching process because the liquid can change
Therefore, all the immersion liquid in the acid tank 1 is discarded and put in a new immersion liquid.
It needs to be replaced. Therefore, well-known etching equipment
One immersion liquid supply tank 2 is provided beside the acid tank 1,
When it is necessary to replenish or replace the immersion liquid in the tank 1, the motor 3
Alternatively, the immersion liquid in the immersion liquid supply tank 2 is
It is replenished in the acid tank 1.

However, in a well-known facility, the immersion liquid supply tank 2 is provided.
The immersion liquid provided by is a liquid at room temperature and is injected into the acid bath 1
After that, the temperature must reach the best reaction temperature.
For example, the temperature of the immersion liquid in the acid bath 1 is increased by heating the liquid in the acid bath 1
It is necessary to heat until the best chemical reaction can be performed. Figure
FIG. 2 shows an example of the heating operation described above.
As shown in the figure, the immersion liquid in the acid bath 1 is at room temperature (about 25
℃) to 80 ° C for 75 minutes heating time
Met. Chemical etching process due to this time loss
Production capacity has been impaired.

Further, a circulation type high temperature glycerol (grease)
Serine) pipeline heating system, glycerol
Heating the nichrome wire in another tank body
Rather, circulates glycerol with suction pump
Is actually disadvantageous in terms of equipment costs.
Glycerol pipeline during the semiconductor process
The immersion liquid is always a flammable raw material.
In some situations, The danger has naturally increased.

[0005] The above-mentioned problem that the heating takes a long time is as follows.
Not only in the semiconductor industry but also in the chemical, mechanical and food industries
It is often seen. This reduces the effect of heating time
To avoid the immersion process becoming a production bottleneck
In order to do so, efforts were needed to improve known equipment.

[0006]

SUMMARY OF THE INVENTION Main problems of the present invention
Is to provide a kind of immersion liquid constant temperature supply system.
That is, it is the wafer etching process in the semiconductor industry.
Constant temperature when replenishing and replacing the immersion liquid used in the process.
Of the immersion liquid in the acid tank
System that can shorten the etching time and improve the productivity of the etching process.
And

The present invention provides a kind of immersion liquid constant temperature supply system.
The challenge is to provide
Immersion liquid or exchange system during or similar process
One constant temperature supply tank, one temperature
Sensor, one heat exchanger and one control unit
Knit shall be included.

The above constant temperature supply tank has an inlet and an outlet.
This is a storage tank, and is used to store replenishable immersion liquid in the acid tank.
The outlet is connected to an acid tank, and the inlet is provided with an immersion liquid.
Used to replenish the constant temperature supply tank. In the present invention,
The pickling solution can be ethylene glycol, organic solvent, or other
Similar chemicals. In a preferred embodiment, the constant temperature
One insulation device is provided in the supply tank, and the heat in the constant temperature supply tank is
The amount is prevented from being dissipated. In the present invention,
Insulation cotton, polystyrene with a heating device covering the thermostatic supply tank
Alternatively, it is a device having another heat insulating function.

[0009] The heat exchanger is extended into a constant temperature supply tank.
Pipeline system, high-temperature deionized water
Heating immersion liquid in constant temperature supply tank applied to pipeline
Used to do. In a preferred embodiment of the present invention,
The heat exchange device is a hot pipeline Equipment and its pipe
A part of the line is installed in a constant temperature supply tank,
The energy in the pump is applied to the heating operation of the immersion liquid
It is. The fluid flowing in the hot pipeline device is
It can be gaseous or liquid, preferably low cost at the factory.
It is high-temperature deionized water that can be easily obtained.

In the present invention, the high-temperature pipeline device is further
May include a flow controller. The flow control
Is used to regulate fluid flow in hot pipelines.
Used. The operation depends on the temperature of the immersion liquid in the constant temperature supply tank.
Is below the set temperature, the fluid flow in the pipeline
The temperature of the immersion liquid in the constant temperature supply tank to the set temperature.
Higher, reduce the fluid flow through the pipeline.
This is done with an expression.

The temperature sensor is provided in a constant temperature supply tank.
Used to monitor the temperature of the immersion liquid in the bath,
Paired with a thermostat or other temperature sensing device
You.

The control unit includes a temperature sensor
Flow rate of heat exchanger using temperature observation data
Control the temperature of the immersion liquid in the constant temperature supply tank.
Maintain within a certain temperature range.

Another object of the present invention is to provide a kind of electric heating device.
Heating without using equipment, safe and energy source and equipment cost
Provide a kind of immersion liquid constant temperature supply system that can save
That are high during wafer and other manufacturing processes.
Circulates in the constant temperature supply tank in the hot liquid pipeline
Pre-heat the immersion liquid and supply it to the immersion liquid in the acid bath.
Utilizing the thermal energy of the liquid, the immersion liquid in the acid tank
The heating time of
It can be reduced.

[0014]

According to the first aspect of the present invention, a semiconductor device is provided.
Supply of immersion liquid in an acid bath applicable to integrated wafer manufacturing process
High temperature during other wafer manufacturing processes
An immersion liquid that injects the immersion liquid into the acid bath using deionized water
The above-mentioned acid bath for keeping the immersion liquid in the supply bath at a constant temperature Immersion liquid
In a temperature supply system, one inlet and one outlet
One storage tank for storing immersion liquid
And a pipeline system extended into the constant temperature supply tank.
And the deionized water is used in the constant temperature supply tank.
One heat exchange device for heating the immersion liquid, and the constant temperature supply tank
To detect the temperature of the immersion liquid in the constant temperature supply tank.
One temperature sensor to emit and the above temperature sensor
The flow rate of the above heat exchanger using the temperature detection data
Control the temperature of the immersion liquid in the constant temperature supply tank
One control unit to keep within a certain range,
Acid bath immersion liquid constant temperature supply system
And The invention according to claim 2 is for manufacturing a semiconductor wafer.
In immersion liquid constant temperature supply system of acid tank applicable to process
One with one inlet and one outlet to contain the immersion liquid
And a pie extended into the constant temperature supply tank
It is a pipeline system that can handle high-temperature pipelines
Heat exchange to heat the immersion liquid in the constant temperature supply tank
Conversion apparatus, wherein the high-temperature pipeline includes another wafer.
-One hot deionized water pipeline during the manufacturing process
The above-mentioned heat exchange device, comprising the above, acid bath
Immersion liquid constant temperature supply system.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 3 shows a immersion liquid constant temperature supply system according to the present invention.
It is an application of the preferred embodiment of the stem. Of the present invention
The immersion liquid constant temperature supply system is used for wafer etching process or
Or similar in-process replenishment and replacement systems.
It is one constant temperature supply tank 20, one temperature sensor
27, one heat exchange device 23 and one control unit
The knit 25 is included.

The constant temperature supply tank 20 is immersed in the acid tank to replenish it.
A storage tank for storing liquid, one inlet 213 and one
It has an outlet 211, which is connected to the acid tank,
Mouth 2 13 is used to replenish the immersion liquid to the constant temperature supply tank 20.
Can be. Immersion liquid applied in the present invention is a flammable chemical
And ethylene glycol or other similar chemistry
Goods.

In a preferred embodiment, the constant temperature supply tank 20
One heat insulating device 29 is provided, and the inside of the constant temperature supply tank 20 is provided.
The heat dissipation device 29 is designed to prevent heat dissipation.
Has a constant thickness and covers the constant temperature supply tank 20.
Cotton, polystyrene or other insulation
Device.

The heat exchanger 23 is used in a semiconductor manufacturing plant.
High-temperature deionized water pipeline that can be easily obtained at low cost
The immersion liquid in the constant temperature supply tank 20 is heated to
Used to make temperature. The pipeline is in the factory
Gas or liquid transport device or other similar
Device.

In the preferred embodiment of the present invention shown in FIG.
The heat exchange device 23 is a high-temperature pipeline device,
Is a part of one high-temperature pipeline 231 during the downstream process
Reaches the constant temperature supply tank 20, and the liquid in the constant temperature supply tank 20
After heat exchange proceeds through the pipe wall, the low-temperature pipeline 2
33, whereby the energy in the tube is directly
It is applied to the heating operation of the immersion liquid, that is, the operation concept of heat exchange is
It is operated. The fluid flowing through the hot pipeline equipment
It can be gas or liquid. Wafers in the semiconductor industry
Cleans relatively hot fluids commonly found in manufacturing processes
Deionized water for hot water
Constant temperature (about 75 ° C to 78 ° C)
Operation in high-temperature pipeline equipment requires manufacturing costs
Is the best choice to save money.

Influence the heating effect of high temperature pipeline equipment
Causes include the temperature and flow rate of the fluid in the pipeline,
Pipeline arrangement in the constant temperature supply tank 20. pie
Deionized water or other hot gas in the pipeline or
If a liquid is used as the carrier fluid, it is
Easier to pull in than the hot pipeline seen so
Temperature and within a certain temperature range,
There is no danger due to improper heating
Is not too much. For flow rate control,
In the present invention, one flow controller 235 is a high-temperature
Fluid in high temperature pipeline installed in pipeline equipment
The flow rate can be adjusted. The operation is as follows
It is as follows. Set the temperature of the immersion liquid in the constant temperature supply tank 20
If the temperature is lower than the temperature, the flow regulating valve
To increase the flow rate of fluid in the pipeline,
If the temperature of the immersion liquid is higher than the set temperature,
The regulating valve reaches the low flow position and the fluid flow in the pipeline
Reduce the amount. In the constant temperature supply tank 20 of the high temperature pipeline
The arrangement can increase the contact area between the pipeline and the immersion liquid
3 so that the contact points can be distributed on average with
Preferred embodiment with curvature and distance savings
Spiral pipeline with spiral tube or flat ground
(Temperature supply tank 20 with a diameter of 35 cm and a height of 50 cm is taken as an example.
To cite, the spiral pipeline is a 3/8 inch English pipe
Using a 2.5 cm tube,
Body inlet located on the outermost side of the spiral pipeline,
The center of the pipeline is the exit). The best
The flow direction of the fluid in the pipe enters from above the constant temperature supply tank 20
And is derived from below,
During the conversion process, the temperature difference between the two fluids can be made uniform.
You.

The temperature sensor 27 is provided in the constant temperature supply tank 20.
Provided to monitor the temperature of the immersion liquid in the bath
Thermocouple, thermostat or other temperature sensing device
Is placed. The grounding position of the temperature sensor 27 is
The position where the temperature of the immersion liquid in the tank 20 is averaged,
Inappropriate locations near the heat exchanger 23
You.

The control unit 25 includes a temperature sensor
Heat exchanger using temperature observation data generated by -27
23, thereby controlling the temperature in the constant temperature supply tank 20.
Maintain the temperature of the immersion liquid within a certain temperature range.

[0023]

【The invention's effect】 Obviously, the above-mentioned invention is in the semiconductor industry.
Not only for the etching process
Immersion processes commonly found in science, machinery, textile and food industries
Operable. The immersion liquid is not limited to an acid solution.
Can be liquid, dyeing liquid (textile industry) or other liquid
You. The pipeline fluid in the heat exchanger is also deionized water
Not limited to heating, heat exchange mediation fluid or application
Any of the possible waste heat recovery fluids is compatible with the heat exchange device of the present invention.
Available as a fluid.

[Brief description of the drawings]

FIG. 1 shows the intention of a well-known acid bath and its immersion liquid supply system.
It is.

FIG. 2 is a heating time diagram after the immersion liquid is injected into a well-known acid bath.
You.

FIG. 3 shows a preferred embodiment of the constant temperature immersion liquid supply system of the present invention.
This is an application intention of the embodiment.

[Explanation of symbols] 1 Acid tank 2 Immersion liquid supply tank 3 pump 20 constant temperature supply tank 21 Tank wall 23 Heat exchange equipment 25 Control unit 27 Temperature sensor 29 Insulation device 211 exit 213 entrance 231 High Temperature Pipeline 233 Low-temperature pipeline 235 Flow controller

────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Yellow ▲ Mon ▼ Birch, No. 307, Nakashiro-ro, Zhongshan Road, Takehoku, Taiwan, Hsinchu County, Taiwan (72) Inventor Document JP-A-5-326488 (JP, A) JP-A-3-214730 (JP, A) JP-A-9-14814 (JP, A) JP-A-6-58657 (JP, A) JP-A 8- 261676 (JP, A) (58) Fields studied (Int. Cl. ⁶ , DB name) H01L 21/304, 21/306 H01L 21/308 C23F 1/00-3/06

Claims (2)

(57) [Claims] 1. An acid applicable to a semiconductor wafer manufacturing process.
An immersion liquid constant temperature supply system for the tank
-Immerse in an acid bath using hot deionized water during the manufacturing process
Keep the immersion liquid in the immersion liquid supply tank where the liquid is injected at a constant temperature
In the immersion liquid constant temperature supply system for the acid bath, It is a storage tank with one inlet and one outlet.
One constant temperature supply tank to accommodate, With a pipeline system extended into the constant temperature supply tank
The immersion in the constant temperature supply tank using the above deionized water
One heat exchange device for heating the liquid, The immersion is provided in the constant temperature supply tank.
One temperature sensor that detects the temperature of the pickling solution, Using the temperature detection data generated by the above temperature sensor
By controlling the flow rate of the heat exchange device, the constant temperature supply tank
To maintain the temperature of the immersion liquid within a certain range.
Control unit, An acid bath immersion liquid constant temperature supply system
Tem. 2. An acid applicable to a semiconductor wafer manufacturing process.
In the bath immersion liquid constant temperature supply system, One inlet and one outlet to contain the immersion liquid
A constant temperature supply tank, With a pipeline system extended into the constant temperature supply tank
The constant temperature supply tank using the high temperature pipeline in the factory
One heat exchange device for heating the immersion liquid therein,
Hot pipeline is one of the other wafer manufacturing processes
High-temperature deionized water pipeline
Place An acid bath immersion liquid constant temperature supply system
Tem.