JPWO2024029409A5 - - Google Patents
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- Publication number
- JPWO2024029409A5 JPWO2024029409A5 JP2024539093A JP2024539093A JPWO2024029409A5 JP WO2024029409 A5 JPWO2024029409 A5 JP WO2024029409A5 JP 2024539093 A JP2024539093 A JP 2024539093A JP 2024539093 A JP2024539093 A JP 2024539093A JP WO2024029409 A5 JPWO2024029409 A5 JP WO2024029409A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- multilayer reflective
- reflective film
- refractive index
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001459 lithography Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229910052741 iridium Inorganic materials 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910000952 Be alloy Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000013041 optical simulation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022124350 | 2022-08-03 | ||
| PCT/JP2023/027271 WO2024029409A1 (ja) | 2022-08-03 | 2023-07-25 | 反射型マスクブランク及び反射型マスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024029409A1 JPWO2024029409A1 (https=) | 2024-02-08 |
| JPWO2024029409A5 true JPWO2024029409A5 (https=) | 2025-04-16 |
Family
ID=89849014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024539093A Pending JPWO2024029409A1 (https=) | 2022-08-03 | 2023-07-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250172863A1 (https=) |
| JP (1) | JPWO2024029409A1 (https=) |
| KR (1) | KR20250041128A (https=) |
| TW (1) | TW202411766A (https=) |
| WO (1) | WO2024029409A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5766393B2 (ja) | 2009-07-23 | 2015-08-19 | 株式会社東芝 | 反射型露光用マスクおよび半導体装置の製造方法 |
| SG11201913862WA (en) * | 2017-07-05 | 2020-01-30 | Toppan Printing Co Ltd | Reflective photomask blank and reflective photomask |
| JP7250511B2 (ja) * | 2018-12-27 | 2023-04-03 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
| KR102946015B1 (ko) * | 2019-10-29 | 2026-03-31 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크 및 반사형 마스크 |
| KR20220122614A (ko) * | 2019-12-27 | 2022-09-02 | 에이지씨 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크, euv 리소그래피용 반사형 마스크 및 그들의 제조 방법 |
| CN118302719A (zh) * | 2021-11-24 | 2024-07-05 | 凸版光掩模有限公司 | 反射型光掩模坯以及反射型光掩模 |
-
2023
- 2023-07-25 JP JP2024539093A patent/JPWO2024029409A1/ja active Pending
- 2023-07-25 WO PCT/JP2023/027271 patent/WO2024029409A1/ja not_active Ceased
- 2023-07-25 KR KR1020257002975A patent/KR20250041128A/ko active Pending
- 2023-07-28 TW TW112128416A patent/TW202411766A/zh unknown
-
2025
- 2025-01-16 US US19/026,233 patent/US20250172863A1/en active Pending
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