JPWO2025005020A5 - - Google Patents

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Publication number
JPWO2025005020A5
JPWO2025005020A5 JP2025530105A JP2025530105A JPWO2025005020A5 JP WO2025005020 A5 JPWO2025005020 A5 JP WO2025005020A5 JP 2025530105 A JP2025530105 A JP 2025530105A JP 2025530105 A JP2025530105 A JP 2025530105A JP WO2025005020 A5 JPWO2025005020 A5 JP WO2025005020A5
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JP
Japan
Prior art keywords
forming composition
lithography
group
composition according
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025530105A
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English (en)
Japanese (ja)
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JPWO2025005020A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/022700 external-priority patent/WO2025005020A1/ja
Publication of JPWO2025005020A1 publication Critical patent/JPWO2025005020A1/ja
Publication of JPWO2025005020A5 publication Critical patent/JPWO2025005020A5/ja
Pending legal-status Critical Current

Links

JP2025530105A 2023-06-30 2024-06-24 Pending JPWO2025005020A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023108181 2023-06-30
PCT/JP2024/022700 WO2025005020A1 (ja) 2023-06-30 2024-06-24 リソグラフィー膜形成組成物、リソグラフィー下層膜及びレジストパターン形成方法

Publications (2)

Publication Number Publication Date
JPWO2025005020A1 JPWO2025005020A1 (https=) 2025-01-02
JPWO2025005020A5 true JPWO2025005020A5 (https=) 2026-04-01

Family

ID=93938566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025530105A Pending JPWO2025005020A1 (https=) 2023-06-30 2024-06-24

Country Status (3)

Country Link
JP (1) JPWO2025005020A1 (https=)
TW (1) TW202511366A (https=)
WO (1) WO2025005020A1 (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190003528A (ko) * 2016-04-28 2019-01-09 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 레지스트 하층막 형성용 조성물, 리소그래피용 하층막, 및, 패턴 형성방법
KR20250138820A (ko) * 2019-07-02 2025-09-22 오지 홀딩스 가부시키가이샤 패턴 형성 방법, 레지스트 재료, 및 패턴 형성 장치

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