KR100386793B1 - 박막의 막두께 계측 방법 및 그 장치 및 이를 이용한 박막디바이스의 제조 방법 및 그 제조 장치 - Google Patents

박막의 막두께 계측 방법 및 그 장치 및 이를 이용한 박막디바이스의 제조 방법 및 그 제조 장치 Download PDF

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Publication number
KR100386793B1
KR100386793B1 KR10-2000-7009171A KR20007009171A KR100386793B1 KR 100386793 B1 KR100386793 B1 KR 100386793B1 KR 20007009171 A KR20007009171 A KR 20007009171A KR 100386793 B1 KR100386793 B1 KR 100386793B1
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South Korea
Prior art keywords
film thickness
thin film
optically transparent
film
light
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KR10-2000-7009171A
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English (en)
Korean (ko)
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KR20010041127A (ko
Inventor
히로세다께노리
노구찌미노리
겐보유끼오
마에다순지
니노미야다까노리
쯔찌야마히로후미
Original Assignee
가부시키가이샤 히타치세이사쿠쇼
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Priority claimed from JP29931198A external-priority patent/JP4460659B2/ja
Application filed by 가부시키가이샤 히타치세이사쿠쇼 filed Critical 가부시키가이샤 히타치세이사쿠쇼
Publication of KR20010041127A publication Critical patent/KR20010041127A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
KR10-2000-7009171A 1998-04-21 1999-04-19 박막의 막두께 계측 방법 및 그 장치 및 이를 이용한 박막디바이스의 제조 방법 및 그 제조 장치 KR100386793B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP1998-110384 1998-04-21
JP11038498 1998-04-21
JP29931198A JP4460659B2 (ja) 1997-10-22 1998-10-21 薄膜の膜厚計測方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
JP1998-299311 1998-10-21

Publications (2)

Publication Number Publication Date
KR20010041127A KR20010041127A (ko) 2001-05-15
KR100386793B1 true KR100386793B1 (ko) 2003-06-09

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KR10-2000-7009171A KR100386793B1 (ko) 1998-04-21 1999-04-19 박막의 막두께 계측 방법 및 그 장치 및 이를 이용한 박막디바이스의 제조 방법 및 그 제조 장치

Country Status (3)

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US (2) US6753972B1 (US06806970-20041019-M00007.png)
KR (1) KR100386793B1 (US06806970-20041019-M00007.png)
WO (1) WO1999054924A1 (US06806970-20041019-M00007.png)

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Also Published As

Publication number Publication date
WO1999054924A1 (fr) 1999-10-28
US6806970B2 (en) 2004-10-19
US6753972B1 (en) 2004-06-22
US20040070773A1 (en) 2004-04-15
KR20010041127A (ko) 2001-05-15

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