KR100445100B1 - 복합 니켈 미분말 및 그의 제조방법 - Google Patents
복합 니켈 미분말 및 그의 제조방법 Download PDFInfo
- Publication number
- KR100445100B1 KR100445100B1 KR10-1999-0019494A KR19990019494A KR100445100B1 KR 100445100 B1 KR100445100 B1 KR 100445100B1 KR 19990019494 A KR19990019494 A KR 19990019494A KR 100445100 B1 KR100445100 B1 KR 100445100B1
- Authority
- KR
- South Korea
- Prior art keywords
- nickel fine
- fine particles
- metal
- composite
- oxide
- Prior art date
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- 239000002131 composite material Substances 0.000 title claims abstract description 110
- 238000000034 method Methods 0.000 title claims description 42
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 512
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 241
- 229910052751 metal Inorganic materials 0.000 claims abstract description 171
- 239000002184 metal Substances 0.000 claims abstract description 164
- 239000000843 powder Substances 0.000 claims abstract description 133
- 239000010419 fine particle Substances 0.000 claims abstract description 119
- 239000002002 slurry Substances 0.000 claims abstract description 55
- 239000007864 aqueous solution Substances 0.000 claims abstract description 17
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 17
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 17
- 230000000737 periodic effect Effects 0.000 claims abstract description 17
- 150000003839 salts Chemical class 0.000 claims abstract description 16
- 239000002253 acid Substances 0.000 claims abstract description 8
- 239000003513 alkali Substances 0.000 claims abstract description 6
- 150000004696 coordination complex Chemical class 0.000 claims abstract description 4
- 239000002245 particle Substances 0.000 claims description 53
- 239000011882 ultra-fine particle Substances 0.000 claims description 50
- 238000004519 manufacturing process Methods 0.000 claims description 20
- 238000002360 preparation method Methods 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 239000000725 suspension Substances 0.000 claims description 7
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 72
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 43
- 230000000052 comparative effect Effects 0.000 description 25
- 239000000919 ceramic Substances 0.000 description 24
- 239000003985 ceramic capacitor Substances 0.000 description 21
- 239000000243 solution Substances 0.000 description 21
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 19
- 238000003756 stirring Methods 0.000 description 18
- 230000003647 oxidation Effects 0.000 description 11
- 238000007254 oxidation reaction Methods 0.000 description 11
- 229910001111 Fine metal Inorganic materials 0.000 description 10
- 238000009792 diffusion process Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000010304 firing Methods 0.000 description 8
- 229910000480 nickel oxide Inorganic materials 0.000 description 8
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 239000011575 calcium Substances 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910000348 titanium sulfate Inorganic materials 0.000 description 4
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 3
- 229910002113 barium titanate Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000011246 composite particle Substances 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 229910052747 lanthanoid Inorganic materials 0.000 description 3
- 150000002602 lanthanoids Chemical class 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 2
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- -1 alkali metal salts Chemical class 0.000 description 2
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229940099596 manganese sulfate Drugs 0.000 description 2
- 235000007079 manganese sulphate Nutrition 0.000 description 2
- 239000011702 manganese sulphate Substances 0.000 description 2
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910001388 sodium aluminate Inorganic materials 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- IPCAPQRVQMIMAN-UHFFFAOYSA-L zirconyl chloride Chemical compound Cl[Zr](Cl)=O IPCAPQRVQMIMAN-UHFFFAOYSA-L 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 241001331845 Equus asinus x caballus Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- 241000282341 Mustela putorius furo Species 0.000 description 1
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910052454 barium strontium titanate Inorganic materials 0.000 description 1
- ZCKXRHNLRWLPLJ-UHFFFAOYSA-N barium(2+);propan-1-olate Chemical compound [Ba+2].CCC[O-].CCC[O-] ZCKXRHNLRWLPLJ-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229940044658 gallium nitrate Drugs 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical class [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
- H01G4/0085—Fried electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/148—Agglomerating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/16—Metallic particles coated with a non-metal
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/10—Alloys containing non-metals
- C22C1/1084—Alloys containing non-metals by mechanical alloying (blending, milling)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Ceramic Capacitors (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
Description
Claims (15)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 금속 니켈 미립자 및 금속 니켈 미립자의 표면에 담지된, 하기 화학식으로 나타내지는 복합 산화물로 구성된 적어도 하나의 구성원을 함유함을 특징으로 하는 복합 니켈 미분말:BamX1-mTinZ1-nO3(상기 식에서, X는 Sr, Ca, Mg 또는 Pb를 나타내고, Z는 Zr, Y, Sn 또는 Ge를 나타내며; m은 0 내지 1의 수이며; n은 0 내지 1의 수이다)
- 제 6 항에 있어서, 금속 니켈 미립자; 및 금속 니켈 미립자의 표면에 담지된, 제 6 항의 복합 산화물로 구성된 그룹으로부터 선택된 적어도 하나의 구성원 및 주기율표의 2 내지 14족에 속하고 12 내지 56 또는 82 범위의 원자 번호를 갖는 적어도 하나의 금속 원소를 함유하는 산화물 및 복합 산화물로 구성된 그룹으로부터 선택된 적어도 하나의 구성원을 함유하는 복합 니켈 미분말.
- 삭제
- 제 6 항 또는 제 7 항에 있어서, 산화물 및 복합 산화물로부터 선택된 적어도 하나의 구성원의 총 담지량이 금속 니켈 미립자의 중량에 대해 0.05 내지 10 중량% 범위인 복합 니켈 미분말.
- 각각 주기율표의 2 내지 14족에 속하고 12 내지 56 또는 82의 범위의 원자 번호를 갖는 금속 원소의 수용성 염으로 구성된 그룹으로부터 선택된 적어도 하나의 구성원을 함유하는 수용액을 금속 니켈 미립자 또는 그 표면이 산화된 금속 니켈 미립자를 함유하는 슬러리에 첨가하고; 이어서 혼합물의 pH를 산 또는 알칼리로 조정하여 금속 니켈 미립자의 표면상에 수용성 염으로부터 유래된 금속 산화물 및/또는 복합 산화물을 담지시키는 단계를 포함하는 복합 니켈 미분말의 제조방법.
- 제 10 항에 있어서, 각각 주기율표의 2 내지 14족에 속하고 12 내지 56 또는 82 범위의 원자 번호를 갖는 금속 원소의 수용성 염으로 구성된 그룹으로부터 선택된 적어도 하나의 구성원을 함유하는 수용액을 금속 니켈 미립자 또는 표면이 산화된 금속 니켈 미립자를 함유하는 슬러리에 첨가하고; 이어서 혼합물의 pH를 산 또는 알칼리로 조정하여 금속 니켈 미립자의 표면상에 수용성 염으로부터 유래된 금속 산화물 및/또는 복합 산화물을 담지시키고; 입자를 세척 및 건조시키고; 부착된 금속 산화물 및/또는 복합 산화물을 담지하는 금속 니켈 미립자를 서로 또는 다른 대상과 충돌시켜 금속 니켈 미립자의 표면에 금속 산화물 및/또는 복합 산화물을 견고하게 담지시키는 단계를 포함하는 복합 니켈 미분말의 제조방법.
- 제 11 항에 있어서, 부착된 금속 산화물 및/또는 복합 산화물을 담지하는 금속 니켈 미립자를 옹그 밀(Ong Mill), 하이브리다이저(Hybridizer), 메카노퓨전(Mechanofusion), 코트 마이저(Coat Mizer), 디스퍼 코트(Disper Coat) 또는 제트 마이저(Jet Mizer)를 사용하여, 서로 또는 다른 대상과 충돌시킴으로써, 금속 산화물 및/또는 복합 산화물을 금속 니켈 미립자의 표면에 견고히 담지시키는 복합 니켈 미분말의 제조방법.
- 주기율표의 2 내지 14족에 속하고 12 내지 56 또는 82 범위의 원자 번호를 갖는 적어도 하나의 금속 원소를 함유하는 산화물 및 복합 산화물의 초미립자로 구성된 그룹으로부터 선택된 적어도 하나의 구성원을 금속 니켈 미립자 또는 표면이 산화된 금속 니켈 미립자의 표면에 일시적으로 담지시키고, 부착된 초미립자를 일시적으로 담지하는 니켈 미립자를 서로 또는 다른 대상과 충돌시킴으로써 초미립자를 금속 니켈 미립자의 표면에 담지시키는 단계를 포함하는 복합 니켈 미분말의 제조방법.
- 주기율표의 2 내지 14족에 속하고 12 내지 56 또는 82 범위의 원자 번호를 갖는 적어도 하나의 금속 원소를 함유하는 산화물 및 복합 산화물의 초미립자로 구성된 그룹으로부터 선택되고 분산된 적어도 하나의 구성원을 함유하는 현탁액을 가열하면서 금속 니켈 미립자 또는 표면이 산화된 금속 니켈 미립자와 혼합하고; 현탁액의 매질을 제거하여 금속 니켈 미립자의 표면에 초미립자를 일시적으로 담지시키고; 부착된 초미립자를 일시적으로 담지하는 금속 니켈 미립자를 서로 또는 다른 대상과 충돌시켜 금속 니켈 미립자의 표면에 초미립자를 담지시키는 단계를 포함하는 복합 니켈 미분말의 제조방법.
- 제 13 항 또는 제 14 항에 있어서, 부착된 초미립자를 일시적으로 담지하는 금속 니켈 미립자를 옹그 밀, 하이브리다이저, 메카노퓨전, 코트 마이저, 디스퍼 코트 또는 제트 마이저를 사용하여 서로 또는 다른 대상과 충돌시킴으로써 금속 니켈 미립자의 표면에 초미립자를 담지시키는 복합 니켈 미분말의 제조방법.
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JP165893/1998 | 1998-05-29 | ||
JP10165893A JP2992270B2 (ja) | 1998-05-29 | 1998-05-29 | 複合ニッケル微粉末及びその製造方法 |
JP092122/1999 | 1999-03-31 | ||
JP09212299A JP4076107B2 (ja) | 1999-03-31 | 1999-03-31 | 複合ニッケル微粉末の製造方法 |
JP92122/1999 | 1999-03-31 |
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US (1) | US6503560B2 (ko) |
EP (2) | EP0960674B1 (ko) |
KR (1) | KR100445100B1 (ko) |
CA (1) | CA2273563C (ko) |
DE (1) | DE69912186T2 (ko) |
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JP3356741B2 (ja) * | 1999-11-09 | 2002-12-16 | 三井金属鉱業株式会社 | 表面修飾ニッケル微粉及びその製造方法 |
JP3776296B2 (ja) * | 2000-06-28 | 2006-05-17 | 田中貴金属工業株式会社 | 酸化物分散強化型の白金材料及びその製造方法 |
JP3947118B2 (ja) * | 2003-03-03 | 2007-07-18 | Jfeミネラル株式会社 | 表面処理金属超微粉、その製造方法、導電性金属ペースト及び積層セラミックコンデンサ |
US7445814B2 (en) * | 2003-10-22 | 2008-11-04 | Hewlett-Packard Development Company, L.P. | Methods of making porous cermet and ceramic films |
US7169208B2 (en) * | 2004-06-10 | 2007-01-30 | Inco Limited | Method and composition for dispersing extra-fine nickel powder |
US20060169389A1 (en) * | 2005-01-31 | 2006-08-03 | Barber Daniel E | Electrode paste for thin nickel electrodes in multilayer ceramic capacitors and finished capacitor containing same |
KR100771773B1 (ko) | 2005-11-01 | 2007-10-30 | 삼성전기주식회사 | 복합니켈 입자 및 그 제조방법 |
US9764448B2 (en) * | 2005-11-14 | 2017-09-19 | National University of Science and Technology “MISIS” | Binder for the fabrication of diamond tools |
US20070253140A1 (en) * | 2006-04-28 | 2007-11-01 | Randall Michael S | Base metal electrode multilayer capacitor with localized oxidizing source |
CN102763233B (zh) * | 2010-02-22 | 2015-08-19 | 株式会社村田制作所 | 热电转换材料及热电转换材料的制造方法 |
JP5862835B2 (ja) | 2013-04-05 | 2016-02-16 | 株式会社村田製作所 | 金属粉末の製造方法、導電性ペーストの製造方法、および積層セラミック電子部品の製造方法 |
JP6573563B2 (ja) | 2016-03-18 | 2019-09-11 | 住友金属鉱山株式会社 | ニッケル粉末、ニッケル粉末の製造方法、およびニッケル粉末を用いた内部電極ペーストならびに電子部品 |
CN106756903A (zh) * | 2016-12-14 | 2017-05-31 | 苏州金仓合金新材料有限公司 | 一种镀镍碳化硅颗粒及其制备方法 |
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EP0834368A1 (en) * | 1996-09-25 | 1998-04-08 | Shoei Chemical Inc. | Nickel powder and process for preparing the same |
KR19990001807A (ko) * | 1997-06-17 | 1999-01-15 | 이형도 | 음성인식기능을 갖는 셋탑박스 |
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US4578114A (en) | 1984-04-05 | 1986-03-25 | Metco Inc. | Aluminum and yttrium oxide coated thermal spray powder |
US5126915A (en) * | 1989-07-28 | 1992-06-30 | E. I. Du Pont De Nemours And Company | Metal oxide-coated electrically conductive powders and compositions thereof |
EP0487272A3 (en) * | 1990-11-19 | 1992-10-21 | Sulzer Plasma Technik, Inc. | Thermal spray powders, their production and their use |
CA2114913C (en) * | 1993-02-05 | 2003-12-09 | Takafumi Atarashi | Powder having at least one layer and process for preparing the same |
JP3670395B2 (ja) * | 1996-06-10 | 2005-07-13 | 日鉄鉱業株式会社 | 多層膜被覆粉体およびその製造方法 |
JP3137035B2 (ja) | 1997-05-26 | 2001-02-19 | 昭栄化学工業株式会社 | ニッケル粉末及びその製造方法 |
JP3475749B2 (ja) | 1997-10-17 | 2003-12-08 | 昭栄化学工業株式会社 | ニッケル粉末及びその製造方法 |
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- 1999-05-28 DE DE69912186T patent/DE69912186T2/de not_active Expired - Fee Related
- 1999-05-28 EP EP03004113A patent/EP1312433A3/en not_active Withdrawn
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EP0834368A1 (en) * | 1996-09-25 | 1998-04-08 | Shoei Chemical Inc. | Nickel powder and process for preparing the same |
EP0834370A1 (en) * | 1996-09-25 | 1998-04-08 | Shoei Chemical Inc. | Coated metal powder and process for preparing the same by decomposition |
KR19990001807A (ko) * | 1997-06-17 | 1999-01-15 | 이형도 | 음성인식기능을 갖는 셋탑박스 |
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EP0960674B1 (en) | 2003-10-22 |
CA2273563C (en) | 2006-05-16 |
DE69912186T2 (de) | 2004-06-03 |
CA2273563A1 (en) | 1999-11-29 |
EP0960674A1 (en) | 1999-12-01 |
DE69912186D1 (de) | 2003-11-27 |
KR19990088656A (ko) | 1999-12-27 |
EP1312433A3 (en) | 2005-04-13 |
EP1312433A2 (en) | 2003-05-21 |
US6503560B2 (en) | 2003-01-07 |
US20020055002A1 (en) | 2002-05-09 |
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