KR100227101B1 - Abs 수지 및 플라스틱상의 건식도금 방법 - Google Patents
Abs 수지 및 플라스틱상의 건식도금 방법 Download PDFInfo
- Publication number
- KR100227101B1 KR100227101B1 KR1019970009892A KR19970009892A KR100227101B1 KR 100227101 B1 KR100227101 B1 KR 100227101B1 KR 1019970009892 A KR1019970009892 A KR 1019970009892A KR 19970009892 A KR19970009892 A KR 19970009892A KR 100227101 B1 KR100227101 B1 KR 100227101B1
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- dry
- plastic
- abs resin
- minutes
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
- 열에 약한 ABS수지나 플라스틱 장식기재를 금색(TiN)으로 건식 도금하기 위하여 통상의 건식도금장치인 진공조의 음극전극에 장식기재를 걸어 놓고, 이에 대응되도록 가열수단을 갖춘 Ti-Target를 설치하며, 반응 GAS 투입구에 아르곤(Ar) 및 질소(N2) GAS를 투입하며, 10-3-10-5Torr로 하며, 석출속도는 0.01-0.02㎛/분으로 하되, 장식기재가 열에 의하여 변형되지 않도록 저온에서 행하는 통상의 건식도금(스팟타링 이온방식)에 있어서, 진공조(Chamber)의 최초 작업 시행온도를 상온에서 부터 시작하되, 건식도금 시간을 5분 도금, 10분 냉각, 5분 도금 10분 냉각 순으로 다단계로 나누어 도금하여 최고 온도가 80°가 넘지 않도록 도금하는 것을 특징으로 하는 ABS수지 및 플라스틱상의 건식도금 방법.
- 제1항에 있어서, 반응 GAS 투입구에 아르곤(Ar), 질소(N2), 아세칠렌(C2H2) GAS를 투입하여 질화 탄소 티타늄(TiCN)의 도금층을 형성하여 GRAY색, BROWN색 도금층을 얻도록 하는 것을 특징으로 하는 ABS수지 및 플라스틱상의 건식도금 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970009892A KR100227101B1 (ko) | 1997-03-21 | 1997-03-21 | Abs 수지 및 플라스틱상의 건식도금 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970009892A KR100227101B1 (ko) | 1997-03-21 | 1997-03-21 | Abs 수지 및 플라스틱상의 건식도금 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980074194A KR19980074194A (ko) | 1998-11-05 |
KR100227101B1 true KR100227101B1 (ko) | 1999-10-15 |
Family
ID=19500483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970009892A KR100227101B1 (ko) | 1997-03-21 | 1997-03-21 | Abs 수지 및 플라스틱상의 건식도금 방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100227101B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030023998A (ko) * | 2001-09-14 | 2003-03-26 | 주식회사 등우 | 플라스틱 성형품의 표면처리 방법 및 그에 의해 제조된플라스틱 성형품 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100387663B1 (ko) * | 2000-11-30 | 2003-06-18 | 이경희 | 엔지니어링 플라스틱상에의 도금방법 |
KR20030003450A (ko) * | 2001-07-02 | 2003-01-10 | 한산고진공산업 주식회사 | 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기위한 아크방전 이온도금방법 |
KR100646009B1 (ko) * | 2005-03-23 | 2006-11-14 | 황은호 | 에이비에스수지 및 플라스틱상의 건식도금 방법 |
KR100977496B1 (ko) * | 2007-12-21 | 2010-08-23 | 한국기계연구원 | 금색 타일 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362863A (ja) * | 1986-09-02 | 1988-03-19 | Seikosha Co Ltd | 金色を呈する物品 |
-
1997
- 1997-03-21 KR KR1019970009892A patent/KR100227101B1/ko not_active IP Right Cessation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362863A (ja) * | 1986-09-02 | 1988-03-19 | Seikosha Co Ltd | 金色を呈する物品 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030023998A (ko) * | 2001-09-14 | 2003-03-26 | 주식회사 등우 | 플라스틱 성형품의 표면처리 방법 및 그에 의해 제조된플라스틱 성형품 |
Also Published As
Publication number | Publication date |
---|---|
KR19980074194A (ko) | 1998-11-05 |
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