JPWO2025005020A1 - - Google Patents
Info
- Publication number
- JPWO2025005020A1 JPWO2025005020A1 JP2025530105A JP2025530105A JPWO2025005020A1 JP WO2025005020 A1 JPWO2025005020 A1 JP WO2025005020A1 JP 2025530105 A JP2025530105 A JP 2025530105A JP 2025530105 A JP2025530105 A JP 2025530105A JP WO2025005020 A1 JPWO2025005020 A1 JP WO2025005020A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
- C08G79/14—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing two or more elements other than carbon, oxygen, nitrogen, sulfur and silicon
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023108181 | 2023-06-30 | ||
| PCT/JP2024/022700 WO2025005020A1 (ja) | 2023-06-30 | 2024-06-24 | リソグラフィー膜形成組成物、リソグラフィー下層膜及びレジストパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2025005020A1 true JPWO2025005020A1 (https=) | 2025-01-02 |
| JPWO2025005020A5 JPWO2025005020A5 (https=) | 2026-04-01 |
Family
ID=93938566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025530105A Pending JPWO2025005020A1 (https=) | 2023-06-30 | 2024-06-24 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2025005020A1 (https=) |
| TW (1) | TW202511366A (https=) |
| WO (1) | WO2025005020A1 (https=) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190003528A (ko) * | 2016-04-28 | 2019-01-09 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 레지스트 하층막 형성용 조성물, 리소그래피용 하층막, 및, 패턴 형성방법 |
| KR20250138820A (ko) * | 2019-07-02 | 2025-09-22 | 오지 홀딩스 가부시키가이샤 | 패턴 형성 방법, 레지스트 재료, 및 패턴 형성 장치 |
-
2024
- 2024-06-24 WO PCT/JP2024/022700 patent/WO2025005020A1/ja not_active Ceased
- 2024-06-24 JP JP2025530105A patent/JPWO2025005020A1/ja active Pending
- 2024-06-28 TW TW113124365A patent/TW202511366A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202511366A (zh) | 2025-03-16 |
| WO2025005020A1 (ja) | 2025-01-02 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251114 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20251029 |