KR100497585B1 - 플라스마 처리장치 및 그 구동방법과 정합회로 설계시스템 및 플라스마 처리방법 - Google Patents

플라스마 처리장치 및 그 구동방법과 정합회로 설계시스템 및 플라스마 처리방법 Download PDF

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Publication number
KR100497585B1
KR100497585B1 KR10-2002-0071613A KR20020071613A KR100497585B1 KR 100497585 B1 KR100497585 B1 KR 100497585B1 KR 20020071613 A KR20020071613 A KR 20020071613A KR 100497585 B1 KR100497585 B1 KR 100497585B1
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South Korea
Prior art keywords
impedance
plasma processing
matching circuit
processing chamber
plasma
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Korean (ko)
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KR20030043669A (ko
Inventor
나까노아끼라
구마가이다다시
오오바도모후미
다다히로 오미
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알프스 덴키 가부시키가이샤
다다히로 오미
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
KR10-2002-0071613A 2001-11-27 2002-11-18 플라스마 처리장치 및 그 구동방법과 정합회로 설계시스템 및 플라스마 처리방법 Expired - Fee Related KR100497585B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001361378 2001-11-27
JPJP-P-2001-00361378 2001-11-27
JP2001367638 2001-11-30
JPJP-P-2001-00367638 2001-11-30

Publications (2)

Publication Number Publication Date
KR20030043669A KR20030043669A (ko) 2003-06-02
KR100497585B1 true KR100497585B1 (ko) 2005-07-01

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ID=26624717

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KR10-2002-0071613A Expired - Fee Related KR100497585B1 (ko) 2001-11-27 2002-11-18 플라스마 처리장치 및 그 구동방법과 정합회로 설계시스템 및 플라스마 처리방법

Country Status (3)

Country Link
US (1) US7095178B2 (enExample)
KR (1) KR100497585B1 (enExample)
TW (1) TW200300649A (enExample)

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TW200300649A (en) 2003-06-01
US20030097984A1 (en) 2003-05-29
TWI299965B (enExample) 2008-08-11
KR20030043669A (ko) 2003-06-02
US7095178B2 (en) 2006-08-22

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