JPWO2024029409A1 - - Google Patents
Info
- Publication number
- JPWO2024029409A1 JPWO2024029409A1 JP2024539093A JP2024539093A JPWO2024029409A1 JP WO2024029409 A1 JPWO2024029409 A1 JP WO2024029409A1 JP 2024539093 A JP2024539093 A JP 2024539093A JP 2024539093 A JP2024539093 A JP 2024539093A JP WO2024029409 A1 JPWO2024029409 A1 JP WO2024029409A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022124350 | 2022-08-03 | ||
| PCT/JP2023/027271 WO2024029409A1 (ja) | 2022-08-03 | 2023-07-25 | 反射型マスクブランク及び反射型マスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024029409A1 true JPWO2024029409A1 (https=) | 2024-02-08 |
| JPWO2024029409A5 JPWO2024029409A5 (https=) | 2025-04-16 |
Family
ID=89849014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024539093A Pending JPWO2024029409A1 (https=) | 2022-08-03 | 2023-07-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250172863A1 (https=) |
| JP (1) | JPWO2024029409A1 (https=) |
| KR (1) | KR20250041128A (https=) |
| TW (1) | TW202411766A (https=) |
| WO (1) | WO2024029409A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5766393B2 (ja) | 2009-07-23 | 2015-08-19 | 株式会社東芝 | 反射型露光用マスクおよび半導体装置の製造方法 |
| SG11201913862WA (en) * | 2017-07-05 | 2020-01-30 | Toppan Printing Co Ltd | Reflective photomask blank and reflective photomask |
| JP7250511B2 (ja) * | 2018-12-27 | 2023-04-03 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
| KR102946015B1 (ko) * | 2019-10-29 | 2026-03-31 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크 및 반사형 마스크 |
| KR20220122614A (ko) * | 2019-12-27 | 2022-09-02 | 에이지씨 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크, euv 리소그래피용 반사형 마스크 및 그들의 제조 방법 |
| CN118302719A (zh) * | 2021-11-24 | 2024-07-05 | 凸版光掩模有限公司 | 反射型光掩模坯以及反射型光掩模 |
-
2023
- 2023-07-25 JP JP2024539093A patent/JPWO2024029409A1/ja active Pending
- 2023-07-25 WO PCT/JP2023/027271 patent/WO2024029409A1/ja not_active Ceased
- 2023-07-25 KR KR1020257002975A patent/KR20250041128A/ko active Pending
- 2023-07-28 TW TW112128416A patent/TW202411766A/zh unknown
-
2025
- 2025-01-16 US US19/026,233 patent/US20250172863A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250041128A (ko) | 2025-03-25 |
| WO2024029409A1 (ja) | 2024-02-08 |
| TW202411766A (zh) | 2024-03-16 |
| US20250172863A1 (en) | 2025-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250122 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260209 |