KR100299403B1 - 물품보호막및이를제공하는방법 - Google Patents

물품보호막및이를제공하는방법 Download PDF

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Publication number
KR100299403B1
KR100299403B1 KR1019950702547A KR19950702547A KR100299403B1 KR 100299403 B1 KR100299403 B1 KR 100299403B1 KR 1019950702547 A KR1019950702547 A KR 1019950702547A KR 19950702547 A KR19950702547 A KR 19950702547A KR 100299403 B1 KR100299403 B1 KR 100299403B1
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KR
South Korea
Prior art keywords
plasma
coating
substrate
gas
abrasion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR1019950702547A
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English (en)
Korean (ko)
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KR950704535A (ko
Inventor
잉-펭후
제임스씨.토우
Original Assignee
그래햄 이. 테일러
더 다우 케미칼 캄파니
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Publication of KR950704535A publication Critical patent/KR950704535A/ko
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Publication of KR100299403B1 publication Critical patent/KR100299403B1/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
KR1019950702547A 1992-12-21 1993-10-05 물품보호막및이를제공하는방법 Expired - Lifetime KR100299403B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/994,381 US5298587A (en) 1992-12-21 1992-12-21 Protective film for articles and method
US07/994381 1992-12-21
PCT/US1993/009528 WO1994014998A1 (en) 1992-12-21 1993-10-05 Protective film for articles and method

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1020007015079A Division KR100360579B1 (ko) 1992-12-21 1993-10-05 규소-탄소 중합체가 접착된 표면을 갖는 기판 적층물
KR1020007015080A Division KR100344334B1 (ko) 1992-12-21 1993-10-05 플라즈마 발생장치

Publications (2)

Publication Number Publication Date
KR950704535A KR950704535A (ko) 1995-11-20
KR100299403B1 true KR100299403B1 (ko) 2001-11-22

Family

ID=25540605

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1019950702547A Expired - Lifetime KR100299403B1 (ko) 1992-12-21 1993-10-05 물품보호막및이를제공하는방법
KR1020007015079A Expired - Lifetime KR100360579B1 (ko) 1992-12-21 1993-10-05 규소-탄소 중합체가 접착된 표면을 갖는 기판 적층물
KR1020007015080A Expired - Lifetime KR100344334B1 (ko) 1992-12-21 1993-10-05 플라즈마 발생장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020007015079A Expired - Lifetime KR100360579B1 (ko) 1992-12-21 1993-10-05 규소-탄소 중합체가 접착된 표면을 갖는 기판 적층물
KR1020007015080A Expired - Lifetime KR100344334B1 (ko) 1992-12-21 1993-10-05 플라즈마 발생장치

Country Status (9)

Country Link
US (2) US5298587A (OSRAM)
EP (1) EP0674722B1 (OSRAM)
JP (1) JP3488458B2 (OSRAM)
KR (3) KR100299403B1 (OSRAM)
CA (1) CA2147486C (OSRAM)
DE (1) DE69318424T2 (OSRAM)
MX (1) MX9306910A (OSRAM)
TW (2) TW296394B (OSRAM)
WO (1) WO1994014998A1 (OSRAM)

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WO1994014998A1 (en) 1994-07-07
KR100344334B1 (ko) 2002-07-22
US5320875A (en) 1994-06-14
KR100360579B1 (ko) 2002-11-13
EP0674722A1 (en) 1995-10-04
US5298587A (en) 1994-03-29
CA2147486A1 (en) 1994-07-07
MX9306910A (es) 1994-06-30
TW375536B (en) 1999-12-01
JP3488458B2 (ja) 2004-01-19
TW296394B (OSRAM) 1997-01-21
JPH08505186A (ja) 1996-06-04
CA2147486C (en) 2005-06-28
EP0674722B1 (en) 1998-05-06

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