KR100249270B1 - 불균일 검사방법 및 장치 - Google Patents

불균일 검사방법 및 장치 Download PDF

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Publication number
KR100249270B1
KR100249270B1 KR1019960015957A KR19960015957A KR100249270B1 KR 100249270 B1 KR100249270 B1 KR 100249270B1 KR 1019960015957 A KR1019960015957 A KR 1019960015957A KR 19960015957 A KR19960015957 A KR 19960015957A KR 100249270 B1 KR100249270 B1 KR 100249270B1
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KR
South Korea
Prior art keywords
image
bokeh
obtaining
pattern
power spectrum
Prior art date
Application number
KR1019960015957A
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English (en)
Korean (ko)
Other versions
KR970003339A (ko
Inventor
구니오 우에타
Original Assignee
이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 이시다 아키라, 다이닛뽕스크린 세이조오 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR970003339A publication Critical patent/KR970003339A/ko
Application granted granted Critical
Publication of KR100249270B1 publication Critical patent/KR100249270B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
KR1019960015957A 1995-06-21 1996-05-14 불균일 검사방법 및 장치 KR100249270B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP95-179551 1995-06-21
JP17955195 1995-06-21
JP96-58430 1996-02-20
JP05843096A JP3366802B2 (ja) 1995-06-21 1996-02-20 ムラ検査方法および装置

Publications (2)

Publication Number Publication Date
KR970003339A KR970003339A (ko) 1997-01-28
KR100249270B1 true KR100249270B1 (ko) 2000-03-15

Family

ID=26399493

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960015957A KR100249270B1 (ko) 1995-06-21 1996-05-14 불균일 검사방법 및 장치

Country Status (2)

Country Link
JP (1) JP3366802B2 (ja)
KR (1) KR100249270B1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4353479B2 (ja) * 2004-10-08 2009-10-28 大日本スクリーン製造株式会社 ムラ検査装置、ムラ検査方法、および、濃淡ムラをコンピュータに検査させるプログラム
JP4899306B2 (ja) * 2004-11-17 2012-03-21 凸版印刷株式会社 周期性パターンムラ検査装置
GB0818625D0 (en) * 2008-10-10 2008-11-19 Renishaw Plc Backlit vision machine
JP2010286353A (ja) * 2009-06-11 2010-12-24 Ricoh Elemex Corp 画像検査装置、画像検査方法およびプログラム
JP5659507B2 (ja) * 2010-03-05 2015-01-28 凸版印刷株式会社 パターン描画装置の状態監視方法および状態監視装置
JP5895350B2 (ja) * 2011-03-16 2016-03-30 凸版印刷株式会社 むら検査装置及びむら検査方法
JP5702639B2 (ja) * 2011-03-25 2015-04-15 株式会社Ｓｃｒｅｅｎホールディングス ムラ検査用画像取得装置およびムラ検査装置並びに照射部の位置決定方法
DE102016000629A1 (de) * 2016-01-22 2017-07-27 Display-Messtechnik & Systeme GmbH & Co. KG Messverfahren für Bildstörungen an Bildschirmen
JP7186054B2 (ja) * 2018-10-11 2022-12-08 神鋼検査サービス株式会社 欠陥検出支援装置、該方法および該プログラム
WO2021251497A1 (ja) * 2020-06-11 2021-12-16 凸版印刷株式会社 評価指標値算出装置、評価指標値算出方法、および評価指標値算出プログラム
JP6977816B1 (ja) * 2020-06-11 2021-12-08 凸版印刷株式会社 評価指標算出装置、評価指標算出方法、および評価指標算出プログラム

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900000948A (ko) * 1988-06-28 1990-01-31 이희종 새도우 마스크 검사용 영상취득 방법 및 장치
KR900017072A (ko) * 1989-04-04 1990-11-15 김정배 화상처리 시스템을 이용한 형광막 검사방법 및 그 장치
JPH04209440A (ja) * 1990-11-30 1992-07-30 Toshiba Seiki Kk 露光装置における光源の位置合わせ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900000948A (ko) * 1988-06-28 1990-01-31 이희종 새도우 마스크 검사용 영상취득 방법 및 장치
KR900017072A (ko) * 1989-04-04 1990-11-15 김정배 화상처리 시스템을 이용한 형광막 검사방법 및 그 장치
JPH04209440A (ja) * 1990-11-30 1992-07-30 Toshiba Seiki Kk 露光装置における光源の位置合わせ装置

Also Published As

Publication number Publication date
JPH0968497A (ja) 1997-03-11
JP3366802B2 (ja) 2003-01-14
KR970003339A (ko) 1997-01-28

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