JPWO2024252870A1 - - Google Patents

Info

Publication number
JPWO2024252870A1
JPWO2024252870A1 JP2025526021A JP2025526021A JPWO2024252870A1 JP WO2024252870 A1 JPWO2024252870 A1 JP WO2024252870A1 JP 2025526021 A JP2025526021 A JP 2025526021A JP 2025526021 A JP2025526021 A JP 2025526021A JP WO2024252870 A1 JPWO2024252870 A1 JP WO2024252870A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025526021A
Other languages
Japanese (ja)
Other versions
JPWO2024252870A5 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024252870A1 publication Critical patent/JPWO2024252870A1/ja
Publication of JPWO2024252870A5 publication Critical patent/JPWO2024252870A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/212Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/33Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2025526021A 2023-06-07 2024-05-15 Pending JPWO2024252870A1 (enExample)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023094199 2023-06-07
PCT/JP2024/017949 WO2024252870A1 (ja) 2023-06-07 2024-05-15 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2024252870A1 true JPWO2024252870A1 (enExample) 2024-12-12
JPWO2024252870A5 JPWO2024252870A5 (enExample) 2026-03-05

Family

ID=93795339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025526021A Pending JPWO2024252870A1 (enExample) 2023-06-07 2024-05-15

Country Status (4)

Country Link
US (1) US20260082686A1 (enExample)
JP (1) JPWO2024252870A1 (enExample)
CN (1) CN121312282A (enExample)
WO (1) WO2024252870A1 (enExample)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4647194B2 (ja) * 2003-07-14 2011-03-09 新光電気工業株式会社 キャパシタ装置及びその製造方法
JP5138260B2 (ja) * 2006-05-19 2013-02-06 株式会社テラミクロス チップ型電子部品
JP2012038818A (ja) * 2010-08-04 2012-02-23 Toshiba Corp 半導体装置
US9153504B2 (en) * 2013-10-11 2015-10-06 Taiwan Semiconductor Manufacturing Company, Ltd. Metal insulator metal capacitor and method for making the same
CN207149541U (zh) * 2015-02-27 2018-03-27 株式会社村田制作所 电容器以及电子设备
JP6489202B2 (ja) * 2015-02-27 2019-03-27 株式会社村田製作所 キャパシタ
US9875848B2 (en) * 2015-12-21 2018-01-23 Qualcomm Incorporated MIM capacitor and method of making the same
JP6451893B2 (ja) * 2016-03-18 2019-01-16 株式会社村田製作所 容量素子
WO2020012691A1 (ja) * 2018-07-11 2020-01-16 株式会社村田製作所 容量素子

Also Published As

Publication number Publication date
US20260082686A1 (en) 2026-03-19
CN121312282A (zh) 2026-01-09
WO2024252870A1 (ja) 2024-12-12

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

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Effective date: 20251203

A621 Written request for application examination

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Effective date: 20251203