KR100219824B1 - 노광방법 및 장치, 그리고 그것을 사용한 디바이스제조방법 - Google Patents

노광방법 및 장치, 그리고 그것을 사용한 디바이스제조방법 Download PDF

Info

Publication number
KR100219824B1
KR100219824B1 KR1019970000253A KR19970000253A KR100219824B1 KR 100219824 B1 KR100219824 B1 KR 100219824B1 KR 1019970000253 A KR1019970000253 A KR 1019970000253A KR 19970000253 A KR19970000253 A KR 19970000253A KR 100219824 B1 KR100219824 B1 KR 100219824B1
Authority
KR
South Korea
Prior art keywords
wafer
operation period
scanning
stage
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970000253A
Other languages
English (en)
Korean (ko)
Other versions
KR970060355A (ko
Inventor
마사히로 모리시타
Original Assignee
미따라이 하지메
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1698696A external-priority patent/JPH09190224A/ja
Priority claimed from JP8340445A external-priority patent/JPH09251955A/ja
Application filed by 미따라이 하지메, 캐논 가부시끼가이샤 filed Critical 미따라이 하지메
Publication of KR970060355A publication Critical patent/KR970060355A/ko
Application granted granted Critical
Publication of KR100219824B1 publication Critical patent/KR100219824B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019970000253A 1996-01-08 1997-01-08 노광방법 및 장치, 그리고 그것을 사용한 디바이스제조방법 Expired - Fee Related KR100219824B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP96-16985 1996-01-08
JP1698596 1996-01-08
JP1698696A JPH09190224A (ja) 1996-01-08 1996-01-08 Ｘｙステージ制御装置
JP96-16986 1996-01-18
JP96-340445 1996-12-06
JP8340445A JPH09251955A (ja) 1996-01-08 1996-12-06 露光方法および装置、ならびにデバイス製造方法

Publications (2)

Publication Number Publication Date
KR970060355A KR970060355A (ko) 1997-08-12
KR100219824B1 true KR100219824B1 (ko) 1999-09-01

Family

ID=27281646

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970000253A Expired - Fee Related KR100219824B1 (ko) 1996-01-08 1997-01-08 노광방법 및 장치, 그리고 그것을 사용한 디바이스제조방법

Country Status (3)

Country Link
EP (1) EP0785571B1 (enExample)
KR (1) KR100219824B1 (enExample)
DE (1) DE69610691T2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100521704B1 (ko) * 1997-09-19 2005-10-14 가부시키가이샤 니콘 스테이지장치, 주사형 노광장치 및 방법, 그리고 이것으로제조된 디바이스
JP3796367B2 (ja) 1999-03-09 2006-07-12 キヤノン株式会社 ステージ制御方法、露光方法、露光装置およびデバイス製造方法
US6285438B1 (en) 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans
JP2004072076A (ja) 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
US7016019B2 (en) 2003-12-16 2006-03-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100456136C (zh) * 2005-12-02 2009-01-28 上海微电子装备有限公司 一种步进扫描投影光刻机多总线时序同步控制方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4023126A (en) * 1975-06-26 1977-05-10 Gte Laboratories Incorporated Scanning photographic printer for integrated circuits
US5285236A (en) * 1992-09-30 1994-02-08 Kanti Jain Large-area, high-throughput, high-resolution projection imaging system

Also Published As

Publication number Publication date
EP0785571B1 (en) 2000-10-18
DE69610691D1 (de) 2000-11-23
KR970060355A (ko) 1997-08-12
DE69610691T2 (de) 2001-05-03
EP0785571A2 (en) 1997-07-23
EP0785571A3 (enExample) 1997-08-27

Similar Documents

Publication Publication Date Title
JP2862477B2 (ja) 露光装置及び該露光装置を用いてデバイスを製造する方法
US6424405B2 (en) Exposure apparatus and device manufacturing method
JPH088177A (ja) 投影露光装置及びそれを用いたデバイスの製造方法
JPH08236438A (ja) 照明装置、走査型露光装置及びこの走査型露光装置を用いたデバイスの製造方法
US20100002212A1 (en) Scanning exposure apparatus, exposure method, and device manufacturing method
KR100219824B1 (ko) 노광방법 및 장치, 그리고 그것을 사용한 디바이스제조방법
US6233040B1 (en) Exposure apparatus with setting of stage driving in accordance with type of motion of stage and device manufacturing method
US6809798B1 (en) Stage control method, exposure method, exposure apparatus and device manufacturing method
JPH11233423A (ja) 露光用シャッタおよび露光装置ならびにディバイス製造方法
KR19980024880A (ko) 주사노광장치 및 방법
JPH0917718A (ja) 露光装置及びこれを用いたデバイス生産方法
JP4579367B2 (ja) 走査露光装置及び走査露光方法
US6970244B2 (en) Scan exposure apparatus and method, and device manufacturing method
JP2000164506A (ja) 露光方法および装置
EP4120022B1 (en) Exposure apparatus and method of manufacturing article
US5838443A (en) Exposure apparatus implementing priority speed setting arrangement
JPH09251955A (ja) 露光方法および装置、ならびにデバイス製造方法
JP4598902B2 (ja) 走査露光装置およびデバイス製造方法
JP2534567B2 (ja) ウエハ周辺露光方法及びウエハ周辺露光装置
JP3387581B2 (ja) 露光装置及び該露光装置を用いてデバイスを製造する方法
JPH09199402A (ja) 走査型露光装置
JP3167077B2 (ja) 露光装置とこれを用いたデバイス製造方法
JP3363522B2 (ja) 走査型露光装置及びデバイス製造方法
JPH09306804A (ja) 露光装置及びそれを用いたデバイスの製造方法
JP2000286177A (ja) ステージ制御方法および制御装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

G170 Re-publication after modification of scope of protection [patent]
PG1701 Publication of correction

St.27 status event code: A-5-5-P10-P19-oth-PG1701

Patent document republication publication date: 20000315

Republication note text: Request for Correction Notice

Gazette number: 1002198240000

Gazette reference publication date: 19990901

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

FPAY Annual fee payment

Payment date: 20100525

Year of fee payment: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20110617

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20110617