JPWO2023228691A5 - - Google Patents
Info
- Publication number
- JPWO2023228691A5 JPWO2023228691A5 JP2024522996A JP2024522996A JPWO2023228691A5 JP WO2023228691 A5 JPWO2023228691 A5 JP WO2023228691A5 JP 2024522996 A JP2024522996 A JP 2024522996A JP 2024522996 A JP2024522996 A JP 2024522996A JP WO2023228691 A5 JPWO2023228691 A5 JP WO2023228691A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- copolymer
- positive
- alkyl group
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022087228 | 2022-05-27 | ||
| JP2022190754 | 2022-11-29 | ||
| PCT/JP2023/017090 WO2023228691A1 (ja) | 2022-05-27 | 2023-05-01 | ポジ型レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023228691A1 JPWO2023228691A1 (https=) | 2023-11-30 |
| JPWO2023228691A5 true JPWO2023228691A5 (https=) | 2026-04-13 |
Family
ID=88919008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024522996A Pending JPWO2023228691A1 (https=) | 2022-05-27 | 2023-05-01 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023228691A1 (https=) |
| TW (1) | TW202349123A (https=) |
| WO (1) | WO2023228691A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6029745A (ja) * | 1983-07-28 | 1985-02-15 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS6064432A (ja) * | 1983-09-19 | 1985-04-13 | Fujitsu Ltd | パタ−ン形成方法 |
| JPH01217020A (ja) * | 1988-02-26 | 1989-08-30 | Tosoh Corp | ポリアクリル酸誘導体 |
| US11644752B2 (en) * | 2016-12-27 | 2023-05-09 | Zeon Corporation | Polymer, positive resist composition, and method of forming resist pattern |
| JP7196496B2 (ja) * | 2018-09-25 | 2022-12-27 | 日本ゼオン株式会社 | レジストパターン形成方法 |
| JP7508805B2 (ja) * | 2020-02-27 | 2024-07-02 | 日本ゼオン株式会社 | 共重合体の製造方法およびポジ型レジスト組成物の製造方法 |
-
2023
- 2023-05-01 JP JP2024522996A patent/JPWO2023228691A1/ja active Pending
- 2023-05-01 WO PCT/JP2023/017090 patent/WO2023228691A1/ja not_active Ceased
- 2023-05-19 TW TW112118770A patent/TW202349123A/zh unknown
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