KR100473197B1 - 집적회로를 위한 위상 시프트 및 트림 마스크를 결정하는방법 및 장치 - Google Patents

집적회로를 위한 위상 시프트 및 트림 마스크를 결정하는방법 및 장치 Download PDF

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Publication number
KR100473197B1
KR100473197B1 KR10-2002-7004059A KR20027004059A KR100473197B1 KR 100473197 B1 KR100473197 B1 KR 100473197B1 KR 20027004059 A KR20027004059 A KR 20027004059A KR 100473197 B1 KR100473197 B1 KR 100473197B1
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South Korea
Prior art keywords
mask
phase
region
integrated circuit
trim
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Expired - Fee Related
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KR10-2002-7004059A
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English (en)
Korean (ko)
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KR20020041814A (ko
Inventor
코브니콜라스베일리
사카지리쿄헤이
Original Assignee
멘터 그래픽스 코포레이션
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Application filed by 멘터 그래픽스 코포레이션 filed Critical 멘터 그래픽스 코포레이션
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Networks Using Active Elements (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR10-2002-7004059A 1999-09-28 2000-07-28 집적회로를 위한 위상 시프트 및 트림 마스크를 결정하는방법 및 장치 Expired - Fee Related KR100473197B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/407,447 1999-09-28
US09/407,447 US6335128B1 (en) 1999-09-28 1999-09-28 Method and apparatus for determining phase shifts and trim masks for an integrated circuit

Publications (2)

Publication Number Publication Date
KR20020041814A KR20020041814A (ko) 2002-06-03
KR100473197B1 true KR100473197B1 (ko) 2005-03-10

Family

ID=23612127

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2002-7004059A Expired - Fee Related KR100473197B1 (ko) 1999-09-28 2000-07-28 집적회로를 위한 위상 시프트 및 트림 마스크를 결정하는방법 및 장치

Country Status (8)

Country Link
US (2) US6335128B1 (https=)
EP (1) EP1218798B1 (https=)
JP (2) JP3916462B2 (https=)
KR (1) KR100473197B1 (https=)
AT (1) ATE343157T1 (https=)
AU (1) AU6388700A (https=)
DE (1) DE60031429T2 (https=)
WO (1) WO2001023961A1 (https=)

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US6541165B1 (en) * 2000-07-05 2003-04-01 Numerical Technologies, Inc. Phase shift mask sub-resolution assist features
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US6635393B2 (en) 2001-03-23 2003-10-21 Numerical Technologies, Inc. Blank for alternating PSM photomask with charge dissipation layer
US6553560B2 (en) * 2001-04-03 2003-04-22 Numerical Technologies, Inc. Alleviating line end shortening in transistor endcaps by extending phase shifters
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US6593038B2 (en) 2001-05-04 2003-07-15 Numerical Technologies, Inc. Method and apparatus for reducing color conflicts during trim generation for phase shifters
KR100498442B1 (ko) * 2001-05-23 2005-07-01 삼성전자주식회사 광 마스크 세트 및 그의 제조 방법
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US6721938B2 (en) 2001-06-08 2004-04-13 Numerical Technologies, Inc. Optical proximity correction for phase shifting photolithographic masks
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US6698007B2 (en) 2001-10-09 2004-02-24 Numerical Technologies, Inc. Method and apparatus for resolving coloring conflicts between phase shifters
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US6749970B2 (en) * 2001-12-11 2004-06-15 Advanced Micro Devices, Inc. Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
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US7135255B2 (en) * 2003-03-31 2006-11-14 International Business Machines Corporation Layout impact reduction with angled phase shapes
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Also Published As

Publication number Publication date
US6335128B1 (en) 2002-01-01
JP4218972B2 (ja) 2009-02-04
JP3916462B2 (ja) 2007-05-16
KR20020041814A (ko) 2002-06-03
EP1218798A1 (en) 2002-07-03
EP1218798B1 (en) 2006-10-18
US6455205B1 (en) 2002-09-24
ATE343157T1 (de) 2006-11-15
AU6388700A (en) 2001-04-30
JP2003510652A (ja) 2003-03-18
JP2006178498A (ja) 2006-07-06
WO2001023961A1 (en) 2001-04-05
DE60031429D1 (de) 2006-11-30
DE60031429T2 (de) 2007-08-30
US20020081500A1 (en) 2002-06-27

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